Kurokawa Syuhei 黒河周平

… Alternative Names

KUROKAWA Syuhei 黒河周平

KUROKAWA Shuhei 黒河周平

Less

Researcher Number	90243899
Other IDs
External Links
Affiliation (Current)	2025: 九州大学, 工学研究院, 教授
Affiliation (based on the past Project Information) *help	2016 – 2021: 九州大学, 工学研究院, 教授 2015: 九州大学, 大学院工学研究院, 教授 2012 – 2015: 九州大学, 工学(系)研究科(研究院), 教授 2008 – 2010: 九州大学, 大学院・工学研究院, 准教授 2003 – 2005: 九州大学, 大学院・工学研究院, 助教授 … More 2000: KYUSHU UNIVERSITY, Faculty of Engineering, Ass. Prof., 大学院・工学研究院, 助教授 1999: 九州大学, 大学院・工学研究科, 助教授 1998: 九大, 工学部, 助教授 1997 – 1998: 九州大学, 工学部, 助教授 1994 – 1995: Kyushu Univ.Faculty of Eng.Associate Professor, 工学部, 助教授 1994: 宮崎大学, 工学部, 助教授 1993: 九州大学, 工学部, 講師 Less
Review Section/Research Field	Principal Investigator 設計工学・機械要素・トライボロジー / Design engineering/Machine functional elements/Tribology Except Principal Investigator 設計工学・機械要素・トライボロジー / Production engineering/Processing studies / Basic Section 18020:Manufacturing and production engineering-related / Mechanics of materials, Production engineering, Design engineering, and related fields
Keywords	Principal Investigator 測定 / 伝達誤差 / かみあい / 歯車 / はすば歯車 / Axial runout / Non-destructive measurement / Tooth flank topography / Transmission error / Engagement … More / Eccentricity / Small module / Gear / 最小自乗法 / 端面振れ / 非破壊測定 / 歯面トポグラフィ / かみ合い / 偏心 / 微小モジュール / 精度 / たわみ / 負荷 / 3次元歯面 / シミュレーション / 画像処理 / 歯面形状誤差 / かみあい伝達誤差 / CCDカメラ / 自動歯車測定 … More Except Principal Investigator Gear / 歯車 / 粒径計測 / 回転拡散係数 / 並進拡散係数 / ブラウン運動 / ナノ粒子 / Hobbing / Cutting / ホブ切り / CBN / 切削 / 難加工材料 / 加工レート / CMP / アトグラム質点系 / 粒度分布測定 / 粒径測定 / DLS / 蛍光ナノプローブ / ナノ粒子チップ / 粘性係数 / 粒度分布 / 蛍光光子相関法 / CMPスラリー / 粒度分布計測 / 並進ブラウン運動 / 回転ブラウン運動 / ダブルパルス / 透明材料 / ダブルパルスビーム / アブレーション / 光励起 / 透明基板 / フェムト秒レーザー / 精密研磨 / 蛍光偏光法 / ナノ粒子粒径計測 / 蛍光色素 / 拡散係数 / 粘度 / 蛍光プローブ / 回転拡散 / 並進拡散 / Mechanism of chip formation / Transient phenomenon of cutting / High speed camera / 画像処理 / 高速度ビデオカメラ / 切りくず / 切りくず生成機構 / 切削過渡現象 / 高速度カメラ / Elastic deformation / Rotary encoder / Measurement system / Simulation / Tooth flank configuration error / High precision measurement / Transmission error / 高精度運動伝達 / 心出し / 負荷 / かみあい精度 / 弾性変形 / ロータリエンコーダ / シミュレーション / 測定システム / 歯面形状誤差 / 高精度測定 / かみあい制度 / Tooth Surface Roughness / Load-Carrying Capacity / Accurate Gear / Cermet / サーメット / 歯面粗さ / 負荷能力 / 高精度歯車 / サ-メット / 超押し込み試験 / SiC, GaN, ダイヤモンド / PCVM / TEM / 超押し込み実験 / SiC, GaN, ﾀﾞｲﾔﾓﾝﾄﾞ / フェムト秒(Fs)レーザ / 融合加工装置 / 超難加工結晶 / 疑似ラジカル / 超難加工材料 / 疑似ラジカル場 / P-CVM / フェムト秒レーザ / 表面粗さ / 加工効率 / プラズマ融合CMP / 高圧酸素雰囲気 / 電解CMP / 雰囲気制御加工 / 多枚数同時加工 / 両面同時加工 / 光触媒反応の援用 / 高圧ガス雰囲気と減圧雰囲気 / ベルジャー密閉型 / SiC / Si / 光触媒反応 / 密閉雰囲気 / 密閉型加工 Less

Nano particle sizing method based on Brownian motion analysis for the system of atto gram particles
- Principal Investigator
  
  Hayashi Terutake
- Project Period (FY)
  2019 – 2021
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  Kyushu University
Laser processing for transparent substrate using double pulse femto second laser beam with photo excitation
- Principal Investigator
  
  Terutake Hayashi
- Project Period (FY)
  2017 – 2018
- Research Category
  
  Grant-in-Aid for Challenging Research (Exploratory)
- Research Field
  
  Mechanics of materials, Production engineering, Design engineering, and related fields
- Research Institution
  Kyushu University
Nano particle sizing method based on the Brownian motion analysis using fluorescent nano probe
- Principal Investigator
  
  Terutake Hayashi
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu University
Breakthrough in the ultra-precison polishing process of diamond substrates as an ulimate device
- Principal Investigator
  
  DOI Toshiro
- Project Period (FY)
  2012 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (S)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu University
Development of a new Chemical Mechanical Polishing (CMP) machine, assisted by the photocatalytic reactions and electrolytic actions in the atmosphere controlled sealed CMP chamber
- Principal Investigator
  
  DOI Toshiro
- Project Period (FY)
  2008 – 2010
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Kyushu University
Transmission error analysis of small module gears with eccentricityPrincipal Investigator
- Principal Investigator
  
  KUROKAWA Syuhei
- Project Period (FY)
  2003 – 2005
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Design engineering/Machine functional elements/Tribology
- Research Institution
  KYUSHU UNIVERSITY
Transient Phenomenon of Chip Generations and movements in hobbing
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1998 – 2000
- Research Category
  
  Grant-in-Aid for Scientific Research (B).
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  KYUSHU UNIVERSITY
はすば歯車の負荷によるたわみ絶対値測定と負荷時かみあい伝達誤差解析Principal Investigator
- Principal Investigator
  
  黒河周平
- Project Period (FY)
  1997 – 1998
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  Kyushu University
はすば歯車の3次元歯面形状誤差測定とかみあい誤差解析による回転伝達状態の把握Principal Investigator
- Principal Investigator
  
  黒河周平
- Project Period (FY)
  1995
- Research Category
  
  Grant-in-Aid for Encouragement of Young Scientists (A)
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  Kyushu University
Development on High Precision Measurement and Simulations of Gear Transmissions under Load
- Principal Investigator
  
  ARIURA Yasutsune
- Project Period (FY)
  1994 – 1995
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research (B)
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  KYUSHU UNIVERSITY
High Efficiency Finish Hobbing of High Accurate Gears with cermet or CBN Hobs
- Principal Investigator
  
  ARIURA Yasutune
- Project Period (FY)
  1993 – 1994
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  設計工学・機械要素・トライボロジー
- Research Institution
  KYUSHU UNIVERSITY

[Book] New Diamond Vol.322016
- Author(s)
  會田英雄、土肥俊郎、佐野泰久、黒河周平、大山幸希、金聖祐
- Total Pages
  2
- Publisher
  (社）ニューダイヤモンドフォーラム
- Data Source
  KAKENHI-PROJECT-24226005
[Book] 超精密研磨/CMP技術とその最新動向(その-最新のCMP技術とトライボケミカル応用-第55巻第11号2010
- Author(s)
  土肥俊郎, 黒河周平, 大西修, 山崎努
- Publisher
  トライボロジスト
- Data Source
  KAKENHI-PROJECT-20246033
[Book] 超精密研磨/CMP技術とその最新動向(その1)-研磨の発展経緯と加工原理-第55巻第11号2010
- Author(s)
  土肥俊郎, 黒河周平, 大西修, 山崎努
- Publisher
  トライボロジスト
- Data Source
  KAKENHI-PROJECT-20246033
[Book] 超精密研磨/CMP技術とその最新動向(その2)-最新のCMP技術とトライボケミカル応用-2010
- Author(s)
  土肥俊郎, 黒河周平, 大西修, 山崎努
- Total Pages
  72
- Publisher
  日本トライボロジー学会
- Data Source
  KAKENHI-PROJECT-20246033
[Book] ものづくりのイノベーションとそのサステナビリティを目指して第75巻,第6号2009
- Author(s)
  土肥俊郎, 黒河周平, 梅崎洋二
- Publisher
  精密工学会誌
- Data Source
  KAKENHI-PROJECT-20246033
[Book] 平坦化CMP装置,電子材料(12月号別冊超LSI製造・試験装置ガイドブック)2008
- Author(s)
  土肥俊郎, 黒河周平
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Measurement of molar concentration spectra for nanoparticle with multi-modal nanoparticle size distribution using nanoparticle chip2022
- Author(s)
  Jaqing Zhu, Terutake Hayashi, Syuhei Kurokawa
- Journal Title
  
  Precision Engineering
  
  Volume: 74 Pages: 460-468
- DOI
  10.1016/j.precisioneng.2021.08.008
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02043
[Journal Article] Nanoparticle sizing for poly-dispersed particles using Nanoparticle chip2020
- Author(s)
  朱家慶, 林照剛, 黒河周平
- Journal Title
  
  Transactions of the JSME (in Japanese)
  
  Volume: 86 Issue: 892 Pages: 20-00220-20-00220
- DOI
  10.1299/transjsme.20-00220
- NAID
  130007961493
- ISSN
  2187-9761
- Language
  Japanese
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02043
[Journal Article] Measurement of number based particle sizing distribution using nanoparticle micro array2019
- Author(s)
  Jiaqing Zhu, Terutake Hayashi, Syuhei Kurokawa
- Journal Title
  
  Proceedings of 14th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII 2019)
  
  Volume: 1
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19H02043
[Journal Article] A novel Particle Sizing method for Nano-abrasives in CMP Slurry by Using Fluorescent Nano Probe2017
- Author(s)
  Terutake Hayashi, Toshiki Seri, and Syuhei Kurokawa
- Journal Title
  
  International Journal of Automation Technology
  
  Volume: -
- NAID
  130007505952
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-16H04249
[Journal Article] Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface2015
- Author(s)
  asuhisa Sano, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Osamu Ohnishi, Michio Uneda, Yuu Okada, Hiroaki Nishikawa and Kazuto Yamauchi
- Journal Title
  
  Key Engineering Materials
  
  Volume: 625 Pages: 550-553
- Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] Consideration of Femtosecond Laser-induced Effect on Semiconductor Material SiC Substrate for CMP Processing2015
- Author(s)
  hengwu WANG, Syuhei KUROKAWA, Toshiro DOI, Yasuhisa SANO, Hideo AIDA, Osamu OHNISHI, Michio UNEDA, Koki OYAMA, Terutake HAYASHI, Ji ZHANG, Asakawa EIJI
- Journal Title
  
  Applied Mechanics and Materials
  
  Volume: 799-800 Pages: 458-462
- Peer Reviewed / Acknowledgement Compliant / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] Dependence of GaN Removal Rate of Plasma Chemical Vaporization Machining on Mechanically Introduced Damage2014
- Author(s)
  Y.Sano, T.K.Doi, S.Kurokawa, H.Aida, O.Ohnishi, M.Uneda, K.Shiozawa, Y.Okada, K.Yamauchi
- Journal Title
  
  Sensors and Materials
  
  Volume: 26 Pages: 429-434
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] Approach to High Efficient CMP For Power Device Substrates2014
- Author(s)
  Syuhei KUROKAWA, Toshiro DOI, Chengwu W.WANG, Yasuhisa SANO, Hideo AIDA, Koki OYAMA, Kunimitsu TAKAHASHI
- Journal Title
  
  ECS Transactions
  
  Volume: 60 Pages: 641-646
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] Novel Chemical Mechanical Polishing/Plasma-Chemical Vaporization Machining [CMP/P-CVM] Combined Processing of Hard-to-Process Crystals Based on Innovative Concepts2014
- Author(s)
  T. K. Doi, Y. Sano, S. Kurokawa, Hideo Aida, Osamu Ohnishi, Michio Uneda, Koki Ohyama
- Journal Title
  
  Sensors & Materials
  
  Volume: 未定
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface2014
- Author(s)
  Yasuhisa Sano, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Osamu Ohnishi, Michio Uneda, Yuu Okada, Hiroaki Nishikawa, Kazuto Yamauchi
- Journal Title
  
  Key Engineering Materials
  
  Volume: 625 Pages: 550-553
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] The Effects of Strong Oxidizing Slurry and Processing Atmosphere on Double-sided CMP of SiC Wafer2012
- Author(s)
  Tao YIN, Toshiro DOI, Syuhei KUROKAWA, Osamu OHNISHI, Tsutomu YAMAZAKI, Zhida WANG, and Zhe TAN
- Journal Title
  
  Advanced Materials Research
  
  Volume: Vols.591-593 Pages: 1131-1134
- DOI
  10.4028/www.scientific.net/amr.591-593.1131
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-24226005
[Journal Article] Basic Characteristics of a Simultaneous Double-side CMP Machine, Housed in a Sealed,Pressure-Resistance Container2010
- Author(s)
  K.Kitamura, T.Doi, S.Kurokawa, Y.Umezaki, Y.Matsukawa, Y.Ooki, T.Hasegawa, I.Koshiyama, K.Ichikawa, Y.Nakamura
- Journal Title
  
  Key Engineering Materials Vols.447-448
  
  Pages: 61-65
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Polishing/CMP for Glass Substrates in a Radical Polishing Environment, Using Manganese Oxide Slurry as an Alternative for Ceria Slurry2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, O.Ohnishi,Y.Akagami, Y.Yamaguchi, S.Kishii
- Journal Title
  
  Advances in Science and Technology Vol.64
  
  Pages: 65-70
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Study on the Development of Resource-Saving High Performance Slurry -Polishing/CMP for glass substrates in a radical polishing environment, using manganese oxide slurry as an alternative for ceria slurry-2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, et al.
- Journal Title
  
  Advances in Science and Technology
  
  Volume: 64 Pages: 65-70
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] CMP of SiC Wafers as a Post-Si Power-Device-Photocatalitic reaction assisted Bell-Jar shaped CMP machine under high pressure oxygen gas-2008
- Author(s)
  土肥俊郎, 黒河周平
- Journal Title
  
  Proceeding of The 5^<th> International Conference on Planarization/CMP Technology (ICPT 2008) 1
  
  Pages: 2-2
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20246033
[Journal Article] Tooth flank topography measurement of small module gear (in Japanese)2006
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of the JSME Kyushu Branch Spring Annual Meeting No.059-1
  
  Pages: 191-192
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 微小モジュール歯車の歯面トポグラフィ計測2006
- Author(s)
  黒河周平, 他2名
- Journal Title
  
  日本機械学会九州支部第59期総会講演会論文集 1
  
  Pages: 191-192
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 微小モジュール歯車の歯面トポグラフィ計測2006
- Author(s)
  黒河周平, 他2名
- Journal Title
  
  日本機械学会九州支部第59期総会講演会論文集 059-1
  
  Pages: 191-192
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Influence of Gear Eccentricity on the Characteristics of Noise Spectrum (in Japanese)2005
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of the JSME Mechanical Engineering Congress, 2005 Japan (MECJ-05) No.05-1, Vol.4
  
  Pages: 185-186
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] かみあい伝達誤差曲線を利用した歯車の偏心量・偏心位相の同定2005
- Author(s)
  黒河周平, 他1名
- Journal Title
  
  日本機械学会九州支部第58期総会講演会論文集 058-1
  
  Pages: 215-216
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Evaluation of transmission error with gear eccentricity by measurement and approximate formula2005
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc. of the 1^<st> Int. Conf. Manufacturing, Machine Design and Tribology ICMDT2005 Vol.1
  
  Pages: 1-4
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Evaluation of transmission error with gear eccentricity by measurement and approximate formula2005
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc.of the 1^<st> Int.Conf.on Manufacturing, Machine Design and Tribology ICMDT2005 1
  
  Pages: 1-4
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 歯車偏心が騒音スペクトルにおよぼす影響2005
- Author(s)
  黒河周平, 他1名
- Journal Title
  
  日本機械学会2005年度年次大会講演論文集 4
  
  Pages: 185-186
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 歯車偏心が騒音スペクトルにおよぼす影響2005
- Author(s)
  黒河周平, 他1名
- Journal Title
  
  日本機械学会2005年度年次大会講演論文集 05-1-4
  
  Pages: 185-186
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Identification of the Parameters of Gear Eccentricity from Transmission Error Curve without Measurement of Gear Eccentricity (in Japanese)2005
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc. of the JSME Kyushu Branch Spring Annual Meeting No.058-1
  
  Pages: 215-216
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Evaluation of Transmission Error with Gear Eccentricity by Measurement and Approximate Formula2005
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of the 1^<st> International Conference on Manufacturing, Machine Design and Tribology ICMDT2005
  
  Pages: 1-4
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] かみあい伝達誤差曲線を利用した歯車の偏心量・偏心位相の同定2005
- Author(s)
  黒河周平他1名
- Journal Title
  
  日本機械学会九州支部第58期総会講演会論文集 1
  
  Pages: 215-216
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Evaluation of gear accuracy by transmission error measurement with nanometer resolution2004
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc. of Int. Symp. on Precision Mechanical Measurement ISPMM'2004 Vol.1
  
  Pages: 21-26
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Evaluation of Gear Accuracy by Transmission Error Measurement with Nanometer Resolution2004
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of International Symposium on Precision Mechanical Measurements ISPMM'2004
  
  Pages: 21-26
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Derivation of an Approximate Formula of Gear Transmission Error with Radial Eccentricity (in Japanese)2004
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of the JSME Mechanical Engineering Congress, 2004 Japan (MECJ-04) No.04-1, Vol.4
  
  Pages: 161-162
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 半径方向偏心を伴う歯車かみあい伝達誤差の近似解の導出2004
- Author(s)
  黒河周平, 他1名
- Journal Title
  
  日本機械学会2004年度年次大会講演論文集 04-1-4
  
  Pages: 161-162
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 半径方向偏心を伴う歯車かみあい伝達誤差の近似解の導出2004
- Author(s)
  黒河周平他1名
- Journal Title
  
  日本機械学会2004年度年次大会講演論文集 4
  
  Pages: 161-162
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Development of Single Flank Gear Testing Machine and the Influence of Measurement Resolution on Observation of Spur and Helical Gear Engagement under Load2004
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc.of Int.Symp.on Technology of Machinery Systems Design 2004 1
  
  Pages: 32-37
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Evaluation of gear accuracy by transmission error measurement with nanometer resolution2004
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc.of Int.Symp. on Precision Mechanical Measurement ISPMM'2004 1
  
  Pages: 21-27
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Development of Single Flank Gear Testing Machine and the Influence of Measurement Resolution on Observation of Spur and Helical Gear Engagement under Load2004
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc. of Int. Symp. on Technology of Machinery Systems Design 2004 Vol.1
  
  Pages: 32-37
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Development of Single Flank Gear Testing Machine and the Influence of Measurement Resolution on Observation of Spur and Helical Gear Engagement under Load2004
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of the International Symposium on Technology of Machinery Systems Design 2004
  
  Pages: 32-37
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] High Precision Measurement of Transmission Errors of Cylindrical Gears with Radial Eccentricity2003
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of International Conference on Power Transmission'03 Vol.2
  
  Pages: 3-7
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] High Precision Measurement of Transmission Errors of Cylindrical Gears with Radial Eccentricity2003
- Author(s)
  Syuhei KUROKAWA, et al.
- Journal Title
  
  Proc. Of Int. Conf. Power Transmissions'03 Vol.2
  
  Pages: 3-7
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] Transmission Error Measurement of a Cylindrical Gear Pair with Different Eccentricities (in Japanese)2003
- Author(s)
  S.KUROKAWA et al.
- Journal Title
  
  Proc.of the JSME Mechanical Engineering Congress, 2003 Japan (MECJ-03) No.03-1, Vol.IV
  
  Pages: 43-44
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Journal Article] 異なる偏心量に対する円筒歯車のかみあい伝達誤差測定2003
- Author(s)
  黒河周平, 他2名
- Journal Title
  
  日本機械学会2003年度年次大会講演論文集 03-1-IV
  
  Pages: 43-44
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560118
[Patent] 粒子分析用の基板、粒子分析システム、及び粒子の分析方法2019
- Inventor(s)
  林　照剛，黒河周平
- Industrial Property Rights Holder
  九州大学
- Industrial Property Rights Type
  特許
- Patent Publication Number
  2020-052043
- Filing Date
  2019
- Data Source
  KAKENHI-PROJECT-19H02043
[Patent] 「プラズマ融合CMP」「plasma fusion CMP」2016
- Inventor(s)
  土肥俊郎、佐野泰久、黒河周平、不二越機械工業、並木精密宝石
- Industrial Property Rights Holder
  土肥俊郎、佐野泰久、黒河周平、不二越機械工業、並木精密宝石
- Industrial Property Rights Type
  実用新案
- Filing Date
  2016-03-01
- Data Source
  KAKENHI-PROJECT-24226005
[Patent] 加工方法及び該方法を用いる複合加工装置並びに該方法または該装置により加工された加工物2014
- Inventor(s)
  佐野, 土肥, 黒河、會田, 大山, 宮下
- Industrial Property Rights Holder
  佐野, 土肥, 黒河、會田, 大山, 宮下
- Industrial Property Rights Type
  特許
- Filing Date
  2014-02-25
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] ナノ粒子チップを用いた多分散粒子の粒度分布計測に関する研究（第三報） ―AFMを用いた高さ相当径の評価2022
- Author(s)
  朱家慶，林照剛，黒河周平
- Organizer
  2022年度精密工学会春期全国大会
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H02043
[Presentation] Nanoparticle sizing for CMP slurry using nanoparticle chip2021
- Author(s)
  Jiaqing ZHU, Terutake HAYASHI and Syuhei KUROKAWA
- Organizer
  The 10th International Conference on Leading Edge Manufacturing in 21st Center(LEM21)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H02043
[Presentation] Measurement of molar concentration spectrum based on number-weighted particle size distribution for poly-dispersed particles using nanoparticle chip2021
- Author(s)
  Jiaqing Zhu, Terutake Hayashi, Syuhei Kurokawa
- Organizer
  XXIII IMEKO World Congress August 30-September 3,　2021, Yokohama, Japan
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H02043
[Presentation] Measurement of molar concentration spectrum for nanoparticle with multi-modal nanoparticle size distribution using nanoparticle chip2020
- Author(s)
  Jiaqing ZHU, Terutake HAYASHI and Syuhei KUROKAWA
- Organizer
  The 18th International Conference on Precision Engineering (ICPE2020 in Kobe)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-19H02043
[Presentation] 蛍光プローブを用いたナノ粒子粒径計測に関する研究～第5報蛍光色素を標識したナノ粒子の並進拡散時間評価～2019
- Author(s)
  草場博喜，林照剛，黒河周平，赤星圭将
- Organizer
  2019年度精密工学会春期全国大会
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] 蛍光プローブを用いた高精度ナノ粒子径計測に関する研究2019
- Author(s)
  赤星圭将，林照剛，黒河周平，草場博喜
- Organizer
  日本機械学会九州支部第72期総会・講演会
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] フェムト秒レーザを用いた薄膜付き透明材料の光励起加工に関する研究2019
- Author(s)
  廣津佑紀，林照剛，黒河周平，水町遼祐
- Organizer
  日本機械学会九州支部第72期総会・講演会
- Data Source
  KAKENHI-PROJECT-17K18831
[Presentation] A novel nano particle characterizing method using nano particle micro array2018
- Author(s)
  Terutake Hayashi, Syuhei KUROKAWA　and Zhu Jiaqing
- Organizer
  17th International Conference on Precision Engineering (ICPE2018)
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] フェムト秒レーザによる膜付き絶縁体に対する光励起加工に関する研究2018
- Author(s)
  廣津佑紀，林照剛，黒河周平，水町遼祐，松川洋二
- Organizer
  2018年度精密工学会九州支部講演会
- Data Source
  KAKENHI-PROJECT-17K18831
[Presentation] ナノ粒子粒径計測時におけるブラウン運動2018
- Author(s)
  赤星圭将，林照剛，黒河周平，草場博喜
- Organizer
  2018年度精密工学会九州支部講演会
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] フェムト秒レーザを用いたダブルパルスビームによる励起状態面の表面加工に関する研究（第九報） ―加工変質層の元素組成評価―2018
- Author(s)
  松永啓伍，林照剛，黒河周平，廣津佑紀，松川洋二，長谷川登，錦野将元
- Organizer
  2018年度精密工学会春期全国大会
- Data Source
  KAKENHI-PROJECT-17K18831
[Presentation] CMP スラリー中のナノ粒子粒径評価に関する研究2018
- Author(s)
  林照剛，黒河周平，草場博喜，赤星圭介，松川洋二
- Organizer
  2018年度機械学会年次大会
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] 蛍光プローブを用いたナノ粒子粒径計測に関する研究～第3報蛍光プローブの並進拡散係数の評価～2018
- Author(s)
  草場博喜，林照剛，黒河周平
- Organizer
  2018年度精密工学会九州支部講演会
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] 蛍光ナノプローブを用いたブラウン運動解析に基づくナノ粒子粒径計測（第3報）2017
- Author(s)
  林照剛，世利俊樹，黒河周平，松川洋二
- Organizer
  2017年度精密工学会春季大会
- Place of Presentation
  慶應義塾大学矢上キャンパス
- Year and Date
  2017-03-13
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] ナノ粒子粒径評価のためのブラウン運動解析に基づく粘性計測2017
- Author(s)
  世利俊樹，林照剛，黒河周平，松川洋二
- Organizer
  2017年度精密工学会春季大会
- Place of Presentation
  慶應義塾大学矢上キャンパス
- Year and Date
  2017-03-13
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作（第11報）－B-Type装置によるGaN基板加工特性とその加工メカニズム-2016
- Author(s)
  大山幸希、土肥俊郎、西澤秀明、會田英雄、佐野泰久、黒河周平山崎直
- Organizer
  2016年度精密工学会春季大会学術講演会
- Place of Presentation
  東京理科大学野田キャンパス
- Year and Date
  2016-03-15
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作（第10報）－基本型装置（A型）によるダイヤモンドの加工－2016
- Author(s)
  佐野泰久, 土肥俊郎, 黒河周平, 會田英雄, 大山幸希, 宮下忠一, 住澤春男, 宮崎俊亘, 山内和人
- Organizer
  2016年度精密工学会春季大会学術講演会
- Place of Presentation
  東京理科大学野田キャンパス
- Year and Date
  2016-03-15
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的プラズマ融合CMP技術の提案とDiamond基板の加工2016
- Author(s)
  西澤秀明、土肥俊郎、會田英雄、黒河周平、佐野泰久
- Organizer
  第31回精密加工ﾌﾟﾛｾｽ研究会
- Place of Presentation
  リファレンス駅東ビル（福岡）
- Year and Date
  2016-02-25
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Particle Size Distribution Analysis for Nano-abrasives in CMP Slurry by Using Fluorescent Nano Probe2016
- Author(s)
  Terutake Hayashi, Toshiki Seri, and Syuhei Kurokawa
- Organizer
  International Conference on Planarization/ CMP Technology
- Place of Presentation
  Beijing,China
- Year and Date
  2016-10-17
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作（第12報）－B-Type装置によるダイヤモンド基板とその加工メカニズム-2016
- Author(s)
  西澤秀明、土肥俊郎、大山幸希、會田英雄、佐野泰久、黒河周平、金聖祐
- Organizer
  2016年度精密工学会春季大会学術講演会
- Place of Presentation
  東京理科大学野田キャンパス
- Year and Date
  2016-03-15
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 先端的難加工基板の高能率精密加工法の研究（第6報）-ｆｓレーザ照射による疑似ラジカルば形成基板表面のCMP研磨特性-2016
- Author(s)
  黒河周平、王成武、土肥俊郎、佐野泰久、會田英雄、大山幸希
- Organizer
  2016年度精密工学会春季大会学術講演会
- Place of Presentation
  東京理科大学野田キャンパス
- Year and Date
  2016-03-15
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 蛍光ナノプローブを用いたブラウン運動解析に基づくナノ粒子粒径計測（第2報） -光子相関法による並進拡散係数計測-2016
- Author(s)
  林　照剛, 世利俊樹，黒河周平，松川洋二
- Organizer
  2016年度精密工学会秋期大会
- Place of Presentation
  茨城大学水戸キャンパス
- Year and Date
  2016-09-06
- Data Source
  KAKENHI-PROJECT-16H04249
[Presentation] High-efficiency planarization method for hard-to-machine semiconductor substrates combining mechanical polishing and atmospheric-pressure plasma etching2015
- Author(s)
  Yasuhisa Sano, Kousuke Shiozawa, Toshiro Doi, Syuhei Kurokawa, Hideo Aida, Tadakazu Miyashita, and Kazuto Yamauchi
- Organizer
  2015 JSME-IIP/ASME-ISPS Joint Conference on Micromechatronics for Information and Precision Equipment
- Place of Presentation
  神戸国際会議場
- Year and Date
  2015-06-14
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的 “Plasma fusion CMP装置”の設計・試作(第9報) －ダイヤモンド単結晶基板の加工特性－2015
- Author(s)
  西澤秀明，大山幸希，土肥俊郎，曾田英雄，金　聖祐，佐野泰久，黒河周平，王　成武
- Organizer
  2015年度精密工学会秋季大会学術講演会
- Place of Presentation
  東北大学川内北キャンパス
- Year and Date
  2015-09-04
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作（第8報） -基本型装置（A型）によるダイヤモンド加工の基礎検討-2015
- Author(s)
  佐野泰久，塩澤昂祐，土肥俊郎，黒河周平，會田英雄，大山幸希，宮下忠一，山内和人
- Organizer
  2015年度精密工学会秋季大会学術講演会
- Place of Presentation
  東北大学川内北キャンパス
- Year and Date
  2015-09-04
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Damage-induced increase of removal rate of atmospheric-pressure plasma etching of diamond substrate2015
- Author(s)
  Y.Sano, K. Shiozawa, T. Doi, S. Kurokawa, H. Aida, K. Oyama, T. Miyashita, H. Sumizawa, K. Yamauchi
- Organizer
  The 9th International Conference on New Diamonds and Nano Carbons 2015
- Place of Presentation
  静岡県コンベンションアーツセンター
- Year and Date
  2015-05-24
- Invited / Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Optimization of Machining Conditions of Basic-Type CMP/P-CVM Fusion Processing Using SiC Substrate2015
- Author(s)
  Yasuhisa Sano, Kousuke Shiozawa, Toshiro Doi, Syuhei kurokawa, Hideo Aida, Koki Oyama, Tadakazu Miyashita, Haruo Sumizawa, Kazuto Yamauchi
- Organizer
  2015 International Conference on Planarization/CMP Technology (ICPT2015)
- Place of Presentation
  アリゾナ（米国）
- Year and Date
  2015-09-30
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Polishing properties of SiC wafer due to the different processing　atmosphere2015
- Author(s)
  張吉，黒河周平，林照剛，王成武，浅川英志
- Organizer
  日本機械学会九州支部第68期総会講演会
- Place of Presentation
  福岡大学（福岡県福岡市）
- Year and Date
  2015-03-13
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Consideration of Femtosecond laser-induced Effect on Semiconductor Material SiC Substrate for CMP Processing2015
- Author(s)
  Syuhei Kurokawa, Toshiro Doi, Yasuhisa Sano, Hideo Aida, Osamu Ohnishi, Michio Uneda, Koki Ohyama, Terutake Hayashi, Ji Zhang, Asakawa Eiji
- Organizer
  2015 ASR Bali Conferences(ICMMT2015/ICRE2015/ICLB2015)
- Place of Presentation
  Bali, Indonesia
- Year and Date
  2015-05-09
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Development of the innovative CMP/P-CVM combined apparatus (basic type)2014
- Author(s)
  K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, T. Miyashita, H. Sumizawa and K. Yamauchi
- Organizer
  International Conference on Planarization/CMP Technology 2014 (ICPT2014)
- Place of Presentation
  神戸国際会議場（兵庫）
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 加工雰囲気の違いによるSiC ウエハの研磨特性2014
- Author(s)
  張吉，黒河周平，林照剛，王成武，浅川英志
- Organizer
  2014年度精密工学会九州支部鹿児島地方講演会
- Place of Presentation
  鹿児島大学（鹿児島県）
- Year and Date
  2014-12-06
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Fabrication of Gallium Nitride Substrate with Novel Approaches –Internally Focused Laser Processing for Crystal Growth and Advanced CMP for Wafering–2014
- Author(s)
  H. AIDA, T. DOI, H. TAKEDA, K. KOYAMA, S. KUROKAWA, Y. SANO
- Organizer
  EMN Spring 2014
- Place of Presentation
  Hotel. red rock(米国・ラスベガス）
- Invited
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作（第1報）―装置化の基本のコンセプトと試作装置―2014
- Author(s)
  土肥俊郎、佐野泰久、黒河周平、曾田英雄
- Organizer
  2014年度精密工学会春季大会学術講演会
- Place of Presentation
  東京大学
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作－基本型融合加工装置(A-type)とその基本特性－2014
- Author(s)
  塩澤昂祐, 佐野泰久, 土肥俊郎, 黒河周平, 會田英雄, 宮下忠一, 住澤春男, 山内和人
- Organizer
  2014年度精密工学会春季大会学術講演会
- Place of Presentation
  東京大学
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Removal Rate of Plasma Chemical Vaporization Machining of Intentionally Damaged Surface by Mechanical Action2014
- Author(s)
  K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, O.Ohnishi, M. Uneda, Y. Okada, and K. Yamauchi
- Organizer
  15th International Conference on Precision Engineering (ICPE2014)
- Place of Presentation
  石川県政記念しいのき迎賓館（石川）
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Basic Study on Etching Selectivity of Plasma Chemical Vaporization Machining by Introducing Crystallographic Damage into Work Surface2014
- Author(s)
  Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, Y. Okada, H. Nishikawa, and K. Yamauchi
- Organizer
  5th International Conference of Asian Society for Precision Engineering and Nanotechnology (ASPEN2013)
- Place of Presentation
  Howard Civil International Centre(台湾）
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的CMP／P-CVM 融合加工法の提案とその加工特性－ワイドギャップ結晶材料の高効率加工へのブレークスルー－2014
- Author(s)
  大山幸希, 土肥俊郎, 佐野泰久, 會田英雄,黒河周平, 金聖祐, 宮下忠一
- Organizer
  日本機械学会2014 年度年次大会
- Place of Presentation
  東京電機大学（東京都）
- Year and Date
  2014-09-10
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Diamond Substrate Planarization Polishing Technique2013
- Author(s)
  K. OYAMA, T. DOI, H. AIDA, S. KUROKAWA, Y.SANO, H. TAKEDA, K. KOYAMA, T. YAMAZAKI, and K. TAKAHASHI
- Organizer
  International Conference on Planarization/CMP Technology
- Place of Presentation
  Ambassador Hotel (台湾）
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Advanced high efficient precision processing method based on the III-N semiconductor processing-A proposal of a process with new concepts for hard-to-process crystal wafers2013
- Author(s)
  T. Doi, Y. Sano, S. Kurokawa, H. Aida
- Organizer
  WUPP for III-Nitride 2013
- Place of Presentation
  The BEST WESTERN PLUS(米国）
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 先端的難加工基板の高効率精密加工法の研究（第4報）－加工変質層の断面TEM による評価とそのPCVM加工特性－2013
- Author(s)
  塩澤昂祐, 佐野泰久, 土肥俊郎, 黒河周平, 會田英雄, 大西修, 畝田道雄, 岡田悠, 山内和人
- Organizer
  2013年度精密工学会秋季大会学術講演会
- Place of Presentation
  関西大学
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Formation and Evaluation of Quasi-radical Site Induced by Femtosecond Laser on the Surface of Diamond2013
- Author(s)
  C. WANG, S. KUROKAWA, S. KOMAI, H. AIDA, K. OYAMA, K. TAKAHASHI, Y. SANO, K. TSUKAMOTO, and Toshiro DOI
- Organizer
  the 13th International Symposium on Aerospace Technology
- Place of Presentation
  サンポートホール高松（香川）
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Processing Properties of Strong Oxidizing Slurry and Effect of Processing Atmosphere in SiC-CMP2012
- Author(s)
  Tao YIN, Toshiro DOI, Syuhei KUROKAWA, Osamu OHNISHI, Tsutomu YAMAZAKI, Zhida WANG, and Zhe TAN
- Organizer
  International Conference on Planarization/CMP Technology 2012
- Place of Presentation
  Grenoble, France
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] SiC-CMP Processing Characteristics under Different Atmospheres Using MnO2 Slurry with Strong Oxidant2012
- Author(s)
  Zhe TAN, Toshiro DOI, Syuhei KUROKAWA, Osamu OHNISHI, Tsutomu YAMAZAKI, and Tao YIN
- Organizer
  Advanced Metallization Conference 2012
- Place of Presentation
  東京大学
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Characteristics of Sapphire CMP Under Various Gas Conditions Using Bell-Jar Type CMP Machine2012
- Author(s)
  Takateru EGASHIRA, Toshiro DOI, Syuhei KUROKAWA, Osamu OHNISHI, Michio UNEDA, Isamu KOSHIYAMA, and Daizo ICHIKAWA
- Organizer
  Advanced Metallization Conference 2012
- Place of Presentation
  東京大学
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 密閉耐圧チャンバー型両面同時CMP装置の開発-各種加工雰囲気下でのSiおよびSiCウエハのCMP特性と光触媒援用CMPの可能性について-2011
- Author(s)
  北村圭, 土肥俊郎, 黒河周平, 大西修, 尹涛, 長谷川正, 越山勇, 市川浩一郎
- Organizer
  日本機械学会九州支部講演会
- Place of Presentation
  九州大学(福岡)
- Year and Date
  2011-03-17
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] 酸化マンガン系スラリーを用いたSiC単結晶基板の精密加工-密閉型加工環境コントロールCMP装置による加工特性-2011
- Author(s)
  長谷川正, 土肥俊郎, 黒河周平, 大西修, 山崎努, 尹涛, 河瀬康弘, 山口靖英, 岸井貞浩
- Organizer
  2011年度精密工学会春季大会学術講演会
- Place of Presentation
  東洋大学(東京)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] 酸化マンガン系スラリーを用いたSiC単結晶基板の精密加工プロセスに関する研究-密閉型加工環境コントロールCMP装置による加工-2011
- Author(s)
  長谷川正, 土肥俊郎, 黒河周平, 大西修, 河瀬康弘, 尹涛, 山崎努, 岸井貞浩
- Organizer
  日本機械学会九州支部講演会
- Place of Presentation
  九州大学(福岡)
- Year and Date
  2011-03-17
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] 耐圧密閉チャンバー型CMP装置を用いた加工環境制御下における加工特性2011
- Author(s)
  江頭峻輝, 土肥俊郎, 黒河周平, 大西修, 山崎努
- Organizer
  日本機械学会九州学生会第42回卒業研究発表講演会
- Place of Presentation
  大分工業高等専門学校(大分)
- Year and Date
  2011-03-11
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] 加工環境を制御したCMP装置によるSiCウエハの高能率加工に関する研究-コロイダルシリカとダイヤモンド微粒子スラリーを用いた加工特性-2011
- Author(s)
  尹涛, 土肥俊郎, 黒河周平, 大西修, 山崎努, 北村圭, 長谷川正
- Organizer
  日本機械学会九州支部講演会
- Place of Presentation
  九州大学(福岡)
- Year and Date
  2011-03-17
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Characteristics of Silicon CMP performed in various high pressure atmospheres-Development of a new double-side simultaneous CMP machine housed in a high pressure chamber2010
- Author(s)
  K.Kitamura, T.Doi, S.Kurokawa, O.Ohnishi, Y.Umezaki, T.Yamazaki, Y.Matsukawa, T.Hasegawa, I.Koshiyama, K.Ichikawa
- Organizer
  Advanced Metallization Conference 2010 : 20^<th> Asian Session)
- Place of Presentation
  東京大学(大学)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Polishing/CMP for glass substrates in a radical polishing environment, using manganese oxide slurry as an alternative for ceria slurry2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, et al.
- Organizer
  Proc.of CIMTEC2010 (12th International Ceramics Congress)
- Place of Presentation
  Itary
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Characteristics of Silicon CMP Performed in Various High Pressure Atmospheres -Development of a New Double-side Simultaneous CMP Machine Housed in a High Pressure Chamber-2010
- Author(s)
  K.Kitamura, T.Doi, S.Kurokawa, O.Ohnishi, Y.Umezaki, T.Yamazaki, Y.Matsukawa, T.Hasegawa, I.Koshiyama, K.Ichikawa
- Organizer
  Advanced Metallization Conference
- Place of Presentation
  東京大学(大学)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Chemical Mechanical Polishing (CMP) of Silicon Carbide (SiC) with Manganese Oxide Slurry -Polishing Characteristics under High Pressure Gas Atmosphere Inside the Bell-Jar (Chamber) Shaped CMP Machine-2010
- Author(s)
  T.Hasegawa, T.Doi, S.Kurokawa, O.Ohnishi, T.Yamazaki, Y.Kawase, Y.Yamaguchi, S.Kishi
- Organizer
  International Conference on Planarization/CMP Technology
- Place of Presentation
  Phoenix, Arizona (USA)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] 4酸化マンガン系スラリーを用いたSiC基板の精密加工プロセスに関する研究-ベルジャー型加工機を用いた各種加工雰囲2010
- Author(s)
  長谷川正, 土肥俊郎, 黒河周平, 大西修, 梅崎洋二, 山崎努, 北村圭, 河瀬康弘, 岸井貞浩
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学(名古屋
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Study on the Development of Resource-Saving High Performance Slurry - Polishing/CMP for glasssubstrates in a radical polishing environment2010
- Author(s)
  T.Doi, T.Yamazaki, S.Kurokawa, Y.Umezaki, O.Ohnishi,Y.Akagami, Y.Yamaguchi, S.Kishii
- Organizer
  using manganese oxide slurry as an alternative for ceria slurry-, CIMTEC2011 12th International Ceramics Congress
- Place of Presentation
  Montecatine Terme, Itary
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] ガラス基板の研磨とラジカル環境場の効果-酸化セリウム系スラリーと酸化マンガン系スラリーによるCMP特性-2010
- Author(s)
  山崎努, 土肥俊郎, 黒河周平, 大西修, 梅崎洋二, 松川洋二, 山口靖英, 岸井貞浩
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学(名古屋
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] SiC単結晶基板の酸化マンガン系スラリーによる精密加工プロセスに関する研究2010
- Author(s)
  長谷川正, 土肥俊郎, 黒河周平, 大西修, 河瀬康弘, 山口靖英, 岸井貞浩
- Organizer
  2010年度精密工学会九州支部熊本地方講演会
- Place of Presentation
  熊本大学(熊本)
- Year and Date
  2010-12-11
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] SiC-CMP characteristics under high pressure gas atmospheres using manganese slurry2010
- Author(s)
  T.Hasegawa, T.Doi, S.Kurokawa, O.Ohnishi, Y.Kawase, Y.Yamaguchi, S.Kishii
- Organizer
  Advanced Metallization Conference
- Place of Presentation
  東京大学(大学)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] SiC-CMP Characteristics under High Pressure Gas Atmospheres using Manganese Slurry2010
- Author(s)
  T.Hasegawa, T.Doi, S.Kurokawa, O.Ohnishi, Y.Kawase, Y.Yamaguchi, S.Kishii
- Organizer
  Advanced Metallization Conference
- Place of Presentation
  東京大学(大学)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] CMP of SiC Wafers as a Post-Si Power-Device-Bell-Jar shaped CMP machine, assisted by photocatalitic reactions under high pressure oxygen gas, and CMP Characteristics of functional materials-2009
- Author(s)
  T.Doi, S.Kurokawa
- Organizer
  1^<st> International Conference on Surface and Interface Fabrication Techonologies(ICSIF)
- Place of Presentation
  RIKEN Wako Institute Welfare and Conference Building, Japan
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] CMP of SiC Wafers as a Post-Si Power-Device (Bell-Jar shaped CMP machine assisted by photocatalitic reactions under high pressure oxygen gas and CMP characteristics of functional material2009
- Author(s)
  土肥俊郎, 黒河周平
- Organizer
  The 1st International Conference on Surface and Interface Fabrication Techonologies (ICSIF)
- Place of Presentation
  (独)理化学研究所(埼玉)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] CMP of SiC Wafers as a Post-Si Power-Device-Photocatalitic reaction assisted Bell-Jar shaped CMP Machine under high pressure oxygen gas-2008
- Author(s)
  土肥俊郎, 黒河周平
- Organizer
  The 5^<th> International Conference on Planarization/CMP Technology (ICPT2008)
- Place of Presentation
  台湾・新竹市
- Year and Date
  2008-11-10
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] CMP of SiC Wafers as a Post-Si Power-Device -Photocatalitic Reaction Assisted Bell-Jar shaped CMP Machine under High Pressure Oxygen Gas-2008
- Author(s)
  土肥俊郎, 黒河周平
- Organizer
  International Conference on Planarization/CMP Technology
- Place of Presentation
  Congress Center,浜松(静岡)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Si CMP with a Sealed "Bell-Jar" Type CMP Machine -Proc. Characteristics of Si-CMP, Influenced by the Processing Atmosphere and Additives Dispersed in the Slurry-2008
- Author(s)
  T.Kihara, T.Doi, S.Kurokawa, Y.Ooki, Y.Umezaki, Y.Matsukawa, K.Ichikawa, I.Koshiyama, H.Kohno
- Organizer
  The 5^<th> International Symposium on Advanced Science and Technology of Silicon Materials
- Place of Presentation
  Kona, Hawaii (USA)
- Data Source
  KAKENHI-PROJECT-20246033
[Presentation] Processing Characteristics of SiC Wafer by Consideration of Oxidation Effect in Different Atmospheric Environment
- Author(s)
  Ji ZHANG, Syuhei KUROKAWA, Terutake HAYASHI, Eiji ASAKAWA, and Chengwu WANG
- Organizer
  2014 International Conference on Planarization/CMP Technology (ICPT2014)
- Place of Presentation
  神戸国際会議場（兵庫県神戸市）
- Year and Date
  2014-11-19 – 2014-11-20
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Development of Basic-Type CMP/P-CVM Fusion Processing System (Type A) and Its Fundamental Characteristics
- Author(s)
  K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, K. Oyama, T. Miyashita, H. Sumizawa, and K. Yamauchi
- Organizer
  2014 International Conference on Planarization/CMP Technology (ICPT2014)
- Place of Presentation
  神戸国際会議場（兵庫県神戸市）
- Year and Date
  2014-11-19 – 2014-11-20
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Innovation in Chemical Mechanical Polishing(CMP): Plasma Fusion CMP for Highly Efficient Processing of Next-Generation Optoelectronics Single Crystals
- Author(s)
  Hideo Aida, Toshiro Doi, Yasuhisa Sano, Syuhei Kurokawa, Seong Woo Kim, Koki Oyama, Tadakazu Miyashita, Michio Uneda, Osamu Ohnishi, Chengwu Wang
- Organizer
  The 8th Manufacturing Institute for Research on Advanced Initiatives
- Place of Presentation
  Taiwan
- Year and Date
  2015-03-25 – 2015-03-26
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Removal Rate of Plasma Chemical Vaporization Machining of Intentionally Damaged Surface by Mechanical Action
- Author(s)
  K. Shiozawa, Y. Sano, T. Doi, S. Kurokawa, H. Aida, O. Ohnishi, M. Uneda, Y. Okada, and K. Yamauchi
- Organizer
  15th International Conference on Precision Engineering (ICPE2014)
- Place of Presentation
  ホテル日航金沢（石川県金沢市）
- Year and Date
  2014-07-22 – 2014-07-25
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的plasma fusion CMP装置の設計・試作（第7報）― plasma fusion CMP装置”（B型）による加工メカニズムの検討―
- Author(s)
  塩澤昂祐，平岡佑太，佐野泰久，土肥俊郎，黒河周平，會田英雄，大山幸希，宮下忠一，住澤春男，山内和人
- Organizer
  2015年度精密工学会春季大会学術講演会
- Place of Presentation
  東洋大学白山キャンパス（東京都文京区）
- Year and Date
  2015-03-17 – 2015-03-19
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 先端的難加工基板の高効率精密加工法の研究（第2報）－疑似ラジカル場を想定した加工変質層の形成によるPCVM加工速度の増大－
- Author(s)
  佐野泰久、土肥俊郎、黒河周平、曾田秀雄、大西修、畝田道雄、岡田悠、西川央明、山内和人
- Organizer
  2013年度精密工学会春季大会学術講演会
- Place of Presentation
  東京工業大学
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] Study on a novel CMP/P-CVM fusion processing system(Type B) and its basic characteristics
- Author(s)
  Koki Oyama, Toshiro K. Doi, Yasuhisa Sano, Syuhei Kurokawa, Hideo Aida, Tadakazu Miyashita, Seongwoo Kim, Hideakli Nishizawa, Tsutomu Yamazaki
- Organizer
  2014 International Conference on Planarization/CMP Technology (ICPT2014)
- Place of Presentation
  神戸国際会議場（兵庫県神戸市）
- Year and Date
  2014-11-19 – 2014-11-20
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的CMP/P-CVM融合装置の設計・試作（第4報）；A-type装置による炭化ケイ素を加工対象とした平坦化特性の評価
- Author(s)
  塩澤昂祐，佐野泰久，土肥俊郎，黒河周平，會田英雄，大山幸希，宮下忠一，山内和人
- Organizer
  2014年度精密工学会秋季大会学術講演会
- Place of Presentation
  鳥取大学（鳥取県）
- Year and Date
  2014-09-16 – 2014-09-18
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的 CMP/P-CVM加工装置の設計・試作(第５報)- B-type装置による各種難加工材料の基本的加工特性とその評価 -
- Author(s)
  大山幸希, 土肥俊郎, 佐野泰久, 黒河周平, 會田英雄, 塩澤昂祐, 宮下忠一, 金聖祐
- Organizer
  2014年度精密工学会秋季大会学術講演会
- Place of Presentation
  鳥取大学（鳥取県）
- Year and Date
  2014-09-16 – 2014-09-18
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 革新的plasma fusion CMP装置の設計・試作（第6報）― 基本型(A型）の平坦化特性についての詳細な検討－
- Author(s)
  塩澤昂祐，平岡佑太，佐野泰久，土肥俊郎，黒河周平，會田英雄，大山幸希，宮下忠一，住澤春男，山内和人
- Organizer
  2015年度精密工学会春季大会学術講演会
- Place of Presentation
  東洋大学白山キャンパス（東京都文京区）
- Year and Date
  2015-03-17 – 2015-03-19
- Data Source
  KAKENHI-PROJECT-24226005
[Presentation] 先端的難加工基板の高効率精密加工法の研究（第1報）-新しい概念を導入した加工プロセスの提案－
- Author(s)
  土肥俊郎、佐野泰久、黒河周平、曾田秀雄、大西修、畝田道雄
- Organizer
  2013年度精密工学会春季大会
- Place of Presentation
  東京工業大学
- Data Source
  KAKENHI-PROJECT-24226005

1. UMEZAKI Yoji (70038066)

# of Collaborated Projects: 5 results

# of Collaborated Products: 11 results
2. ONIKURA Hiromiti (90108655)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
3. ARIURA Yasutune (10038044)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
4. Terutake Hayashi (00334011)

# of Collaborated Projects: 3 results

# of Collaborated Products: 20 results
5. ISHIMARU Ryohei (10264061)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
6. NAKANISHI Tsutomu (40038055)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
7. DOI Toshiro (30207675)

# of Collaborated Projects: 2 results

# of Collaborated Products: 72 results
8. SANO Yasuhisa (40252598)

# of Collaborated Projects: 1 results

# of Collaborated Products: 39 results
9. OHNISHI Osamu (50315107)

# of Collaborated Projects: 1 results

# of Collaborated Products: 17 results
10. UNEDA Michio (00298324)

# of Collaborated Projects: 1 results

# of Collaborated Products: 14 results
11. YAMAMOTO Motoji (90202390)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
12. MOHRI Akira (50037909)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
13. AIDA Hideo

# of Collaborated Projects: 1 results

# of Collaborated Products: 35 results

Kurokawa Syuhei 黒河 周平

KUROKAWA Syuhei 黒河 周平

KUROKAWA Shuhei 黒河 周平

Research Projects

Research Products

Co-Researchers

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Transmission error analysis of small module gears with eccentricityPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

はすば歯車の負荷によるたわみ絶対値測定と負荷時かみあい伝達誤差解析Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

はすば歯車の3次元歯面形状誤差測定とかみあい誤差解析による回転伝達状態の把握Principal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

[Book] New Diamond Vol.322016

Author(s)

Total Pages

Publisher

Data Source

[Book] 超精密研磨/CMP技術とその最新動向(その-最新のCMP技術とトライボケミカル応用-第55巻第11号2010

Author(s)

Publisher

Data Source

[Book] 超精密研磨/CMP技術とその最新動向(その1)-研磨の発展経緯と加工原理-第55巻第11号2010

Author(s)

Publisher

Data Source

[Book] 超精密研磨/CMP技術とその最新動向(その2)-最新のCMP技術とトライボケミカル応用-2010

Author(s)

Total Pages

Kurokawa Syuhei 黒河周平

KUROKAWA Syuhei 黒河周平

KUROKAWA Shuhei 黒河周平