尾田 年充  ODA Toshiatsu

28th ICPIG (Prague, Chech Republic) (accepted)(proceedings)

ページ: 4-4

Proc. 6th Int. Conf. Reactive Plasmas and 23rd Sympo. Plasma Processing, Sendai, Japan, Jan. 24-27

ページ: 711-712

Plasma Devices and Operations Vol. 14, No. 1

ページ: 81-89

J. Appl. Phys. 99, 073302

ページ: 1-9

120000879698

Jpn. J. Appl. Phys. 44・11

ページ: 8118-8124

Jpn. J. Appl. Phys. Vol. 44, No. 11

ページ: 8118-8124

Jpn.J.Appl.Phys. 44・11

ページ: 8118-8124

4th Int.Symp.on Plasma Polarization Spectroscopy, Kyoto, Japan, NIFS PROC 57

ページ: 137-143

4th Int.Symp.on Plasma Polarization Spectroscopy, Kyoto, Japan NIFS PROC-57

ページ: 137-143

56th annual Gaseous Electronics Conference, San Francisco, CA, Oct.21-24 (2003), Bull.Amer.Phys.Soc 48-6

ページ: 46-46

56th annual Gaseous Electronics Conference, San Francisco, CA, Oct.21-24, Bull.Amer.Phys.Soc 48-6

ページ: 46-46

Proc.11th Int.Sympo.Laser-Aided Plasma, Les Houch, France Sept.29-Oct.2

Proc.11th Int.Sympo.Laser-Aided Plasma Diagnostics, Les Houch, France, Sept.29-Oct.2,2003