Hirayama Masaki 平山昌樹

… Alternative Names

Researcher Number	70250701
External Links
Affiliation (Current)	2022: 東北大学, 未来科学技術共同研究センター, 准教授
Affiliation (based on the past Project Information) *help	2010 – 2014: 東北大学, 未来科学技術共同研究センター, 准教授 2002 – 2005: 東北大学, 未来科学技術共同研究センター, 助教授 2002: 東北大学, 未来化学技術共同研究センター, 客員助教授 1998 – 2001: 東北大学, 大学院・工学研究科, 助手
Review Section/Research Field	Principal Investigator 電子デバイス・機器工学 / Electron device/Electronic equipment / Electronic materials/Electric materials / 複合化集積システム Except Principal Investigator Electronic materials/Electric materials / Science and Engineering / Engineering / 電子デバイス・機器工学
Keywords	Principal Investigator マイクロ波プラズマ / シリコン窒化膜 / プラズマ / マイクロ波 / 強誘電体 / ラジアルラインスロットアンテナ / microwave plasma / STNO / フェーズドアレイアンテナ / 誘電体アンテナ … More Except Principal Investigator LSI / SOI / プラズマプロセス / 気体分離配線 / 陽極化成 / CVD / BED / 1 / シリコン / MOSFET / 半導体製造プロセス / 半導体製造装置 / MOSトランジスタ / シリコン表面平坦化 / 面方位 / ラフネス / シリサイド / 3次元構造 / 金属基板SOI / ウルトラクリーンプロセス / Xeプラズマ / シリサイド反応 / 多孔質シリコン / エピタキシャル / gas isolated interconnect / metal gate / high-permittivity gate insulator / metal-substrate SOI / ベクトル量子化 / コードブック空間情報処理 / 画像圧縮 / 顔画像認識 / 実時間処理 / LSI設計 / 高速情報処理 / SS-CDMAフレキシブルワイヤレスネットワーク / システムオンチップ / 高精度トランジスタモデリング / 高精細静止画像圧縮 / フレキシブルワイヤレスネットワーク / 近似同期CDMA方式 / パケットSS-CDMA方式 / 顔認識 / 話者認識 / チャネル多重 / Vector Quantization / Codebook Spectrum / Image Compression / Face Recognition / Real-Time Processing / LSI Design / Ta メタルゲート / 相互コンダクタンス / FD-SOI MOSFET / 界面 / トラップ準位 / 低周波ノイズ / BPSG / 無水HF / 銅配線 / 金属基板 / Ta metal gate / gas-isolated-interconnects / mutual conductance / interface / trap level / low frequency noise / 小規模生産ライン / 段階投資 / マイクロ波プラズマ / ガス供給システム / バックポンプ / RLSA / シャワープレート / クラスターツール / 半導体生産 / エッチング / profitable mini-line / step-by-step investment / microwave plasma / plasma process / gas distribution system / back pump / Si(110)面 / Si_3N_4ゲート絶縁膜 / Balanced-CMOS集積回路 / fノイズ / 室温5工程洗浄 / システムLSI / チャネル移動度 / マイクロ波励起高密度プラズマ / Si(110) / CMOS / Si(110)surface / Si_3N_4 gate insulator / Balanced-CMOS / f noise / Room Temperature 5 step Cleaning / System LSI / Channel mobility / Microwave-excited high-density plasma Less

Research Projects
(10 results)
Co-Researchers
(8 People)

Study on fabrication process of 3-D structured MOS transistor having atomically flat gate insulator/Si interface
- Principal Investigator
  
  OHMI Tadahiro
- Project Period (FY)
  2010 – 2014
- Research Category
  
  Grant-in-Aid for Specially Promoted Research
- Review Section
  
  Science and Engineering
  Engineering
- Research Institution
  Tohoku University
仕事関数制御透明電極を用いたトップエミッション超高寿命高効率有機ELディスプレイPrincipal Investigator
- Principal Investigator
  
  平山昌樹
- Project Period (FY)
  2004 – 2005
- Research Category
  
  Grant-in-Aid for Young Scientists (A)
- Research Field
  
  Electron device/Electronic equipment
- Research Institution
  Tohoku University
フェーズドアレーアンテナと金属基板マイクロ波デバイスを用いた超低消費電力携帯端末Principal Investigator
- Principal Investigator
  
  平山昌樹
- Project Period (FY)
  2002 – 2003
- Research Category
  
  Grant-in-Aid for Young Scientists (A)
- Research Field
  
  電子デバイス・機器工学
- Research Institution
  Tohoku University
Ultra-High-Speed and High-Precision Integration Circuit Using Si(110) Surface Metal Substrate SOI Balanced-CMOS
- Principal Investigator
  
  OHMI Tadahiro
- Project Period (FY)
  2002 – 2003
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  電子デバイス・機器工学
- Research Institution
  TOHOKU UNIVERSITY
Ultra-High-Speed Real-Time Processing Circuit and Algorithm
- Principal Investigator
  
  OHMI Tadahiro
- Project Period (FY)
  2000 – 2002
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Review Section
  
  Science and Engineering
- Research Institution
  TOHOKU UNIVERSITY
Development of ultra-high-speed LSI with gas-isolated-interconnects and Ta metal gate transistors on SOI substrate
- Principal Investigator
  
  OHMI Tadahiro
- Project Period (FY)
  2000 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Tohoku University
Plasma process technology controlling dissociation of process gas for realizing step-by-step investment semiconductor manufacturing
- Principal Investigator
  
  OHMI Tadahiro
- Project Period (FY)
  2000 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Tohoku University
Study for low-temperature formation of high-quality STNO high-k films for non-volatile memoriesPrincipal Investigator
- Principal Investigator
  
  HIRAYAMA Masaki
- Project Period (FY)
  2000 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  複合化集積システム
- Research Institution
  Tohoku University
Metal-substrate SOI integrated circuits technologies for 10GHz clock operation
- Principal Investigator
  
  OHMI Tadahiro
- Project Period (FY)
  1998 – 1999
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  TOHOKU UNIVERSITY
Research of low-k/high-k dielectric films growth utilizing microwave exited plasmaPrincipal Investigator
- Principal Investigator
  
  HIRAYAMA Masaki
- Project Period (FY)
  1998 – 1999
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  TOHOKU UNIVERSITY

1. OHMI Tadahiro (20016463)

# of Collaborated Projects: 8 results

# of Collaborated Products: 0 results
2. KOTANI Koji (20250699)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
3. SUGAWA Shigetoshi (70321974)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
4. 伊野和英

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
5. GOTO Tetsuya (00359556)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. SUWA Tomoyuki (70431541)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
7. TSUBOUCHI Kazuo (30006283)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
8. MIURA Michiko (70291482)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

Hirayama Masaki 平山 昌樹

HIRAYAMA Masaki 平山 昌樹

Research Projects

Co-Researchers

Study on fabrication process of 3-D structured MOS transistor having atomically flat gate insulator/Si interface

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

仕事関数制御透明電極を用いたトップエミッション超高寿命高効率有機ELディスプレイPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

フェーズドアレーアンテナと金属基板マイクロ波デバイスを用いた超低消費電力携帯端末Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Ultra-High-Speed and High-Precision Integration Circuit Using Si(110) Surface Metal Substrate SOI Balanced-CMOS

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Ultra-High-Speed Real-Time Processing Circuit and Algorithm

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Development of ultra-high-speed LSI with gas-isolated-interconnects and Ta metal gate transistors on SOI substrate

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Plasma process technology controlling dissociation of process gas for realizing step-by-step investment semiconductor manufacturing

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Study for low-temperature formation of high-quality STNO high-k films for non-volatile memoriesPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Metal-substrate SOI integrated circuits technologies for 10GHz clock operation

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Research of low-k/high-k dielectric films growth utilizing microwave exited plasmaPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Hirayama Masaki 平山昌樹

HIRAYAMA Masaki 平山昌樹