UMEZAKI Yoji 梅崎洋二

Researcher Number	70038066
Other IDs
External Links
Affiliation (based on the past Project Information) *help	2008 – 2010: 九州大学, 大学院・工学研究院, 助教 2003 – 2005: 九州大学, 大学院・工学研究院, 助手 2000: KYUSHU UNIVERSITY, Faculty of Engineering, Research Ass., 大学院・工学研究院, 助手 1999: 九州大学, 大学院・工学研究科, 助手 1997 – 1998: 九州大学, 工学部, 助手 1988 – 1995: 九州大学, 工学部, 助手 1994: 宮崎大学, 工学部, 助手
Review Section/Research Field	Principal Investigator 機械要素 Except Principal Investigator 設計工学・機械要素・トライボロジー / 機械要素 / Design engineering/Machine functional elements/Tribology / Production engineering/Processing studies / 機械工作・生産工学
Keywords	Principal Investigator 高精度ホブ切り / 高硬度歯車 / ホブ盤の動特性 / 切削 / 歯車 / ホブ切り精度 / 歯車精度 / ホブ切り Except Principal Investigator Gear / 歯車 … More / ホブ切り / Hobbing / 負荷能力 / Transmission error / Cutting / 歯面粗さ / CBN / 切削 / Tooth surface failure / Tooth surface durability / 歯面損傷 / Load carrying capacity / Tooth surface roughness / Gear accuracy / Economical tooth finishing / 歯面強さ / 歯車精度 / 経済的歯面仕上げ / Axial runout / Non-destructive measurement / Tooth flank topography / Engagement / Eccentricity / Small module / 最小自乗法 / 測定 / かみあい / 端面振れ / 非破壊測定 / 歯面トポグラフィ / 伝達誤差 / かみ合い / 偏心 / 微小モジュール / Mechanism of chip formation / Transient phenomenon of cutting / High speed camera / 画像処理 / 高速度ビデオカメラ / 切りくず / 切りくず生成機構 / 切削過渡現象 / 高速度カメラ / Elastic deformation / Rotary encoder / Measurement system / Simulation / Tooth flank configuration error / High precision measurement / 高精度運動伝達 / 心出し / 負荷 / かみあい精度 / 弾性変形 / ロータリエンコーダ / シミュレーション / 測定システム / 歯面形状誤差 / 高精度測定 / かみあい制度 / Tooth Surface Roughness / Load-Carrying Capacity / Accurate Gear / Cermet / サーメット / 高精度歯車 / サ-メット / Bending fatigue strength / Load-carrying capacity / Rolling / Hyobbing / Austempered ductile iron / 面圧強さ / 曲げ強さ / 転造 / 球状黒鉛鋳鉄 / 高圧酸素雰囲気 / 電解CMP / 雰囲気制御加工 / 難加工材料 / 多枚数同時加工 / 両面同時加工 / 光触媒反応の援用 / 高圧ガス雰囲気と減圧雰囲気 / ベルジャー密閉型 / 加工レート / SiC / Si / 光触媒反応 / 密閉雰囲気 / 密閉型加工 / CMP / 高回転数 / 法線分力 / 低剛性砥石 / 低切込み / 研削低抗 / 目づまり / CBN工具 / 超音波振動研削 Less

Development of a new Chemical Mechanical Polishing (CMP) machine, assisted by the photocatalytic reactions and electrolytic actions in the atmosphere controlled sealed CMP chamber
- Principal Investigator
  
  DOI Toshiro
- Project Period (FY)
  2008 – 2010
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu University
Transmission error analysis of small module gears with eccentricity
- Principal Investigator
  
  KUROKAWA Syuhei
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Design engineering/Machine functional elements/Tribology
- Research Institution
  KYUSHU UNIVERSITY
Transient Phenomenon of Chip Generations and movements in hobbing
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1998 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (B).
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  KYUSHU UNIVERSITY
超音波振動研削によるCBN焼結多刃工具の成形に関する基礎研究
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1997 – 1998
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  機械工作・生産工学
- Research Institution
  Kyushu University
Development on High Precision Measurement and Simulations of Gear Transmissions under Load
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1994 – 1995
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research (B)
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  KYUSHU UNIVERSITY
High Efficiency Finish Hobbing of High Accurate Gears with cermet or CBN Hobs
- Principal Investigator
  
  ARIURA Yasutune
- Project Period (FY)
  1993 – 1994
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  KYUSHU UNIVERSITY
高硬度歯車の高精度ホブ切りに関する研究Principal Investigator
- Principal Investigator
  
  梅崎洋二
- Project Period (FY)
  1992
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  機械要素
- Research Institution
  Kyushu University
Research on Austempered Ductile Iron Gear
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1990 – 1991
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research (B)
- Research Field
  
  機械要素
- Research Institution
  Kyushu University
Economical manufacturing of high accuracy gears and their performance
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1988 – 1989
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  機械要素
- Research Institution
  Kyushu University

All 2010 2009 2008

All Journal Article Presentation Book

[Book] ものづくりのイノベーションとそのサステナビリティを目指して第75巻,第6号2009
- Author(s)
  土肥俊郎, 黒河周平, 梅崎洋二
- Publisher
  精密工学会誌
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Polishing/CMP for Glass Substrates in a Radical Polishing Environment, Using Manganese Oxide Slurry as an Alternative for Ceria Slurry2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, O.Ohnishi,Y.Akagami, Y.Yamaguchi, S.Kishii
- Journal Title
  
  Advances in Science and Technology Vol.64
  
  Pages: 65-70
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Study on the Development of Resource-Saving High Performance Slurry -Polishing/CMP for glass substrates in a radical polishing environment, using manganese oxide slurry as an alternative for ceria slurry-2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, et al.
- Journal Title
  
  Advances in Science and Technology
  
  Volume: 64 Pages: 65-70
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Basic Characteristics of a Simultaneous Double-side CMP Machine, Housed in a Sealed,Pressure-Resistance Container2010
- Author(s)
  K.Kitamura, T.Doi, S.Kurokawa, Y.Umezaki, Y.Matsukawa, Y.Ooki, T.Hasegawa, I.Koshiyama, K.Ichikawa, Y.Nakamura
- Journal Title
  
  Key Engineering Materials Vols.447-448
  
  Pages: 61-65
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] 4酸化マンガン系スラリーを用いたSiC基板の精密加工プロセスに関する研究-ベルジャー型加工機を用いた各種加工雰囲2010
- Author(s)
  長谷川正, 土肥俊郎, 黒河周平, 大西修, 梅崎洋二, 山崎努, 北村圭, 河瀬康弘, 岸井貞浩
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学(名古屋
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Characteristics of Silicon CMP Performed in Various High Pressure Atmospheres -Development of a New Double-side Simultaneous CMP Machine Housed in a High Pressure Chamber-2010
- Author(s)
  K.Kitamura, T.Doi, S.Kurokawa, O.Ohnishi, Y.Umezaki, T.Yamazaki, Y.Matsukawa, T.Hasegawa, I.Koshiyama, K.Ichikawa
- Organizer
  Advanced Metallization Conference
- Place of Presentation
  東京大学(大学)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Polishing/CMP for glass substrates in a radical polishing environment, using manganese oxide slurry as an alternative for ceria slurry2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, et al.
- Organizer
  Proc.of CIMTEC2010 (12th International Ceramics Congress)
- Place of Presentation
  Itary
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Characteristics of Silicon CMP performed in various high pressure atmospheres-Development of a new double-side simultaneous CMP machine housed in a high pressure chamber2010
- Author(s)
  K.Kitamura, T.Doi, S.Kurokawa, O.Ohnishi, Y.Umezaki, T.Yamazaki, Y.Matsukawa, T.Hasegawa, I.Koshiyama, K.Ichikawa
- Organizer
  Advanced Metallization Conference 2010 : 20^<th> Asian Session)
- Place of Presentation
  東京大学(大学)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] ガラス基板の研磨とラジカル環境場の効果-酸化セリウム系スラリーと酸化マンガン系スラリーによるCMP特性-2010
- Author(s)
  山崎努, 土肥俊郎, 黒河周平, 大西修, 梅崎洋二, 松川洋二, 山口靖英, 岸井貞浩
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学(名古屋
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Study on the Development of Resource-Saving High Performance Slurry - Polishing/CMP for glasssubstrates in a radical polishing environment2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, O.Ohnishi,Y.Akagami, Y.Yamaguchi, S.Kishii
- Organizer
  using manganese oxide slurry as an alternative for ceria slurry-, CIMTEC2011 12th International Ceramics Congress
- Place of Presentation
  Montecatine Terme, Itary
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Si CMP with a Sealed "Bell-Jar" Type CMP Machine -Proc. Characteristics of Si-CMP, Influenced by the Processing Atmosphere and Additives Dispersed in the Slurry-2008
- Author(s)
  T.Kihara, T.Doi, S.Kurokawa, Y.Ooki, Y.Umezaki, Y.Matsukawa, K.Ichikawa, I.Koshiyama, H.Kohno
- Organizer
  The 5^<th> International Symposium on Advanced Science and Technology of Silicon Materials
- Place of Presentation
  Kona, Hawaii (USA)
- Data Source
  KAKENHI-PROJECT-20246033

1. ARIURA Yasutsune (10038044)

# of Collaborated Projects: 6 results

# of Collaborated Products: 0 results
2. KUROKAWA Syuhei (90243899)

# of Collaborated Projects: 5 results

# of Collaborated Products: 11 results
3. NAKANISHI Tsutomu (40038055)

# of Collaborated Projects: 5 results

# of Collaborated Products: 0 results
4. ONIKURA Hiromiti (90108655)

# of Collaborated Projects: 4 results

# of Collaborated Products: 0 results
5. ISHIMARU Ryohei (10264061)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
6. DOI Toshiro (30207675)

# of Collaborated Projects: 1 results

# of Collaborated Products: 11 results
7. YANO Mitsuru (10230286)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. ODA Satoru (50032016)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
9. OZAKI Tatsuo (40037742)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
10. YAMAMOTO Motoji (90202390)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
11. MOHRI Akira (50037909)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
12. 甲木昭雄 (20038095)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
13. 井上繁 (20069553)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
14. 上野拓 (10037640)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

UMEZAKI Yoji 梅崎 洋二

Research Projects

Research Products

Co-Researchers

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

高硬度歯車の高精度ホブ切りに関する研究Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Book] ものづくりのイノベーションとそのサステナビリティを目指して第75巻,第6号2009

Author(s)

Publisher

Data Source

[Journal Article] Polishing/CMP for Glass Substrates in a Radical Polishing Environment, Using Manganese Oxide Slurry as an Alternative for Ceria Slurry2010

Author(s)

Journal Title

Data Source

[Journal Article] Study on the Development of Resource-Saving High Performance Slurry -Polishing/CMP for glass substrates in a radical polishing environment, using manganese oxide slurry as an alternative for ceria slurry-2010

Author(s)

Journal Title

Data Source

[Journal Article] Basic Characteristics of a Simultaneous Double-side CMP Machine, Housed in a Sealed,Pressure-Resistance Container2010

Author(s)

Journal Title

Data Source

[Presentation] 4酸化マンガン系スラリーを用いたSiC基板の精密加工プロセスに関する研究-ベルジャー型加工機を用いた各種加工雰囲2010

Author(s)

Organizer

Place of Presentation

Data Source

[Presentation] Characteristics of Silicon CMP Performed in Various High Pressure Atmospheres -Development of a New Double-side Simultaneous CMP Machine Housed in a High Pressure Chamber-2010

Author(s)

Organizer

Place of Presentation

Data Source

[Presentation] Polishing/CMP for glass substrates in a radical polishing environment, using manganese oxide slurry as an alternative for ceria slurry2010

Author(s)

Organizer

Place of Presentation

UMEZAKI Yoji 梅崎洋二