YOSHIDA Norimitsu 吉田憲充

Researcher Number	70293545
Other IDs
Affiliation (Current)	2025: 岐阜大学, 工学部, 准教授
Affiliation (based on the past Project Information) *help	2009 – 2010: Gifu University, 工学研究科, 准教授 2008: Gifu University, 大学院・工学研究科, 准教授 2004: 岐阜大学, 工学研究科, 助教授 2002 – 2004: 岐阜大学, 大学院・工学研究科, 助教授 1999: Faculty of Engineering, Gifu University, Associate Professor, 工学部, 助教授
Review Section/Research Field	Principal Investigator Electronic materials/Electric materials Except Principal Investigator Electronic materials/Electric materials
Keywords	Principal Investigator 物性実験 / 電気・電子材料 Except Principal Investigator 微結晶シリコン / low energy absorption / photothermal bending spectroscopy / microcrystalline silicon carbide / microcrystalline silicon / 微結晶シリコンカーバイト薄膜 / 微結晶シリコン薄膜 / 低エネルギー光吸収 … More / 温度可変光熱ベンディング分光法 / 微結晶シリコン系薄膜 / 低エネルギー吸収 / 温度可変光熱ベンディンング分光法 / 微結晶シリコンカーバイド薄膜 / Coefficient of linear expansion / Microcrystalline silicon / Initial stress / Amorphous lattice relaxzation / Laser optical-lever bending method / Photodegradation / Hydrogenated amorphous silicon / Light-induced expansion / 格子緩和 / 可逆現象 / アモルファス構造変化 / ベンディング法 / 線膨張係数 / 初期応力 / アモルファス格子緩和 / レーザー光てこベンディング法 / 光劣化 / 水素化アモルファスシリコン / 光誘起膨張 Less

A study on the origin of localized states in Si thin films by photothermal bending spectroscopyPrincipal Investigator
- Principal Investigator
  
  YOSHIDA Norimitsu
- Project Period (FY)
  2008 – 2010
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Gifu University
A study on estimation of localized states and its reduction in microcrystalline silicon films 〜An application of resonant photothenmal bending spectroscopy to hetero-structured films〜
- Principal Investigator
  
  NONOMURA Shuichi
- Project Period (FY)
  2002 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Gifu University
The Study of Light-induced Expansion in Hydrogenated Amorphous Silicon with Photodegradation
- Principal Investigator
  
  NONOMURA Shuichi
- Project Period (FY)
  1998 – 1999
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Gifu University

All 2010 2009 2008 2005 2004 Other

All Journal Article Presentation

[Journal Article] Preparations of P- and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells2010
- Author(s)
  Norimitsu Yoshida, Sho Terazawa, Atsuteru Takeuchi, Nobutaka Yoneyama, Tomo-o Morino, Zhao Jun, Hironori Natsuhara, Shuichi Nonomura
- Journal Title
  
  Physica Status Solidi (c)
  
  Volume: 7 Pages: 790-792
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560294
[Journal Article] Preparations of P-and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells2010
- Author(s)
  Norimitsu Yoshida, Sho Terazawa, Atsuteru Takeuchi, Nobutaka Yoneyama, Tomo-o Morino, Zhao Jun, Hironori Natsuhara, Shuichi Nonomura
- Journal Title
  
  Physica Status Solidi (c) Vol.7, No.3-4
  
  Pages: 790-792
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560294
[Journal Article] A study of absorption coefficient spectra in a-Si : H films near the transition from amorphous to crystalline phase measured by resonant photothermal bending spectroscopy2008
- Author(s)
  Norimitsu Yoshida, Yasuko Shimizu, Takashi Honda, Toshiaki Yokoi, Shuichi Nonomura
- Journal Title
  
  Journal of on-Crystalline Solids Vol.354
  
  Pages: 2164-2166
- NAID
  120006340027
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560294
[Journal Article] A study of absorption coefficient spectra in a-Si H films near the transition from amor phous to crystalline phase measured by resonant photothermal bending speetroscopy2008
- Author(s)
  Norimitsu Yoshida
- Journal Title
  
  Journal of Non-Crystalline Solids 354
  
  Pages: 2164-2166
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560294
[Journal Article] Suppression of photo-induced dilation in cyanide treated hydrogenated amorphous silicon films2005
- Author(s)
  Y.Sobajima, K.Mori, M.Tsukamoto, N.Yoshida, M.Takahashi, H.Kobayashi, S.Nonomura
- Journal Title
  
  Solar Energy Materials & Solar Cells 85
  
  Pages: 177-187
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Suppression of photo-induced dilation in cyanide treated hydrogenated amorphous silicon films2005
- Author(s)
  Y.Sobajima, K.Mori, M.Tsukamoto, N.Yoshida, M.Takahashi, H.Kobayashi, S.Nonomura
- Journal Title
  
  Solar Energy Materials & Solar Cells Vol.85
  
  Pages: 177-187
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] A Study of the localized state at 0.7〜1.2 eV in the Mc-Si:H film by resonant-PBS and CPM2004
- Author(s)
  T.Kunii, H.Shibagaki, T.Kiriyama, N.Yoshida, S.Nonomura
- Journal Title
  
  Proceedings of 19^<th> European Photovoltaic Solar Energy Conference and Exhibition
  
  Pages: 1629-1632
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] A change of photoinduced dilation of a-Si:H by cyanide treatment2004
- Author(s)
  Y.Sobajima, K.Mori, M.Tsukamoto.H.Kamiguchi, N.Yoshida, H.Kobayashi, S.Nonomura
- Journal Title
  
  Journal of Non-Crystalline Solids 338-340
  
  Pages: 365-368
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] A Study of the localized state at 0.7〜1.2 eV in the μc-Si : H film by resonant-PBS and CPM2004
- Author(s)
  T.Kunii, H.Shibagaki, T.Kiriyama, N.Yoshida, S.Nonomura
- Journal Title
  
  Proceedings of 19^<th> European Photovoltaic Solar Energy Conference and Exhibition
  
  Pages: 1629-1632
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] A study of the localized state at 0.7〜1.2 eV in the μc-Si:H by resonant-PBS and CPM2004
- Author(s)
  T.Kunii, H.Shibagaki, T.Kiriyama, N.Yoshida, S.Nonomura
- Journal Title
  
  Proceedings of 19^<th> European Photovoltaic Solar Energy Conference
  
  Pages: 1629-1632
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Preparation of N-doped TiO_2 thin films protecting transparent conducting oxide films for Si thin film solar cells
- Author(s)
  H.Natsuhara, K.Matsumoto, N.Yoshida, T.Itoh, S.Nonomura, M.Fukawa, K.Sato
- Journal Title
  
  Solar Energy Materials & Solar Cells (発表予定)
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Formation of the heterojunctions using carbon alloys by the hot-wire CVD method
- Author(s)
  S.Nonomura, N.Yoshida, T.Itoh
- Journal Title
  
  Thin Solid Films (発表予定)
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Amorphous SiC_x : H films prepared by Cat-CVD method using C_4H_<10> as a C source gas and its application to window layer for Si thin film solar cells
- Author(s)
  N.Yoshida, K.Takemoto, Y.Yamaguchi, M.Tsukamoto, K.Chikusa, A.Fukuta, T.Itoh, S.Nonomura
- Journal Title
  
  Solar Energy Materials & Solar Cells (in print)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Formation of the heterojunctions using carbon alloys by the hot-wire CVD method
- Author(s)
  S.Nonomura, N.Yoshida, T.Itoh
- Journal Title
  
  Thin Solid Films (印刷中)
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Preparation of N-doped TiO_2 shin films protecting transparent conducting oxide films for Si thin film solar cells
- Author(s)
  H.Natsuhara, K.Matsumoto, N.Yoshida, T.Itoh, S.Nonomura, M.Fukawa, K.Sato
- Journal Title
  
  Solar Energy Materials & Solar Cells (印刷中)
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] TiO_2 thin films as protective material for transparent conducting oxides used in Si thin film solar cells
- Author(s)
  H.Natsuhara, K.Matsumoto, N.Yoshida, T.Itoh, S.Nonomura, M.Fukawa, K.Sato
- Journal Title
  
  Solar Energy Materials & Solar Cells (発表予定)
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] TiO_2 thin films as protective material for transparent conducting oxides used in Si thin film solar cells
- Author(s)
  H.Natsuhara, K.Matsumoto, N.Yoshida, T.Itoh, S.Nonomura, M.Fukawa, K.Sato
- Journal Title
  
  Solar Energy Materials & Solar Cells (in print)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Formation of the heterojunctions using carbon alloys by the hot-wire CVD method
- Author(s)
  S.Nonomura, N.Yoshida, T.Itoh
- Journal Title
  
  Thin Solid Films (in print)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Amorphous SiC_X:H films prepared by Cat-CVD method using C_4H_<10> as a C source gas and its application to window layer for Si thin film solar cell
- Author(s)
  N.Yoshida, K.Takemoto, Y.Yamaguchi, M.Tsukamoto, K.Chikusa, A.Fukuta, T.Itoh, S.Nonomura
- Journal Title
  
  Solar Energy Materials & Solar Cells (印刷中)
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Preparation of N-doped TiO_2 thin films protecting transparent conducting oxide films for Si thin film solar cells
- Author(s)
  H.Natsuhara, K.Matsumoto, N.Yoshida, T.Itoh, S.Nonoomura, M.Fukawa, K.Sato
- Journal Title
  
  Solar Energy Materials & Solar Cells (in print)
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Journal Article] Amorphous SiC_x : H films prepared by Cat-CVD method using C_4H_<10> as a C source gas and its application to window layer for Si thin film solar cell
- Author(s)
  N.Yoshida, K.Takemoto, Y.Yamaguchi, M.Tsukamoto, K.Chikusa, A.Fukuta, T.Itoh, S.Nonomura
- Journal Title
  
  Solar Energy Materials & Solar Cells (発表予定)
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-14350163
[Presentation] Preparations of P-and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for si thin film solar cells2009
- Author(s)
  Norimitsu Yoshida, et al
- Organizer
  23rd International Conference on Amorphous and Nanocrystalline Semiconductors
- Place of Presentation
  Utrecht, the Netherlands
- Year and Date
  2009-08-24
- Data Source
  KAKENHI-PROJECT-20560294
[Presentation] Preparations of P-and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells2009
- Author(s)
  Norimitsu Yoshida, Sho Terazawa, Atsuteru Takeuchi, Nobutaka Yoneyama, Tomo-o Morino, Zhao Jun, Hironori Natsuhara, Shuichi Nonomura
- Organizer
  23rd International Conference on Amorphous and Nanocrystalline Semiconductors
- Place of Presentation
  Utrecht, the Netherlands.
- Year and Date
  2009-08-24
- Data Source
  KAKENHI-PROJECT-20560294

1. NONOMURA Shuichi (80164721)

# of Collaborated Projects: 3 results

# of Collaborated Products: 20 results
2. NATSUHARA Hironori (30444334)

# of Collaborated Projects: 1 results

# of Collaborated Products: 3 results
3. NITTA Shoji (90021584)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
4. ITOH Takashi (00223157)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

YOSHIDA Norimitsu 吉田 憲充

Research Projects

Research Products

Co-Researchers

A study on the origin of localized states in Si thin films by photothermal bending spectroscopyPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

A study on estimation of localized states and its reduction in microcrystalline silicon films 〜An application of resonant photothenmal bending spectroscopy to hetero-structured films〜

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

The Study of Light-induced Expansion in Hydrogenated Amorphous Silicon with Photodegradation

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Journal Article] Preparations of P- and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells2010

Author(s)

Journal Title

Data Source

[Journal Article] Preparations of P-and N-doped hydrogenated microcrystalline cubic silicon carbide films by VHF plasma enhanced chemical vapor deposition method for Si thin film solar cells2010

Author(s)

Journal Title

Data Source

[Journal Article] A study of absorption coefficient spectra in a-Si : H films near the transition from amorphous to crystalline phase measured by resonant photothermal bending spectroscopy2008

Author(s)

Journal Title

NAID

Data Source

[Journal Article] A study of absorption coefficient spectra in a-Si H films near the transition from amor phous to crystalline phase measured by resonant photothermal bending speetroscopy2008

Author(s)

Journal Title

Data Source

[Journal Article] Suppression of photo-induced dilation in cyanide treated hydrogenated amorphous silicon films2005

Author(s)

Journal Title

Description

Data Source

[Journal Article] Suppression of photo-induced dilation in cyanide treated hydrogenated amorphous silicon films2005

Author(s)

Journal Title

Description

Data Source

[Journal Article] A Study of the localized state at 0.7〜1.2 eV in the Mc-Si:H film by resonant-PBS and CPM2004

Author(s)

Journal Title

Description

Data Source

[Journal Article] A change of photoinduced dilation of a-Si:H by cyanide treatment2004

Author(s)

Journal Title

Data Source

[Journal Article] A Study of the localized state at 0.7〜1.2 eV in the μc-Si : H film by resonant-PBS and CPM2004

Author(s)

Journal Title

Description

Data Source

[Journal Article] A study of the localized state at 0.7〜1.2 eV in the μc-Si:H by resonant-PBS and CPM2004

Author(s)

Journal Title

Data Source

[Journal Article] Preparation of N-doped TiO_2 thin films protecting transparent conducting oxide films for Si thin film solar cells

Author(s)

Journal Title

Description

Data Source

[Journal Article] Formation of the heterojunctions using carbon alloys by the hot-wire CVD method

Author(s)

Journal Title

Description

Data Source

[Journal Article] Amorphous SiC_x : H films prepared by Cat-CVD method using C_4H_<10> as a C source gas and its application to window layer for Si thin film solar cells

Author(s)

Journal Title

YOSHIDA Norimitsu 吉田憲充