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Sawano Kentaro  澤野 憲太郎

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… Alternative Names

SAWANO Kentarou  澤野 憲太郎

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Researcher Number 90409376
Other IDs
Affiliation (Current) 2025: 東京都市大学, 理工学部, 教授
Affiliation (based on the past Project Information) *help 2018 – 2024: 東京都市大学, 理工学部, 教授
2015 – 2019: 東京都市大学, 工学部, 教授
2012 – 2016: 東京都市大学, 工学部, 准教授
2009 – 2011: 東京都市大学, 工学部, 講師
2008: Musashi Institute of Technology, 工学部, 講師 … More
2008: Musashi Institute of Technology, 工学部・電気電子工学科, 講師
2007: Musashi Institute of Technology, 総合研究所, 助手
2006 – 2007: 武蔵工業大学, 付置研究所, 助手 Less
Review Section/Research Field
Principal Investigator
Applied materials science/Crystal engineering / Medium-sized Section 21:Electrical and electronic engineering and related fields / Basic Section 21050:Electric and electronic materials-related / Crystal engineering / Applied materials
Except Principal Investigator
Medium-sized Section 28:Nano/micro science and related fields / Applied materials science/Crystal engineering / Broad Section D / Broad Section C / Medium-sized Section 21:Electrical and electronic engineering and related fields … More / Basic Section 30010:Crystal engineering-related / Basic Section 21060:Electron device and electronic equipment-related / Basic Section 21050:Electric and electronic materials-related / Electronic materials/Electric materials / Nanostructural physics / Nanomaterials engineering / Applied materials / Thin film/Surface and interfacial physical properties Less
Keywords
Principal Investigator
ゲルマニウム / 歪みゲルマニウム / イオン注入 / 歪み / 多孔質ガラス / ナノドット / マイクロブリッジ / 発光デバイス / ガラス / SiGe結晶 … More / 光暗号通信 / スピンLED / ゲルマニウムLED / 円偏光 / スピントロニクス / LED / 半導体物性 / 一軸歪み / 歪み制御 / 結晶工学 / 結晶欠陥 / 一軸性歪み / 結晶歪み / 単正孔デバイス / 歪みGe / 高移動度 / 2次元正孔ガス / 量子ドット / MBE / 面方位 / イオン注入法 / SiGe … More
Except Principal Investigator
ゲルマニウム / シリコン / ナノ構造 / 熱電材料 / 歪みシリコン / 量子ドット / フォノン / 半導体スピントロニクス / シリコンゲルマニウム / 結晶欠陥 / 半導体スピントロにクス / MBE / スピン注入 / スピントロニクス / 分子線エピタキシー / 高誘電率絶縁膜 / 光子ースピン量子インターフェース / 光子-スピン量子インターフェース / スピン量子状態発光素子 / 量子中継 / Ge量子ドット / 光子―スピン量子インターフェース / スピン軌道相互作用 / 量子情報 / フォノニック結晶 / 熱伝導計測 / 熱制御 / 熱伝導 / 熱電変換 / ナノスケール熱輸送 / ナノスケール熱伝導 / フォノンエンジニアリング / ピラミッドPD / 超高速撮影 / 裏面照射 / ピラミッド構造 / 光電変換 / イメージセンサ / エピタキシャル / 結晶方位依存性 / Ge-in-Si / ピラミッド光電変換層 / 超高速イメージセンサ / 準安定相 / 薄膜成長 / シリセン / MOSFET / シリコン・ゲルマニウム / 集積回路 / 高移動度トランジスタ / 界面準位 / Silicon photonics / Molecular beam epitaxy / Laser / Optical amplifier / Rare-earth oxide / ナノ共振器 / 光導波路 / シリコンフォトニクス / レーザー / 光増幅器 / 希土類イオン / 歪みシリコンゲルマニウム / ホイスラー合金 / トランジスタ / スピン伝導 / スピンMOSFET / 高移動度トランジスター / キャリア移動度 / 電子デバイス / 半導体結晶 / スピンエレクトロニクス / 電気・電子材料 / 電子・電気材料 / ハーフメタル / スピン流 / エピタキシャル成長 / 二次元電子ガス / ナノ構造物性 / thin film transistor / Polycrystalline Si / microwave plasma / 多結晶シリコン・ゲルマニウム / 電界効界トランジスタ / 電界効果トランジスタ / 多結晶シリコン / マイクロ波加熱 / 極薄Si酸化膜 / ユビキタス元素 / MBE / ドーピング技術 / 極薄Si酸化膜 / ユギキタス元素 / シリコン系材料 / 熱電変換材料 / ナノドット / 熱電ナノ材料 / ナノ材料・創製プロセス / 金属-半導体界面 / 結晶成長 / ヘテロ構造 / 半導体界面 / 深さ方向元素分布 / 積層構造 / 高誘電率絶縁膜/半導体界面 / 角度分解X線光電子分光法 / 歪Geチャネル / 表面・界面物性 / 界面構造 / Ge / 高移動度チャネル / 高誘電率膜ゲート絶縁膜 / 硬X線光電子分光法 / 歪チャネル / マイクロディスク / 光電子融合デバイス / 導波路 / 微小共振器 / 歪み / シミュレーション / フォトニック結晶 Less
  • Research Projects

    (25 results)
  • Research Products

    (560 results)
  • Co-Researchers

    (46 People)
  •  Developing Silicon Germanium Optical Spintronics

    • Principal Investigator
      浜屋 宏平
    • Project Period (FY)
      2024 – 2028
    • Research Category
      Grant-in-Aid for Scientific Research (S)
    • Review Section
      Broad Section C
    • Research Institution
      Osaka University
  •  Phonon and electron system with different dimensions formed by silicene manipulation and development of high performance thermoelectric thin film device

    • Principal Investigator
      中村 芳明
    • Project Period (FY)
      2023 – 2026
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Review Section
      Medium-sized Section 28:Nano/micro science and related fields
    • Research Institution
      Osaka University
  •  Exploring spin coherence engineering in group IV semiconductor quantum structures

    • Principal Investigator
      小寺 哲夫
    • Project Period (FY)
      2023 – 2027
    • Research Category
      Grant-in-Aid for Scientific Research (S)
    • Review Section
      Broad Section D
    • Research Institution
      Institute of Science Tokyo
  •  Creation of innovative quantum repeater technology for semiconductor spin qubits based on photon-spin quantum state conversion

    • Principal Investigator
      大岩 顕
    • Project Period (FY)
      2023 – 2027
    • Research Category
      Grant-in-Aid for Scientific Research (S)
    • Review Section
      Broad Section D
    • Research Institution
      Osaka University
  •  Giga-second imaging leaded by pyrramid photoconductive layer

    • Principal Investigator
      Ando Taeko
    • Project Period (FY)
      2022 – 2023
    • Research Category
      Grant-in-Aid for Challenging Research (Exploratory)
    • Review Section
      Medium-sized Section 21:Electrical and electronic engineering and related fields
    • Research Institution
      Ritsumeikan University
  •  Investigation on the interface states at strained Si/SiO2 interfaces formed on Si(110) substrates

    • Principal Investigator
      Arimoto Keisuke
    • Project Period (FY)
      2021 – 2023
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Review Section
      Basic Section 30010:Crystal engineering-related
    • Research Institution
      University of Yamanashi
  •  フォトニクスとのアナロジーで拓くサーマルフォノンエンジニアリング

    • Principal Investigator
      野村 政宏
    • Project Period (FY)
      2021 – 2025
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Review Section
      Medium-sized Section 28:Nano/micro science and related fields
    • Research Institution
      The University of Tokyo
  •  Creation of Ge quantum structure on porous glass and its applications to optoelectronic integrated devicesPrincipal Investigator

    • Principal Investigator
      Sawano Kentarou
    • Project Period (FY)
      2020 – 2023
    • Research Category
      Grant-in-Aid for Challenging Research (Exploratory)
    • Review Section
      Medium-sized Section 21:Electrical and electronic engineering and related fields
    • Research Institution
      Tokyo City University
  •  Development of a germanium spin MOSFET

    • Principal Investigator
      Hamaya Kohei
    • Project Period (FY)
      2019 – 2023
    • Research Category
      Grant-in-Aid for Scientific Research (S)
    • Review Section
      Broad Section C
    • Research Institution
      Osaka University
  •  Creation of Germanium Circular-polarized LED toward Optical Encrypted CommunicationPrincipal Investigator

    • Principal Investigator
      Sawano Kentarou
    • Project Period (FY)
      2019 – 2021
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      Tokyo City University
  •  Development of rare-earth oxide based optical amplifiers and lasers integrated on Si by using magnetic light-matter interactions

    • Principal Investigator
      Xu Xuejun
    • Project Period (FY)
      2019 – 2021
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Review Section
      Basic Section 21060:Electron device and electronic equipment-related
    • Research Institution
      NTT Basic Research Laboratories
  •  Development of Si-based Dirac electron superlattice and its thermoelectric devices based on phonon and electron trapsport physics

    • Principal Investigator
      Nakamura Yoshiaki
    • Project Period (FY)
      2019 – 2023
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Review Section
      Medium-sized Section 28:Nano/micro science and related fields
    • Research Institution
      Osaka University
  •  Control of defects and surface morphology on strained Si/SiGe/Si(110) structure using the ion implantation method

    • Principal Investigator
      ARIMOTO Keisuke
    • Project Period (FY)
      2018 – 2020
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Review Section
      Basic Section 21050:Electric and electronic materials-related
    • Research Institution
      University of Yamanashi
  •  High performance Si thermoelectric material design based on phonon-carrier wave control in novel heteronanostructures

    • Principal Investigator
      Nakamura Yoshiaki
    • Project Period (FY)
      2016 – 2019
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Nanostructural physics
    • Research Institution
      Osaka University
  •  Optical and electric-field control of pure spin current transport

    • Principal Investigator
      HAMAYA Kohei
    • Project Period (FY)
      2016 – 2019
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Osaka University
  •  Developments of high mobility uniaxially strained Germanium channel devicesPrincipal Investigator

    • Principal Investigator
      Sawano Kentarou
    • Project Period (FY)
      2014 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Crystal engineering
    • Research Institution
      Tokyo City University
  •  Development of vertical-type spin MOSFET with Schottky source and drain

    • Principal Investigator
      Hamaya Kohei
    • Project Period (FY)
      2013 – 2015
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Applied materials
    • Research Institution
      Osaka University
      Kyushu University
  •  Development of coherently-connected nanodot structure for rare-metal-free thermoelectric materials

    • Principal Investigator
      Nakamura Yoshiaki
    • Project Period (FY)
      2013 – 2016
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Nanomaterials engineering
    • Research Institution
      Osaka University
  •  Quantum Dot Single Hole Device based on Strained Germanium Two Dimensional Hole GasPrincipal Investigator

    • Principal Investigator
      Sawano Kentarou
    • Project Period (FY)
      2013 – 2015
    • Research Category
      Grant-in-Aid for Challenging Exploratory Research
    • Research Field
      Applied materials
    • Research Institution
      Tokyo City University
  •  Realization of compressively strained silicon by defect control using ion implantation and application to high hole mobilty devices

    • Principal Investigator
      Usami Noritaka
    • Project Period (FY)
      2012 – 2015
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Nagoya University
      Tohoku University
  •  面方位と異方性歪みを同時制御した革新的ゲルマニウムチャネル開発Principal Investigator

    • Principal Investigator
      澤野 憲太郎
    • Project Period (FY)
      2010 – 2011
    • Research Category
      Grant-in-Aid for Young Scientists (B)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Tokyo City University
  •  Demonstration of innovative Germanium optoelectronic devices and developments of simulation technologies

    • Principal Investigator
      SHIRAKI Yasuhiro
    • Project Period (FY)
      2009 – 2012
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Tokyo City University
  •  Study of high-κ/strained-Ge channel and high-κ/strained-Si channel using X-ray Photoelectron Spectroscopy

    • Principal Investigator
      NOHIRA Hiroshi
    • Project Period (FY)
      2009 – 2011
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Thin film/Surface and interfacial physical properties
    • Research Institution
      Tokyo City University
  •  Development of selective strain controlling technique in Silicon Germanium hetero-structuresPrincipal Investigator

    • Principal Investigator
      SAWANO Kentarou
    • Project Period (FY)
      2007 – 2008
    • Research Category
      Grant-in-Aid for Young Scientists (B)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Musashi Institute of Technology
  •  Selective and rapid heating method for polycrystallization of amorphous Si using microwave plasma irradiation

    • Principal Investigator
      NAKAGAWA Kiyokazu
    • Project Period (FY)
      2006 – 2007
    • Research Category
      Grant-in-Aid for Scientific Research (C)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      University of Yamanashi

All 2024 2023 2022 2021 2020 2019 2018 2017 2016 2015 2014 2013 2012 2011 2010 2009 2008 2007 2006 Other

All Journal Article Presentation

  • [Journal Article] Growth of all-epitaxial Co2MnSi/Ge/Co2MnSi vertical spin-valve structures on Si2024

    • Author(s)
      Yamada Atsuya、Yamada Michihiro、Kusumoto Shuhei、do Nascimento Julio A.、Murrill Connor、Yamada Shinya、Sawano Kentarou、Lazarov Vlado K.、Hamaya Kohei
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 173 Pages: 108140-108140

    • DOI

      10.1016/j.mssp.2024.108140

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23KJ1446, KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-23H05455
  • [Journal Article] Enhancement of room temperature electroluminescence from strained SiGe/Ge(111) multiple quantum wells light emitting diodes2024

    • Author(s)
      Shuya Kikuoka, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya, Kentarou Sawano
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 176 Pages: 108299-108299

    • DOI

      10.1016/j.mssp.2024.108299

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-23H05455, KAKENHI-PROJECT-23H05458
  • [Journal Article] Fabrication of crack-free strained SiGe/Ge multiple quantum wells on Ge-on-Si(111) by the patterning method2024

    • Author(s)
      R. Kanesawa, S. Kikuoka, Y. Shibahara, Y. Wagatsuma, M. Yamada, K. Hamaya and K. Sawano
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 176 Pages: 108300-108300

    • DOI

      10.1016/j.mssp.2024.108300

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-23H05455, KAKENHI-PROJECT-23H05458
  • [Journal Article] Effect of Sn doping on low-temperature growth of Ge epilayers on half-metallic Co2FeSi2024

    • Author(s)
      Yamada Michihiro、Kusumoto Shuhei、Yamada Atsuya、Sawano Kentarou、Hamaya Kohei
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 171 Pages: 107987-107987

    • DOI

      10.1016/j.mssp.2023.107987

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-23KJ1446, KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-23H05455
  • [Journal Article] Al-Ge-paste-induced liquid phase epitaxy of Si-rich SiGe(111) for epitaxial Co-based Heusleralloys2024

    • Author(s)
      Michihiro Yamada, Shota Suzuki, Ai I. Osakae, Kazuaki Sumi, Takahiro Inoue, Azusa N. Hattori, Shinya Yamada, Kentarou Sawano, Marwan Dhamrin, Kohei Hamaya
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 174 Pages: 108232-108232

    • DOI

      10.1016/j.mssp.2024.108232

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-23H05455
  • [Journal Article] Electrical properties of a low-temperature fabricated Ge-based top-gate MOSFET structure with epitaxial ferromagnetic Heusler-alloy Schottky-tunnel source and drain2023

    • Author(s)
      Yamamoto Keisuke、Matsuo Takuro、Yamada Michihiro、Wagatsuma Youya、Sawano Kentaro、Hamaya Kohei
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 167 Pages: 107763-107763

    • DOI

      10.1016/j.mssp.2023.107763

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Journal Article] Dzyaloshinskii-Moriya interaction at epitaxial ferromagnet/semiconductor interface2023

    • Author(s)
      Kimura Shuto、Yamada Michihiro、Okuno Takumi、Sawano Kentarou、Hamaya Kohei、Ando Kazuya
    • Journal Title

      Physical Review B

      Volume: 108 Issue: 9 Pages: 094441-094441

    • DOI

      10.1103/physrevb.108.094441

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-22H04964, KAKENHI-PROJECT-20H00337
  • [Journal Article] Influences of lattice strain and SiGe buffer layer thickness on electrical characteristics of strained Si/SiGe/Si(110) heterostructures2023

    • Author(s)
      Fujisawa Taisuke、Onogawa Atsushi、Horiuchi Miki、Sano Yuichi、Sakata Chihiro、Yamanaka Junji、Hara Kosuke O.、Sawano Kentarou、Nakagawa Kiyokazu、Arimoto Keisuke
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 161 Pages: 107476-107476

    • DOI

      10.1016/j.mssp.2023.107476

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-21K04900
  • [Journal Article] Strain Engineering of Heteroepitaxial SiGe/Ge on Si with Various Crystal Orientations2022

    • Author(s)
      Alam Md. Mahfuz、Wagatsuma Youya、Okada Kazuya、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      ECS Transactions

      Volume: 109 Issue: 4 Pages: 197-204

    • DOI

      10.1149/10904.0197ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Journal Article] Significant reduction of crack propagation in the strained SiGe/Ge(111) induced by the local growth on the depth-controlled area patterning2022

    • Author(s)
      Wagatsuma Youya、Kanesawa Rena、Alam Md. Mahfuz、Okada Kazuya、Inoue Takahiro、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      Applied Physics Express

      Volume: 16 Issue: 1 Pages: 015502-015502

    • DOI

      10.35848/1882-0786/aca751

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Journal Article] Effect of Strain on Room-Temperature Spin Transport in Si0.1Ge0.92022

    • Author(s)
      Naito T.、Yamada M.、Wagatsuma Y.、Sawano K.、Hamaya K.
    • Journal Title

      Physical Review Applied

      Volume: 18 Issue: 2 Pages: 024005-024005

    • DOI

      10.1103/physrevapplied.18.024005

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-22KJ2049, KAKENHI-PROJECT-19H05616
  • [Journal Article] Significant effect of interfacial spin moments in ferromagnet-semiconductor heterojunctions on spin transport in a semiconductor2022

    • Author(s)
      Naito T.、Nishimura R.、Yamada M.、Masago A.、Shiratsuchi Y.、Wagatsuma Y.、Sawano K.、Nakatani R.、Oguchi T.、Hamaya K.
    • Journal Title

      Physical Review B

      Volume: 105 Issue: 19 Pages: 195308-195308

    • DOI

      10.1103/physrevb.105.195308

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-22KJ2049, KAKENHI-PROJECT-21K18719, KAKENHI-PROJECT-19H05616
  • [Journal Article] Strong room-temperature EL emission from Ge-on-Si (111) diodes2022

    • Author(s)
      Sugiura Yuwa、Sasaki Masashi、Wagatsuma Youya、Yamada Koudai、Hoshi Yusuke、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      Journal of Crystal Growth

      Volume: 594 Pages: 126766-126766

    • DOI

      10.1016/j.jcrysgro.2022.126766

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Journal Article] Fabrication of Thick SiGe/Ge Multiple Quantum Wells on Ge-on-Si and Their Optical Properties2022

    • Author(s)
      Kanesawa Rena、Wagatsuma Youya、Kikuoka Shuya、Sugiura Yuwa、Sawano Kentarou
    • Journal Title

      ECS Transactions

      Volume: 109 Issue: 4 Pages: 289-295

    • DOI

      10.1149/10904.0289ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Journal Article] Mechanism of crack formation in strained SiGe(111) layers2022

    • Author(s)
      Wagatsuma Youya、Mahfuz Alam Md.、Okada Kazuya、Kanesawa Rena、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      Journal of Crystal Growth

      Volume: - Pages: 126672-126672

    • DOI

      10.1016/j.jcrysgro.2022.126672

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Journal Article] Fabrication of SiGe/Ge microbridges based on Ge-on-Si(110) and observation of resonant light emission2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, R. Ikegaya, K. Okada, K. Sawano
    • Journal Title

      Journal of Crystal Growth

      Volume: 590 Pages: 126682-126682

    • DOI

      10.1016/j.jcrysgro.2022.126682

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616
  • [Journal Article] Fabrication of branch-like bridges based on Ge-on-Si (110) and observation of resonant light emission2022

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Ayaka Odashima, Masaki Nagao, Kentarou Sawano
    • Journal Title

      ECS Transactions

      Volume: 109 Issue: 4 Pages: 297-302

    • DOI

      10.1149/10904.0297ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H05616
  • [Journal Article] Temperature dependence of two-terminal local magnetoresistance in Co-based Heusler alloy/Ge lateral spin-valve devices2022

    • Author(s)
      Yamada Michihiro、Naito Takahiro、Sumi Kazuaki、Sawano Kentarou、Hamaya Kohei
    • Journal Title

      IEEE Transactions on Magnetics

      Volume: - Issue: 8 Pages: 1-4

    • DOI

      10.1109/tmag.2022.3145393

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-21K18719, KAKENHI-PROJECT-22KJ2049
  • [Journal Article] Experimental extraction of donor-driven spin relaxation in n-type nondegenerate germanium2021

    • Author(s)
      M. Yamada, T. Ueno, T. Naito, K. Sawano, and K. Hamaya
    • Journal Title

      Physical Review B

      Volume: 104 Issue: 11 Pages: 115301-106

    • DOI

      10.1103/physrevb.104.115301

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-22KJ2049
  • [Journal Article] Enhanced electroluminescence from Ge-on-Si by precise in-situ doping and post-annealing2021

    • Author(s)
      Yamada Kodai、Wagatsuma Youya、Okada Kazuya、Hoshi Yusuke、Sawano Kentarou
    • Journal Title

      Applied Physics Express

      Volume: 14 Issue: 4 Pages: 045504-045504

    • DOI

      10.35848/1882-0786/abf0df

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] Magnetoresistance ratio of more than 1% at room temperature in germanium vertical spin-valve devices with Co2FeSi2021

    • Author(s)
      Yamada A.、Yamada M.、Honda M.、Yamada S.、Sawano K.、Hamaya K.
    • Journal Title

      Applied Physics Letters

      Volume: 119 Issue: 19 Pages: 192404-192404

    • DOI

      10.1063/5.0061504

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-21H05000, KAKENHI-PROJECT-19H02175
  • [Journal Article] Dependences of the hole mobility in the strained Si pMOSFET and gated Hall bars formed on SiGe/Si(110) on the channel direction and the strained Si thickness2021

    • Author(s)
      Keisuke Arimoto, Taisuke Fujisawa, Daichi Namiuchi, Atsushi Onogawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa
    • Journal Title

      Journal of Crystal Growth

      Volume: 571 Pages: 126246-126246

    • DOI

      10.1016/j.jcrysgro.2021.126246

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Journal Article] A drastic increase in critical thickness for strained SiGe by growth on mesa-patterned Ge-on-Si2021

    • Author(s)
      Wagatsuma Youya、Alam Md. Mahfuz、Okada Kazuya、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      Applied Physics Express

      Volume: 14 Issue: 2 Pages: 025502-025502

    • DOI

      10.35848/1882-0786/abd4c5

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] 8.Room-temperature two-terminal magnetoresistance ratio reaching 0.1 % in semiconductor-based lateral devices with L21-ordered Co2MnSi2021

    • Author(s)
      K. Kudo, M. Yamada, S. Honda, Y. Wagatsuma, S. Yamada, K. Sawano, and K. Hamaya
    • Journal Title

      Applied Physics Letters

      Volume: 118 Issue: 16 Pages: 162404-162404

    • DOI

      10.1063/5.0045233

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-19H02175
  • [Journal Article] Effect of Fe atomic layers at the ferromagnet-semiconductor interface on temperature-dependent spin transport in semiconductors2021

    • Author(s)
      Yamada M.、Shiratsuchi Y.、Kambe H.、Kudo K.、Yamada S.、Sawano K.、Nakatani R.、Hamaya K.
    • Journal Title

      Journal of Applied Physics

      Volume: 129 Issue: 18 Pages: 183901-183901

    • DOI

      10.1063/5.0048321

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-19H02175
  • [Journal Article] Thermoelectric Si1?xGex and Ge epitaxial films on Si(001) with controlled composition and strain for group IV element-based thermoelectric generators2020

    • Author(s)
      Taniguchi Tatsuhiko、Ishibe Takafumi、Hosoda Ryoya、Wagatsuma Youya、Alam Md. Mahfuz、Sawano Kentarou、Uenuma Mutsunori、Uraoka Yukiharu、Yamashita Yuichiro、Mori Nobuya、Nakamura Yoshiaki
    • Journal Title

      Applied Physics Letters

      Volume: 117 Issue: 14 Pages: 141602-141602

    • DOI

      10.1063/5.0023820

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-18J20160, KAKENHI-PROJECT-19H00853
  • [Journal Article] Large, Tunable Valley Splitting and Single-Spin Relaxation Mechanisms in a Si/SixGe1?x Quantum Dot2020

    • Author(s)
      Hollmann Arne、Struck Tom、Langrock Veit、Schmidbauer Andreas、Schauer Floyd、Leonhardt Tim、Sawano Kentarou、Riemann Helge、Abrosimov Nikolay V.、Bougeard Dominique、Schreiber Lars R.
    • Journal Title

      Physical Review Applied

      Volume: 13 Issue: 3

    • DOI

      10.1103/physrevapplied.13.034068

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Journal Article] Low-frequency spin qubit energy splitting noise in highly purified 28Si/SiGe2020

    • Author(s)
      Struck Tom、Hollmann Arne、Schauer Floyd、Fedorets Olexiy、Schmidbauer Andreas、Sawano Kentarou、Riemann Helge、Abrosimov Nikolay V.、Cywi?ski ?ukasz、Bougeard Dominique、Schreiber Lars R.
    • Journal Title

      npj Quantum Information

      Volume: 6 Issue: 1 Pages: 40-40

    • DOI

      10.1038/s41534-020-0276-2

    • Peer Reviewed / Open Access / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Journal Article] (Invited) Engineering Strain, Defects, and Electronic Properties of (110)-Oriented Strained Si2020

    • Author(s)
      Arimoto Keisuke、Yamanaka Junji、Hara Kosuke O、Sawano Kentarou、Usami Noritaka、Nakagawa Kiyokazu
    • Journal Title

      ECS Transactions

      Volume: 98 Issue: 5 Pages: 277-290

    • DOI

      10.1149/09805.0277ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Journal Article] Hole mobility enhancement observed in (110)-oriented strained Si2020

    • Author(s)
      Keisuke Arimoto, Naoto Utsuyama, Shohei Mitsui, Kei Satoh, Takane Yamada, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 59

    • NAID

      210000157909

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Journal Article] Nanostructural effect on thermoelectric properties in Si films containing iron silicide nanodots2020

    • Author(s)
      Sakane Shunya、Ishibe Takafumi、Taniguchi Tatsuhiko、Hinakawa Takahiro、Hosoda Ryoya、Mizuta Kosei、Alam Md. Mahfuz、Sawano Kentarou、Nakamura Yoshiaki
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Issue: SF Pages: SFFB01-SFFB01

    • DOI

      10.7567/1347-4065/ab5b58

    • NAID

      210000157639

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-17J00622, KAKENHI-PROJECT-18J20160, KAKENHI-PROJECT-16H02078, KAKENHI-PROJECT-19H00853
  • [Journal Article] High Thermoelectric Power Factor Realization in Si-Rich SiGe/Si Superlattices by Super-Controlled Interfaces2020

    • Author(s)
      Taniguchi Tatsuhiko、Ishibe Takafumi、Naruse Nobuyasu、Mera Yutaka、Alam Md. Mahfuz、Sawano Kentarou、Nakamura Yoshiaki
    • Journal Title

      ACS Applied Materials & Interfaces

      Volume: 12 Issue: 22 Pages: 25428-25434

    • DOI

      10.1021/acsami.0c04982

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19K22110, KAKENHI-PROJECT-18J20160, KAKENHI-PROJECT-19H00853
  • [Journal Article] Spin injection through energy-band symmetry matching with high spin polarization in atomically controlled ferromagnet/ferromagnet/semiconductor structures2020

    • Author(s)
      Yamada Michihiro、Kuroda Fumiaki、Tsukahara Makoto、Yamada Shinya、Fukushima Tetsuya、Sawano Kentarou、Oguchi Tamio、Hamaya Kohei
    • Journal Title

      NPG Asia Materials

      Volume: 12 Issue: 1 Pages: 47-47

    • DOI

      10.1038/s41427-020-0228-5

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-18K04926, KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-19H05616
  • [Journal Article] Enhanced photoluminescence from strained Ge-on-Insulator surface-passivated with hydrogenated amorphous Si2020

    • Author(s)
      Niikura Kenta、Yamahata Natsuki、Hoshi Yusuke、Takamura Tsukasa、Saito Kimihiko、Konagai Makoto、Sawano Kentarou
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 115 Pages: 105104-105104

    • DOI

      10.1016/j.mssp.2020.105104

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-19H02175
  • [Journal Article] Suppression of Donor-Driven Spin Relaxation in Strained Si0.1Ge0.92020

    • Author(s)
      Naito T.、Yamada M.、Yamada S.、Sawano K.、Hamaya K.
    • Journal Title

      Physical Review Applied

      Volume: 13 Issue: 5

    • DOI

      10.1103/physrevapplied.13.054025

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] (Invited) Strain Engineering of Si/Ge Heterostructures on Ge-on-Si Platform2020

    • Author(s)
      Sawano Kentarou、Youya Wagatsuma、Alam Md. M、Omata Kaisei、Niikura Kenta、Shibata Shougo、Hoshi Yusuke、Yamada Michihiro、Hamaya Kohei
    • Journal Title

      ECS Transactions

      Volume: 98 Issue: 5 Pages: 267-276

    • DOI

      10.1149/09805.0267ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] Reduced Inhomogeneous Broadening in Hexagonal Boron Nitride-Encapsulated MoTe2 Monolayers by Thermal Treatment2020

    • Author(s)
      Hayashida Shunya、Saitoh Risa、Watanabe Kenji、Taniguchi Takashi、Sawano Kentarou、Hoshi Yusuke
    • Journal Title

      ACS Applied Electronic Materials

      Volume: 2 Issue: 9 Pages: 2739-2744

    • DOI

      10.1021/acsaelm.0c00452

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Journal Article] Hole mobility in Strained Si/Relaxed SiGe/Si(110) hetero structures studied by gated Hall measurements2020

    • Author(s)
      Namiuchi Daichi、Onogawa Atsushi、Fujisawa Taisuke、Sano Yuichi、Izumi Daisuke、Yamanaka Junji、Hara Kosuke O.、Sawano Kentarou、Nakagawa Kiyokazu、Arimoto Keisuke
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 113 Pages: 105052-105052

    • DOI

      10.1016/j.mssp.2020.105052

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-19H02175
  • [Journal Article] Engineering Strain, Defects, and Electronic Properties of (110)-Oriented Strained Si2020

    • Author(s)
      K. Arimoto, J. Yamanaka, K. O. Hara, K. Sawano, N. Usami and K. Nakagawa
    • Journal Title

      ECS Transactions

      Volume: 98 (5) Pages: 277-290

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Journal Article] Hole mobility in Strained Si/Relaxed SiGe/Si(110) hetero structures studied by gated Hall measurements2020

    • Author(s)
      Daichi Namiuchi, Atsushi Onogawa, Taisuke Fujisawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa, Keisuke Arimoto
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 113 Pages: 105052-105052

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Journal Article] Increased Critical Thickness for Strained SiGe on Ge-on-Si(111)2020

    • Author(s)
      Youya Wagatsuma、Alam Md. M、Okada Kazuya、Hoshi Yusuke、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      ECS Transactions

      Volume: 98 Issue: 5 Pages: 499-503

    • DOI

      10.1149/09805.0499ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] Crack formation in strained SiGe grown on Ge-on-Si (111) and its suppression by patterning substrates2020

    • Author(s)
      Wagatsuma Youya、Alam Md Mahfuz、Okada Kazuya、Hoshi Yusuke、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 117 Pages: 105153-105153

    • DOI

      10.1016/j.mssp.2020.105153

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] Strong Room-Temperature Electroluminescence from Ge-on-Si by Precise in-situ Doping Control2020

    • Author(s)
      Yamada Kodai、Hoshi Yusuke、Sawano Kentarou
    • Journal Title

      ECS Transactions

      Volume: 98 Issue: 5 Pages: 513-518

    • DOI

      10.1149/09805.0513ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-20K21009, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-19H05616
  • [Journal Article] Inverse local magnetoresistance effect up to room temperature in ferromagnet-semiconductor lateral spin-valve devices2020

    • Author(s)
      Naito Takahiro、Yamada Michihiro、Yamada Shinya、Kanashima Takeshi、Sawano Kentarou、Hamaya Kohei
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 113 Pages: 105046-105046

    • DOI

      10.1016/j.mssp.2020.105046

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-18J00502
  • [Journal Article] Conduction Type Control of Ge-on-Insulator: Combination of Smart-Cut(TM) and Defect Elimination2019

    • Author(s)
      Keisuke Yamamoto, Kohei Nakae, Hiroshi Akamine, Dong Wang, Hiroshi Nakashima, Md. M Alam, Kentarou Sawano, Zhongying Xue, Miao Zhang, Zengfeng Di
    • Journal Title

      ECS transactions

      Volume: 93 Issue: 1 Pages: 73-77

    • DOI

      10.1149/09301.0073ecst

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19K15028, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-17H03237
  • [Journal Article] High thermoelectric performance in high crystallinity epitaxial Si films containing silicide nanodots with low thermal conductivity2019

    • Author(s)
      Sakane Shunya、Ishibe Takafumi、Hinakawa Takahiro、Naruse Nobuyasu、Mera Yutaka、Mahfuz Alam Md.、Sawano Kentarou、Nakamura Yoshiaki
    • Journal Title

      Applied Physics Letters

      Volume: 115 Issue: 18 Pages: 182104-182104

    • DOI

      10.1063/1.5126910

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-17J00622, KAKENHI-PROJECT-16H02078, KAKENHI-PROJECT-19H00853
  • [Journal Article] Room-temperature local magnetoresistance effect in n-Ge devices with low-resistive Schottky-tunnel contacts2019

    • Author(s)
      M. Tsukahara, M. Yamada, T. Naito, S. Yamada, K. Sawano, V. K. Lazarov, and K. Hamaya
    • Journal Title

      Appl. Phys. Express

      Volume: 12 Issue: 3 Pages: 033002-033002

    • DOI

      10.7567/1882-0786/ab0252

    • NAID

      210000135621

    • Peer Reviewed / Open Access / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-18J00502, KAKENHI-PROJECT-18KK0111
  • [Journal Article] Hole mobility enhancement observed in (110)-oriented strained Si2019

    • Author(s)
      Arimoto Keisuke、Utsuyama Naoto、Mitsui Shohei、Satoh Kei、Yamada Takane、Yamanaka Junji、Hara Kosuke O.、Sawano Kentarou、Nakagawa Kiyokazu
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 59 Issue: SG Pages: SGGK06-SGGK06

    • DOI

      10.7567/1347-4065/ab6591

    • NAID

      210000157909

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-19H02175
  • [Journal Article] Critical thickness of strained Si1-xGex on Ge(111) and Ge-on-Si(111)2019

    • Author(s)
      Alam Md. Mahfuz、Wagatsuma Youya、Okada Kazuya、Hoshi Yusuke、Yamada Michihiro、Hamaya Kohei、Sawano Kentarou
    • Journal Title

      Applied Physics Express

      Volume: 12 Issue: 8 Pages: 081005-081005

    • DOI

      10.7567/1882-0786/ab2db8

    • NAID

      210000156582

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-19H02175, KAKENHI-PROJECT-18J00502
  • [Journal Article] Conduction Type Control of Ge-on-Insulator : Combination of Smart-CutTM and Defect Elimination2019

    • Author(s)
      K. Yamamoto, K. Nakae, H. Akamine, D. Wang, H. Nakashima, Md M. Alam, K. Sawano, Z. Xue, M. Zhang, and Z. Di
    • Journal Title

      ECS Transactions

      Volume: 93 Pages: 73-77

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Journal Article] Nonmonotonic bias dependence of local spin accumulation signals in ferromagnet/semiconductor lateral spin-valve devices2019

    • Author(s)
      Fujita Y.、Yamada M.、Tsukahara M.、Naito T.、Yamada S.、Sawano K.、Hamaya K.
    • Journal Title

      Physical Review B

      Volume: 100 Issue: 2 Pages: 024431-024431

    • DOI

      10.1103/physrevb.100.024431

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-19H05616, KAKENHI-PROJECT-18J00502
  • [Journal Article] Semiballistic thermal conduction in polycrystalline SiGe nanowires2019

    • Author(s)
      Okamoto Noboru、Yanagisawa Ryoto、Anufriev Roman、Mahfuz Alam Md.、Sawano Kentarou、Kurosawa Masashi、Nomura Masahiro
    • Journal Title

      Applied Physics Letters

      Volume: 115 Issue: 25 Pages: 253101-253101

    • DOI

      10.1063/1.5130659

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-15H05869, KAKENHI-PROJECT-17H02729, KAKENHI-PROJECT-19H02175
  • [Journal Article] Thermoelectric power factor enhancement based on carrier transport physics in ultimately phonon-controlled Si nanostructures2019

    • Author(s)
      Sakane Shunya、Ishibe Takafumi、Taniguchi Tatsuhiko、Naruse Nobuyasu、Mera Yutaka、Fujita Takeshi、Alam Md. Mahfuz、Sawano Kentarou、Mori Nobuya、Nakamura Yoshiaki
    • Journal Title

      Materials Today Energy

      Volume: 13 Pages: 56-63

    • DOI

      10.1016/j.mtener.2019.04.014

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17J00622, KAKENHI-PROJECT-18J20160, KAKENHI-PROJECT-16H02078, KAKENHI-PROJECT-19H00853
  • [Journal Article] Observation of local magnetoresistance signals in a SiGe-based lateral spin-valve device2018

    • Author(s)
      M. Yamada, T. Naito, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Journal Title

      Semicond. Sci. Technol.

      Volume: 33 Issue: 11 Pages: 114009-114009

    • DOI

      10.1088/1361-6641/aae34f

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-18J00502
  • [Journal Article] Resonant light emission from uniaxially tensile-strained Ge microbridges2018

    • Author(s)
      Zhou Peiji、Xu Xuejun、Matsushita Sho、Sawano Kentarou、Maruizumi Takuya
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 57 Issue: 4S Pages: 04FH10-04FH10

    • DOI

      10.7567/jjap.57.04fh10

    • NAID

      210000148948

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-17K14670
  • [Journal Article] Stability of strain in Si layers formed on SiGe/Si(110) heterostructures2018

    • Author(s)
      Arimoto Keisuke、Onogawa Atsushi、Saito Shingo、Yamada Takane、Sato Kei、Utsuyama Naoto、Sano Yuichi、Izumi Daisuke、Yamanaka Junji、Hara Kosuke O、Sawano Kentarou、Nakagawa Kiyokazu
    • Journal Title

      Semiconductor Science and Technology

      Volume: 33 Issue: 12 Pages: 124016-124016

    • DOI

      10.1088/1361-6641/aaeb10

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Journal Article] Pure spin current transport in a SiGe alloy2018

    • Author(s)
      T. Naito, M. Yamada, M.Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Journal Title

      Applied Physics Express

      Volume: 11 Issue: 5 Pages: 0530061-5

    • DOI

      10.7567/apex.11.053006

    • NAID

      210000136197

    • Peer Reviewed / Open Access / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-17H06832, KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-18J00502
  • [Journal Article] Formation of uniaxial strained Ge via control of dislocation alignment in Si/Ge heterostructures2018

    • Author(s)
      Konoshima Shiori、Yonekura Eisuke、Arimoto Keisuke、Yamanaka Junji、Nakagawa Kiyokazu、Sawano Kentarou
    • Journal Title

      AIP Advances

      Volume: 8 Issue: 7 Pages: 075112-075112

    • DOI

      10.1063/1.5011397

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Journal Article] Spin absorption effect at ferromagnet/Ge Schottky-tunnel contacts2018

    • Author(s)
      M. Yamada, Y. Fujita, S. Yamada, K. Sawano, and K. Hamaya
    • Journal Title

      Materials

      Volume: 11 Issue: 1 Pages: 1501-8

    • DOI

      10.3390/ma11010150

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-17H06832
  • [Journal Article] Correlation between spin transport signal and quality of the Heusler-alloy/semiconductor interface in lateral spin-valve devices2018

    • Author(s)
      B. Kuerbanjiang, Y. Fujita, M. Yamada, S. Yamada, A. M. Sanchez, P. J. Hasnip, A. Ghasemi, D. Kepaptsoglou, G. Bell, K. Sawano, K. Hamaya, and V. K. Lazarov
    • Journal Title

      Phys. Rev. B

      Volume: 98 Issue: 11 Pages: 115304-115304

    • DOI

      10.1103/physrevb.98.115304

    • Peer Reviewed / Int'l Joint Research
    • Data Source
      KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-18J00502
  • [Journal Article] Spin transport and relaxation in germanium (Topical Review)2018

    • Author(s)
      K. Hamaya, Y. Fujita, M. Yamada, M. Kawano, S. Yamada, and K. Sawano
    • Journal Title

      J. Phys. D: Appl. Phys.

      Volume: 51 Issue: 39 Pages: 393001-393001

    • DOI

      10.1088/1361-6463/aad542

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-17H06120, KAKENHI-PROJECT-16H02333, KAKENHI-PROJECT-18J00502
  • [Journal Article] Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion implanted Si (100) substrates2017

    • Author(s)
      You Arisawa, Yusuke Hoshi, Kentarou Sawano, Junji Yamanaka, Keisuke Arimoto, Chiaya Yamamoto, Noritaka Usami
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: 印刷中 Pages: 127-132

    • DOI

      10.1016/j.mssp.2016.11.024

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Giant spin accumulation in silicon nonlocal spin-transport devices2017

    • Author(s)
      A. Spiesser, H. Saito, Y. Fujita, S. Yamada, K. Hamaya, S. Yuasa and R. Jansen
    • Journal Title

      Phys. Rev. Appl.

      Volume: 8 Issue: 6 Pages: 064023-064023

    • DOI

      10.1103/physrevapplied.8.064023

    • Peer Reviewed
    • Data Source
      KAKENHI-PLANNED-26103002, KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-16H02333
  • [Journal Article] Room-temperature spin transport in n-Ge probed by four-terminal nonlocal measurements2017

    • Author(s)
      Michihiro Yamada, Makoto Tsukahara, Yuichi Fujita, Takahiro Naito, Shinya Yamada, Kentarou Sawano and Kohei Hamaya
    • Journal Title

      Applied Physics Express

      Volume: 10 Issue: 9 Pages: 093001-093001

    • DOI

      10.7567/apex.10.093001

    • NAID

      210000135968

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Journal Article] Study on ion implantation conditions in fabricating compressively strained Si/relaxed Si1−xCx heterostructures using the defect control by ion implantation technique2017

    • Author(s)
      You Arisawa, Kentarou Sawano, Noritaka Usami
    • Journal Title

      Journal of Crystal Growth

      Volume: 印刷中 Pages: 601-604

    • DOI

      10.1016/j.jcrysgro.2016.12.065

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Light emission enhancement from Ge quantum dots with phosphorous δ-doped neighboring confinement structures2017

    • Author(s)
      K. Sawano, T. Nakama, K. Mizutani, N. Harada, X. Xu, T. Maruizumi
    • Journal Title

      Journal of Crystal Growth

      Volume: 印刷中 Pages: 131-134

    • DOI

      10.1016/j.jcrysgro.2017.03.008

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Control of electrical properties in Heusler-alloy/Ge Schottky tunnel contacts by using phosphorous δ-doping with Si-layer insertion2017

    • Author(s)
      M. Yamada, Y. Fujita, S. Yamada, T. Kanashima, K. Sawano, and K. Hamaya
    • Journal Title

      Materials Science in Semiconductor Processing

      Volume: - Pages: 83-85

    • DOI

      10.1016/j.mssp.2016.07.025

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-14J03484, KAKENHI-PROJECT-16H02333
  • [Journal Article] Large impact of impurity concentration on spin transport in degenerate n-Ge2017

    • Author(s)
      M. Yamada, Y. Fujita, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Journal Title

      Physical Review B (Rapid Communications)

      Volume: 95 Issue: 16

    • DOI

      10.1103/physrevb.95.161304

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-14J03484, KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-16H02333
  • [Journal Article] Highly n-doped germanium-on-insulator microdisks with circular Bragg gratings2017

    • Author(s)
      Xuejun Xu, Hideaki Hashimoto, Kentarou Sawano, and Takuya Maruizumi
    • Journal Title

      Optics Express

      Volume: 25 Issue: 6 Pages: 6550-6560

    • DOI

      10.1364/oe.25.006550

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] TEM Observation of Si0.99C0.01 Thin Films with Arsenic-Ion-, Boron-Ion-, and Silicon-Ion-Implantation Followed by Rapid Thermal Annealing2017

    • Author(s)
      Junji Yamanaka, Shigenori Inoue, Keisuke Arimoto, Kiyokazu Nakagawa, Kentarou Sawano, Yasuhiro Shiraki, Atsushi Moriya, Yasuhiro Inokuchi, Yasuo Kunii
    • Journal Title

      Journal of Materials Science and Chemical Engineering

      Volume: 5 Issue: 01 Pages: 15-25

    • DOI

      10.4236/msce.2017.51003

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Thermoelectric properties of epitaxial β-FeSi2 thin films/Si(111) and enhancement approach of its thermoelectric performance2017

    • Author(s)
      Tatsuhiko Taniguchi, Shunya Sakane, Shunsuke Aoki, Ryo Okuhata, Takafumi Ishibe, Kentaro Watanabe, Takeyuki Suzuki, Takeshi Fujita, Kentarou Sawano, and Yoshiaki Nakamura
    • Journal Title

      Journal of Electronic Materials

      Volume: 46 Issue: 5 Pages: 3235-3241

    • DOI

      10.1007/s11664-016-4997-0

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-16H02078, KAKENHI-PROJECT-25286026, KAKENHI-PROJECT-15K13276
  • [Journal Article] Enhanced light emission from germanium microdisks on silicon by surface passivation through thermal oxidation2016

    • Author(s)
      Xuejun Xu, Hideaki Hashimoto, Kentarou Sawano, Hiroshi Nohira, and Takuya Maruizumi
    • Journal Title

      Applied Physics Express

      Volume: 9 Issue: 5 Pages: 052101-052101

    • DOI

      10.7567/apex.9.052101

    • NAID

      210000137877

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Suppression of segregation of the phosphorus δ-doping layer in germanium by incorporation of carbon2016

    • Author(s)
      M. Yamada, K. Sawano, M. Uematsu, Y. Shimizu, K. Inoue, Y. Nagai, and K. M. Itoh
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 55 Issue: 3 Pages: 031304-031304

    • DOI

      10.7567/jjap.55.031304

    • NAID

      210000146129

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-15H05413, KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26220602, KAKENHI-PROJECT-16H02446, KAKENHI-PROJECT-26286044
  • [Journal Article] Compressively strained Si/Si1-xCx heterostructures formed on Ar ion implanted Si(100) substrates2016

    • Author(s)
      Yusuke Hoshi, You Arisawa, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, and Noritaka Usami
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 55 Issue: 3 Pages: 031302-031302

    • DOI

      10.7567/jjap.55.031302

    • NAID

      210000146127

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Journal Article] A low-temperature fabricated gate-stack structure for Ge-based MOSFET with ferromagnetic epitaxial Heusler-alloy/Ge electrodes2016

    • Author(s)
      Y. Fujita, M. Yamada, Y. Nagatomi, K. Yamamoto, S. Yamada, T. Kanashima, H. Nakashima, and K. Hamaya
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 55 Issue: 6 Pages: 063001-063001

    • DOI

      10.7567/jjap.55.063001

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-14J03484, KAKENHI-PROJECT-16H02333
  • [Journal Article] Independent control of electrical and heat conduction by nanostructure designing for Si-based thermoelectric materials2016

    • Author(s)
      Shuto Yamasaka, Kentaro Watanabe, Shunya Sakane, Shotaro Takeuchi, Akira Sakai, Kentarou Sawano, and Yoshiaki Nakamura
    • Journal Title

      Scientific Reports

      Volume: 6 Issue: 1

    • DOI

      10.1038/srep22838

    • Peer Reviewed / Acknowledgement Compliant / Open Access
    • Data Source
      KAKENHI-PROJECT-15K13276, KAKENHI-PROJECT-25286026
  • [Journal Article] Temperature-independent spin relaxation in heavily doped n-type germanium2016

    • Author(s)
      Y. Fujita, M. Yamada, S. Yamada, T. Kanashima, K. Sawano, and K. Hamaya
    • Journal Title

      Physical Review B

      Volume: 94 Issue: 24 Pages: 245302-245302

    • DOI

      10.1103/physrevb.94.245302

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PLANNED-26103003, KAKENHI-PROJECT-14J03484, KAKENHI-PROJECT-16H02333
  • [Journal Article] Anisotropic Strain Introduction into Si/Ge Hetero Structures2016

    • Author(s)
      Kentarou Sawano, Shiori Konoshima, Junji Yamanaka, Keisuke Arimoto, and Kiyokazu Nakagawa
    • Journal Title

      ECS transaction

      Volume: 75 Issue: 8 Pages: 563-569

    • DOI

      10.1149/07508.0563ecst

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Straining of Group IV Semiconductor Materials for Bandgap and Mobility Engineering2016

    • Author(s)
      Kentarou Sawano, Xuejun Xu, Shiori Konoshima, Nayuta Shitara, Takeshi Ohno, and Takuya Maruizumi
    • Journal Title

      ECS transaction

      Volume: 75 Issue: 4 Pages: 191-197

    • DOI

      10.1149/07504.0191ecst

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Journal Article] Suppression of surface segregation of the phosphorous δ-doping layer by insertion of an ultra-thin silicon layer for ultra-shallow Ohmic contacts on n-type germanium2015

    • Author(s)
      Michihiro Yamada, Kentarou Sawano, Masashi Uematsu and Kohei M. Itoh
    • Journal Title

      Appl. Phys. Lett.

      Volume: 107 Issue: 13 Pages: 132101-132101

    • DOI

      10.1063/1.4931939

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26286044, KAKENHI-PROJECT-26220602
  • [Journal Article] Ultralarge transient optical gain from tensile-strained, n-doped germanium on silicon by spin-on dopant diffusion2015

    • Author(s)
      Xuejun Xu, Xiaoxin Wang, Keisuke Nishida, Koki Takabayashi, Kentarou Sawano, Yasuhiro Shiraki, Haofeng Li, Jifeng Liu, and Takuya Maruizumi
    • Journal Title

      Applied Physics Express

      Volume: 8 Issue: 9 Pages: 092101-092101

    • DOI

      10.7567/apex.8.092101

    • NAID

      210000137638

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26286044
  • [Journal Article] Structural and electrical properties of Ge(111) films grown on Si(111) substrates and application to Ge(111)-on-Insulator2015

    • Author(s)
      K. Sawano, Y. Hoshi, S. Kubo, K. Arimoto, J. Yamanaka, K. Nakagawa, K. Hamaya, M. Miyao, Y. Shiraki
    • Journal Title

      Thin Solid Films

      Volume: 未定 Pages: 24-28

    • DOI

      10.1016/j.tsf.2015.11.020

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26286044
  • [Journal Article] Highly n-doped, tensile-strained Ge grown on Si by molecular beam epitaxy2014

    • Author(s)
      Keisuke Nishida, Xuejun Xu, Kentarou Sawano, Takuya Maruizumi, Yasuhiro Shiraki
    • Journal Title

      Thin Solid Films

      Volume: 557 Pages: 66-69

    • DOI

      10.1016/j.tsf.2013.10.082

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26286044
  • [Journal Article] Formation of Ge(111) on Insulator by Ge epitaxy on Si(111) and layer transfer2014

    • Author(s)
      K. Sawano, Y. Hoshi, S. Endo, T. Nagashima, K. Arimoto, J. Yamanaka, K. Nakagawa, S. Yamada, K. Hamaya, M. Miyao and Y. Shiraki
    • Journal Title

      Thin Solid Films

      Volume: 557 Pages: 76-79

    • DOI

      10.1016/j.tsf.2013.10.074

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26286044
  • [Journal Article] Greatly enhanced generation efficiency of pure spin currents in Ge using Heusler compound Co2FeSi electrodes2014

    • Author(s)
      K. Kasahara, Y. Fujita, S. Yamada, K. Sawano, M. Miyao, and K. Hamaya
    • Journal Title

      Applied Physics Express

      Volume: 7 Issue: 3 Pages: 033002-033002

    • DOI

      10.7567/apex.7.033002

    • NAID

      210000137020

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-25246020, KAKENHI-PROJECT-25889041
  • [Journal Article] Cubic Rashba Spin-Orbit Interaction of a Two-Dimensional Hole Gas in a Strained-Ge/SiGe Quantum Well2014

    • Author(s)
      Rai Moriya, Kentarou Sawano, Yusuke Hoshi, Satoru Masubuchi, Yasuhiro Shiraki, Andreas Wild, Christian Neumann, Gerhard Abstreiter, Dominique Bougeard, Takaaki Koga, and Tomoki Machida
    • Journal Title

      Physical Review Letters

      Volume: 113 Issue: 8 Pages: 086601-086601

    • DOI

      10.1103/physrevlett.113.086601

    • NAID

      120007044497

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Journal Article] Reliable reduction of Fermi-level pinning at atomically matched metal/Ge interfaces by sulfur treatment2014

    • Author(s)
      K. Kasahara, S. Yamada, T. Sakurai, K. Sawano, H. Nohira, M. Miyao and K. Hamaya
    • Journal Title

      Applied Physics Letters

      Volume: 104 Issue: 17

    • DOI

      10.1063/1.4875016

    • Peer Reviewed / Open Access
    • Data Source
      KAKENHI-PROJECT-13J00339, KAKENHI-PROJECT-25246020, KAKENHI-PROJECT-25889041
  • [Journal Article] Uniaxially strained SiGe(111) and SiGe(100) grown on selectively ion-implanted substrates2014

    • Author(s)
      K. Sawano, Y. Hoshi, S. Kubo, S. Yamada, K. Nakagawa, Y. Shiraki
    • Journal Title

      Journal of Crystal Growth

      Volume: 401 Pages: 758-761

    • DOI

      10.1016/j.jcrysgro.2014.02.014

    • Peer Reviewed / Acknowledgement Compliant
    • Data Source
      KAKENHI-PROJECT-25600079, KAKENHI-PROJECT-26286044
  • [Journal Article] Gas-source MBE growth of strain-relaxed Si1-xCx on Si(100) substrates2013

    • Author(s)
      Keisuke Arimoto, Shoichiro Sakai, Hiroshi Furukawa, Junji Yamanaka, Kiyokazu Nakagawa, Noritaka Usami, Yusuke Hoshi, Kentarou Sawano, Yasuhiro Shiraki
    • Journal Title

      J. Cryst. Growth

      Volume: 378 Pages: 212-217

    • DOI

      10.1016/j.jcrysgro.2012.12.152

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-24360001, KAKENHI-PROJECT-25600079
  • [Journal Article] Room-temperature sign reversed spin-accumulation signals in Si using an atomically smooth Fe_3Si/Si(111) interface2013

    • Author(s)
      Y. Fujita, S. Yamada. Y. Ando, K. Sawano, H. Itoh, M. Miyao, and K. Hamaya
    • Journal Title

      Journal of Applied Physics

      Volume: 113 Issue: 1

    • DOI

      10.1063/1.4773072

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-11J01889, KAKENHI-PROJECT-25600079
  • [Journal Article] An ultra-thin buffer layer for Ge epitaxial layers on Si2013

    • Author(s)
      M. Kawano, S. Yamada. K. Tanikawa, K. Sawano, M. Miyao, and K. Hamaya
    • Journal Title

      Applied Physics Letters

      Volume: 102 Issue: 12

    • DOI

      10.1063/1.4798659

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-11J01889, KAKENHI-PROJECT-25600079
  • [Journal Article] On the origin of the uniaxial strain induced in Si/Ge heterostructures with selective ion implantation technique2013

    • Author(s)
      K. Sawano
    • Journal Title

      Journal of Crystal Growth

      Volume: - Pages: 251-253

    • DOI

      10.1016/j.jcrysgro.2012.12.100

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003, KAKENHI-PROJECT-25600079
  • [Journal Article] Qualitative study of temperature-dependent spin signals in n-Ge-based lateral devices with Fe_3Si/n^+-Ge Schottky-tunnel contacts2013

    • Author(s)
      K. Hamaya, Y. Baba, G Takemoto, K. Kasahara, S. Yamada, K. Sawano, and M. Miyao
    • Journal Title

      Journal of Applied Physics

      Volume: 113 Issue: 18

    • DOI

      10.1063/1.4804320

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-13J00339, KAKENHI-PROJECT-25600079
  • [Journal Article] Formation of compressively strained Si/Si1-xCx/Si(100) heterostructures using gas-source molecular beam epitaxy2013

    • Author(s)
      Keisuke Arimoto
    • Journal Title

      Journal of Crystal Growth

      Volume: 362 Pages: 276-281

    • DOI

      10.1016/j.jcrysgro.2011.12.084

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-23760011, KAKENHI-PROJECT-24360001, KAKENHI-PROJECT-25600079
  • [Journal Article] Formation of Uniaxially Strained Si/Ge Channels on SiGe Buffers Strain-controlled with Selective Ion Implantation2012

    • Author(s)
      K. Sawano
    • Journal Title

      ECS Transactions

      Volume: 50(9) Issue: 9 Pages: 815-820

    • DOI

      10.1149/05009.0815ecst

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Acceptor-Like States in SiGe Alloy Related to Point Defects Induced by Si+ Ion Implantation2012

    • Author(s)
      Motoki Satoh, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, and Yasuhiro Shiraki
    • Journal Title

      Jpn. J. Appl. Phys.

      Volume: 51 Issue: 10R Pages: 105801-105801

    • DOI

      10.1143/jjap.51.105801

    • NAID

      210000141389

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Formation of Tensilely Strained Germanium- on- Insulator2012

    • Author(s)
      Yusuke Hoshi, Kentarou Sawano, Kohei Hamaya
    • Journal Title

      Masanobu Miyao, and Yasuhiro Shiraki Applied Physics Express

      Volume: 5 Issue: 1 Pages: 15701-15701

    • DOI

      10.1143/apex.5.015701

    • NAID

      10030155011

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Upper limit of two-dimensional hole gas mobility in strained Ge/SiGe Heterostructures2012

    • Author(s)
      T. Tanaka, Y. Hoshi, K. Sawano, N. Usami, Y. Shiraki, and K. M. Itoh
    • Journal Title

      Appl. Phys. Lett.

      Volume: 100 Issue: 22 Pages: 222102-222102

    • DOI

      10.1063/1.4723690

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003, KAKENHI-PROJECT-22241024
  • [Journal Article] Effects of increased compressive strain on hole effective mass and scattering mechanisms in strained Ge channels2011

    • Author(s)
      K.Sawano, K.Toyama, R.Masutomi, T.Okamoto, K.Arimoto, K.Nakagawa, N.Usami, Y.Shiraki
    • Journal Title

      Microelectronic Engineering

      Volume: 88 Pages: 465-468

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Effects of increased compressive strain on hole effective mass and scattering mechanisms in strained Ge channels2011

    • Author(s)
      K.Sawano, K.Toyama, R.Masutomi, T.Okamoto, K.Arimoto, K.Nakagawa, N.Usami, Y.Shiraki
    • Journal Title

      Microelectronic Engineering

      Volume: 88 Pages: 465-468

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] XPS Study on Chemical Bonding States of high-κ/high-μGate Stacks for Advanced CMOS2011

    • Author(s)
      Hiroshi Nohira, Arata Komatsu, Koji Yamashita, Kuniyuki Kakushima, Hiroshi Iwai, Yusuke Hoshi, Kentarou Sawano, and Yasuhiro Shiraki
    • Journal Title

      Electrochemical Society Inc., ECS Transactions

      Volume: Vol.41 Pages: 137-146

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Journal Article] XPS Study on Chemical Bonding States of high-κ/high-μ Gate Stacks for Advanced CMOS2011

    • Author(s)
      Hiroshi Nohira, Arata Komatsu, Koji Yamashita, Kuniyuki Kakushima, Hiroshi Iwai, Yusuke Hoshi, Kentarou Sawano, Yasuhiro Shiraki
    • Journal Title

      Electrochemical Society Inc., ECS Transactions

      Volume: 41(Invited) Pages: 137-146

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Journal Article] Self-diffusion in compressively strained Ge2011

    • Author(s)
      Yoko Kawamura, Masashi Uematsu, Yusuke Hoshi, Kentarou Sawano, Maksym Myronov, Yasuhiro Shiraki, Eugene E.Haller, Kohei M.Itoh
    • Journal Title

      Journal of Applied Physics

      Volume: 110 Issue: 1

    • DOI

      10.1115/1.4004462

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Linewidth of Low-Field Electrically Detected Magnetic Resonance of Phosphorus in Isotopically Controlled Silicon2011

    • Author(s)
      Hiroki Morishita, Eisuke Abe, Waseem Akhtar, Leonid S.Vlasenko, Akira Fujimoto, Kentarou Sawano, Yasuhiro Shiraki, Lukas Dreher, Helge Riemann, Nikolai V.Abrosimov, Peter Becker, Hans-J.Pohl, Mike L.W.Thewalt, Martin S.Brandt, Kohei M.Itoh
    • Journal Title

      Applied Physics Express

      Volume: 4

    • NAID

      10027782881

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Line width dependence of anisotropic strain state in SiGe films induced by selective ion implantation2011

    • Author(s)
      Y. Hoshi, K. Sawano, A. Yamada, S. Nagakura, N. Usami, K. Arimoto, K. Nakagawa, and Y. Shiraki
    • Journal Title

      Applied Physics Express

      Volume: 4 Pages: 95701-95701

    • NAID

      10029622735

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Line width dependence of anisotropic strain state in SiGe films induced by selective ion implantation2011

    • Author(s)
      Y.Hoshi, K.Sawano, A.Yamada, S.Nagakura, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Journal Title

      Applied Physics Express

      Volume: 4 Issue: 9 Pages: 095701-095701

    • DOI

      10.1143/apex.4.095701

    • NAID

      10029622735

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Aluminum oxide for an effective gate in Si/SiGe two-dimensional electron gas systems2011

    • Author(s)
      Yun-Sok Shin, Roland Brunner, Akihiro Shibatomi, Toshiaki Obata, Tomohiro Otsuka, Jun Yoneda, Yasuhiro Shiraki, Kentarou Sawano, Yasuhiro Tokura, Yuichi Harada, Koji Ishibashi, Seigo Tarucha
    • Journal Title

      Semiconductor Science and Technology

      Volume: 26

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Metallic Behavior of Cyclotron Relaxation Time in Two-Dimensional Systems2011

    • Author(s)
      R. Masutomi, K. Sasaki, I. Yasuda, A. Sekine, K. Sawano, Y. Shiraki, and T. Okamoto
    • Journal Title

      Physical Review Letters

      Volume: 106 Issue: 19 Pages: 196404-196404

    • DOI

      10.1103/physrevlett.106.196404

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21244047, KAKENHI-PROJECT-21246003, KAKENHI-PROJECT-23740233
  • [Journal Article] Aluminum oxide for an effective gate in Si/SiGe two-dimensional electron gas systems2011

    • Author(s)
      Yun-Sok Shin, Roland Brunner, Akihiro Shibatomi, Toshiaki Obata, Tomohiro Otsuka, Jun Yoneda, Yasuhiro Shiraki, Kentarou Sawano, Yasuhiro Tokura, Yuichi Harada, Koji Ishibashi, Seigo Tarucha
    • Journal Title

      Semiconductor Science and Technology

      Volume: 26

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Linewidth of Low-Field Electrically Detected Magnetic Resonance of Phosphorus in Isotopically Controlled Silicon2011

    • Author(s)
      Hiroki Morishita, Eisuke Abe, Waseem Akhtar, Leonid S.Vlasenko, Akira Fujimoto, Kentarou Sawano, Yasuhiro Shiraki, Lukas Dreher, Helge Riemann, Nikolai V.Abrosimov, Peter Becker, Hans-J.Pohl, Mike L.W.Thewalt, Martin S.Brandt, Kohei M.Itoh
    • Journal Title

      Applied Physics Express

      Volume: 4

    • NAID

      10027782881

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Electrical detection of cross relaxation between electron spins of phosphorus and oxygen-vacancy centers in silicon2011

    • Author(s)
      W.Akhtar, H.Morishita, K.Sawano, Y.Shiraki, L.S.Vlasenko, K.M.Itoh
    • Journal Title

      Physical Review B

      Volume: 84 Issue: 4 Pages: 45204-45204

    • DOI

      10.1103/physrevb.84.045204

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003, KAKENHI-PROJECT-22241024
  • [Journal Article] Ion energy and dose dependence of strain relaxation for thin SiGe buffer layers using Si+ implantation2010

    • Author(s)
      Y.Hoshi, K.Sawano, A.Yamada, K.Arimoto, N.Usami, K.Nakagawa, Y.Shiraki
    • Journal Title

      Thin Solid Films 518

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Formation of Uniaxially Strained SiGe by Selective Ion Implantation Technique2010

    • Author(s)
      Kentarou Sawano, Yusuke Hoshi, Atsunori Yamada, Yoshiyasu Hiraoka, Noritaka Usami, Keisuke Arimoto, Kiyokazu Nakagawa, Yasuhiro Shiraki
    • Journal Title

      Thin Solid Films 518

      Pages: 2454-2456

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Ultrashallow Ohmic contacts for n-type Ge by Sb δ-doping2010

    • Author(s)
      K.Sawano, Y.Hoshi, K.Kasahara, K.Yamane, K.Hamaya, M.Miyao, Y.Shiraki
    • Journal Title

      Applied Physics Letters

      Volume: 97

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Formation of Uniaxially Strained SiGe by Selective Ion Implantation Technique2010

    • Author(s)
      Kentarou Sawano, Yusuke Hoshi, AtsunoriYamada, Yoshiyasu Hiraoka, Noritaka Usami, Keisuke Arimoto, Kiyokazu Nakagawa, and Yasuhiro Shiraki
    • Journal Title

      Thin Solid Films

      Volume: 518 Pages: 2454-2454

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Excitonic Aharonov-Bohm effect in isotopically pure 70GeO Si self-assembled type-II quantum dots2010

    • Author(s)
      Satoru Miyamoto, Oussama Moutanabbir, Toyofumi Ishikawa, Mikio Eto, Eugene E.Haller, Kentarou Sawano, Yasuhiro Shiraki, Kohei M.Itoh
    • Journal Title

      Physical Review B

      Volume: 82

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Ion dose, energy, and species dependencies of strain relaxation of SiGe buffer layers fabricated by ion implantation technique2010

    • Author(s)
      Y.Hoshi, K.Sawano, A.Yamada, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Journal Title

      Journal of Applied Physics

      Volume: 107

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Quantum Transport and Cyclotron Resonance Study of Ge/SiGe Quantum Wells in High Magnetic Fields2010

    • Author(s)
      N.Miura, N.V.Kozlova, K.Dorr, J.Freudenberger, L.Schultz, O.Drachenko, K.Sawano, Y.Shiraki
    • Journal Title

      Journal of Low Temperature Physics

      Volume: 159 Pages: 222-225

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Cyclotron resonance of two-dimensional electrons in a Si quantum well2010

    • Author(s)
      R.Masutomi, A.Sekine, K.Sasaki, K.Sawano, Y.Shiraki, T.Okamoto
    • Journal Title

      Physica E : Low-dimensional Systems and Nanostructures

      Volume: 42 Pages: 1184-1187

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Landau level crossing and pseudospin phase transitions in Si quantum wells2010

    • Author(s)
      Kohei Sasaki, Ryuichi Masutomi, Kiyohiko Toyama, Kentarou Sawano, Yasuhiro Shiraki, Tohru Okamoto
    • Journal Title

      Physica E : Low-dimensional Systems and Nanostructures

      Volume: 42 Pages: 1018-1021

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Study of HfO_2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron Spectroscopy2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, Yasuhiro Shiraki
    • Journal Title

      Electrochemical Society Inc., ECS Transactions

      Volume: Vol.33,No.3 Pages: 467-472

    • NAID

      110008900164

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Journal Article] Optical anisotropies of Si grown on step-graded SiGe(110) layers2010

    • Author(s)
      R.E.Balderas-Navarro, L.F.Lastras-Martinez, K.Arimoto, R.Castro-Garcia, O.Villalobos-Aguilar, A.Lastras-Martinez, K.Nakagawa, K.Sawano, Y.Shiraki, N.Usami, K.Nakajima
    • Journal Title

      Applied Physics Letters

      Volume: 96

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Study of HfO_2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron Spectroscopy2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, Yasuhiro Shiraki
    • Journal Title

      ECS Transaction

      Volume: 33 Pages: 467-472

    • NAID

      110008900164

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Ion dose, energy, and species dependencies of strain relaxation of SiGe buffer layers fabricated by ion implantation technique2010

    • Author(s)
      Y.Hoshi, K.Sawano, A.Yamada, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Journal Title

      Journal of Applied Physics

      Volume: 107

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Study of HfO_2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron Spectroscopy2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, and Yasuhiro Shiraki
    • Journal Title

      Electrochemical Society Inc., ECS Transactions

      Volume: Vol.33, No.3 Pages: 467-472

    • NAID

      110008900164

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Journal Article] Ion dose, energy, and species dependencies of strain relaxation of SiGe buffer layers fabricated by ion implantation technique2010

    • Author(s)
      Y. Hoshi, K. Sawano, A. Yamada, N. Usami,K. Arimoto, K. Nakagawa, and Y. Shiraki
    • Journal Title

      J. Appl. Phys.

      Volume: 107 Pages: 103509-103509

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Excitonic Aharonov-Bohm effect in isotopically pure 70GeO Si self-assembled type-II quantum dots2010

    • Author(s)
      Satoru Miyamoto, Oussama Moutanabbir, Toyofumi Ishikawa, Mikio Eto, Eugene E.Haller, Kentarou Sawano, Yasuhiro Shiraki, Kohei M.Itoh
    • Journal Title

      Physical Review B

      Volume: 82

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Landau level crossing and pseudospin phase transitions in Si quantum wells2010

    • Author(s)
      Kohei Sasaki, Ryuichi Masutomi, Kiyohiko Toyama, Kentarou Sawano, Yasuhiro Shiraki, Tohru Okamoto
    • Journal Title

      Physica E : Low-dimensional Systems and Nanostructures

      Volume: 42 Pages: 1018-1021

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Ultrashallow Ohmic contacts for n-type Ge by Sb --doping2010

    • Author(s)
      K. Sawano, Y. Hoshi, K. Kasahara, K. Yamane, K. Hamaya, M. Miyao, and Y. Shiraki
    • Journal Title

      Appl. Phys. Lett.

      Volume: 97 Pages: 162108-162108

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Comparison of Nonlocal and Local Magnetoresistance Signals in Laterally Fabricated Fe3Si/Si Spin-Valve Devices2010

    • Author(s)
      Yuichiro Ando, Kenji Kasahara, Kazutaka Yamane, Kohei Hamaya, Kentarou Sawano, Takashi Kimura, Masanobu Miyao
    • Journal Title

      Applied Physics Express

      Volume: 3

    • NAID

      210000014783

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Cyclotron resonance of two-dimensional electrons in a Si quantum well2010

    • Author(s)
      R.Masutomi, A.Sekine, K.Sasaki, K.Sawano, Y.Shiraki, T.Okamoto
    • Journal Title

      Physica E : Low-dimensional Systems and Nanostructures

      Volume: 42 Pages: 1184-1187

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Optical anisotropies of Si grown on step-graded SiGe(110) layers2010

    • Author(s)
      R.E.Balderas-Navarro, L.F.Lastras-Martinez, K.Arimoto, R.Castro-Garcia, O.Villalobos-Aguilar, A.Lastras-Martinez, K.Nakagawa, K.Sawano, Y.Shiraki, N.Usami, K.Nakajima
    • Journal Title

      Applied Physics Letters

      Volume: 96

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Journal Article] Ultrashallow Ohmic contacts for n-type Ge by Sb δ-doping2010

    • Author(s)
      K.Sawano, Y Hoshi, K.Kasahara, K.Yamane, K.Hamaya, M.Miyao, Y.Shiraki
    • Journal Title

      Applied Physics Letters

      Volume: 97

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Comparison of Nonlocal and Local Magnetoresistance Signals in Laterally Fabricated Fe3Si/Si Spin-Valye Devices2010

    • Author(s)
      Yuichiro Ando, Kenji Kasahara, Kazutaka Yamane, Kohei Hamaya, Kentarou Sawano, Takashi Kimura, Masanobu Miyao
    • Journal Title

      Applied Physics Express

      Volume: 3

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Quantum Transport and Cyclotron Resonance Study of Ge/SiGe Quantum Wells in High Magnetic Fields2010

    • Author(s)
      N.Miura, N.V.Kozlova, K.Dorr, J.Freudenberger, L.Schultz, O.Drachenko, K.Sawano, Y Shiraki
    • Journal Title

      Journal of Low Temperature Physics

      Volume: 159 Pages: 222-225

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Study of HfO_2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron Spectroscopy2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, Yasuhiro Shiraki
    • Journal Title

      ECS Transaction

      Volume: 33 Pages: 467-472

    • NAID

      110008900164

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Strain relaxation mechanisms in step-graded SiGe/Si(110) heterostructures grown by gas-source MBE at high temperatures2009

    • Author(s)
      Keisuke Arimoto, Masato Watanabe, Junji Yamanaka, Kiyokazu Nakagawa, Noritaka Usami, Kazuo Nakajima, Kentarou Sawano, Yasuhiro Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 819-824

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Probing the Behaviors of Point Defects in Silicon and Germanium Using Isotope Superlattices2009

    • Author(s)
      Masashi Uematsu, Miki Naganawa, Yasuo Shimizu, Kohei M.Itoh, Kentarou Sawano, Yasuhiro Shiraki, Eugene E.Haller
    • Journal Title

      ECS Transaction 25

      Pages: 51-54

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Insulating phases induced by crossing of partially filled Landau levels in a Si quantum well2009

    • Author(s)
      Tohru Okamoto, Kohei Sasaki, Kiyohiko Toyama, Ryuichi Masutomi, Kentarou Sawano, Yasuhiro Shiraki
    • Journal Title

      Physical Review B 79

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Electrical injection and detection of spin-polarized electrons in silicon through an Fe3Si/Si Schottky tunnel barrier2009

    • Author(s)
      Y.Ando, K.Hamaya, K.Kasahara, Y.Kishi, K.Ueda, K.Sawano, T.Sadoh, M.Miyao
    • Journal Title

      Applied Physics Letters 94

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Local Control of Strain in SiGe by IonImplantation Technique2009

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, N. Usami , K. Nakagawa, Y. Shiraki
    • Journal Title

      Journal of Crystal Growth

      Volume: 311 Pages: 806-808

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Electrical detection and magnetic-field control of spin states in phosphorus-doped silicon2009

    • Author(s)
      H.Morishita, L.S.Vlasenko, H.Tanaka, K.Semba, K.Sawano, Y.Shiraki, M.Eto, K.M.Itoh
    • Journal Title

      Physical Review B 80

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Strain relaxation mechanisms in compositionally uniform and step-graded SiGe films grown on Si(110) substrates2009

    • Author(s)
      Keisuke Arimoto, Masato Watanabe, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, Yasuhiro Shiraki, Noritaka Usami, Kazuo Nakajima
    • Journal Title

      Solid-State Electronics 53

      Pages: 1135-1143

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Strain dependence of hole effective mass and scattering mechanism in strained Ge channel structures2009

    • Author(s)
      K. Sawano, K. Toyama, R. Masutomi, T. Okamoto, N. Usami, K. Arimoto, K. Nakagawa, and Y. Shiraki
    • Journal Title

      Appl. Phys. Lett.

      Volume: 95 Pages: 122109-122109

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Strain dependence of hole effective mass and scattering mechanism in strained Ge channel structures2009

    • Author(s)
      K.Sawano, K.Toyama, R.Masutomi, T.Okamoto, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Journal Title

      Applied Physics Letters 95

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Local Control of Strain in SiGe by Ion Implantation Technique2009

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, N. Usami , K. Nakagawa, Y. Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 806-808

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Structural and transport properties of strained SiGe grown on V-groove patterned Si(110) substrates2009

    • Author(s)
      Keisuke Arimoto, Genki Kawaguchi, Kana Shimizu, Masato Watanabe, Junji Yamanaka, Kiyokazu Nakagawa, Noritaka Usami, Kazuo Nakajima, Kentarou Sawano, Yasuhiro Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 814-818

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Crystalline morphologies of step-graded SiGe layers grown on exact and vicinal (110) Si substrates2009

    • Author(s)
      Keisuke Arimoto, Masato Watanabe, Junji Yamanaka, Kiyokazu Nakagawa, Kentarou Sawano, Yasuhiro Shiraki, Noritaka Usami, Kazuo Nakajima
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 809-813

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Fabrication of thin strain-relaxed SiGe buffer layers with high Ge composition by ion implantation method2009

    • Author(s)
      Y.Hoshi, K.Sawano, Y.Hiraoka, Y.Sato, Y.Ogawa, A.Yamada, N.Usami, K.Nakagawa, Y.Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 825-828

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Fabrication of thin strain-relaxed SiGe buffer layers with high Ge composition by ion implantation method2009

    • Author(s)
      Y. Hoshi, K. Sawano, Y. Hiraoka, Y. Sato, Y. Ogawa, A. Yamada, N. Usami, K. Nakagawa, Y. Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 825-828

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Local Control of Strain in SiGe by Ion Implantation Technique2009

    • Author(s)
      K.Sawano, Y.Hoshi, Y.Hiraoka, N.Usami, K.Nakagawa, Y.Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 806-808

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Well-width dependence of valley splitting in Si/SiGe quantum wells2009

    • Author(s)
      Kohei Sasaki, Ryuichi Masutomi, Kiyohiko Toyama, Kentarou Sawano, Yasuhiro Shiraki, Tohru Okamoto
    • Journal Title

      Applied Physics Letters 95

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Journal Article] Local Control of Strain in SiGe by Ion Implantation Technique2008

    • Author(s)
      K. Sawano, Y. Hoshi, Y Hiraoka, N. Usami, K. Nakagawa, Y. Shiraki
    • Journal Title

      Journal of Crystal Growth 311

      Pages: 806-808

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Introduction of Uniaxial Strain into Si/Ge Heterostructures by Selective Ion Implantation2008

    • Author(s)
      Kentarou Sawano, Yusuke Hoshi, Atsunori Yamada, Yoshiyasu Hiraoka, Noritaka Usami, Keisuke Arimoto, Kiyokazu Nakagawa, Yasuhiro Shiraki
    • Journal Title

      Applied Physics Express 1

      Pages: 121401-121401

    • NAID

      10025083624

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] New Structure of Polycrystalline Silicon Thin-Film Transistor with Germanium Layer in Source/Drain Regions for Low-Temperature Device Fabrication2008

    • Author(s)
      M. Mitsui, K. Arimoto, J. Yamanaka, K. Nakagawa, K. Sawano and Y. Shiraki
    • Journal Title

      Japanese Journal of Applied Physics 47

      Pages: 1547-1549

    • NAID

      40015945438

    • Description
      「研究成果報告書概要(和文)」より
    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Journal Article] Fabrication of high quality SiGe relaxed thin layers by ion implantation technique with Ar, Si and Ge ions2008

    • Author(s)
      K. Sawano, A. Fukumoto, Y Hoshi, J. Yamanaka, K. Nakagawa, and Y Shiraki
    • Journal Title

      Thin Solid Films 517

      Pages: 87-89

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] New Structure of Polycrystalline Silicon Thin-Film Transistor with Germanium Layer in Source/Drain Regions for Low-Temperature Device Fabrication2008

    • Author(s)
      M. Mitsui, K. Arimoto, J. Yamanaka, K. Nakagawa, K. Sawano, Y. Shiraki
    • Journal Title

      Jpn. J. Appl. Phys 47

      Pages: 1547-1549

    • NAID

      40015945438

    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Journal Article] Fabrication of high quality SiGe relaxed thin layers by ion implantation technique with Ar, Si and Ge ions2008

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, J. Yamanaka, K. Nakagawa, and Y. Shiraki
    • Journal Title

      Thin Solid Films 517

      Pages: 87-89

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Strained-Si nMOSFET formed on very thin SiGe buffer layer fabricated by ion implantation technique2008

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, K. Nakagawa, and Y. Shiraki
    • Journal Title

      Thin Solid Films 517

      Pages: 353-355

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Strained-Si n-channel metal-oxide-semiconductor field-effect-transistors formed on very thin SiGe relaxed layer fabricated by ion implantation technique2007

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, Y. Shiraki, J. Yamanaka, K. Nakagawa
    • Journal Title

      Applied Physics Letters 90

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Fabrication of SiGe Virtual Substrates by Ion Implantation Technique2007

    • Author(s)
      K. Sawano, Y. Shiraki, and K. Nakagawa
    • Journal Title

      ECS Transaction 11

      Pages: 75-75

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Strained-Si n-channel metal-oxide-semiconductor field-effect-transistors formed on very thin SiGe relaxed layer fabricated by ion implantation technique2007

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, Y. Shiraki, J. Yamanaka, and K. Nakagawa
    • Journal Title

      Appl. Phys. Lett 90

      Pages: 202101-202101

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Fabrication of SiGe Virtual Substrates by Ion Implantation Technique2007

    • Author(s)
      K. Sawano, Y. Shiraki, K. Nakagawa
    • Journal Title

      ECS Transaction 11

      Pages: 75-89

    • Peer Reviewed
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Journal Article] Influence of Ge atoms on mobility and junction properties of thin-film transistors fabricated on solid-phase crystallized poly-SiGe2006

    • Author(s)
      M.Mitsui, a_K.Arimoto, J.Yamanaka, K.Nakagawa, K.Sawano, Y.Shiraki
    • Journal Title

      Applied Physics Letters 89

      Pages: 192102-192102

    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] パターニング手法によって形成した歪み SiGe 層内へのクラック発生に対する熱処理の影響2024

    • Author(s)
      澤野 憲太郎
    • Organizer
      第71回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-23H05458
  • [Presentation] 高移動度歪みGeチャネルに向けたSi(111)上SiGeバッファーの形成とクラック発生抑制2024

    • Author(s)
      澤野 憲太郎
    • Organizer
      第71回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] 高移動度歪みGeチャネルに向けたSi(111)上SiGeバッファーの形成とクラック発生抑制2024

    • Author(s)
      澤野 憲太郎
    • Organizer
      第71回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-23H05458
  • [Presentation] Si0.1Ge0.9における室温スピン伝導の歪み効果2024

    • Author(s)
      内藤貴大, 山田道洋, 我妻勇哉, 澤野憲太郎, 浜屋宏平
    • Organizer
      第71回応用物理学会春季学術講演会
    • Invited
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] パターニング手法によって形成した歪み SiGe 層内へのクラック発生に対する熱処理の影響2024

    • Author(s)
      澤野 憲太郎
    • Organizer
      第71回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Significant effect of carrier concentration on spin lifetime at low temperatures in strained Si0.1Ge0.92023

    • Author(s)
      K. Kawashima, T. Naito, M. Yamada, T. Okada, Y. Wagatsuma, K. Sawano, and K. Hamaya
    • Organizer
      INTERMAG 2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] SiGe/Ge quantum dots as an interface for photon-to-electron-hole spin conversion2023

    • Author(s)
      Gabriel Gulak Maia,Akira Oiwa, and Kentaro Sawano
    • Organizer
      MRM2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05458
  • [Presentation] Fabrication of crack free strained SiGe/Ge multiple quantum wells on Ge on Si(111) by the patterning method2023

    • Author(s)
      R. Kanesawa, Y. Wagatsuma, S. Kikuoka, Y. Sugiura, M. Yamada, K. Hamaya and K. Sawano
    • Organizer
      The Joint ISTDM-ICSI 2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Detection of magnetoresistance effect in all-epitaxial Co2MnSi/Ge/Co2MnSi vertical spin-valve devices on Si(111)2023

    • Author(s)
      Atsuya Yamada, Michihiro Yamada, Shuhei Kusumoto, Youya Wagatsuma, Shinya Yamada, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      ISTDM-ICSI-2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Effect of interfacial magnetism on spin injection/detection efficiency in Ge-based spin devices with Co2FeAl0.5Si0.5/Ge Schottky tunnel junctions2023

    • Author(s)
      M. Yamada, T. Naito, R. Nishimura, A. Masago, Y. Shiratsuchi, Y. Wagatsuma, K. Sawano, R. Nakatani, T. Oguchi, and K. Hamaya
    • Organizer
      MRM2023/IUMRS-ICA2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strain engineering of Si/Ge heterostructures based on Ge virtual substrates2023

    • Author(s)
      Kentarou Sawano
    • Organizer
      E-MRS 2023 Spring Meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Fabrication of Si/Ge microbridges based on Ge-on-Si (110) and effect of bridge length2023

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Ayaka Odashima, Masaki Nagao, Kentarou Sawano
    • Organizer
      The Joint ISTDM-ICSI 2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Valley splitting energy in strained Si0.1Ge0.9/Ge-on-Si detected by lateral spin transport measurements2023

    • Author(s)
      K. Kawashima, T. Okada, M. Yamada, T. Naito, Y. Wagatsuma, K. Sawano, and K. Hamaya
    • Organizer
      MRM2023/IUMRS-ICA2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 強磁性ホイスラー合金Co2FeSi上へのGeエピタキシャル成長におけるSn添加の効果2023

    • Author(s)
      楠本修平, 山田道洋, 山田敦也, 我妻勇哉, 澤野憲太郎, 浜屋宏平
    • Organizer
      第70回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Effect of carrier concentration on low-temperature spin transport in strained n-Si0.1Ge0.92023

    • Author(s)
      Kazuaki Kawashima, Takahiro Naito, Michihiro Yamada, Takuya Okada, Youya Wagatsuma, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      第70回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Enhancement of spin signals in CoFe/Sn-doped Ge/Co2FeSi vertical spin-valve devices2023

    • Author(s)
      S. Kusumoto, M. Yamada, A. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      MRM2023/IUMRS-ICA2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Enhancement in Spin Transport Length in Strained n-Si0.1Ge0.9(111)2023

    • Author(s)
      Takahiro Naito, Michihiro Yamada, Youya Wagatsuma, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      ISTDM-ICSI-2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Structural and magnetic properties of CoFe/Sn-doped Ge/Co2FeSi for vertical spin-valve devices on Si2023

    • Author(s)
      Shuhei Kusumoto, Michihiro Yamada, Atsuya Yamada, Youya Wagatsuma, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      INTERMAG 2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Low-temperature annealing effect on spin transport in lateral spin valve devices with Co-based Heusler alloys/Ge heterostructures2023

    • Author(s)
      Michihiro Yamada, Naoyuki Sugiyama, Kazuaki Sumi, Kenji Oki, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      第84回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Diode characteristics and room temperature EL emission of strained SiGe/Ge quantum well LEDs2023

    • Author(s)
      Shuya Kikuoka, Youya Wagatsuma, Yuwa Sugiura, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      The Joint ISTDM-ICSI 2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] スピン輸送測定を用いた歪みSi0.1Ge0.9伝導帯 バレー 分裂の推定と低温における不純物散乱の影響2023

    • Author(s)
      岡田拓也,川嶌一彰,山田道洋,内藤貴大, 我妻勇哉,澤野憲太郎,浜屋宏平
    • Organizer
      第47回日本磁気学会学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] パターニング手法によって形成した歪み SiGe 層内へのクラック発生に対する熱処理の影響2023

    • Author(s)
      澤野 憲太郎
    • Organizer
      第71回応用物理学会春季学術講演会
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05455
  • [Presentation] Fabrication of a germanium quantum dot device for photon-spin conversion2023

    • Author(s)
      J. Bauer, G. Maia, B. Sergl, K. Sawano, A. Oiwa
    • Organizer
      The 27th SANKEN International Symposium
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05458
  • [Presentation] 高移動度歪みGeチャネルに向けたSi(111)上SiGeバッファーの形成とクラック発生抑制2023

    • Author(s)
      澤野 憲太郎
    • Organizer
      第71回応用物理学会春季学術講演会
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05455
  • [Presentation] The influence of light irradiation the transport properties of SiGe/Ge heterostructure devices2023

    • Author(s)
      Gabriel Gulak Maia,Akira Oiwa, and Kentaro Sawano
    • Organizer
      1st International Workshop on Quantum Information Engineering (QIE2023)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05458
  • [Presentation] Molecular beam epitaxy growth of ferromagnetic Heusler alloy films on SiGe(111) grown by Al-Ge-paste-induced liquid phase epitaxy,2023

    • Author(s)
      Michihiro Yamada, Kazuaki Sumi, Ai. I. Osaka, Azusa. N. Hattori, Youya Wagatsuma, Kentarou Sawano, Shinya Yamada, Shota Suzuki, Marwan Dhamrin, and Kohei Hamaya
    • Organizer
      ISTDM-ICSI-2023
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strain engineering of Si/Ge heterostructures based on Ge virtual substrates2023

    • Author(s)
      Kentarou Sawano
    • Organizer
      E-MRS 2023 Spring Meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strain engineering of Si/Ge heterostructures based on Ge virtual substrates2023

    • Author(s)
      Kentarou Sawano
    • Organizer
      E-MRS 2023 Spring Meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05458
  • [Presentation] Strain engineering of Si/Ge heterostructures based on Ge virtual substrates2023

    • Author(s)
      Kentarou Sawano
    • Organizer
      E-MRS 2023 Spring Meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-23H05455
  • [Presentation] メサパターン上の歪みSiGe膜へのクラック発生におけるエッチング深さの影響2022

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、金澤伶奈、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第69回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of thick SiGe/Ge multiple quantum wells on Ge-on-Si and their optical properties2022

    • Author(s)
      Rena Kanesawa, Youya Wagatsuma, Syuya Kikuoka, Yuwa Sugiura and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 階層的ナノ多孔層ガラス基板を用いたPドープGeナノ結晶の形成と発光特性2022

    • Author(s)
      長尾 優希、井上 貴裕、小田島 綾華、我妻 勇哉、藤間 卓也、澤野 憲太郎
    • Organizer
      第83回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Light emissions from strained Si1-xGex/Ge MQW formed on Ge-on-Si2022

    • Author(s)
      Rena Kanesawa, Youya Wagatsuma, Syuya Kikuoka, Yuwa Sugiura, Kentarou Sawano
    • Organizer
      The 22nd International Vacuum Congress
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Evaluation of crack propagation in strained SiGe on Ge(111) patterned with various etching thickness2022

    • Author(s)
      Youya Wagatsuma, Rena Kanesawa, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪み印加半導体薄膜のヘテロ成長におけるクラック発生とその抑制メカニズム2022

    • Author(s)
      我妻勇哉,金澤伶奈,Md. Mahfuz Alam,岡田和也,井上貴裕,山田道洋,浜屋宏平,澤野憲太郎
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Epitaxially grown of SiGe on Ge microbridge and observation of strong resonant light emission2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, L. Ikegaya, A. Odashima, M. Nagao and K. Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Fabrication of microbridges based on Ge-on-SOI and observation of strong resonant light emission2022

    • Author(s)
      Ayaka Odashima, Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Masaki Nagao and Kentarou Sawano
    • Organizer
      The 22nd International Vacuum Congress
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of SiGe/Ge microbridges based on Ge-on-Si(110) and observation of resonant light emission2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, R. Ikegaya, A. Odashima, M. Nagao, K. Sawano
    • Organizer
      APAC Silicide 2022
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Fabrication of microbridges based on Ge-on-SOI and observation of strong resonant light emission2022

    • Author(s)
      Ayaka Odashima, Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Masaki Nagao and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Ge-on-SOI上のマイクロブリッジの作製と強い共振発光の観測2022

    • Author(s)
      小田島 綾華、井上 貴裕、我妻 勇哉、池ヶ谷 玲雄、長尾 優希、澤野 憲太郎
    • Organizer
      第83回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Crack formations in SiGe/Ge MQW layers on Ge-on-Si(111) substrates2022

    • Author(s)
      Youya Wagatsuma, Rena Kanesawa, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano
    • Organizer
      APAC Silicide 2022
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of microbridges based on Ge-on-SOI and observation of strong resonant light emission2022

    • Author(s)
      Ayaka Odashima, Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Masaki Nagao and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] メサパターン上の歪みSiGe膜へのクラック発生におけるエッチング深さの影響2022

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、金澤伶奈、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第69回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 縦型半導体スピン素子を目指したCo2FeSi上の高品質Ge成長と室温磁気抵抗比の増大2022

    • Author(s)
      山田 敦也,山田 道洋,山田 晋也,澤野 憲太郎,浜屋 宏平
    • Organizer
      第69回応用物理学会春季学術講演会
    • Invited
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 二軸歪みGeマイクロブリッジの発光特性におけるスリット導入の効果2022

    • Author(s)
      駒澤 卓哉、池ヶ谷 玲雄、井上 貴裕、我妻 勇哉、澤野 憲太郎
    • Organizer
      第83回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Epitaxially grown of SiGe on Ge microbridge and observation of strong resonant light emission2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, L. Ikegaya, A. Odashima, M. Nagao and K. Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Long-distance spin-drift transport in strained SiGe2022

    • Author(s)
      Takahiro Naito, Kazuaki Kawashima, Michihiro Yamada, Youya Wagatsuma, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      第69回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strain engineering of heteroepitaxial SiGe/Ge on Si with various crystal orientations2022

    • Author(s)
      Md. Mahfuz Alam, Youya Wagatsuma, Kazuya Okada, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] メッシュ型パッドを有する歪みGeマイクロブリッジの発光特性にホールサイズが与える影響2022

    • Author(s)
      池ヶ谷 玲雄、井上 貴裕、駒澤 卓哉、我妻 勇哉、澤野 憲太郎
    • Organizer
      第83回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Pumping power dependence of light emissions from strained Ge microbridges2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, R. Ikegaya, A. Odashima, M. Nagao, K. Sawano
    • Organizer
      The 22nd International Vacuum Congress IVC-22
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Geマイクロブリッジ上への歪みSiGe成長と発光特性2022

    • Author(s)
      井上 貴裕、我妻 勇哉、池ヶ谷 玲雄、岡田 和也、澤野 憲太郎
    • Organizer
      第69回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Pumping power dependence of light emissions from strained Ge microbridges2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, R. Ikegaya, A. Odashima, M. Nagao, K. Sawano
    • Organizer
      The 22nd International Vacuum Congress
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of SiGe/Ge microbridges based on Ge-on-Si(110) and observation of resonant light emission2022

    • Author(s)
      T. Inoue, Y. Wagatsuma, R. Ikegaya, A. Odashima, M. Nagao, K. Sawano
    • Organizer
      APAC Silicide 2022
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Ge-on-Si (110)を用いた枝型マイクロブリッジ作製による共振発光の観測2022

    • Author(s)
      井上 貴裕、我妻 勇哉、池ヶ谷 玲雄、小田島 綾華、長尾 優希、澤野 憲太郎
    • Organizer
      第83回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Effects of etching depth on crack generation in strained SiGe films on mesa-patterned Ge2022

    • Author(s)
      Youya Wagatsuma, Rena Kanesawa, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano
    • Organizer
      The 2022 Spring Meeting of the European Materials Research Society
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of strained Ge microbridge structures with meshed pads and their optical properties2022

    • Author(s)
      Reo Ikegaya, Takahiro Inoue, Takuya Komazawa, Youya Wagatsuma and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Strong Room-temperature EL emissions from strained SiGe/Ge-on-Si (111) LEDs2022

    • Author(s)
      Shuya Kikuoka, Youya Wagatsuma, Yuwa Sugiura, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪みSiGe/Ge(111)におけるクラック伝搬に与えるメサ・エッチング深さの影響2022

    • Author(s)
      我妻勇哉,金澤伶奈,Md. Mahfuz Alam,岡田和也,井上貴裕,山田道洋,浜屋宏平,澤野憲太郎
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Increased critical thickness of strained SiGe layers on Ge-on-Si(111)2022

    • Author(s)
      Youya Wagatsuma, Rena Kanesawa, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya, and Kentarou Sawano
    • Organizer
      The 22nd International Vacuum Congress
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Ge-on-Si(111)上に成長した歪みSiGe層の電気伝導特性に与えるクラック発生の影響2022

    • Author(s)
      市川大悟,我妻勇哉,山田道洋,浜屋宏平,澤野憲太郎
    • Organizer
      第83回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of branch-like bridges based on Ge-on-Si(110) and observation of strong resonant light emission2022

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kentarou Sawano
    • Organizer
      The 2022 Spring Meeting of the European Materials Research Society
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of branch-like bridges based on Ge-on-Si(110) and observation of strong resonant light emission2022

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kentarou Sawano
    • Organizer
      The 2022 Spring Meeting of the European Materials Research Society (E-MRS)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] 歪みSi/緩和 SiGe/Si(110)ヘテロ構造p-MOSFETの高正孔移動度化とリーク電流の低減2022

    • Author(s)
      藤澤 泰輔、各川 敦史、堀内 未希、坂田 千尋、山中 淳二、原 康祐、澤野 憲太郎、中川 清和、有元 圭介
    • Organizer
      第69回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-21K04900
  • [Presentation] Two-terminal magnetoresistance ratio in Co-based Heusler alloy/germanium lateral spin-valve devices2022

    • Author(s)
      M. Yamada, K. Sumi, T. Naito, K. Sawano, and K. Hamaya
    • Organizer
      15th Joint MMM-INTERMAG Conference
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Fabrication of microbridges based on Ge-on-SOI and observation of strong resonant light emission2022

    • Author(s)
      Ayaka Odashima, Takahiro Inoue, Youya Wagatsuma, Reo Ikegaya, Masaki Nagao and Kentarou Sawano
    • Organizer
      The 22nd International Vacuum Congress IVC-22
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Fabrication of strained Ge microbridge structures with meshed pads and their optical properties2022

    • Author(s)
      Reo Ikegaya, Takahiro Inoue, Takuya Komazawa, Youya Wagatsuma and Kentarou Sawano
    • Organizer
      The 242nd ECS Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Observation of photoluminescence from SiGe/Ge MQW on Ge-on-Si(111)2021

    • Author(s)
      Y. Wagatsuma, Md. M. Alam, K. Okada, R. Kanesawa, M. Yamada, K. Hamaya and K. Sawano
    • Organizer
      International Symposium on Novel maTerials and quantum Technologies (ISNTT) 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strong resonant light emission in strained Ge microbridges2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kazuya Okada and Kentarou Sawano
    • Organizer
      International Symposium on Novel maTerials and quantum Technologies (ISNTT) 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪みSiGe/Ge(111)におけるクラック形成と伝搬方向制御2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、金澤 伶奈、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Suppression of crack formation in strained SiGe layers by patterning of Ge-on-Si substrates2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      EMRS 2021, Spring meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Geマイクロブリッジ上への歪みSiGeのエピタキシャル成長2021

    • Author(s)
      井上 貴裕、我妻 勇哉、池ヶ谷 玲雄、岡田 和也、澤野 憲太郎
    • Organizer
      第4回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 熱電出力因子増大に向けたエピタキシャルCoSi2ナノドット含有SiGe薄膜の開発2021

    • Author(s)
      細田 凌矢、水田 光星、石部 貴史、Md. Mahfuz Alam、澤野 憲太郎、中村 芳明
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] エピタキシャルGe-on-Si(111)LEDの熱処理による室温EL発光強度増大2021

    • Author(s)
      杉浦 由和、佐々木 雅至、我妻 勇哉、山田 航大、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第4回結晶工学xISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Epitaxial growth of strained Si0.2Ge0.8 on Ge microbridge2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kazuya Okada and Kentarou Sawano
    • Organizer
      21st ICMBE 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Annealing tolerance of Co-based Heusler alloys/Fe/Ge spin injection interfaces2021

    • Author(s)
      Kazuaki Sumi, Michihiro Yamada, Takahiro Naito, Kohei Kudo, Kentarou Sawano, Kohei Hamaya
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Suppression of crack formation in strained SiGe layers by patterning of Ge-on-Si substrates2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      EMRS 2021 Spring Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Effect of uniaxial strain direction on luminescence properties of strained Ge microbridge structures2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Kodai Yamada and Kentarou Sawano
    • Organizer
      EMRS 2021 Spring Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Room temperature EL from strained Ge-on-Si(111) diode structures2021

    • Author(s)
      Yuwa Sugiura, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      EMRS 2021 Spring Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] エピタキシャルGe-on-Si(111)LEDの熱処理による室温EL発光強度増大2021

    • Author(s)
      杉浦 由和 、佐々木 雅至、我妻 勇哉、山田 航大、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第4回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Ge-on-Si(111)LEDの熱処理による室温EL発光強度増大2021

    • Author(s)
      杉浦 由和 、佐々木 雅至、我妻 勇哉、山田 航大 、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第82回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みGeマイクロブリッジ構造の発光特性に及ぼす一軸歪み方向の影響2021

    • Author(s)
      井上 貴裕、我妻 勇哉、山田 航大、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 高Q値中赤外Siマイクロディスク共振器2021

    • Author(s)
      三宅 拓磨、徐 学俊、澤野 憲太郎、丸泉 琢也、俵 毅彦、後藤 秀樹
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みGe-on-Si(111)ダイオード構造からの室温EL発光2021

    • Author(s)
      杉浦 由和, 我妻 勇哉, 山田 航大, 星 祐介, 山田 道洋, 浜屋 宏平, 澤野 憲太郎
    • Organizer
      第68回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] プラズマCVDを用いたSiO2/GeO2/Ge MOS構造の形成技術開発2021

    • Author(s)
      小俣快晴,澤野憲太郎,中川清和,荒井哲司,高松利行
    • Organizer
      第26回 電子デバイス界面テクノロジー研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Co2FeSi上へのGe薄膜の高品質化と縦型Ge素子におけるMR比の増大2021

    • Author(s)
      Atsuya Yamada, Michihiro Yamada, Shinya Yamada, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      第26回半導体におけるスピン工学の基礎と応用
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪みGeマイクロブリッジにおける端面共振発光の観測2021

    • Author(s)
      井上 貴裕、我妻 勇哉、池ヶ谷 玲雄、岡田 和也、澤野 憲太郎
    • Organizer
      第82回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Strong room-temperature EL emission from Ge-on-Si (111) diodes with ferromagnetic Schottky-tunnel electrodes2021

    • Author(s)
      Yuwa Sugiura, Masashi Sasaki, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya, Kentarou Sawano
    • Organizer
      International Symposium on Novel maTerials and quantum Technologies (ISNTT) 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪・組成制御エピタキシャルSiGe薄膜の熱電性能2021

    • Author(s)
      谷口 達彦、石部 貴史、我妻 勇哉、澤野 憲太郎、山下 雄一郎、中村 芳明
    • Organizer
      2021年第68回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H00853
  • [Presentation] Suppression of crack formation in strained SiGe layers by patterning of Ge-on-Si substrates2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      EMRS 2021 Spring Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Observation of photoluminous from SiGe/Ge MQW on Ge-on-Si(111)2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ISNTT 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Strong resonant light emission in strained Ge microbridges2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kazuya Okada and Kentarou Sawano
    • Organizer
      ISNTT 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Suppression of crack formation and propagation in strained SiGe by patterning Ge-on-Si substrates2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      21st ICMBE 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Dependences of the hole mobility in the strained Si pMOSFET formed on SiGe/Si(110) on strained Si thickness and the channel direction2021

    • Author(s)
      Keisuke Arimoto, Taisuke Fujisawa, Daichi Namiuchi, Atsushi Onogawa, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa
    • Organizer
      The 8th Asian Conference on Crystal Growth and Crystal Technology
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] Influence of non-magnetic layers at Co2FeAl0.5Si0.5/Ge interface on spin injection/detection efficiency2021

    • Author(s)
      Rintaro Nishimura, Takahiro Naito, Michihiro Yamada, Akira Masago, Yu Shiratsuchi, Ryoichi Nakatani, Kentarou Sawano, Tamio Oguchi, Kohei Hamaya
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Effect of uniaxial strain direction on luminescence properties of strained Ge microbridge structures2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Kodai Yamada and Kentarou Sawano
    • Organizer
      EMRS 2021 Spring Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Epitaxial growth of strained Si0.2Ge0.8 on Ge microbridge2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kazuya Okada and Kentarou Sawano
    • Organizer
      ICMBE 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造p-MOSFETにおける正孔移動度のチャネル方向依存性2021

    • Author(s)
      藤澤 泰輔、各川 敦史、浪内 大地、佐野 雄一、泉 大輔、山中 淳二、原 康祐、澤野 憲太郎、中川 清和、有元 圭介
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みGeマイクロブリッジ構造の発光特性に及ぼす一軸歪み方向の影響2021

    • Author(s)
      井上 貴裕、我妻 勇哉、山田 航大、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Ge基板に替わりGe-on-Siを用いることによる歪みSiGeへのクラック発生抑制2021

    • Author(s)
      我妻 勇哉, Md. Mahfuz Alam, 岡田 和也, 山田 道洋, 浜屋 宏平, 澤野 憲太郎
    • Organizer
      第68回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strain and Defect Engineering for the (110)-Oriented Si pMOSFETs2021

    • Author(s)
      Keisuke Arimoto, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa
    • Organizer
      International Conference on Materials Science and Engineering (Materials Oceania)
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-21K04900
  • [Presentation] 歪みGeマイクロブリッジにおける端面共振発光の観測2021

    • Author(s)
      井上 貴裕、我妻 勇哉、池ヶ谷 玲雄、岡田 和也、澤野 憲太郎
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strong room-temperature EL emission from Ge-on-Si(111) diodes2021

    • Author(s)
      Yuwa Sugiura, Masashi Sasaki, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ICMBE 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Ge基板に替わりGe-on-Siを用いることによる歪みSiGeへのクラック発生抑制2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みSiGe/Ge(111)におけるクラック形成と伝搬方向制御2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、金澤伶奈、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第82回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 二テルル化モリブデンのhBN封止構造における熱安定性2021

    • Author(s)
      林田 隼弥、野上田 聖、渡邊 賢司、谷口 尚、澤野 憲太郎、星 裕介
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Room temperature EL from strained Ge-on-Si(111) diode structures2021

    • Author(s)
      Yuwa Sugiura, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      EMRS 2021 Spring Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Strong room-temperature EL emission from Ge-on-Si(111) diodes with ferromagnetic Schottky-tunnel electrodes2021

    • Author(s)
      Yuwa Sugiura, Masashi Sasaki, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ISNTT 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] メッシュ型パッドを有する歪みGeマイクロブリッジ構造の作製と発光特性2021

    • Author(s)
      池ヶ谷 玲雄、井上 貴裕、佐々木雅至、我妻 勇哉、澤野 憲太郎
    • Organizer
      第82回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Suppression of crack formation and propagation in strained SiGe by patterning Ge-on-Si substrates2021

    • Author(s)
      Y. Wagatsuma, Md. M. Alam, K. Okada, R. Kanesawa, M. Yamada, K. Hamaya and K. Sawano
    • Organizer
      21st International Conference on Molecular Beam Epitaxy
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strong room-temperature EL emission from Ge-on-Si(111) diodes with ferromagnetic Schottky-tunnel electrodes2021

    • Author(s)
      Yuwa Sugiura, Masashi Sasaki, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ISNTT 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] 歪みGeマイクロブリッジ構造の発光特性に及ぼす一軸歪み方向の影響2021

    • Author(s)
      井上 貴裕,我妻 勇哉,山田 航大,澤野 憲太郎
    • Organizer
      第68回応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 選択成長を用いたGe-on-Si(111)基板上への高品質な歪みSiGe層の作製2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 熱処理によるhBN/単層MoTe2ヘテロ構造の界面不純物除去2021

    • Author(s)
      林田 隼弥、渡邊 賢司、谷口 尚、澤野 憲太郎、星 裕介
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] In-situドーピング制御によるGe-on-Siからの室温EL発光2021

    • Author(s)
      山田 航大、星 裕介、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Invited
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Effect of uniaxial strain direction on luminescence properties of strained Ge microbridge structures2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Kodai Yamada and Kentarou Sawano
    • Organizer
      EMRS 2021, Spring meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Observation of photoluminous from SiGe/Ge MQW on Ge-on-Si(111)2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ISNTT 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] In-situドーピング制御によるGe-on-Siからの室温EL発光2021

    • Author(s)
      山田 航大、星 裕介、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Invited
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] メッシュ型パッドを有する歪みGeマイクロブリッジ構造の作製と発光特性2021

    • Author(s)
      池ヶ谷 玲雄、井上 貴裕、佐々木雅至、我妻 勇哉、澤野 憲太郎
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Ge基板に替わりGe-on-Siを用いることによる歪みSiGeへのクラック発生抑制2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Strong room-temperature EL emission from Ge-on-Si(111) diodes2021

    • Author(s)
      Yuwa Sugiura, Masashi Sasaki, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      21st ICMBE 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] イオン注入と熱処理による金属相MoTe2の形成2021

    • Author(s)
      野上田 聖、林田 隼弥、澤野 憲太郎、星 裕介
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Ge-on-Si(111) LEDの熱処理による室温EL発光強度増大2021

    • Author(s)
      杉浦 由和、佐々木 雅至、我妻 勇哉、山田 航大、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 引っ張り歪み薄膜のヘテロ成長におけるクラック発生とその抑制メカニズム2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、金澤伶奈、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第4回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪み緩和SiGe/Si(111)バッファー層の作製とアニールの効果2021

    • Author(s)
      岡田 和也、我妻 勇哉,、山田 航大、井上 貴裕、澤野 憲太郎
    • Organizer
      第82回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪・組成制御エピタキシャルSiGe薄膜の熱電特性2021

    • Author(s)
      谷口 達彦、石部 貴史、我妻 勇哉、澤野 憲太郎、山下 雄一郎、中村 芳明
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みGe-on-Si(111)ダイオード構造からの室温EL発光2021

    • Author(s)
      杉浦 由和、我妻 勇哉、山田 航大、星 祐介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Strong resonant light emission in strained Ge microbridges2021

    • Author(s)
      Takahiro Inoue, Youya Wagatsuma, Leo Ikegaya, Kazuya Okada and Kentarou Sawano
    • Organizer
      ISNTT 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Suppression of crack formation and propagation in strained SiGe by patterning Ge-on-Si substrates2021

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Rena Kanesawa, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ICMBE 2021
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Ge-on-Si(100) p-i-nダイオードの室温 EL 発光における i-Ge 層膜厚の影響2021

    • Author(s)
      佐々木 雅至、杉浦 由和、我妻 勇哉、澤野 憲太郎、山田 航大
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Room-temperature two-terminal magnetoresistance ratios in Ge-based vertical spin-valve devices with Co2FeSi2021

    • Author(s)
      Michihiro Yamada, Atsuya Yamada, Takamasa Usami, Shinya Yamada, Kentarou Sawano, Kohei Hamaya
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 貼り合わせにより作製した歪みGe-on-Insulator基板上への歪みSiGe層の成長2021

    • Author(s)
      伊藤 拓海、我妻 勇哉、岡田 和也、澤野 憲太郎
    • Organizer
      第4回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 引っ張り歪み薄膜のヘテロ成長におけるクラック発生とその抑制メカニズム2021

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、金澤伶奈、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第4回結晶工学xISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Room-temperature spin diffusion length in strained SiGe2021

    • Author(s)
      Takahiro Naito, Michihiro Yamada, Youya Wagatsuma, Shinya Yamada, Kentarou Sawano, Kohei Hamaya
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Ge-on-Si(100) p-i-nダイオードの室温 EL 発光における i-Ge 層膜厚の影響2021

    • Author(s)
      佐々木 雅至、杉浦 由和、我妻 勇哉、澤野 憲太郎、山田 航大
    • Organizer
      第82回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] In-situドーピング制御によるGe-on-Siからの室温EL発光2021

    • Author(s)
      山田 航大、星 裕介、澤野 憲太郎
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Room temperature EL from strained Ge-on-Si(111) diode structures2021

    • Author(s)
      Yuwa Sugiura, Youya Wagatsuma, Koudai Yamada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      EMRS 2021, Spring meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 縦型半導体スピン素子のための単結晶Co2FeSi上Ge薄膜の高品質化2021

    • Author(s)
      山田 敦也、山田 道洋、山田 晋也、澤野 憲太郎、浜屋 宏平
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪み緩和SiGe/Si(111)バッファー層の作製とアニールの効果2021

    • Author(s)
      岡田 和也、我妻 勇哉,、山田 航大、井上 貴裕、澤野 憲太郎
    • Organizer
      第82回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪みGe-on-Si(111)ダイオード構造からの室温EL発光2021

    • Author(s)
      杉浦 由和、我妻 勇哉、山田 航大、星 祐介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第68回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Spin transport in non-degenerate n-Ge2020

    • Author(s)
      T. Ueno, M. Yamada, T. Matsuoka, T. Naito, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      第67回応用物理学会春季学術講演会、上智大学 四谷キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Engineering Strain, Defects and Electronic Properties of (110)-Oriented Strained Si2020

    • Author(s)
      K. Arimoto, J. Yamanaka, K. O. Hara, K. Sawano, N. Usami and K. Nakagawa
    • Organizer
      PRiME 2020
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みGeマイクロブリッジ構造の発光特性に与える一軸歪み方向の影響2020

    • Author(s)
      井上 貴裕,我妻 勇哉,山田 航大,澤野 憲太郎
    • Organizer
      第3回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] In-situドーピング制御によるGe-on-Siからの室温EL発光2020

    • Author(s)
      山田 航大,星 裕介,澤野 憲太郎
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Silicon Microdisk Resonators in the Mid-Infrared for On-Chip Gas Sensing2020

    • Author(s)
      Miyake Takuma, Rikito Osako, Xuejun Xu, Kentarou Sawano, Takuya Maruizumi, Takehiko Tawara and Hideki Gotoh
    • Organizer
      SSDM 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Strain engineering of Si/Ge heterostructures on Ge-on-Si platform2020

    • Author(s)
      Kentarou Sawano, Youya Wagatsuma, Md. Mahfuz Alam, Kaisei Omata, Kenta Niikura, Shougo Shibata, Yusuke Hoshi, Michihiro Yamada and Kohei Hamaya
    • Organizer
      PRiME 2020
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Engineering Strain, Defects, and Electronic Properties of (110)-Oriented Strained Si2020

    • Author(s)
      K. Arimoto, J. Yamanaka, K. O. Hara, K. Sawano, N. Usami and K. Nakagawa
    • Organizer
      ECS PRiME 2020
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] 選択成長を用いたGe-on-Si(111)基板上への高品質な歪みSiGe層の作製2020

    • Author(s)
      我妻 勇哉, Md. Mahfuz Alam, 岡田 和也, 星 裕介, 山田 道洋, 浜屋 宏平, 澤野 憲太郎
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Influence of external temperature on interface spin polarization of ferromagnet-semiconductor heterostructures2020

    • Author(s)
      M. Yamada, Y. Shiratsuchi, H. Kambe, K. Kudo, S. Yamada, K. Sawano, R. Nakatani, and K. Hamaya
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 単層MoTe2のhBN封止構造における熱処理による光学特性への影響2020

    • Author(s)
      林田 隼弥、齋藤 梨沙、渡邊 賢司、谷口 尚、澤野 憲太郎、星 裕介
    • Organizer
      第67回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Si(111)基板上のエピタキシャルGe(111)ダイオードからの室温EL発光2020

    • Author(s)
      杉浦 由和,我妻 勇哉,山田 航大,星 裕介,山田 道洋,浜屋 宏平,澤野 憲太郎
    • Organizer
      第3回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造p-MOSFETにおける正孔移動度のチャネル方向依存性2020

    • Author(s)
      藤澤 泰輔、各川 敦史、浪内 大地、佐野 雄一、泉 大輔、山中 淳二、原 康祐、澤野 憲太郎、中川 清和、有元 圭介
    • Organizer
      第81回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] Ge-on-Si基板のパターニングによる歪みSiGe層中クラック発生の抑制2020

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第67回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Formation and Evaluation of Al2O3 Layer by Direct ALD on Epitaxial SiGe2020

    • Author(s)
      Hiroshi Nohira, Eriko Shigesawa and Kentarou Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Strain engineering of Si/Ge heterostructures on Ge-on-Si platform2020

    • Author(s)
      Kentarou Sawano, Youya Wagatsuma, Md. Mahfuz Alam, Kaisei Omata, Kenta Niikura, Shougo Shibata, Yusuke Hoshi, Michihiro Yamada and Kohei Hamaya
    • Organizer
      PRiME 2020
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] GOI基板作製における貼り合わせ後熱処理の影響2020

    • Author(s)
      柴田 翔吾、石川 亮佑、星 裕介、澤野 憲太郎
    • Organizer
      第67回応用物理学会春季学術講演会、上智大学 四谷キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] メサ型Ge-on-Si(111)基板上への臨界膜厚を超えた歪みSiGe層の作製2020

    • Author(s)
      我妻 勇哉,Md. Mahfuz Alam,岡田 和也,山田 道洋,浜屋 宏平,澤野 憲太郎
    • Organizer
      第3回結晶工学×ISYSE合同研究会
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Crystal quality degradation in MoTe2 monolayers by a thermal annealing and its suppression by hexagonal boron nitride encapsulation2020

    • Author(s)
      S. Hayashida, R. Saito, K. Watanabe, T. Taniguchi, K. Sawano, Y. Hoshi
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Ge-on-Si基板のパターニングによる歪みSiGe層中クラック発生の抑制2020

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第67回応用物理学会春季学術講演会、上智大学 四谷キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Thermal stability at the interface between ferromagnetic alloys and germanium for semiconductor spintronics devices2020

    • Author(s)
      M. Yamada, T. Matsuoka, T. Ueno, T. Naito, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strong room-temperature electroluminescence from Ge-on-Si by precise in-situ doping control2020

    • Author(s)
      Kodai Yamada, Yusuke Hoshi and Kentarou Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Strong room-temperature electroluminescence from Ge-on-Si by precise in-situ doping control2020

    • Author(s)
      Kodai Yamada, Yusuke Hoshi and Kentarou Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] サーマルマネージメント出力因子増大機構解明に向けたCoSi2ナノドット含有SiGe薄膜の熱電特性評価2020

    • Author(s)
      水田 光星、細田 凌矢、石部 貴史、Md. Mahfuz Alam、澤野 憲太郎、中村 芳明
    • Organizer
      第17回日本熱電学会学術講演会(TSJ2020)
    • Data Source
      KAKENHI-PROJECT-19H00853
  • [Presentation] 熱電出力因子増大に向けたエピタキシャルCoSi2ナノドット含有SiGe薄膜の開発2020

    • Author(s)
      細田凌矢、水田光星、石部貴史、Md. Mahfuz Alam、澤野憲太郎、中村芳明
    • Organizer
      2020年 第81回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H00853
  • [Presentation] GOI基板作製における貼り合わせ後熱処理の影響2020

    • Author(s)
      柴田 翔吾、石川 亮佑、星 裕介、澤野 憲太郎
    • Organizer
      第67回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Increased critical thickness for strained SiGe on Ge-on-Si(111)2020

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-20K21009
  • [Presentation] Strong room-temperature electroluminescence from Ge-on-Si by precise in-situ doping control2020

    • Author(s)
      K. Yamada, Y. Hoshi, and K. Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Increased critical thickness for strained SiGe on Ge-on-Si(111)2020

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Strain engineering of Si/Ge heterostructures on Ge-on-Si platform2020

    • Author(s)
      K. Sawano, Y. Wagatsuma, Md. Mahfuz Alam, K. Omata, K. Niikura, S. Shibata, Y. Hoshi, M. Yamada, and K. Hamaya
    • Organizer
      PRiME 2020
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Increased critical thickness of strained SiGe on Ge-on-Si(111)2020

    • Author(s)
      Y. Wagatsuma, Md. Mahfuz Alam, K. Okada, Y. Hoshi, M. Yamada, K. Hamaya, and K. Sawano
    • Organizer
      PRiME 2020
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Observation of room-temperature spin transport in Ge-based lateral spin-valve devices with low-temperature grown Co2MnSi electrodes2020

    • Author(s)
      K. Kudo, M. Yamada, S. Honda, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      第25回半導体におけるスピン工学の基礎と応用
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Effect of thermal annealing at a low temperature on exciton dynamics in semiconducting MoTe2 crystals2019

    • Author(s)
      Shunya Hayashida, Kenji Watanabe, Takashi Taniguchi, Kentarou Sawano, and Yusuke Hoshi
    • Organizer
      SSDM2019
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Surface Morphology Evolution of Strained Si1-xGex Grown on Relaxed Ge(111)2019

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya, Kentarou Sawano
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Hole Mobility Enhancement Observed in (110)-Oriented Strained Si2019

    • Author(s)
      Keisuke Arimoto, Naoto Utsuyama, Shohei Mitsui, Kei Satoh, Takane Yamada, Junji Yamanaka, Kosuke O. Hara, Kentarou Sawano, Kiyokazu Nakagawa
    • Organizer
      2019 International Conference on Solid State Devices and Materials
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] Si/Ge Heterostructures with Various Surface Orientations2019

    • Author(s)
      Md. Mahfuz Alam and Kentarou Sawano
    • Organizer
      EMN Epitaxy 2019
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造p-MOSFETにおける電界効果移動度の歪みSi膜厚依存性2019

    • Author(s)
      藤澤 泰輔、各川 敦史、浪内 大地、斎藤 慎吾、佐野 雄一、泉 大輔、山中 淳二、原 康祐、澤野 憲太郎、中川 清和、有元 圭介
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] Spin transport in a strained SiGe alloy2019

    • Author(s)
      T. Naito, M. Yamada, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造の反転キャリアのHall移動度評価2019

    • Author(s)
      浪内 大地、澤野 憲太郎、各川 敦史、佐野 雄一、泉 大輔、有元 圭介、山中 淳二、原 康祐、中川 清和
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Controlling comosition for high thermoelectric power factor in Si-rich SiGe/Si superlattices2019

    • Author(s)
      Tatsuhiko Taniguchi, Takafumi Ishibe, Md. Mahfuz Alam, Kentarou Sawano, Nobuyasu Naruse, Yutaka Mera, and Yoshiaki Nakamura
    • Organizer
      The 38th International Conference on Themoelectrics and The 4th Asian Conference on Themoelectrics (ICT/ACT2019)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造の反転キャリアのHall移動度評価2019

    • Author(s)
      浪内 大地、澤野 憲太郎、各川 敦史、佐野 雄一、泉 大輔、有元 圭介、山中 淳二、原 康祐、中川 清和
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] Ge-on-Si(111) 及びGe(111) 基板上の歪みSi1-xGexの臨界膜厚2019

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Improvement of nonmonotonic bias-dependent local spin signals in Co2FeAl0.5Si0.5/Ge lateral spin-valve devices2019

    • Author(s)
      M. Yamada, S. Honda, Y, Fujita, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      第24回「半導体スピン工学の基礎と応用」研究会 (PASPS-24)、東北大学 片平キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Inverse local magnetoresistance in Heusler/SiGe lateral spin valve devices2019

    • Author(s)
      T. Naito, M. Yamada, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      平成30年度スピン変換年次報告会、東北大学 AIMR本館
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Observation of lateral spin transport in non-degenerate n-Ge2019

    • Author(s)
      T. Ueno, M. Yamada, T. Matsuoka, T. Naito, S. Yamada, K. Sawano and K. Hamaya
    • Organizer
      第24回「半導体スピン工学の基礎と応用」研究会 (PASPS-24)、東北大学 片平キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Strain states and critical thickness of Si1-xGex epitaxial layers on Ge-on-Si(111)2019

    • Author(s)
      Md. Mahfuz Alam, Kazuya Okada, Yuya Wagatsuma, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ISTDM / ICSI 2019 Conference, Madison, USA
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 欠陥制御によるナノ結晶含有Si薄膜の熱電特性改善2019

    • Author(s)
      坂根 駿也、石部 貴史、成瀬 延康、目良 裕、Md. Mahfuz Alam、澤野 憲太郎、中村 芳明
    • Organizer
      第80回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] n-SiGe横型スピンバルブ素子における負の局所スピン信号2019

    • Author(s)
      内藤貴大, 山田道洋, 山田晋也, 澤野憲太郎, 浜屋宏平
    • Organizer
      Spin Research Network of Japan (Spin-RNJ) 2019年度年次報告会, 大阪大学 豊中キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] ナノ多孔層ガラス基板を利用したGeナノドットの作製2019

    • Author(s)
      石井 大介、下田 麻由、伊藤 匠、星 裕介、藤間 卓也、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Si/Ge Heterostructures with Various Surface Orientations2019

    • Author(s)
      Md. Mahfuz Alam and Kentarou Sawano
    • Organizer
      EMN Epitaxy 2019, Amsterdam, the Netherlands
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 強磁性体/半導体スピン素子におけるスピン蓄積信号の 非線形バイアス依存性2019

    • Author(s)
      藤田裕一, 山田道洋, 塚原誠人, 内藤貴大, 山田晋也, 澤野憲太郎, 浜屋宏平
    • Organizer
      第43回日本磁気学会学術講演会, 京都大学 吉田キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] P トープGe-on-Si における拡散ストップ層挿入の効果2019

    • Author(s)
      山田 航大、熊澤 裕太、丸泉 琢也、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] In-situ ドープによる Ge-on-Si(111)の n 型伝導制御2019

    • Author(s)
      水口 俊希、大島 修一郎、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Simultaneous realization of thermoelectric power factor enhancement and thermal conductivity reduction in epitaxial Si films containing b-FeSi2 nanodots2019

    • Author(s)
      Shunya Sakane, Takafumi Ishibe, Nobuyasu Naruse, Yutaka Mera, Md. Mahfuz Alam, Kentarou Sawano, Nobuya Mori, and Yoshiaki Nakamura
    • Organizer
      The 5th Asia-Pacific Conference on Semiconducting Silicides and Related Materials (APAC-Silicide 2019)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Inverse local magnetoresistance effect up to room temperature in ferromagnet-semiconductor lateral spin-valve devices2019

    • Author(s)
      T. Naito, M. Yamada, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8), 東北大学 片平キャンパス
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Thermal stability of mechanically-exfoliated monolayer and few layer MoTe22019

    • Author(s)
      Shunya Hayashida, Kenji Watanabe, Takashi Taniguchi, Kentarou Sawano, and Yusuke Hoshi
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Strain states and critical thickness of Si1-xGex epitaxial layers on Ge-on-Si(111)2019

    • Author(s)
      Md. Mahfuz Alam, Kazuya Okada, Yuya Wagatsuma, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya and Kentarou Sawano
    • Organizer
      ISTDM / ICSI 2019 Conference
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Optical Interferences in Monolayer Tungsten Disulfide and Tungsten Diselenide Encapsulated by Hexagonal Boron nitride2019

    • Author(s)
      Yusuke Hoshi, Shunya Hayashida, Kentarou Sawano
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造p-MOSFETにおける電界効果移動度の歪みSi膜厚依存性2019

    • Author(s)
      藤澤 泰輔、各川 敦史、浪内 大地、斎藤 慎吾、佐野 雄一、泉 大輔、山中 淳二、原 康祐、澤野 憲太郎、中川 清和、有元 圭介
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] hBN/1L-WSe2/hBN構造の光取り出し効率の改善2019

    • Author(s)
      林田 隼弥、渡邊 賢司、谷口 尚、増渕 覚、守谷 頼、町田 友樹、澤野 憲太郎、星 裕介
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Hole Mobility in Strained Si/Relaxed SiGe/Si(110) Hetero Structures Studied by Gated Hall Measurements2019

    • Author(s)
      Daichi Namiuchi, Atsushi Onogawa, Keisuke Arimoto, Yuichi Sano, Daisuke Izumi, Junji Yamanaka, Kosuke O Hara, Kentarou Sawano, Kiyokazu Nakagawa
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] ナノ多孔層ガラス基板を利用したGeナノドットの作製2019

    • Author(s)
      石井 大介、下田 麻由、伊藤 匠、星 裕介、藤間 卓也、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] PドープGe-on-Si における拡散ストップ層挿入の効果2019

    • Author(s)
      山田 航大、熊澤 裕太、丸泉 琢也、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Surface Morphology Evolution of Strained Si1-xGex Grown on Relaxed Ge(111)2019

    • Author(s)
      Youya Wagatsuma, Md. Mahfuz Alam, Kazuya Okada, Yusuke Hoshi, Michihiro Yamada, Kohei Hamaya, Kentarou Sawano
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造p-MOSFETにおける電界効果移動度の歪みSi膜厚依存性2019

    • Author(s)
      藤澤 泰輔、各川 敦史、浪内 大地、斎藤 慎吾、佐野 雄一、泉 大輔、山中 淳二、原 康祐、澤野 憲太郎、中川 清和、有元 圭介
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 歪みSi/緩和SiGe/Si(110)ヘテロ構造の反転キャリアのHall移動度評価2019

    • Author(s)
      浪内 大地、澤野 憲太郎、各川 敦史、佐野 雄一、泉 大輔、有元 圭介、山中 淳二、原 康祐、中川 清和
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] サブ波長格子構造を有するSi中赤外導波路2019

    • Author(s)
      大迫 力人、徐 学俊、忠永 修、澤野 憲太郎、丸泉 琢也、俵 毅彦、後藤 秀樹
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Enhanced Photoluminescence from Strained Ge-on-Insulator Surface-Passivated with Hydrogenated Amorphous Si2019

    • Author(s)
      Kenta Niikura, Yuta Kumazawa, Natsuki Yamahata, Yusuke Hoshi, Tsukasa Takamura, Kimihiko Saito, Makoto Konagai, Kentarou Sawano
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] Ge-on-Si(111) 及びGe(111) 基板上の歪みSi1-xGexの臨界膜厚2019

    • Author(s)
      我妻 勇哉、Md. Mahfuz Alam、岡田 和也、星 裕介、山田 道洋、浜屋 宏平、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-19H02175
  • [Presentation] 非縮退n-Ge中のスピン伝導特性2019

    • Author(s)
      上野登希生, 山田道洋, 松岡哲平, 内藤貴大, 山田晋也, 澤野憲太郎, 浜屋宏平
    • Organizer
      Spin Research Network of Japan (Spin-RNJ) 2019年度年次報告会, 大阪大学 豊中キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Enhanced Photoluminescence from Strained Ge-on-Insulator Surface-Passivated with Hydrogenated Amorphous Si2019

    • Author(s)
      Kenta Niikura, Yuta Kumazawa, Natsuki Yamahata, Yusuke Hoshi, Tsukasa Takamura, Kimihiko Saito, Makoto Konagai, Kentarou Sawano
    • Organizer
      8th International Symposium on Control of Semiconductor Interfaces (ISCSI-8)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] 強磁性体/半導体スピン素子の性能と界面磁性の相関2019

    • Author(s)
      山田道洋, 白土優, 塚原誠人, 神部広翔, 工藤康平, 山田晋也, 澤野憲太郎, 中谷亮一, 浜屋宏平
    • Organizer
      第43回日本磁気学会学術講演会, 京都大学 吉田キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] In-situ ドープによる Ge-on-Si(111)の n 型伝導制御2019

    • Author(s)
      水口 俊希、大島 修一郎、澤野 憲太郎
    • Organizer
      第80回応用物理学会秋季学術講演会, 北海道大学 札幌キャンパス
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Conduction Type Control of Ge-on-Insulator: Combination of Smart-Cut and Defect Elimination2019

    • Author(s)
      K. Yamamoto, K. Nakae, H. Akamine, D. Wang, H. Nakashima, Md. M Alam, K. Sawano, Z. Xue, M. Zhang, Z. Di
    • Organizer
      2nd Joint ISTDM / ICSI 2019 Conference, Madison, WI, USA
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-19H05616
  • [Presentation] Room-temperature local magnetoresistance effect in n-Ge lateral devices2019

    • Author(s)
      M. Tsukahara, M. Yamada, T. Naito, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      平成30年度スピン変換年次報告会、東北大学 AIMR本館
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Observation of spin transport in a SiGe alloy2018

    • Author(s)
      T. Naito, M. Yamada, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      平成29年度スピン変換年次報告会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Thermoelectric Performance in Boundary-Defect-Controlled SiGe/Si superlattice2018

    • Author(s)
      Tatsuhiko Taniguchi, Takafumi Ishibe, Md. Mahfuz Alam, Kentarou Sawano, and Yoshiaki Nakamura
    • Organizer
      ACSIN-14 & ICSPM26
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Room-temperature spin transport in n-Ge probed by four-terminal nonlocal measurements2018

    • Author(s)
      M. Yamada, M. Tsukahara, Y. Fujita, T. Naito, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      第79回応用物理学会秋季学術講演大会、名古屋国際会議場
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 四端子非局所測定によるn-Ge中の室温スピン伝導2018

    • Author(s)
      山田道洋、塚原誠人、藤田裕一、内藤貴大、山田晋也、澤野憲太郎、浜屋宏平
    • Organizer
      第65回応用物理学会春季学術講演会「シリコンテクノロジー分科会論文賞 受賞講演」
    • Invited
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Observation of local spin signals at room temperature in germanium lateral devices2018

    • Author(s)
      M. Tsukahara, M. Yamada, T. Naito, Y. Fujita, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      INTERMAG 2018, Marina Bay Sands Convention Center, Singapore
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 伸張歪みSi/緩和SiGe/Si(110)ヘテロ構造のゲート電圧印加Hall測定による移動度評価2018

    • Author(s)
      浪内 大地、佐藤 圭、澤野 憲太郎、有元 圭介、山中 淳二、原 康祐、中川 清和
    • Organizer
      第79回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-18K04229
  • [Presentation] Spin transport in a Ge-rich SiGe alloy2018

    • Author(s)
      Takahiro Naito, Michihiro Yamada, Makoto Tsukahara, Kentarou Sawano, and Kohei Hamaya: "Spin transport in a Ge-rich SiGe alloy
    • Organizer
      2018 European Materials Research Society (E-MRS 2018), Warsaw University of Technology, Warsaw, Porland
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Room-temperature local spin signals in germanium lateral devices2018

    • Author(s)
      M. Tsukahara, M. Yamada, T. Naito, S. Oki, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      平成29年度スピン変換年次報告会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Nonlocal spin transport in a SiGe alloy2018

    • Author(s)
      . Naito, M. Yamada, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      「スピントロニクス学術研究基盤と連携ネットワーク」シンポジウム(Spin-RNJ Symposium 2017)
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Spin transport in Ge and SiGe2018

    • Author(s)
      M. Yamada, M. Tukahara, Y. Fujita, T. Naito, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      CSRN-Osaka Annual Workshop 2018, Osaka University, Japan
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Low-resistance ferromagnet/germanium Schottky-tunnel contacts for spintronic applications2018

    • Author(s)
      K. Hamaya, T. Naito, M. Tsukahara, M. Yamada, and K. Sawano
    • Organizer
      The Electrochemical Society 2018 SiGe Symposium, Cancun, Mexico
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Room-temperature magnetoresistance effect in Ge lateral spin-valve devices2018

    • Author(s)
      M. Tsukahara, M. Yamada, T. Naito, S. Oki, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      「スピントロニクス学術研究基盤と連携ネットワーク」シンポジウム(Spin-RNJ Symposium 2017)
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 反平行磁化配置が不安定なゲルマニウム横型スピンバルブ素子における非局所スピン伝導2018

    • Author(s)
      沖宗一郎, 山田道洋, 山田晋也, 澤野憲太郎, 浜屋宏平
    • Organizer
      第42回日本磁気学会学術講演大会、日本大学理工学部駿河台キャンパス1号館
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Electrical spin injection and transport in a SiGe alloy2018

    • Author(s)
      M. Yamada, T. Naito, M. Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      The 9th International SiGe Technology and Device Meeting (ISTDM), Seminaris Seehotel Potsdam, Germany
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] ナノ構造化Si薄膜における出力因子決定機構2018

    • Author(s)
      坂根 駿也、渡辺 健太郎、成瀬 延康、目良 裕、Md. Mahfuz Alam、澤野 憲太郎、森 伸也、中村 芳明
    • Organizer
      2018年 第65回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Local magnetoresistance effect at room temperature in Co2FeAlxSi1-x/n-Ge lateral spin-valve devices2018

    • Author(s)
      M. Yamada, M. Tukahara, T. Naito, Y. Fujita, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      One-Day Symposium on Spintronics Properties of Graphene and Related 2D Materials , The University of Tokyo, Japan
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 界面制御によるSi/SiGe超格子の出力因子操作2018

    • Author(s)
      谷口 達彦、渡辺 健太郎、Md. M. Alam、澤野 憲太郎、中村 芳明
    • Organizer
      2018年 第65回 応用物理学会春季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Thermoelectric Performance in Boundary-Defect-Controlled SiGe/Si superlattice2018

    • Author(s)
      Tatsuhiko Taniguchi, Takafumi Ishibe, Md. Mahfuz Alam,Kentarou Sawano, and Yoshiaki Nakamura
    • Organizer
      ACSIN-14&ICSPM26
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] ゲルマニウム中の室温電子スピン伝導2017

    • Author(s)
      山田道洋、塚原誠人、藤田裕一、内藤貴大、山田晋也、澤野憲太郎、浜屋宏平
    • Organizer
      第11回物性科学領域横断研究会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Donor-Induced Spin Relaxation in n-Ge2017

    • Author(s)
      M. Yamada, Y. Fujita, M.Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      The 9th International school and conference on Spintech
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] ゲルマニウム中の電子スピン伝導とスピン緩和2017

    • Author(s)
      藤田裕一、山田道洋、塚原誠人、山田晋也、澤野憲太郎、浜屋宏平
    • Organizer
      第41回日本磁気学会学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Independent control of phonon and electron transport in Si-based nanoarchitectures with epitaxial Ge nanodots2017

    • Author(s)
      Kentaro Watanabe, Shuto Yamasaka, Takafumi Ishibe, Shunya Sakane, Kentarou Sawano, and Yoshiaki Nakamura
    • Organizer
      The 1st Asian Conference on Thermal Sciences (ACTS 2017)
    • Place of Presentation
      Jeju Island, Korea
    • Year and Date
      2017-03-26
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Giant Enhancement of Nonlocal Spin Signals in n-Ge using Co2FeAl0.5Si0.5 Electrodes2017

    • Author(s)
      M. Tsukahara, Y. Fujita, M. Yamada, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      The 9th International school and conference on Spintech
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 低RAショットキートンネル接合電極を用いたn-Ge中の室温スピン伝導検出2017

    • Author(s)
      塚原誠人、山田道洋、藤田裕一、内藤貴大、山田晋也、澤野憲太郎、浜屋宏平
    • Organizer
      第78回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] ナノドット含有Si薄膜における構造と出力因子の関係2017

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      2017年春季<第64回>応用物理学会
    • Place of Presentation
      パシフィコ横浜(神奈川県横浜市)
    • Year and Date
      2017-03-14
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] 組成制御によるSiGe/Si超格子の出力因子制御2017

    • Author(s)
      谷口 達彦、奥畑 亮、渡辺 健太郎、Md. Mahfuz Alam、澤野 憲太郎、藤田 武志、中村 芳明
    • Organizer
      2017年 第78回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] ナノドット含有Si薄膜における構造と出力因子の関係2017

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      2017年春季<第64回>応用物理学会
    • Place of Presentation
      パシフィコ横浜(神奈川県横浜市)
    • Year and Date
      2017-03-14
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Room-temperature spin transport in n-Ge using four-terminal nonlocal measurements with low-RA Schottky-tunnel contacts2017

    • Author(s)
      M. Tsukahara, M. Yamada, Y. Fujita, T. Naito, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      平成29年度スピン変換研究会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] ENHANCEMENT OF THERMOELECTRIC PROPERTIES BY EPITAXIAL NANODOTS IN Si FILMS2017

    • Author(s)
      Shunya Sakane, Kentaro Watanabe, Takeshi Fujita, Md. Mahfuz Alam, Kentarou Sawano, Yoshiaki Nakamura
    • Organizer
      The 17th International Conference on Micro and Nanotechnology for Power Generation and Energy Conversion Applications (Power MEMS 2017)
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] エピタキシャルb-FeSi2ナノドット含有Si薄膜の作製とその熱電特性評価2017

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      応用物理学会関西支部平成28年度第3回講演会
    • Place of Presentation
      大阪大学中之島センター(大阪府大阪市)
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Local Magnetoresistance in a Co2FeAl0.5Si0.5/n+-Ge lateral spin valve2017

    • Author(s)
      S. Oki, Y. Fujita, M.Tsukahara, S. Yamada, K. Sawano, and K. Hamaya
    • Organizer
      The 9th International school and conference on Spintech
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Independent control of phonon and electron transport in Si-based nanoarchitectures with epitaxial Ge nanodots2017

    • Author(s)
      Kentaro Watanabe, Shuto Yamasaka, Takafumi Ishibe, Shunya Sakane, Kentarou Sawano, and Yoshiaki Nakamura
    • Organizer
      The 1st Asian Conference on Thermal Sciences (ACTS 2017)
    • Place of Presentation
      Jeju Island, Korea
    • Year and Date
      2017-03-26
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Thermoelectric Properties of Si Films Containing Epitaxial Nanodots of Various Materials2017

    • Author(s)
      Shunya Sakane, Kentaro Watanabe, Takeshi Fujita, Kentarou Sawano, Takeyuki Suzuki, Yoshiaki Nakamura
    • Organizer
      The 36th International Conference on Thermoelectrics (ICT 2017)
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] エピタキシャルb-FeSi2ナノドット含有Si薄膜の作製とその熱電特性評価2017

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      応用物理学会関西支部平成28年度第3回講演会
    • Place of Presentation
      大阪大学中之島センター(大阪府大阪市)
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] ナノドット含有Si薄膜の熱電特性に与える熱処理の影響2017

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、Md. Mahfuz Alam、澤野 憲太郎、中村 芳明
    • Organizer
      2017年 第78回 応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Co2FeAl/n+-Geショットキートンネル接合電極を用いた室温スピン伝導の検出2017

    • Author(s)
      塚原誠人、山田道洋、藤田裕一、内藤貴大、山田晋也、澤野憲太郎、浜屋宏平
    • Organizer
      第22回半導体におけるスピン工学の基礎と応用(PASPS-22)
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Si(111)基板上エピタキシャルβ-FeSi2薄膜の熱電特性2016

    • Author(s)
      谷口 達彦、坂根 駿也、青木 俊輔、奥畑 亮、渡辺 健太郎、鈴木 健之、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      2016年秋季<第77回>応用物理学会
    • Place of Presentation
      朱鷺メッセ(新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Influences of Phosphorous δ-Doping at Ge Quantum Dots / Si Interface on Photoluminescence Properties and Dot Formation2016

    • Author(s)
      K. Sawano, K. Watanabe, K. Mizutani, X. Xu, T. Maruizumi
    • Organizer
      The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)
    • Place of Presentation
      Nagoya Congress Center (Aichi)
    • Year and Date
      2016-08-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] 低温における縮退n-Geのスピン拡散長2016

    • Author(s)
      藤田裕一、山田道洋、山田晋也、金島岳、澤野憲太郎、浜屋 宏平
    • Organizer
      第21回半導体におけるスピン工学の基礎と応用
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] エピタキシャルGeナノドット含有Si薄膜における熱伝導率の低減2016

    • Author(s)
      渡辺 健太郎、山阪 司祐人、澤野 憲太郎、中村 芳明
    • Organizer
      2016年秋季<第77回>応用物理学会
    • Place of Presentation
      朱鷺メッセ(新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] イオン注入を利用した圧縮歪みSi/緩和Si1-xCxヘテロ構造の作製におけるイオン注入条件の検討2016

    • Author(s)
      有澤洋、澤野憲太郎、宇佐美徳隆
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学
    • Year and Date
      2016-03-19
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Spin relaxation in heavily doped n-Ge at low temperatures2016

    • Author(s)
      藤田裕一、山田道洋、山田晋也、金島岳、澤野憲太郎、浜屋宏平
    • Organizer
      第10回物性科学領域横断研究会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Thermal stability of compressively strained Si/relaxed Si1-xCx heterostructures formed on Ar ion implanted Si (100) substrates2016

    • Author(s)
      You Arisawa, Yusuke Hoshi, Kentarou Sawano, Junji Yamanaka, Keisuke Arimoto, Chiaya Yamamoto, Noritaka Usami
    • Organizer
      8th International Conference on Si Epitaxy and Heterostructures
    • Place of Presentation
      Nagoya University
    • Year and Date
      2016-06-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Independent control of phonon and electron transport in Si films including epitaxial Ge nanodots2016

    • Author(s)
      Kentaro Watanabe, Shuto Yamasaka, Shunya Sakane, Kentarou Sawano, and Yoshiaki Nakamura
    • Organizer
      The 35th International Conference & The 1st Asian Conference on Thermoelectrics (ICT/ACT2016)
    • Place of Presentation
      Wuhan, P. R. China
    • Year and Date
      2016-05-29
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Anisotropic strain engineering of Si/Ge heterostructures2016

    • Author(s)
      Kentarou Sawano
    • Organizer
      2016 Global Research Efforts on Energy and Nanomaterials (GREEN 2016)
    • Place of Presentation
      Taipei, Taiwan
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Highly N-doped Ge Microdisks with Circular Bragg Gratings on Ge-on-Insulator2016

    • Author(s)
      H. Hashimoto, X. Xu, K. Sawano, T. Maruizumi
    • Organizer
      19th International Conference on Molecular Beam Epitaxy (MBE 2016)
    • Place of Presentation
      Montpellier, France
    • Year and Date
      2016-09-04
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Electrical spin injection and detection at room temperature in n-Ge based lateral spin valves with Co2FeSi0.5Al0.5/n+-Ge Schottky tunnel contacts2016

    • Author(s)
      Yuichi Fujita, Michihiro Yamada, Shinya Yamada, Kentarou Sawano, Takeshi Kanashima, and Kohei Hamaya
    • Organizer
      9th International Conference on Physics and Applications of Spin-Related Phenomena in Solids
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Control of Electrical Properties in Heusler-Alloy/Ge Schottky Tunnel Contacts formed by Phosphorous δ-Doping with Si-Layer Insertion2016

    • Author(s)
      Michihiro Yamada, Yuichi Fujita, Shinya Yamada, Kentarou Sawano, Kohei Hamaya
    • Organizer
      International SiGe Technology and Device Meeting 2016 (ISTDM2016)
    • Place of Presentation
      Nagoya University (Aichi)
    • Year and Date
      2016-06-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Fabrication of uniaxially strained Ge by selective ion implantation technique2016

    • Author(s)
      Shiori Konoshima, Eisuke Yonekura, Kentarou Sawano
    • Organizer
      The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)
    • Place of Presentation
      Nagoya Congress Center (Aichi)
    • Year and Date
      2016-08-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Hole Mobility in Strained Si/SiGe/Vicinal Si(110) Grown by Gas Source MBE2016

    • Author(s)
      K. Arimoto, S. Yagi, J. Yamanaka, K. Nakagawa, N. Usami, K. Sawano
    • Organizer
      The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)
    • Place of Presentation
      Nagoya Congress Center (Aichi)
    • Year and Date
      2016-08-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Enhanced Light Emission from N-Doped Ge Microdisks by Thermal Oxidation2016

    • Author(s)
      H. Hashimoto, X. Xu, K. Sawano, T. Maruizumi
    • Organizer
      Pacific Rim Meeting on Electrochemical and Solid-State Science (PRiME 2016)
    • Place of Presentation
      Honolulu, USA
    • Year and Date
      2016-10-02
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Independent control of phonon and electron transport in Si films including epitaxial Ge nanodots2016

    • Author(s)
      Kentaro Watanabe, Shuto Yamasaka, Shunya Sakane, Kentarou Sawano, and Yoshiaki Nakamura
    • Organizer
      The 35th International Conference & The 1st Asian Conference on Thermoelectrics (ICT/ACT2016)
    • Place of Presentation
      Wuhan, P. R. China
    • Year and Date
      2016-05-29
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Control of electrical properties in Heusler-alloy/Ge Schottky tunnel contacts formed by phosphorous δ-doping with Si-layer insertion2016

    • Author(s)
      Michihiro Yamada, Yuichi Fujita, Shinya Yamada, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      7th International Symposium on Control of Semiconductor Interfaces/International SiGe Technology and Device Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 鉄シリサイドナノドット構造制御によるSi薄膜の熱電物性向上2016

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      2016年秋季<第77回>応用物理学会
    • Place of Presentation
      朱鷺メッセ(新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Formation of Strained Ge-on-Insulator (GOI) Substrates using SiGe Etching Stop Layers2016

    • Author(s)
      Yuuki Yajima, Yuta Ariyama, Kentarou Sawano
    • Organizer
      International SiGe Technology and Device Meeting 2016 (ISTDM2016)
    • Place of Presentation
      Nagoya University (Aichi)
    • Year and Date
      2016-06-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Study on ion implantation conditions in fabricating compressively strained Si/relaxed Si1-xCx heterostructures using the defect control by ion implantation technique2016

    • Author(s)
      Y.Arisawa, K. Sawano and N. Usami
    • Organizer
      The 18th International Conference on Crystal Growth and Epitaxy (ICCGE-18)
    • Place of Presentation
      Nagoya Congress Center (Aichi)
    • Year and Date
      2016-08-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Room-temperature electrical spin injection and detection in n-Ge through Co2Fe0.5SiAl0.5/n+-Ge Schottky tunnel contacts2016

    • Author(s)
      Yuichi Fujita, Michihiro Yamada, Shinya Yamada, Kentarou Sawano, Takeshi Kanashima, and Kohei Hamaya
    • Organizer
      7th International Symposium on Control of Semiconductor Interfaces/International SiGe Technology and Device Meeting
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] 鉄シリサイドナノドット構造制御によるSi薄膜の熱電物性向上2016

    • Author(s)
      坂根 駿也、渡辺 健太郎、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      2016年秋季<第77回>応用物理学会
    • Place of Presentation
      朱鷺メッセ(新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Short spin diffusion length of n+-Ge at low temperatures2016

    • Author(s)
      Yuichi Fujita, Michihiro Yamada, Shinya Yamada, Kentarou Sawano, Takeshi Kanashima, and Kohei Hamaya
    • Organizer
      61st Annual Magnetism and Magnetic Materials Conference (MMM 2016)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Electrical spin injection and detection in n+-Ge using Schottky tunnel contacts2016

    • Author(s)
      Yuichi Fujita, Michihiro Yamada, Shinya Yamada, Takeshi Kanashima, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      第77回応用物理学会秋季学術講演会
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] エピタキシャルGeナノドット含有Si構造を用いたSi系熱電材料の性能向上2016

    • Author(s)
      山阪 司祐人、渡辺 健太郎、澤野 憲太郎、竹内 正太郎、酒井 朗、中村 芳明
    • Organizer
      第63回応用物理学会春季学術講演会、20p-W323-12
    • Place of Presentation
      東京工業大学 大岡山キャンパス (東京都目黒区)
    • Year and Date
      2016-03-19
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Electrical properties in Co2FeSi1-xAlx/n+-Ge contacts with phosphorous δ-doping and silicon-layer insertions2016

    • Author(s)
      Keisuke Arima, Michihiro Yamada, Yuichi Fujita, Kentarou Sawano, Shinya Yamada, Takeshi Kanashima, and Kohei Hamaya
    • Organizer
      9th International Conference on Physics and Applications of Spin-Related Phenomena in Solids
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Fabrication of high-quality strain relaxed SiGe(110) films by controlling defects via ion implantation2016

    • Author(s)
      M. Kato, T. Murakami, K. Arimoto, J. Yamanaka, K. Nakagawa, K, Sawano
    • Organizer
      19th International Conference on Molecular Beam Epitaxy (MBE 2016)
    • Place of Presentation
      Montpellier, France
    • Year and Date
      2016-09-04
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] エピタキシャルGeナノドット含有Si薄膜における熱伝導率の低減2016

    • Author(s)
      渡辺 健太郎、山阪 司祐人、澤野 憲太郎、中村 芳明
    • Organizer
      2016年秋季<第77回>応用物理学会
    • Place of Presentation
      朱鷺メッセ(新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Light Emission Enhancement from Ge Quantum Dots with Phosphorous delta-Doping2016

    • Author(s)
      K. Sawano, K. Mizutani, K. Watanabe, X. Xu, T. Maruizumi
    • Organizer
      19th International Conference on Molecular Beam Epitaxy (MBE 2016)
    • Place of Presentation
      Montpellier, France
    • Year and Date
      2016-09-04
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] 微傾斜基板を用いた伸張歪みSi/緩和SiGe/Si(110)ヘテロ構造のモフォロジー及び素子特性2016

    • Author(s)
      宇津山直人、佐藤圭、山田 崇峰、有元圭介、山中淳二、中川清和、原康介、宇佐美徳隆、澤野憲太郎
    • Organizer
      第63回応用物理学会春季学術講演会
    • Place of Presentation
      東京工業大学
    • Year and Date
      2016-03-19
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Si(111)基板上エピタキシャルβ-FeSi2薄膜の熱電特性2016

    • Author(s)
      谷口 達彦、坂根 駿也、青木 俊輔、奥畑 亮、渡辺 健太郎、鈴木 健之、藤田 武志、澤野 憲太郎、中村 芳明
    • Organizer
      2016年秋季<第77回>応用物理学会
    • Place of Presentation
      朱鷺メッセ(新潟県新潟市)
    • Year and Date
      2016-09-13
    • Data Source
      KAKENHI-PROJECT-16H02078
  • [Presentation] Thermal Stability of Compressively Strained Si/Relaxed Si1-xCx Heterostructures Formed on Ar Ion Implanted Si (100) Substrates2016

    • Author(s)
      You Arisawa, Yusuke Hoshi, Kentarou Sawano, Junji Yamanaka, Keisuke Arimoto, Chiaya Yamamoto, Noritaka Usami
    • Organizer
      International SiGe Technology and Device Meeting 2016 (ISTDM2016)
    • Place of Presentation
      Nagoya University (Aichi)
    • Year and Date
      2016-06-07
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Straining of Group IV Semiconductor Materials for Bandgap and Mobility Engineering2016

    • Author(s)
      Kentarou Sawano
    • Organizer
      Pacific Rim Meeting on Electrochemical and Solid-State Science (PRiME 2016)
    • Place of Presentation
      Honolulu, USA
    • Year and Date
      2016-10-02
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Strained Ge-on-Insulator Substrates toward Optoelectronic Integrated Circuits2016

    • Author(s)
      Kentarou Sawano
    • Organizer
      The International Conference on Small Science (ICSS 2016)
    • Place of Presentation
      Prague, Czech Republic
    • Year and Date
      2016-06-25
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Spin absorption affect at ferromagnetic alloy/n+-Ge interfaces2016

    • Author(s)
      Michihiro Yamada, Yuichi Fujita, Shinya Yamada, Takeshi Kanashima, Kentarou Sawano, and Kohei Hamaya
    • Organizer
      61st Anuual Magnetism and Magnetic Materials Conference (MMM 2016)
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-16H02333
  • [Presentation] Anisotropic Strain Introduction into Si/Ge Hetero Structures2016

    • Author(s)
      Kentarou Sawano
    • Organizer
      Pacific Rim Meeting on Electrochemical and Solid-State Science (PRiME 2016)
    • Place of Presentation
      Honolulu, USA
    • Year and Date
      2016-10-02
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Robust quantum dot devices for qubits in isotopically purified 28Si2015

    • Author(s)
      Christian Neumann, Johannes Kierig, Florian Forster, Andreas Wild, J. W. Ager, E. E. Haller, Gerhard Abstreiter, Kentarou Sawano, Stefan Ludwig, and Dominique Bougeard
    • Organizer
      21st International Conference on Electronic Properties of Two-Dimensional Systems (EP2DS-21)
    • Place of Presentation
      Sendai International Center, Miyagi
    • Year and Date
      2015-07-26
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Fabrication of Strained Ge-on-Insulator for Ge-based Optoelectronic Devices2015

    • Author(s)
      K. Sawano, T. Nagashima, H. Hashimoto, X. Xu, K. Hamaya, and T. Maruizumi
    • Organizer
      E-MRS 2015 Spring Meeting
    • Place of Presentation
      Lille, France
    • Year and Date
      2015-05-11
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Arイオン注入法を用いた圧縮歪み/緩和Si1-xCxヘテロ構造の作製2015

    • Author(s)
      有澤 洋, 星 裕介, 藤原 幸亮, 山中 淳二, 有元 圭介, 中川 清和, 澤野 憲太郎, 宇佐美 徳隆
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-12
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] 歪みSi/Si1-xCx/Si(001)ヘテロ構造の結晶性と不純物活性化過程との関係2015

    • Author(s)
      藤原幸亮、酒井翔一朗、小林昭太、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-12
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Compressively strained Si/Si1-xCx heterostructures formed by Ar ion implantation technique2015

    • Author(s)
      Y.Hoshi, K.Arimoto, K.Sawano, Y.Arisawa, K.Fujiwara, J.Yamanaka, K.Nakagawa, and N.Usami
    • Organizer
      The 9th International Conference on Silicon Epitaxy and Heterostructures (ICSI 9)
    • Place of Presentation
      Montreal, Canada
    • Year and Date
      2015-05-17
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Cubic Rashba Spin-Orbit Interaction of a Two-Dimensional Hole Gas in a Ge/SiGe Quantum Well2015

    • Author(s)
      Rai Moriya, Kentarou Sawano, Yusuke Hoshi, Satoru Masubuchi, Yasuhiro Shiraki, Takaaki Koga, and Tomoki Machida
    • Organizer
      21st International Conference on Electronic Properties of Two-Dimensional Systems (EP2DS-21)
    • Place of Presentation
      Sendai International Center, Miyagi
    • Year and Date
      2015-07-26
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] イオン注入による欠陥制御を用いて作製した圧縮歪みSi/Si1-xCx ヘテロ構造の熱的安定性2015

    • Author(s)
      有澤洋、星裕介、有元圭介、山中淳二、中川清和、澤野憲太郎、宇佐美徳隆
    • Organizer
      第76回応用物理学会秋季学術講演会
    • Place of Presentation
      名古屋国際会議場
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Strained Germanium based Nano-Structures toward High Performance Optoelectronic Integrated Circuits2015

    • Author(s)
      Kentarou Sawano
    • Organizer
      International Symposium for Advanced Materials Research 2015
    • Place of Presentation
      Nantou, Taiwan
    • Year and Date
      2015-08-16
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Fabrication of Strained Ge-on-Insulator for Ge-based Optoelectronic Devices2015

    • Author(s)
      K. Sawano, T. Nagashima, H. Hashimoto, X. Xu, K. Hamaya, and T. Maruizumi
    • Organizer
      E-MRS 2015 Spring Meeting
    • Place of Presentation
      Lille, France
    • Year and Date
      2015-05-11
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Co2FeSi0.5Al0.5/n+-Geショットキートンネル接合を用いたn-Ge中の室温スピン伝導検出2015

    • Author(s)
      藤田 裕一、岡 孝保、山田 晋也、山田 道洋、澤野憲太郎、金島 岳、浜屋 宏平
    • Organizer
      第39回日本磁気学会学術講演会
    • Place of Presentation
      名古屋大学 東山キャンパス (愛知県名古屋市)
    • Year and Date
      2015-09-06
    • Data Source
      KAKENHI-PROJECT-25246020
  • [Presentation] Compressively strained Si/Si1-xCx heterostructures formed by Ar ion implantation technique2015

    • Author(s)
      Y. Hoshi, K. Arimoto, K. Sawano, Y. Arisawa, K. Fujiwara, J. Yamanaka, K. Nakagawa, N. Usami
    • Organizer
      9th International Conference on Silicon Epitaxy and Heterostructures
    • Place of Presentation
      Montreal, Canada
    • Year and Date
      2015-05-17
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Suppression of the segregation of delta-doped P by the insertion of Si layers in Ge2015

    • Author(s)
      Michihiro Yamada, Kentarou Sawano, Masashi Uematsu, and Kohei. M. Itoh
    • Organizer
      9th International Conference on Silicon Epitaxy and Heterostructures
    • Place of Presentation
      Montreal, Canada
    • Year and Date
      2015-05-17
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] エピタキシャルGeナノドット含有Si薄膜における熱電特性制御2015

    • Author(s)
      山阪 司祐人、渡辺 健太郎、澤野憲太郎、竹内正太郎、酒井朗、中村芳明
    • Organizer
      2015年秋季第76回応用物理学会、13p-2T-5
    • Place of Presentation
      名古屋国際会議場(愛知県名古屋市)
    • Year and Date
      2015-09-13
    • Data Source
      KAKENHI-PROJECT-25286026
  • [Presentation] Strained Germanium based Nano-Structures toward High Performance Optoelectronic Integrated Circuits2015

    • Author(s)
      Kentarou Sawano
    • Organizer
      International Symposium for Advanced Materials Research 2015
    • Place of Presentation
      Sun Moon Lake, Taiwan
    • Year and Date
      2015-08-16
    • Invited / Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Low-temperature Fabrication of a Gate Stack Structure for Ge-based Spin-MOSFET2015

    • Author(s)
      Yuichi Fujita, Takayasu Oka, Yuta Nagatomi, Keisuke Yamamoto, Michihiro Yamada, Kentarou Sawano, Shinya Yamada, Takeshi Kanashima, and Kohei Hamaya
    • Organizer
      2015 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ELECTRON DEVICES -SCIENCE AND TECHNOLOGY- (2015 IWDTF)
    • Place of Presentation
      日本科学未来館 (東京都江東区)
    • Year and Date
      2015-11-02
    • Int'l Joint Research
    • Data Source
      KAKENHI-PROJECT-25246020
  • [Presentation] Compressively strained Si/Si1-xCx heterostructures formed by Ar ion implantation technique2015

    • Author(s)
      Y. Hoshi, K. Arimoto, K. Sawano, Y. Arisawa, K. Fujiwara, J. Yamanaka, K. Nakagawa, and N. Usami
    • Organizer
      9th International Conference on Silicon Epitaxy and Heterostructures
    • Place of Presentation
      Montreal
    • Year and Date
      2015-05-19
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] イオン注入成長法で作製した圧縮歪みSi/Si1-xCx/Si(001)構造MOSFETの電気特性評価2015

    • Author(s)
      中込諒、酒井翔一朗、藤原幸亮、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第62回応用物理学会春季学術講演会
    • Place of Presentation
      東海大学
    • Year and Date
      2015-03-12
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] 2歪みSi/Si1-xCx/Si(001) 構造の不純物活性化過程における結晶性及び電気特性評価2014

    • Author(s)
      藤原幸亮、酒井翔一朗、古川洋志、井上樹範、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-18
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Electrical properties of strained Ge(111)-on-Insulator (GOI) fabricated by Ge epitaxy on Si and layer transfer2014

    • Author(s)
      Tomonori Nagashima, Hironori Katsumata, Kohei Hamaya, Masanobu Miyao, Yasuhiro Shiraki, Kentarou Sawano
    • Organizer
      7th International Silicon-Germanium Technology and Device Meeting, 2014 ISTDM
    • Place of Presentation
      Singapore
    • Year and Date
      2014-06-02
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] イオン注入法がSi1-xCx/Si(001)構造の欠陥形成過程に及ぼす効果2014

    • Author(s)
      中込諒、酒井翔一朗、藤原幸亮、古川洋志、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] イオン注入法で作製した圧縮歪みSi/Si1-xCx/Si(001) 構造の結晶性及びデバイス特性評価2014

    • Author(s)
      中込諒、酒井翔一朗、藤原幸亮、古川洋志、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学
    • Year and Date
      2014-09-18
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] 圧縮歪みSi/Si1-xCx/Si(100)ヘテロ構造における炭素傾斜組成の電気伝導特性への効果2014

    • Author(s)
      酒井翔一朗、古川洋志、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] 不純物イオン注入および熱処理がSi1-xCx層の結晶性に及ぼす影響2014

    • Author(s)
      藤原幸亮、酒井翔一朗、古川洋志、井上樹範、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎
    • Organizer
      第61回応用物理学会春季学術講演会
    • Place of Presentation
      青山学院大学
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Formation of Ge(111) on Insulator by Ge epitaxy on Si(111) and layer transfer2013

    • Author(s)
      K. Sawano, Y. Hoshi, S. Endo, H. Katsumata, T. Nagashima, K. Arimoto, J. Yamanaka, K. Nakagawa, K. Hamaya, M. Miyao and Y. Shiraki
    • Organizer
      The 8th Int. Conf. on Si Epitaxy and Heterostructures (ICSI-8)
    • Place of Presentation
      Fukuoka, Japan
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Co2FeSi ホイスラー合金電極を用いたn 型Ge 中のスピン伝導検出2013

    • Author(s)
      笠原健司, 藤田裕一, 山田晋也, 澤野憲太郎, 宮尾正信, 浜屋宏平
    • Organizer
      第18回半導体スピン工学の基礎と応用
    • Place of Presentation
      大阪
    • Data Source
      KAKENHI-PROJECT-25246020
  • [Presentation] 圧縮歪みSi/Si1-xCx/Si(100)構造を用いたMOSFETに関する研究2013

    • Author(s)
      中込諒、酒井翔一朗、藤原幸亮、古川洋志、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎、白木靖寛
    • Organizer
      第2回結晶工学未来塾
    • Place of Presentation
      学習院大学
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Formation of Uniaxially Strained Ge by Selective Ion Implantation2013

    • Author(s)
      K. Sawano, Y. Shoji, E. Yonekura, K. Nakagawa, and Y. Shiraki
    • Organizer
      E-MRS 2013 Spring Meeting
    • Place of Presentation
      Strasbourg, France
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Strain engineered Si/Ge heterostructures2013

    • Author(s)
      K. Sawano
    • Organizer
      The International Conference on Small Science (ICSS 2013)
    • Place of Presentation
      Las Vegas, USA
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Uniaxially strained Si/Ge heterostructures grown on selectively ion-implanted substrates2013

    • Author(s)
      K. Sawano, Y. Shoji, N. Funabashi, E. Yonekura, K. Nakagawa, Y. Shiraki
    • Organizer
      17th International Conference on Crystal Growth and Epitaxy (ICCGE-17)
    • Place of Presentation
      Warsaw, Poland
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] Si1-xCx混晶半導体の不純物活性化プロセスにおける結晶欠陥形成過程の解明2013

    • Author(s)
      藤原幸亮、酒井翔一朗、古川洋志、井上樹範、有元圭介、山中淳二、中川清和、宇佐美徳隆、星裕介、澤野憲太郎、白木靖寛
    • Organizer
      第2回結晶工学未来塾
    • Place of Presentation
      学習院大学
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Gas-source MBE growth of compressively strained-Si/Si1-xCx/Si(100) heterostructures2012

    • Author(s)
      S. Sakai, H. Furukawa, K. Arimoto, J. Yamanaka, K. Nakagawa, Y. Hoshi, K. Sawano, Y. Shiraki, N. Usami
    • Organizer
      The 17th International Conference on Molecular Beam Epitaxy
    • Place of Presentation
      奈良
    • Year and Date
      2012-09-27
    • Data Source
      KAKENHI-PROJECT-24360001
  • [Presentation] Formation of Uniaxially Strained Si/Ge Channels on SiGe Buffers Strain-controlled with Selective Ion Implantation2012

    • Author(s)
      K. Sawano
    • Organizer
      222nd Meeting of The Electrochemical Society (PRiME 2012)
    • Place of Presentation
      Honolulu, HI, US
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] On the origin of the uniaxial strain induced in Si/Ge heterostructures with selective ion implantation technique2012

    • Author(s)
      K. Sawano
    • Organizer
      The 17th International Conference on Molecular Beam Epitaxy (MBE2012)
    • Place of Presentation
      Nara
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Si-capによるHfO_2/歪みGe界面のHfジャーマネイト形成の抑制2012

    • Author(s)
      小松新, 多田隼人, 渡邉将人, 那須賢太郎, 星祐介, 榑林徹, 澤野憲太郎, ミロノフマクシム, 白木靖寛, 野平博司
    • Organizer
      第59回応用物理学関係連合講演会
    • Place of Presentation
      早稲田大学(東京都)
    • Year and Date
      2012-03-15
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] On the origin of the uniaxial strain induced in Si/Ge heterostructures with selective ion implantation technique2012

    • Author(s)
      K. Sawano
    • Organizer
      The 17th International Conference on Molecular Beam Epitaxy
    • Place of Presentation
      Nara, Japan
    • Year and Date
      2012-09-26
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 角度分解硬X線光電子分光法によるHfO_2/Si/歪みGe/SiGe構造の評価2011

    • Author(s)
      野平博司, 小松新, 那須賢太郎, 星裕介, 博林徹, 澤野憲太郎, マクシムミロノフ, 白木靖寛
    • Organizer
      電子情報通信学会技術研究会報告シリコン材料・デバイス
    • Place of Presentation
      東北大学(宮城県)(招待講演)
    • Year and Date
      2011-10-21
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] XPS Study on Chemical Bonding States of high-kappa/high-k Gate Stacks for Advanced CMOS2011

    • Author(s)
      Hiroshi Nohira, Arata Komatsu, Koji Yamashita, Kuniyuki Kakushima, Hiroshi Iwai, Yusuke Hoshi, Kentarou Sawano, Yasuhiro Shiraki
    • Organizer
      220th Meeting of The Electrochemical Society
    • Place of Presentation
      Boston, MA, USA(招待講演)
    • Year and Date
      2011-10-11
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Fabrication of strained thin-film GOT based on wafer bonding2011

    • Author(s)
      Yusuke Hoshi, Kentarou Sawano, Kohei Hamaya, Masanobu Miyao, Yasuhiro Shiraki
    • Organizer
      7th International Conference on Si Epitaxy and Heterostructures
    • Place of Presentation
      Leuven, Belgium
    • Year and Date
      2011-08-28
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Microstructure Change of Si0.99C0.01 Thin Films Caused by Arsenic-Ion-, Boron-Ion-, and Silicon-Ion-Implantation and Successive Rapid Thermal Annealing Treatment2011

    • Author(s)
      Shigenori Inoue, Keisuke Arimoto, Junji Yamanaka, Kiyokazu Nakagawa Kentarou Sawano, Yasuhiro Shiraki, Atsushi Moriya, Yasuhiro Inokuchi, Yasuo Kunii
    • Organizer
      7th International Conference on Si Epitaxy and Heterostructures
    • Place of Presentation
      Leuven, Belgium
    • Year and Date
      2011-08-28
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪みGe/SiGe構造の評価2011

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, マクシムミロノフ, 野平博司, 白木靖寛
    • Organizer
      応用物理学会薄膜・表面物理分科会・シリコンテクノロジー分科会共催特別研究会「ゲートスタック研究会-材料・プロセス・評価の物理-」(第16回研究会)(旧「極薄シリコン酸化膜の形成・評価・信頼性」研究会)
    • Place of Presentation
      東京工業大学(東京都)
    • Year and Date
      2011-01-22
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪みGe/SiGe構造の評価2011

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, マクシムミロノフ, 野平博司, 白木靖寛
    • Organizer
      応用物理学会薄膜・表面物理分科会・シリコンテクノロジー分科会共催特別研究会 「ゲートスタック研究会-材料・プロセス・評価の物理-」(第16回研究会)(旧「極薄シリコン酸化膜の形成・評価・信頼性」研究会)
    • Place of Presentation
      東京工業大学(東京都)
    • Year and Date
      2011-01-22
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] Stripe line width dependence of anisotorpic strain states induced into SiGe films by selective ion implantation technique2011

    • Author(s)
      Y.Hoshi, K.Sawano, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Organizer
      E-MRS 2011 Spring Meeting
    • Place of Presentation
      Nice, France
    • Year and Date
      2011-05-10
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Ion Implantation for Strain Engineering of Si-based Semiconductor2011

    • Author(s)
      Kentarou Sawano
    • Organizer
      Invited BIT's 1st Annual World Congress ofNano-S&T 2011
    • Place of Presentation
      Dalian, China
    • Year and Date
      2011-10-26
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Surface segregation behavior of Sb, B, Ga, and As dopant atoms on Ge(100) and Ge(111) surface examined with a first-principles method2011

    • Author(s)
      T.Maruizumi, Jiro Ushio, Shotaro Abe, Kentarou Sawano, Yasuhiro Shiraki
    • Organizer
      7th International Conference on Si Epitaxy and Heterostructures
    • Place of Presentation
      Leuven, Belgium
    • Year and Date
      2011-08-30
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Surface segregation behavior of B, Ga, Sb, and As dopant atoms on Ge(100) and Ge(111) examined with a first-principles method2011

    • Author(s)
      F.Iijima, K.Sawano, T.Maruizumi, Y.Shiraki
    • Organizer
      15th International Conference on Thin Films
    • Place of Presentation
      京都テルサ、京都
    • Year and Date
      2011-11-08
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] XPS Study on Chemical Bonding States of high-κ/high-μ Gate Stacks for Advanced CMOS2011

    • Author(s)
      Hiroshi Nohira, Arata Komatsu, Koji Yamashita, Kuniyuki Kakushima, Hiroshi Iwai, Yusuke Hoshi, Kentarou Sawano, Yasuhiro Shiraki
    • Organizer
      220th Meeting of The Electrochemical Society
    • Place of Presentation
      Boston (USA)(招待講演)
    • Year and Date
      2011-10-10
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] 角度分解硬X線光電子分光法によるHfO_2/Si/歪みGe/SiGe構造の評価2011

    • Author(s)
      野平博司, 小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, マクシムミロノフ, 白木靖寛
    • Organizer
      電子情報通信学会技術研究会報告シリコン材料・デバイス
    • Place of Presentation
      東北大学(宮城県)
    • Year and Date
      2011-10-21
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] Temperature dependence of two-dimensional hole gas mobility in a strained Ge quantum well2011

    • Author(s)
      T.Tanaka, K.Sawano, Y.Hoshi, Y.Shiraki, K.M.Itoh
    • Organizer
      The 19th international conference on Electronic Properties of Two-Dimensional Systems (EP2DS19)
    • Place of Presentation
      Florida, USA
    • Year and Date
      2011-07-25
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 選択的イオン注入法により作製される一軸性歪みSiGeの表面構造評価2010

    • Author(s)
      永倉壮, 星裕介, 澤野憲太郎, 宇佐美徳隆, 中川清和, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] CVDにより作製した歪みGeチャネルの電気伝導特性2010

    • Author(s)
      榑林徹, 星裕介, 那須賢太郎, 澤野憲太郎, 宇佐美徳隆, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Ge(111)への高濃度Sbデルタドーピングによる低抵抗コンタクト形成2010

    • Author(s)
      竹田圭吾, 星裕介, 笠原健司, 山根一高, 澤野憲太郎, 浜屋宏平, 宮尾正信, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Si/SiGe系2DEGのPdショットゲート制御による結合量子ドットの作製2010

    • Author(s)
      福岡佑二, 小寺哲夫, 大塚朋廣, 武田健太, 小幡利顕, 吉田勝治, 澤野憲太郎, 内田建, 白木靖寛, 樽茶清悟, 小田俊理
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] (110)面を表面に有する歪みSiの正孔移動度と結晶モフォロジーとの関係2010

    • Author(s)
      八木聡介, 有元圭介, 中川清和, 宇佐美徳隆, 中嶋一雄, 澤野憲太郎, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Ge(111)への高濃度Sbデルタドーピングによる低抵抗コンタクト形成2010

    • Author(s)
      竹田圭吾, 星裕介, 笠原健司, 山根一高, 澤野憲太郎, 浜屋宏平, 宮尾正信, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪Ge/SiGe構造の評価II2010

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, ミロノフマクシム, 野平博司, 白木靖寛
    • Organizer
      2010年秋季第71回応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-15
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] イオン注入法によるSi(111)基板上緩和SiGeバッファ層の作製2010

    • Author(s)
      久保智史, 澤野憲太郎, 星裕介, 中川清和, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪Ge/SiGe構造の評価2010

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, マクシムミロノフ, 野平博司, 白木靖寛
    • Organizer
      第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学・湘南キャンパス
    • Year and Date
      2010-03-18
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] CVDにより作製した歪みGeチャネルの電気伝導特性2010

    • Author(s)
      榑林徹, 星裕介, 那須賢太郎, 澤野憲太郎, 宇佐美徳隆, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Ar^+およびSi^+イオン注入欠陥がSiGe層の歪緩和に与える影響2010

    • Author(s)
      星裕介, 澤野憲太郎, 宇佐美徳隆, 有元圭介, 中川清和, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Effects of increased compressive strain on hole effective mass and scattering mechanisms in strained Ge channels2010

    • Author(s)
      K.Sawano, K.Toyama, R.Masutomi, T.Okamoto, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Organizer
      E-MRS 2010 Spring Meeting, Symposium H
    • Place of Presentation
      Strasbourg (France)
    • Year and Date
      2010-06-10
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Study of HfO2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, Yasuhiro Shiraki
    • Organizer
      218th Meeting of The Electrochemical Society
    • Place of Presentation
      Las Vegas (USA)
    • Year and Date
      2010-10-12
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Effect of line width on uniasial strain states of SiGe layers fabricated by selective ion implantation2010

    • Author(s)
      Y.Hoshi, K.Sawano, A.Yamada, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Organizer
      5th International SiGe Technology and Device Meeting (ISTDM)
    • Place of Presentation
      Stockholm (Sweden)
    • Year and Date
      2010-05-24
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Effects of increased compressive strain on hole effective mass and scattering mechanisms in strained Ge channels2010

    • Author(s)
      K.Sawano, K.Toyama, R.Masutomi, T.Okamoto, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Organizer
      E-MRS 2010 Spring Meeting, Symposium H
    • Place of Presentation
      Strasbourg (France)
    • Year and Date
      2010-06-10
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪Ge/SiGe構造の評価II2010

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, ミロノフマクシム, 野平博司, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-15
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Si/SiGe系2DEGのPdショットゲート制御による結合量子ドットの作製2010

    • Author(s)
      福岡佑二, 小寺哲夫, 大塚朋廣, 武田健太, 小幡利顕, 吉田勝治, 澤野憲太郎, 内田 建, 白木靖寛, 樽茶清悟, 小田俊理
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] (110)面を表面に有する歪みSiの正孔移動度と結晶モフォロジーとの関係2010

    • Author(s)
      八木聡介, 有元圭介, 中川清和, 宇佐美徳隆, 中嶋一雄, 澤野憲太郎, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Study of HfO2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, Yasuhiro Shiraki
    • Organizer
      218th Meeting of The Electrochemical Society
    • Place of Presentation
      Las Vegas (USA)
    • Year and Date
      2010-10-12
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Study of HfO_2/Si/Strained-Ge/SiGe Using Angle Resolved X-ray Photoelectron Spectroscopy2010

    • Author(s)
      Arata Komatsu, Kentarou Nasu, Yusuke Hoshi, Toru Kurebayashi, Kentarou Sawano, Maksym Myronov, Hiroshi Nohira, and Yasuhiro Shiraki
    • Organizer
      218th Meeting of The Electrochemical Society
    • Place of Presentation
      Las Vegas, NV, USA
    • Year and Date
      2010-10-13
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪Ge/SiGe構造の評価II2010

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, ミロノフマクシム, 野平博司, 白木靖寛
    • Organizer
      2010年秋季第71回応用物理学会学術講演会,予稿集, 15p-ZA-12
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-15
    • Data Source
      KAKENHI-PROJECT-21560035
  • [Presentation] イオン注入法によるSi(111)基板上緩和SiGeバッファ層の作製2010

    • Author(s)
      久保智史, 澤野憲太郎, 星裕介, 中川清和, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Ar^+およびSi^+イオン注入欠陥がSiGe層の歪緩和に与える影響2010

    • Author(s)
      星裕介, 澤野憲太郎, 宇佐美徳隆, 有元圭介, 中川清和, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 選択的イオン注入法により作製される一軸性歪みSiGeの表面構造評価2010

    • Author(s)
      永倉壮, 星裕介, 澤野憲太郎, 宇佐美徳隆, 中川清和, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-14
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] 低抵抗コンタクト形成へ向けたGeへのSbデルタドーピングとその偏析現象2010

    • Author(s)
      澤野憲太郎
    • Organizer
      2010年春季 第57回応用物理学関係連合講演会
    • Place of Presentation
      東海大学(平塚)
    • Year and Date
      2010-03-17
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 角度分解X線光電子分光法によるHfO_2/Si/歪Ge/SiGe構造の評価II2010

    • Author(s)
      小松新, 那須賢太郎, 星裕介, 榑林徹, 澤野憲太郎, ミロノフマクシム, 野平博司, 白木靖寛
    • Organizer
      2010年秋季<第71回>応用物理学会学術講演会
    • Place of Presentation
      長崎大学(長崎県)
    • Year and Date
      2010-09-15
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Effect of line width on uniaxial strain states of SiGe layers fabricated by selective ion implantation2010

    • Author(s)
      Y.Hoshi, K.Sawano, A.Yamada, N.Usami, K.Arimoto, K.Nakagawa, Y.Shiraki
    • Organizer
      5th International SiGe Technology and Device Meeting (ISTDM)
    • Place of Presentation
      Stockholm (Sweden)
    • Year and Date
      2010-05-24
    • Data Source
      KAKENHI-PROJECT-22760011
  • [Presentation] Introduction of Uniaxial Strain into Si/Ge Heterostructures by Selective Ion Implantation (Invited)2009

    • Author(s)
      澤野憲太郎
    • Organizer
      2009年秋季 第70回応用物理学関係連合講演会
    • Place of Presentation
      富山大学(富山)
    • Year and Date
      2009-09-10
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] Formation of Uniaxially Strained SiGe by Selective Ion Implantation Technique2009

    • Author(s)
      澤野憲太郎
    • Organizer
      E-MRS 2009 Spring Meeting
    • Place of Presentation
      Strasbourg, France
    • Year and Date
      2009-06-11
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] CMP for high mobility strained Si/GeChannels2009

    • Author(s)
      Kentarou Sawano
    • Organizer
      Invited2009 MRS (Materials Research Society) Spring Meeting, Symposium E : Science andTechnology of Chemical Mechanical Planarization (CMP)
    • Place of Presentation
      San Francisco, USA
    • Year and Date
      2009-04-16
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] CMP for high mobility strained Si/Ge Channels (Invited)2009

    • Author(s)
      澤野憲太郎
    • Organizer
      2009 MRS (Materials Research Society) Spring Meeting
    • Place of Presentation
      San Francisco, USA
    • Year and Date
      2009-04-16
    • Data Source
      KAKENHI-PROJECT-21246003
  • [Presentation] 選択的イオン注入法によるSiGe層の面内歪み制御2008

    • Author(s)
      平岡良康,星裕介,河南信治,澤野憲太郎,中川清和,宇佐美徳隆,白木靖寛
    • Organizer
      第55回応用物理学関係連合講演会
    • Place of Presentation
      日本大学(千葉)
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Local Strain Control of SiGe by Selective Ion Implantation Technique2008

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, S. Kannan, Y. Shiraki, N. Usami, and K. Nakagawa
    • Organizer
      4th International SiGe Technology and Device Meeting (ISTDM) 2008
    • Place of Presentation
      台湾、新竹
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] マイクロ波プラズマ加熱による非晶質シリコンの結晶化における加熱機構2008

    • Author(s)
      芦澤里樹, 有泉慧, 三井実, 有元圭介, 山中淳二, 中川清和, 荒井哲司, 高松利行, 澤野憲太郎, 白木靖寛
    • Organizer
      第55回応用物理学関係連合講演会
    • Place of Presentation
      日本大学理工学部船橋キャンパス
    • Year and Date
      2008-03-29
    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] Siイオン注入法により作製されたSiGeバッファー層の歪緩和過程2008

    • Author(s)
      星裕介,澤野憲太郎,平岡良康,山田淳矩,宇佐美徳隆,中川清和,白木靖寛
    • Organizer
      第69回応用物理学会学術講演会
    • Place of Presentation
      中部大学
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Local Control of Strain in SiGe by Ion Implantation Technique2008

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, N. Usami, K. Nakagawa, Y. Shiraki
    • Organizer
      4th Asian Conference on Crystal Growth and Crystal Technology
    • Place of Presentation
      (CGCT-4), Sendai
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] 選択的イオン注入により作製したSiGe層における一軸性歪みの観測2008

    • Author(s)
      山田淳矩,澤野憲太郎,星裕介,平岡良康,宇佐美徳隆,中川清和,白木靖寛
    • Organizer
      第69回応用物理学会学術講演会
    • Place of Presentation
      中部大学
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Development of Thin SiGe Virtual Substrate with High Ge Composition by Ion Implantation Method2008

    • Author(s)
      Yusuke Hoshi, Kentarou Sawano, Yoshiyasu Hiraoka, Yuu Satoh, Atsunori Yamada, Yuta Ogawa, Yasuhiro Shiraki, Noritaka Usami, and Kiyokazu Nakagawa
    • Organizer
      4th International SiGe Technology and Device Meeting (ISTDM) 2008
    • Place of Presentation
      Taiwan
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Local Strain Control of SiGe by Selective Ion Implantation Technique2008

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, S. Kannan, Y. Shiraki, N. Usami, and K. Nakagawa
    • Organizer
      4th International SiGe Technology and Device Meeting (ISTDM) 2008
    • Place of Presentation
      Taiwan
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Fabrication of thin strain-relaxed SiGe buffer layers with high-Ge comp osition by ion implantation method2008

    • Author(s)
      Y. Hoshi, K. Sawano, Y. Hiraoka, N. Usami, K. Nakagawa, and Y. Shiraki
    • Organizer
      4th Asian Conference on Crystal Growth and Crystal Technology
    • Place of Presentation
      東北大学 (仙台)
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Fabrication of thin strain-relaxed SiGe buffer layers with high-Ge composition by ion implantation method2008

    • Author(s)
      Y. Hoshi, K. Sawano, Y. Hiraoka, N. Usami, K. Nakagawa, and Y. Shiraki
    • Organizer
      4th Asian Conference on Crystal Growth and Crystal Technology
    • Place of Presentation
      (CGCT-4), Sendai
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Development of Thin SiGe Virtual Substrate with High Ge Composition by Ion Implantation Method2008

    • Author(s)
      Yusuke Hoshi, Kentarou Sawano, Yoshiyasu Hiraoka, Yuu Satoh, Atsunori Yamada, Yuta Ogawa, Yasuhiro Shiraki, No ritaka Usami, and Kivokazu Nakagawa
    • Organizer
      4th International SiGe Technology and Device Meeting (ISTDM) 2008
    • Place of Presentation
      台湾、新竹
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] 選択的イオン注入により作製したsiGe層における-軸性歪みの観測2008

    • Author(s)
      山田淳矩, 澤野憲太郎, 星裕介, 平岡良康, 宇佐美徳隆, 中川清和, 白木靖寛
    • Organizer
      第69回応用物理学会学術講演会
    • Place of Presentation
      中部大学
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Local Control of Strain in SiGe by Ion Implantation Technique2008

    • Author(s)
      K. Sawano, Y. Hoshi, Y. Hiraoka, N. Usami, K. Nakagawa, Y. Shiraki
    • Organizer
      4th Asian Conference on Crystal Growth and Crystal Technology
    • Place of Presentation
      4th Asian Conference on Crystal Growth and Crystal Technology
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Fabrication of SiGe Virtual Substrates by Ion Implantation Technique2007

    • Author(s)
      K. Sawano, Y. Shiraki, and K. Nakagawa
    • Organizer
      The 212th Meeting of the Electrochemical Society, ULSI Process Integration 5
    • Place of Presentation
      ワシントンDC
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] 非晶質シリコンのマイクロ波加熱による結晶化の雰囲気依存性2007

    • Author(s)
      芦澤里樹、三井実、有元圭介、山中淳二、中川清和、荒井哲司、高松利行、澤野憲太郎、白木靖寛
    • Organizer
      第68回応用物理学会学術講演会
    • Place of Presentation
      北海道工業大学
    • Year and Date
      2007-09-04
    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] Heating Mechanism of Microwave Plasma Annealing for Crystallization of Amorphous Silicon2007

    • Author(s)
      S. Ashizawa, S. Ariizumi, M. Mitsui, K. Arimoto, J. Yamanaka, K. Nakagawa, T. Arai, T. Takamatsu, K. Sawano, Y. Shiraki
    • Organizer
      55th Spring Meeting, Japan Society of Applied Physics
    • Place of Presentation
      Nihon University, Japan
    • Year and Date
      2007-03-29
    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] Fabrication of high quality SiGe relaxed thin layers by ion implantation technique with Ar, Si and Ge ions2007

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, J. Yamanaka, K. Nakagawa, and Y. Shiraki
    • Organizer
      5th International Conference on Silicon Epitaxy and Heterostructures (ICSi-5)
    • Place of Presentation
      フランス、マルセイユ
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Atmosphere Dependence of Silicon Crystallization by Microwave Annealing2007

    • Author(s)
      S. Ashizawa, M. Mitsui, K. Arimoto, J. Yamanaka, K. Nakagawa, T. Arai, T. Takamatsu, K. Sawano, Y. Shiraki
    • Organizer
      68th Spring Meeting, Japan Society of Applied Physics
    • Place of Presentation
      Hokkaido Insti tute of Technology, Japan
    • Year and Date
      2007-09-04
    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] Fabrication of high quality SiGe relaxed thin layers by ion implantation technique with Ar, Si and Ge ions2007

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, J. Yamanaka, K. Nakagawa, and Y. Shiraki
    • Organizer
      5th International Conference on Silicon Epitaxy and Heterostructures (ICSi-5)
    • Place of Presentation
      Marseille, France
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Fabrication of SiGe Virtual Substrates by Ion Implantation Technique2007

    • Author(s)
      K. Sawano, Y. Shiraki, and K. Nakagawa
    • Organizer
      The 212th Meeting of the Electrochemical Society, ULSI Process Integration 5 (招待講演)
    • Place of Presentation
      Washington DC, USA
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Strained-Si nMOSFET formed on very thin SiGe buffer layer fabricated by ion implantation technique2007

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, K. Nakagawa, and Y. Shiraki
    • Organizer
      5th International Conference on Silicon Epitaxy and Heterostructures (ICSi-5)
    • Place of Presentation
      Marseille, France
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] イオン注入法により作製した薄膜SiGe緩和層上の歪みSi-nMOSFET2007

    • Author(s)
      澤野憲太郎、福本敦之、星裕介、中川清和、白木靖寛
    • Organizer
      第68回応用物理学会学術講演会
    • Place of Presentation
      北海道工業大学
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] Crystallization of Amorphous Silicon by Micro-wave Annealing2007

    • Author(s)
      S. Ashizawa, M. Mitsui, T. Horie, K. Arimoto, J. Yamanaka, K. Nakagawa, T. Arai, T. Takamatsu, K. Sawano, Y. Shiraki
    • Organizer
      54th Spring Meeting, Japan Society of Applied Physics
    • Place of Presentation
      Aoyama Gakuin University. Japan
    • Year and Date
      2007-03-30
    • Description
      「研究成果報告書概要(欧文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] Strained-Si nMOSFET formed on very thin SiGe buffer layer fabricated by ion implantation technique2007

    • Author(s)
      K. Sawano, A. Fukumoto, Y. Hoshi, K. Nakagawa, and Y. Shiraki
    • Organizer
      5th International Conference on Silicon Epitaxy and Heterostructures (ICSi-5)
    • Place of Presentation
      フランス、マルセイユ
    • Data Source
      KAKENHI-PROJECT-19760011
  • [Presentation] マイクロ波加熱による非晶質シリコンの結晶化2007

    • Author(s)
      芦澤里樹、三井実、堀江忠司、有元圭介、山中淳二、中川清和、荒井哲司、高松利行、澤野憲太郎、白木靖寛第
    • Organizer
      54回応用物理学関係連合講演会
    • Place of Presentation
      青山学院大学
    • Year and Date
      2007-03-30
    • Description
      「研究成果報告書概要(和文)」より
    • Data Source
      KAKENHI-PROJECT-18560007
  • [Presentation] Formation of Uniaxially Strained SiGe with High Ge Concentrations by Selective Ion Implantation

    • Author(s)
      Eisuke Yonekura, JunjiYamanaka, KeisukeArimoto, KiyokazuNakagawa, YasuhiroShirakiand KentarouSawano
    • Organizer
      7th International Silicon-Germanium Technology and Device Meeting, 2014 ISTDM
    • Place of Presentation
      Singapore
    • Year and Date
      2014-06-02 – 2014-06-04
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Anisotropic Strain Engineering in Si/Ge Heterostructures

    • Author(s)
      Kentarou Sawano
    • Organizer
      The Collaborative Conference on Crystal Growth (3CG 2014)
    • Place of Presentation
      Phuket, Thailand
    • Year and Date
      2014-11-04 – 2014-11-07
    • Invited
    • Data Source
      KAKENHI-PROJECT-25600079
  • [Presentation] 貼り合わせ法による高移動度歪みGOIの作製

    • Author(s)
      長嶋 智典,勝俣 洋典,浜屋 宏平,宮尾 正信,澤野 憲太郎
    • Organizer
      第75回応用物理学会秋季学術講演会
    • Place of Presentation
      北海道大学 (北海道札幌市)
    • Year and Date
      2014-09-17 – 2014-09-20
    • Data Source
      KAKENHI-PROJECT-25246020
  • [Presentation] Generation and detection of pure spin current in n-Ge using L21-ordered Co2FeSi electrodes

    • Author(s)
      K. Kasahara, Y. Fujita, S. Yamada, K. Sawano, M. Miyao, and K. Hamaya
    • Organizer
      IEEE International Magnetics Conference (Intermag 2014)
    • Place of Presentation
      Dresden (Germany)
    • Year and Date
      2014-05-04 – 2014-05-08
    • Data Source
      KAKENHI-PROJECT-25246020
  • [Presentation] Anisotropic Strain Engineering in Si/Ge Heterostructures

    • Author(s)
      K. Sawano
    • Organizer
      Collaborative Conference on Crystal Growth (3CG)
    • Place of Presentation
      Phuket (Thailand)
    • Year and Date
      2014-11-04 – 2014-11-07
    • Invited
    • Data Source
      KAKENHI-PROJECT-25246020
  • [Presentation] Anisotropic Strain Engineering in Si/Ge Heterostructures

    • Author(s)
      Kentarou Sawano
    • Organizer
      The Collaborative Conference on Crystal Growth (3CG 2014)
    • Place of Presentation
      Phuket, Thailand
    • Year and Date
      2014-11-04 – 2014-11-07
    • Invited
    • Data Source
      KAKENHI-PROJECT-26286044
  • [Presentation] Electrical properties of strained Ge(111)-on-Insulator (GOI) fabricated by Ge epitaxy on Si and layer transfer

    • Author(s)
      Tomonori Nagashima, Hironori Katsumata, Kohei Hamaya, Masanobu Miyao, Yasuhiro Shiraki, Kentarou Sawano
    • Organizer
      7th International Silicon-Germanium Technology and Device Meeting, 2014 ISTDM
    • Place of Presentation
      Singapore
    • Year and Date
      2014-06-02 – 2014-06-04
    • Data Source
      KAKENHI-PROJECT-25600079
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  • 46.  岡本 徹
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    # of Collaborated Products: 1 results

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