ISOMURA Masao 磯村雅夫

Researcher Number	70365998
Other IDs
Affiliation (based on the past Project Information) *help	2017 – 2019: 東海大学, 工学部, 教授 2008 – 2013: Tokai University, 工学部, 教授
Review Section/Research Field	Principal Investigator Applied physics, general Except Principal Investigator Plasma science
Keywords	Principal Investigator ゲルマニウム / 熱光発電 / プラズマ / 光電変換 / バイアス電圧 / 薄膜 / イオンダメージ / カソードバイアス / プラズマ電位 / スパッター … More / 結晶性 / イオン衝撃 / 水素 / 不活性ガス / ナノ結晶 / 反応性スパッター … More Except Principal Investigator プラズマ・核融合 / プラズマ加工 / プラズマ土壌改質 / 航空機翼材表面処理 / マイクロ波大気圧プラズマ / 大規模直線型マイクロ波照射源 / 大規模直線型プラズマ / 大規模表面処理 / 大面積プラズマ / 大規模直線型マイクロ波放射源 / 大規模プラズマ表面処理 / マイクロ波直線プラズマ / 大規模直線型大気圧プラズマ / FPDプロセス / 半導体プロセス / 大気圧プラズマ / 大面積プラズマ処理 / 大規模直線型マイクロ波プラズマ Less

A Study on Production Technology of Large-Scaled Linear Atmosheric Pressure Microwave Plasma
- Principal Investigator
  
  Shindo Haruo
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Plasma science
- Research Institution
  Plasma Research Laboratory Co., Ltd.
Nano-crystalline germanium films for thermo-photovoltaic devisesPrincipal Investigator
- Principal Investigator
  
  ISOMURA MASAO
- Project Period (FY)
  2011 – 2013
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  Tokai University
Nano-crystalline Germanium for Thermo-PhotovoltaicPrincipal Investigator
- Principal Investigator
  
  ISOMURA Masao
- Project Period (FY)
  2008 – 2010
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Applied physics, general
- Research Institution
  Tokai University

All 2020 2018 2017 2014 2013 2012 2011 2010 2009 2008 Other

All Journal Article Presentation Patent

[Journal Article] Development of flexible perovskite solar cells by the low-temperature fabrication of TiO2 electron transport layers2020
- Author(s)
  Mohammed Alshemeili, Arthur Nnadi, Sem Visal, Tetsuya Kaneko, Masao Isomura, Tetsuhiro Katsumata, Koji Tomita, Md. Shahiduzzaman
- Journal Title
  
  J. Advanced Science
  
  Volume: 32
- NAID
  130007815450
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K05736
[Journal Article] 大規模表面処理のための直線型マイクロ波プラズマ2018
- Author(s)
  進藤春雄　桑畑周司　磯村雅夫
- Journal Title
  
  自動車技術（招待論文）
  
  Volume: 72 Pages: 74-80
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K05736
[Journal Article] 表面処理のための大気圧直線型マイクロ波プラズマ2017
- Author(s)
  進藤春雄、桑畑周司、磯村雅夫
- Journal Title
  
  Journal of Vacuum Technologies of Japan
  
  Volume: 60 Pages: 105-111
- NAID
  130005466792
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K05736
[Journal Article] Generation of microwave-excited atmospheric-pressure line plasma and its application2017
- Author(s)
  Hiroshi Kuwahata, Hiroshi Miyata, Masao Isomura and Haruo Shindo
- Journal Title
  
  Japanese Journal of Applied Physics
  
  Volume: 56 Issue: 12 Pages: 126201-126201
- DOI
  10.7567/jjap.56.126201
- NAID
  210000148462
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-17K05736
[Journal Article] A new Floating-Probe for Measurement of Insulated Plasma Produced by Radio-Frequency Power2012
- Author(s)
  Yasuyuki Taniuch, Toshinori Yamada, Takanori Tokieda, Michiaki Utsumi, Masao Isomura and Haruo Shindo
- Journal Title
  
  Jpn. J. Appl. Phys.
  
  Volume: 51
- NAID
  210000141592
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23560057
[Journal Article] 反応性スパッタ法による微結晶ゲルマニウム薄膜における不純物添加効果2011
- Author(s)
  山田利宜、片岡拓朗、畑野雄太、磯村雅夫
- Journal Title
  
  東海大学紀要工学部
  
  Volume: 51 Pages: 77-82
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23560057
[Journal Article] 反応性スパッタ法による微結晶ゲルマニウム薄膜における不純物添加効果2011
- Author(s)
  山田利宜、片岡拓朗、畑野雄太、磯村雅夫
- Journal Title
  
  東海大学紀要工学部
  
  Volume: Vol.51、No. 1 Pages: 77-82
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-23560057
[Journal Article] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering2010
- Author(s)
  N.Yoshida, Y.Hatano, M.Isomura
- Journal Title
  
  Sol.Energy Mater.& Sol.Cells 95
  
  Pages: 175-178
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560047
[Journal Article] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering2010
- Author(s)
  N.Yoshida, Y.Hatano, M.Isomura
- Journal Title
  
  Sol.Energy Mater & Sol.Cells
  
  Volume: 95 Pages: 175-178
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560047
[Journal Article] Microcrystalline Silicon thin films deposited by the reactive RF magnetron sputtering system2009
- Author(s)
  Yuki Tomita, Masao Isomura
- Journal Title
  
  Sol.Energy Mater.& Sol.Cells 93
  
  Pages: 816-819
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560047
[Journal Article] Microcrystalline Germanium Thin Films Prepared by the Reactive RF Sputtering2008
- Author(s)
  M.Sugita, Y.Sano, Y.Tomita, M.Isomura
- Journal Title
  
  Method J.Non-Cryst Solids 354
  
  Pages: 2113-2116
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560047
[Journal Article] 反応性スパッター法による微結晶シリコンゲルマニウム半導体薄膜の作製2008
- Author(s)
  磯村雅夫、中村勲
- Journal Title
  
  J.Vac.Soc.Jpn. 51
  
  Pages: 663-667
- NAID
  10024407181
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560047
[Journal Article] Microcrystalline Silicon-Germanium Thin Films Prepared by the Chemical Transport Process Using Hydrogen Radicals2008
- Author(s)
  H.Kawauchi, M.Isomura, T.Matsui, M.Kondo
- Journal Title
  
  J.Non-Cryst.Solids 354
  
  Pages: 109-2112
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20560047
[Patent] 多結晶ゲルマニウムおよび多結晶シリコンゲルマニウム2010
- Inventor(s)
  磯村雅夫
- Industrial Property Rights Holder
  学校法人東海大学
- Filing Date
  2010-03-02
- Data Source
  KAKENHI-PROJECT-20560047
[Patent] 多結晶ゲルマニウムおよび多結晶シリコンゲルマニウム2010
- Inventor(s)
  磯村雅夫
- Industrial Property Rights Holder
  学校法人東海大学
- Filing Date
  2010-03-02
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 直線型マイクロ波プラズマ生成のための導波管内電磁界2018
- Author(s)
  宮翔真, 亀山高範, 内海倫明, 桑畑周司, 磯村雅夫, 進藤春雄
- Organizer
  応用物理学会
- Data Source
  KAKENHI-PROJECT-17K05736
[Presentation] Effect of Applying Negative DC Cathode Bias in RF Magnetron Sputtering2014
- Author(s)
  K. Osuga, T. Yamada, H. Shindo, M. Isomura
- Organizer
  8th International Conference on Reactive Plasmas / 31st Symposium on Plasma Processing
- Place of Presentation
  Fukuoka International Congress Center
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] Amorphous silicon-nitride films prepared by reactive sputtering2013
- Author(s)
  Makoto Nozawa and Masao Isomura
- Organizer
  25rd International Conference on Amorphous and Nanocrystalline Semiconductors
- Place of Presentation
  Trornto Univ., Canada
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] Amorphous silicon-nitride films prepared by reactive sputtering2013
- Author(s)
  M. Nozawa and M. Isomura
- Organizer
  25rd International Conference on Amorphous and Nanocrystalline Semiconductors
- Place of Presentation
  Toronto, Canada
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] Effect of applying negative DC cathode bias in RF magnetron sputtering2013
- Author(s)
  K. Osuga, T. Yamada, H. Shindo, M. Isomura
- Organizer
  MJIIT-JUC joint international symposium 2013
- Place of Presentation
  東海大学　湘南校舎
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] Effect of applying negative DC cathode bias in RF magnetron sputtering2013
- Author(s)
  K. Osuga, T. Yamada, H. Shindo, M. Isomura
- Organizer
  Proc. the MJIIT-JUC joint international symposium 2013
- Place of Presentation
  Tokai Univ., Hiratsuka, Japan
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] RFマグネトロンスパッタにおける負のDCカソードバイアス印加の効果2013
- Author(s)
  大須賀康平、山田利宜、進藤春雄、磯村雅夫
- Organizer
  第60回応用物理学会春季学術講演会
- Place of Presentation
  神奈川工科大学
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性スパッタ法を用いたアモルファスシリコン系ワイドバンドギャップ薄膜作製に関する検討2012
- Author(s)
  野澤慎、鈴木亮祐、磯村雅夫
- Organizer
  第73回応用物理学会学術講演会
- Place of Presentation
  愛媛大学・松山大学
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性RFスパッタ法におけるターゲット電極への負の直流バイアス印加によるイオンダメージ低減の検討2012
- Author(s)
  大須賀康平,山田利宜,進藤春雄,磯村雅夫
- Organizer
  第4回薄膜太陽電池セミナー
- Place of Presentation
  龍谷大学アバンティ響都ホ-ル
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] Effect of negative cathode bias voltage in reactive sputtering of microcrystalline silicon2012
- Author(s)
  T. Yamada, Y. Taniuti, H.Sindo , M. Isomura
- Organizer
  2th International Photovoltaic Science and Engineering Conference
- Place of Presentation
  Hangzhou, China
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] Effect of negative cathode bias voltage in reactive sputtering of microcrystalline silicon2012
- Author(s)
  T. Yamada, Y. Taniuti, H.Sindo , M. Isomura
- Organizer
  22th International Photovoltaic Science and Engineering Conference
- Place of Presentation
  Hangzhou, China
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 新エミッシブプロープ法による高周波プラズマの診断2012
- Author(s)
  山田利宜, 谷内康行, 内海倫明、磯村雅夫, 進藤春雄
- Organizer
  第59回応用物理学関係連合演会
- Place of Presentation
  早稲田大学
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性RFスパッタ法におけるターゲット電極への負の直流バイアス印加によるイオンダメージ低減の検討2012
- Author(s)
  大須賀康平，山田利宜，進藤春雄，磯村雅夫
- Organizer
  第４回薄膜太陽電池セミナー
- Place of Presentation
  龍谷大学アバンティ響都ホ－ル
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 微結晶SiGe太陽電池の現状と展望2011
- Author(s)
  磯村雅夫、近藤道夫、松井卓也
- Organizer
  表面技術協会材料機能ドライプロセス部会第86回例会
- Place of Presentation
  大田区産業プラザPiO
- Year and Date
  2011-01-26
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 容量結合型プラズマにおける負の直流カソードバイアス印加の効果2011
- Author(s)
  山田利宜, 谷内康行,磯村雅夫, 進藤春雄
- Organizer
  第７２回応用物理学会学術講演会
- Place of Presentation
  山形大学
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 容量結合型プラズマにおける負の直流カソードバイアス印加の効果2011
- Author(s)
  山田利宜,谷内康行,磯村雅夫,進藤春雄
- Organizer
  第72回応用物理学会学術講演会
- Place of Presentation
  山形大学
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性スパッタ法による微結晶Si_<1->XGe_XにおけるCH_4ガス添加効果2011
- Author(s)
  齋藤浩央、磯村雅夫
- Organizer
  第3回薄膜太陽電池セミナー
- Place of Presentation
  ラフレさいたま
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性スパッタ法を用いたSiO薄膜作製に関する検討2011
- Author(s)
  鈴木亮祐、磯村雅夫
- Organizer
  第３回薄膜太陽電池セミナー
- Place of Presentation
  ラフレさいたま
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性スパッタ法による微結晶Si1-XGeXにおけるCH4ガス添加効果2011
- Author(s)
  齋藤浩央、磯村雅夫
- Organizer
  第３回薄膜太陽電池セミナー
- Place of Presentation
  ラフレさいたま
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 高圧水蒸気処理による多結晶Ge薄膜の膜質改善に関する検討2011
- Author(s)
  鷺坂建, 高津貴大, 磯村雅夫
- Organizer
  第58回応用物理学関係連合演会
- Place of Presentation
  神奈川工科大学
- Year and Date
  2011-03-27
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 反応性スパッタ法を用いたSiO薄膜作製に関する検討2011
- Author(s)
  鈴木亮祐、磯村雅夫
- Organizer
  第3回薄膜太陽電池セミナー
- Place of Presentation
  ラフレさいたま
- Data Source
  KAKENHI-PROJECT-23560057
[Presentation] 反応性スパッタ法によって作製した微結晶Ge薄膜におけるCO_2添加効果2010
- Author(s)
  片岡拓郎、江川淳一、畑野雄太、吉田直広、磯村雅夫
- Organizer
  第57回応用物理学関係連合演会
- Place of Presentation
  東海大学湘南校舎
- Year and Date
  2010-03-18
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] Effects of CO_2 introduction to the reactive RF sputtering processes for micro-crys talline Ge thin films2010
- Author(s)
  Y.Hatano, N.Yoshida, M.Isomura
- Organizer
  5th World Conference on Photovoftaic Energy Conversion
- Place of Presentation
  Valencia, Spain
- Year and Date
  2010-09-06
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] Effects of CO_2 introduction to the reactive RF sputtering processes for micro-crystalline Ge thin films2010
- Author(s)
  Y.Hatano, N.Yoshida, M.Isomura
- Organizer
  25th European Photovoltaic Solar Energy Conference and 5th World Conference on Photovoltaic Energy Conversion
- Place of Presentation
  Valencia
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 反応性スパッタ法によって作製した微結晶Ge薄膜におけるCO_2添加効果2010
- Author(s)
  片岡拓郎、江川淳一、畑野雄太、吉田直広、磯村雅夫
- Organizer
  第57回応用物理学関係連合演会
- Place of Presentation
  東海大学
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 水素と不活性ガスの混合ガスを用いた反応性RFスパッタ法により作製した微結晶Ge薄膜2009
- Author(s)
  畑野雄太、吉田直弘、磯村雅夫
- Organizer
  第56回応用物理学関係連合演会
- Place of Presentation
  筑波大学
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering2009
- Author(s)
  N.Yoshida, Y.Hatano, M.Isomura
- Organizer
  19th International Photovoltaic Science and Engineering
- Place of Presentation
  Jeju, Korea
- Year and Date
  2009-11-11
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering2009
- Author(s)
  N.Yoshida, Y.Hatano, M.Isomura
- Organizer
  19th International Photovoltaic Science and Engineering Conference
- Place of Presentation
  Jeju, Korea, Nov.
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] Crystalline growth of Ge on single crystal Si substrates by solid phase crystallization2009
- Author(s)
  T.Nishimura, M.Isomura
- Organizer
  23rd International Conference on Amorphous and Nanocrystalline Semiconductors
- Place of Presentation
  Utrecht, Netherlands
- Year and Date
  2009-08-25
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 単結晶Si基板上に形成した非晶質Ge薄膜の固相成長による結晶成長2009
- Author(s)
  井口正太郎、西村友秀、磯村雅夫
- Organizer
  第70回応用物理学会学術講演会
- Place of Presentation
  富山大学
- Year and Date
  2009-09-10
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] 化学輸送堆積法により作製した微結晶SiGe薄膜における不活性ガス添加効果2008
- Author(s)
  上坂祐介、川内弘美、磯村雅夫
- Organizer
  第69回応用物理学会学術講演会
- Place of Presentation
  中部大学
- Data Source
  KAKENHI-PROJECT-20560047
[Presentation] Effect of Applying Negative DC Cathode Bias in RF Magnetron Sputtering
- Author(s)
  K. Osuga, T. Yamada, H. Shindo, M. Isomura
- Organizer
  8th International Conference on Reactive Plasmas / 31st Symposium on Plasma Processing (Fukuoka International Congress Center
- Place of Presentation
  Fukuoka, Japan
- Data Source
  KAKENHI-PROJECT-23560057

1. Shindo Haruo (20034407)

# of Collaborated Projects: 1 results

# of Collaborated Products: 4 results

ISOMURA Masao 磯村 雅夫

Research Projects

Research Products

Co-Researchers

A Study on Production Technology of Large-Scaled Linear Atmosheric Pressure Microwave Plasma

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Nano-crystalline germanium films for thermo-photovoltaic devisesPrincipal Investigator

Principal Investigator

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Research Institution

Nano-crystalline Germanium for Thermo-PhotovoltaicPrincipal Investigator

Principal Investigator

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[Journal Article] Development of flexible perovskite solar cells by the low-temperature fabrication of TiO2 electron transport layers2020

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NAID

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[Journal Article] 大規模表面処理のための直線型マイクロ波プラズマ2018

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[Journal Article] 表面処理のための大気圧直線型マイクロ波プラズマ2017

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NAID

Data Source

[Journal Article] Generation of microwave-excited atmospheric-pressure line plasma and its application2017

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DOI

NAID

Data Source

[Journal Article] A new Floating-Probe for Measurement of Insulated Plasma Produced by Radio-Frequency Power2012

Author(s)

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NAID

Data Source

[Journal Article] 反応性スパッタ法による微結晶ゲルマニウム薄膜における不純物添加効果2011

Author(s)

Journal Title

Data Source

[Journal Article] 反応性スパッタ法による微結晶ゲルマニウム薄膜における不純物添加効果2011

Author(s)

Journal Title

Data Source

[Journal Article] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering2010

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Data Source

[Journal Article] Microcrystalline Germanium Thin Films Prepared By Reactive RF Sputtering2010

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Data Source

[Journal Article] Microcrystalline Silicon thin films deposited by the reactive RF magnetron sputtering system2009

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[Journal Article] Microcrystalline Germanium Thin Films Prepared by the Reactive RF Sputtering2008

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Data Source

[Journal Article] 反応性スパッター法による微結晶シリコンゲルマニウム半導体薄膜の作製2008

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NAID

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[Journal Article] Microcrystalline Silicon-Germanium Thin Films Prepared by the Chemical Transport Process Using Hydrogen Radicals2008

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ISOMURA Masao 磯村雅夫