Ohmi Hiromasa 大参宏昌

… Alternative Names

OHMI Hiromasa 大参宏昌

Less

Researcher Number	00335382
Other IDs
Affiliation (Current)	2025: 大阪大学, 大学院工学研究科, 准教授
Affiliation (based on the past Project Information) *help	2024: 大阪大学, 大学院工学研究科, 准教授 2022: 大阪大学, 大学院工学研究科, 准教授 2021: 大阪大学, 工学研究科, 准教授 2016 – 2020: 大阪大学, 工学研究科, 助教 2013 – 2015: 大阪大学, 工学(系)研究科(研究院), 助教 … More 2013: 大阪大学, 大学院工学研究科, 助教 2012: 大阪大学, 工学研究科, 助教 2007 – 2011: Osaka University, 大学院・工学研究科, 助教 2009 – 2010: Osaka University, 工学研究科, 助教 2005 – 2006: 大阪大学, 大学院工学研究科, 助手 2002 – 2005: 大阪大学, 大学院・工学研究科, 助手 2004: 阪大, 工学(系)研究科(研究院), 助手 Less
Review Section/Research Field	Principal Investigator Production engineering/Processing studies / Basic Section 18020:Manufacturing and production engineering-related / Electronic materials/Electric materials / Medium-sized Section 18:Mechanics of materials, production engineering, design engineering, and related fields Except Principal Investigator Production engineering/Processing studies / Materials engineering and related fields / Applied materials science/Crystal engineering
Keywords	Principal Investigator プラズマ / 水素 / シリコン / 特殊加工 / 太陽電池 / 水素プラズマ / ナノ構造 / 精製 / ドライエッチング / エッチング … More / 表面処理 / 化学輸送法 / 大気圧水素プラズマ / 無反射表面 / 光無反射 / 光無反射表面 / 半導体 / 光反射率 / 無反射 / 反射率制御 / Si / 銅 / エコフレンドリー / 高速 / 高圧 / 化学輸送 / 加工 / 成膜 / 配線 / 金属 / 精密部品加工 / 電子・電気材料 / プラズマ加工 / 材料加工・処理 / ウエハ / ゲッタリング / 欠陥制御 / 製造技術 / ウエハ加工 / 金属級シリコン / 微粒子 / ナノシリコン / ナノ粒子 / 炭素 / バイオマス / ダイヤモンド / プラズマプロセス / 物質変換 / 材料精製 / メタン生成 / マイクロ波 / 機能性炭素膜 / 白炭 / 木質バイオマス / 精製プロセス / ナノマイクロ加工 / ナノワイヤ / PTFE / 大気圧プラズマ / 準大気圧 / 高圧力 / 地球温暖化ガス / VHFプラズマ / フッ素樹脂 / 大気圧 / 混晶半導体 / ガズ分析 / 反応生成種 / SiGe / SiC / シリコン薄膜 … More Except Principal Investigator 大気圧プラズマ / シリコン / エピタキシャル成長 / 太陽電池 / 表面パッシベーション / 大気圧プラズマ酸化 / 大気圧プラズマCVD / プラズマ酸化 / エピタキシャル / 窒化物ナノ構造 / 窒素ラジカル / 窒素プラズマ / インピーダンス整合 / 電磁場シミュレーション / 電子温度 / 電子密度 / InNナノ構造 / nano-imprint / solid phase crystallization / Ge nano-crystal / crystal nucleus / large-grain / glass substrate / Si thin film / polycrystalline Si / 固相結晶化 / 自己組織化 / 核形成 / 結晶核 / Ge微結晶 / ガラス基板 / 大粒径 / 多結晶Si薄膜 / ポーラスSi / 高速成膜 / 多結晶Si / 超薄型Si結晶太陽電池 / 表面再結合 / 界面準位 / Al_2O_3 / ドーピング・エピ技術 / 全低温プロセス / 大気圧プラズマ窒化 / 機能材料 / 薄膜成長 / 半導体プロセス / インライン・エピ技術 / 高速成長 / 低温成長 / 選択成長 / CVD / Al_xGa_<1-x>N / PA-MBE / 紫外光 / レーザ / AlN / 窒化物半導体 Less

Development of a smart manufacturing process for ultrathin crystalline Si solar cell using hydrogen plasmaPrincipal Investigator
- Principal Investigator
  
  大参宏昌
- Project Period (FY)
  2024 – 2026
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  Osaka University
nanostructuring on semiconductor surface for optical management by high-pressure hydrogen plasmaPrincipal Investigator
- Principal Investigator
  
  Ohmi Hiromasa
- Project Period (FY)
  2020 – 2022
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Review Section
  
  Basic Section 18020:Manufacturing and production engineering-related
- Research Institution
  Osaka University
Development of metal wiring process with low environmental load using high-density hydrogen radicalsPrincipal Investigator
- Principal Investigator
  
  Ohmi Hiromasa
- Project Period (FY)
  2018 – 2020
- Research Category
  
  Grant-in-Aid for Challenging Research (Exploratory)
- Review Section
  
  Medium-sized Section 18:Mechanics of materials, production engineering, design engineering, and related fields
- Research Institution
  Osaka University
Formation of Nitride Nanostructures by Reaction of High Density N Radicals with Metals
- Principal Investigator
  
  Yasutake Kiyoshi
- Project Period (FY)
  2017 – 2019
- Research Category
  
  Grant-in-Aid for Challenging Research (Exploratory)
- Research Field
  
  Materials engineering and related fields
- Research Institution
  Osaka University
Development of chemical-free and sophisticated manufacturing process for semiconductor substrate through hydrogen cyclePrincipal Investigator
- Principal Investigator
  
  Ohmi Hiromasa
- Project Period (FY)
  2016 – 2018
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Development of soft process of dimensional transformation for Si by non-equilibrium high-pressure hydrogen plasmaPrincipal Investigator
- Principal Investigator
  
  Ohmi Hiromasa
- Project Period (FY)
  2015 – 2016
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Direct formation of the high-quality nanowire Si from metallurgical Si source based on the plasma and nanotechnology sciencePrincipal Investigator
- Principal Investigator
  
  Ohmi Hiromasa
- Project Period (FY)
  2013 – 2015
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Synthesis of industrial diamond film from woody biomass feedstock at low temperature and normal pressurePrincipal Investigator
- Principal Investigator
  
  OHMI Hiromasa
- Project Period (FY)
  2013 – 2014
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Atmospheric-pressure plasma processes for high-rate film formation applicable for thin crystalline Si solar cells
- Principal Investigator
  
  KIYOSHI Yasutake
- Project Period (FY)
  2010 – 2013
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
大気圧プラズマを用いた機能性界面創生によるSi表面パッシベーション技術の開発
- Principal Investigator
  
  安武潔
- Project Period (FY)
  2009 – 2010
- Research Category
  
  Grant-in-Aid for Challenging Exploratory Research
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Development of eco-friendly surface treatment technique for photovoltaic crystalline Si substrate by using fluorine resignsPrincipal Investigator
- Principal Investigator
  
  OHMI Hiromasa
- Project Period (FY)
  2009 – 2011
- Research Category
  
  Grant-in-Aid for Young Scientists (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
Development and application of totally low-temperature semiconductor process using atmospheric-pressure plasma
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  2007 – 2009
- Research Category
  
  Grant-in-Aid for Scientific Research (A)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
インライン対応シリコン低温選択エビ技術の開発
- Principal Investigator
  
  安武潔
- Project Period (FY)
  2006 – 2007
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
大気圧水素プラズマと固体原料を用いたIV族混晶半導体薄膜の高能率形成法の開発Principal Investigator
- Principal Investigator
  
  大参宏昌
- Project Period (FY)
  2006 – 2007
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Osaka University
大気圧水素プラズマのみによるシリコン薄膜の形成Principal Investigator
- Principal Investigator
  
  大参宏昌
- Project Period (FY)
  2004 – 2005
- Research Category
  
  Grant-in-Aid for Young Scientists (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Osaka University
Fabrication of Large-Grained Polycrystalline Si Thin Films by Controlling Nucleation Sites on Glass Substrates
- Principal Investigator
  
  YASUTAKE Kiyoshi
- Project Period (FY)
  2004 – 2006
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Production engineering/Processing studies
- Research Institution
  Osaka University
窒化物半導体による紫外光(UV)レーザへの発展
- Principal Investigator
  
  芳井熊安
- Project Period (FY)
  2002 – 2004
- Research Category
  
  Grant-in-Aid for Exploratory Research
- Research Field
  
  Applied materials science/Crystal engineering
- Research Institution
  Osaka University

[Book] 超精密加工と表面科学－原子レベルの生産技術－「大気圧プラズマ化学輸送法」2014
- Author(s)
  大参宏昌
- Total Pages
  9
- Publisher
  大阪大学出版会
- Data Source
  KAKENHI-PROJECT-25289016
[Book] 超精密加工と表面科学－原子レベルの生産技術－「大気圧プラズマ化学輸送法」2014
- Author(s)
  大参宏昌　分筆
- Total Pages
  9
- Publisher
  大阪大学出版会
- Data Source
  KAKENHI-PROJECT-25630027
[Book] 改訂版「大気圧プラズマの生成制御と応用技術」第5章第1節"大気圧プラズマCVDによるシリコン薄膜の形成"(監修小駒益弘)2012
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Publisher
  サイエンス&テクノロジー
- Data Source
  KAKENHI-PROJECT-22246017
[Book] 大気圧プラズマの生成制御と応用技術(監修小駒益弘),大気圧プラズマCVD によるシリコン薄膜の形成2012
- Author(s)
  安武潔,垣内弘章,大参宏昌
- Publisher
  サイエンス & テクノロジー, 改訂版
- Data Source
  KAKENHI-PROJECT-22246017
[Book] in Generation and Applications of Atmospheric Pressure Plasmas (eds. M. Kogoma et al.), Preparation of Si-based thin films using atmospheric pressure plasma chemical vapor deposition2011
- Author(s)
  K. Yasutake, H. Kakiuchi and H. Ohmi
- Publisher
  Nova Science Publishers
- Data Source
  KAKENHI-PROJECT-22246017
[Book] "Preparation of Si-based thin films using atmospheric pressure plasma chemical vapour deposition" in Generation and Applications of Atmospheric Pressure Plasmas Eds : M.Kogoma, M.Kusano, Y.Kusano2011
- Author(s)
  Kiyoshi Yasutake, Hiroaki Kakiuchi, Hiromasa Ohmi
- Total Pages
  22
- Publisher
  Nova Science Publishers, Inc.
- Data Source
  KAKENHI-PROJECT-22246017
[Book] 「大気圧プラズマ基礎と応用」第6章,6.7.3(2),シリコン系CVD2009
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Total Pages
  5
- Publisher
  オーム社
- Data Source
  KAKENHI-PROJECT-19206018
[Book] 大気圧プラズマ基礎と応用(日本学術振興会プラズマ材料科学第153委員会編)2009
- Author(s)
  安武潔, 垣内弘章, 大参宏昌, 他
- Publisher
  オーム社
- Data Source
  KAKENHI-PROJECT-19206018
[Book] 新コーティングのすべて」第2章,2.2(1),大気圧プラズマCVD法-フィルムコーティングのための大気圧・超高周波プラズマ技術-2009
- Author(s)
  垣内弘章, 大参宏昌, 安武潔
- Total Pages
  5
- Publisher
  加工技術研究会
- Data Source
  KAKENHI-PROJECT-19206018
[Book] "High-Rate and Low-Temperature Film Growth Technology Using Stable Glow Plasma at Atmospheric Pressure"in Trends in Thin Solid Films Research(ed. A. R. Jost)2007
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Yasutake
- Total Pages
  50
- Publisher
  Nova Science, New York
- Data Source
  KAKENHI-PROJECT-19206018
[Book] NY, Trends in Thin Solid Films Research (ed. A. R. Jost), High-rate and low-temperature film growth technology using stable glow plasma at atmospheric pressure2007
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Yasutake, et. al.
- Publisher
  Nova Science
- Data Source
  KAKENHI-PROJECT-19206018
[Book] "High-Rate and Low-Temperature Film Growth Technology Using Stable Glow Plasma at Atmospheric Pressure"in Trends in Thin Solid Films Research (ed. A.R. Jost)2007
- Author(s)
  H. Kakiuchi, H. Ohmi, K. Yasutake
- Publisher
  Nova Science, New York
- Data Source
  KAKENHI-PROJECT-18656046
[Book] 「システムオンパネルをめざした低温ポリシリコン薄膜トランジスタの開発」第2編第6章"Ge核を用いたSi薄膜の低温結晶化技術"(監修浦岡行治)2007
- Author(s)
  安武潔, 渡部平司, 大参宏昌, 垣内弘章
- Total Pages
  12
- Publisher
  シーエムシー出版
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Book] システムオンパネルをめざした低温ポリシリコン薄膜トランジスタの開発(第2編第6章 Ge核を用いたSi薄膜の低温結晶化技術)(監修浦岡行治)2007
- Author(s)
  安武潔, 渡部平司, 大参宏昌, 垣内弘章
- Total Pages
  11
- Publisher
  シーエムシー出版
- Data Source
  KAKENHI-PROJECT-16360070
[Book] 大気圧プラズマの生成制御と応用技術(2章第7節大気圧プラズマCVDによる無機物膜堆積)(監修小駒益弘)2006
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Total Pages
  17
- Publisher
  サイエンス＆テクノロジー
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] Shallow Defect Layer Formation as Cu Gettering Layer of Ultra-thin Si Chips Using Moderate-pressure (3.3 kPa) Hydrogen Plasma2023
- Author(s)
  Toshimitsu Nomura, Hiroaki Kakiuchi, Hiromasa Ohmi
- Journal Title
  
  Journal of Applied Physics
  
  Volume: 133 Issue: 16
- DOI
  10.1063/5.0146215
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H02049
[Journal Article] Si nanocone structure fabricated by a relatively high-pressure hydrogen plasma in the range of 3.3 - 27 kPa2022
- Author(s)
  Toshimitsu Nomura, Kenta Kimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake, and Hiromasa Ohmi
- Journal Title
  
  Journal of Vacuum Science & Technology B
  
  Volume: 40 Issue: 3
- DOI
  10.1116/6.0001676
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H02049
[Journal Article] Study on silicon removal property and surface smoothing phenomenon by moderate-pressure microwave hydrogen plasma2021
- Author(s)
  Hiromasa Ohmi, Kenta Kimoto, Toshimitsu Nomura, Hiroaki Kakiuchi, Kiyoshi Yasutake
- Journal Title
  
  Materials Science in Semiconductor Processing
  
  Volume: 129 Pages: 105780-105780
- DOI
  10.1016/j.mssp.2021.105780
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-20H02049
[Journal Article] Significant Improvement of Copper Dry Etching Property of a High-Pressure Hydrogen-Based Plasma by Nitrogen Gas Addition2019
- Author(s)
  Hiromasa Ohmi, Jumpei Sato, Yoshiki Shirasu, Tatsuya Hirano, Hiroaki Kakiuchi, and Kiyoshi Yasutake
- Journal Title
  
  ACS Omega
  
  Volume: 4 Issue: 2 Pages: 4360-4366
- DOI
  10.1021/acsomega.8b03163
- Peer Reviewed / Open Access
- Data Source
  KAKENHI-PROJECT-18K18809, KAKENHI-PROJECT-16H04245
[Journal Article] On-site SiH4 generator using hydrogen plasma generated in slit-type narrow gap2018
- Author(s)
  N. Takei, F. Shinoda, H. Kakiuchi, K. Yasutake and H. Ohmi
- Journal Title
  
  J. Phys D: Appl. Phys.
  
  Volume: 51 Issue: 24 Pages: 245203-245203
- DOI
  10.1088/1361-6463/aac2ae
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16H04245
[Journal Article] Efficiency of silane gas generation in high-rate silicon etching by narrow-gap microwave hydrogen plasma2016
- Author(s)
  Hiromasa Ohmi, Takeshi Funaki, Hiroaki Kakiuchi and Kiyoshi Yasutake
- Journal Title
  
  J. Physics D: Appl. Phys.
  
  Volume: 49 Issue: 3 Pages: 035202-035202
- DOI
  10.1088/0022-3727/49/3/035202
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-15K13848
[Journal Article] Copper dry etching by sub-atmospheric-pressure pure hydrogen glow plasma2016
- Author(s)
  Hiromasa Ohmi, Jumpei Sato, Tatsuya Hirano, Yusuke Kubota, Hiroaki Kakiuchi, and Kiyoshi Yasutake
- Journal Title
  
  Appl. Phys. Lett.
  
  Volume: 109 Issue: 21
- DOI
  10.1063/1.4967382
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-16H04245
[Journal Article] Selective deposition of a crystalline Si film by a chemical sputtering process in a high pressure hydrogen plasma2015
- Author(s)
  Hiromasa Ohmi, Hiroaki Kakiuchi, and Kiyoshi Yasutake
- Journal Title
  
  Journal of Applied Physics
  
  Volume: 118 Issue: 4 Pages: 045301-045301
- DOI
  10.1063/1.4926849
- Peer Reviewed / Acknowledgement Compliant
- Data Source
  KAKENHI-PROJECT-25289016
[Journal Article] Atmospheric-pressure low-temperature plasma processes for thin film deposition2014
- Author(s)
  H. Kakiuchi, H. Ohmi and K. Yasutake
- Journal Title
  
  J. Vac. Sci. Technol. A
  
  Volume: vol.32 (published online 31 October 2013) Issue: 3
- DOI
  10.1116/1.4828369
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Interface properties of SiOxNy layer on Si prepared by atmospheric-pressure plasma oxidationnitridation2013
- Author(s)
  Z. Zhuo, Y. Sannomiya, Y. Kanetani, T. Yamada, H. Ohmi, H. Kakiuchi and K. Yasutake
- Journal Title
  
  Nanoscale Research Letters
  
  Volume: 8 Issue: 1 Pages: 201-201
- DOI
  10.1186/1556-276x-8-201
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Voltage distribution over capacitively coupled plasma electrode for atmosphericpressure plasma generation2013
- Author(s)
  M. Shuto, F. Tomino, H. Ohmi, H. Kakiuchi and K. Yasutake
- Journal Title
  
  Nanoscale Research Letters
  
  Volume: 8 Issue: 1 Pages: 202-202
- DOI
  10.1186/1556-276x-8-202
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] Formation of SiO2/Si structure with low interface state density by atmospheric-pressure VHF plasma oxidation2012
- Author(s)
  Z. Zhuo, Y. Sannomiya, K. Goto, T. Yamada, H. Ohmi, H. Kakiuchi and K. Yasutake
- Journal Title
  
  Current Appl. Phys
  
  Volume: vol.12 Pages: S57-S62
- DOI
  10.1016/j.cap.2012.04.015
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] An atomically controlled Si film formation process at low temperatures using atmospheric-pressure VHF plasma2011
- Author(s)
  K.Yasutake, H.Kakiuchi, H.Ohmi, K.Inagaki, Y.Oshikane, M.Nakano
- Journal Title
  
  J.Phys. : Condens. Matter
  
  Volume: 23 Pages: 1-22
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017
[Journal Article] An atomically controlled Si film formation process at low temperatures using atmospheric-pressure VHF plasma2011
- Author(s)
  K. Yasutake, H. Kakiuchi, H. Ohmi, K. Inagaki, Y. Oshikane and M. Nakano
- Journal Title
  
  J. Phys.: Condens. Matter
  
  Volume: vol.23 Issue: 39 Pages: 1-22
- DOI
  10.1088/0953-8984/23/39/394205
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-22246017, KAKENHI-PROJECT-22560110
[Journal Article] Kazuya Kishimoto, Hiroaki Kakiuchi, and Kiyoshi Yasutake2010
- Author(s)
  Hiromasa Ohmi
- Journal Title
  
  PFC-Free Dry Etching Method for Si Using Narrow-Gap VHF Plasma at Subatmospheric Pressure
  
  Volume: 157
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21686014
[Journal Article] PFC-Free Dry Etching Method for Si Using Narrow-Gap VHF Plasma at Subatmospheric Pressure2010
- Author(s)
  Hiromasa Ohmi, azuya Kishimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake
- Journal Title
  
  Journal of The Electrochemical Society 157
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-21686014
[Journal Article] In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2009
- Author(s)
  T.Ohnishi, Y.Kirihata, H.Ohmi, H.Kakiuchi, K.Yasutake
- Journal Title
  
  ECS Trans. 25
  
  Pages: 309-315
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] n situ doped Si selective epitaxial growth at low temperatures by atmospheric pressure plasma CVD2009
- Author(s)
  T. Ohnishi, Y. Kirihata, H. Ohmi, H. Kakiuchi, K. Yasutake
- Journal Title
  
  ECS Trans. vol.25
  
  Pages: 309-315
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] In situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi, K. Yasutake
- Journal Title
  
  Surf. Interface Anal 40
  
  Pages: 984-987
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] n situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi, K. Yasutake
- Journal Title
  
  Surf. Interface Anal. vol.40
  
  Pages: 984-987
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2008
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Journal Title
  
  Thin Solid Films vol.517
  
  Pages: 242-244
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] In situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressure plasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchia and K. Yasutakea
- Journal Title
  
  Surf. Interface Anal. 40(in press)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] SiO_2 Formation by Oxidation of Crystalline and Hydrogenated Amorphous Si in Atmospheric Pressure Plasma Excited by Very High Frequency Power2008
- Author(s)
  H. Kakiuchi, H. Ohmi, M. Harada, H. Watanabe, K. Yasutake
- Journal Title
  
  Jpn. J. Appl. Phys 47
  
  Pages: 1884-1888
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] In situ B-doped Si epitaxial growth at low temperatures by atmospheric-pressureplasma CVD2008
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchia and K. Yasutakea
- Journal Title
  
  Surf. Interface Anal. 40(in press)
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2008
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Journal Title
  
  Thin Solid Films 517
  
  Pages: 242-244
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] 大気圧プラズマCVD法によるSiの低温・高速エピタキシャル成長2007
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Journal Title
  
  応用物理 75
  
  Pages: 1031-1036
- NAID
  10019855405
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] Photoluminescence Study of Defect-Free Epitaxial Silicon Films Grown at Low Temperatures by Atmospheric Pressure Plasma Chemical Vapor Deposition2007
- Author(s)
  K.Yasutake, N.Tawara, H.Ohmi, Y.Terai, H.Kakiuchi, H.Watanabe, Y.Fujiwara
- Journal Title
  
  Jpn. J. Appl. Phys. 46・4B(in press)
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] Photoluminescence Study of Defect-Free Epitaxial Silicon Films Grown at Low Temperatures by Atmospheric Pressure Plasma Chemical Vapor Deposition2007
- Author(s)
  K. Yasutake, N. Tawara, H. Ohmi, Y. Terai, H. Kakiuchi, H. Watanabe and Y.Fujiwara
- Journal Title
  
  Jpn. J. Appl. Phys. 46
  
  Pages: 2510-2515
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] 大気圧プラズマCVD法によるSiの低温・高速エピタキシャル成長2007
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Journal Title
  
  応用物理 75
  
  Pages: 1031-1036
- NAID
  10019855405
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] 大気圧プラズマCVD法によるSiの低温・高速エピタキシャル成長2007
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Journal Title
  
  応用物理 vol.75
  
  Pages: 1031-1036
- NAID
  10019855405
- Peer Reviewed
- Data Source
  KAKENHI-PROJECT-19206018
[Journal Article] Ge Nuclei for Fabrication of Poly-Si Thin Films on Glass Substrates (Invited)2006
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi
- Journal Title
  
  Meeting Abst. MA 2006-02 Joint Int. Meeting of 210th Meeting of The Electrochemical Society and XXI Congreso de la Sociedad Mexicana de Electroquimica Cancun, Mexico, (2006) #1575.
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Influence of H_2/SiH_4 Ratio on the Deposition Rate and Morphology of Polycrystalline Silicon Films Deposited by Atomospheric Pressure Plasma CVD2006
- Author(s)
  Hiromasa Ohmi, Hiroaki Kakuuchi, Kiyoshi Yasutake, Yasuji Nakahama, Yusuke Ebata, Kumayasu Yoshii, Yuzo Mori
- Journal Title
  
  Japanese Journal of Applied Physics 45・4B(In print)
- Data Source
  KAKENHI-PROJECT-16760256
[Journal Article] Ge Nuclei for Fabrication of Poly-Si Thin Films on Glass Substrates2006
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi
- Journal Title
  
  ECS Transactions 3巻・8号
  
  Pages: 215-225
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Fabrication of Polycrystalline Silicon Thin Films on Glass Substrates Using Ge Nano-Islands as Nuclei2006
- Author(s)
  K.Minami, C.Yoshimoto, H.Ohmi, T.Shimura, H.Kakiuchi, H.Watanabe, K.Yasutake
- Journal Title
  
  Ext.Abst. of Int.21st Century COE Symp. on Atomistic Fabrication Technology 19-29
  
  Pages: 65-66
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Characterization of high-pressure (200-760 Torr), stable glow plasma of pure hydrogen by measuring etching properties of Si and optical emission spectroscopy2006
- Author(s)
  Hiromasa Ohmi, Hiroaki Kakuuchi, Yoshiki Ogiyama, Heiji Watanabe, Kiyoshi Yasutake
- Journal Title
  
  The proceedings of the 6th ICRP and 23rd SSP (Matsushima/Sendai)
  
  Pages: 301-301
- Data Source
  KAKENHI-PROJECT-16760256
[Journal Article] Ge Nuclei for Fabrication of Poly-Si Thin Films on Glass Substrates2006
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi
- Journal Title
  
  ECS Transactions 3 [8]
  
  Pages: 215-225
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Ge Nuclei for Fabrication of Poly-Si Thin Films on Glass Substrates2006
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi
- Journal Title
  
  ECS Transactions 3・8
  
  Pages: 215-225
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Characterization of Epitaxial Si Films Grown by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Cylindrical Rotary Electrode2006
- Author(s)
  K.Yasutake, H.Ohmi, H.Kakiuchi, T.Wakamiya, H.Watanabe
- Journal Title
  
  Jpn. J. Appl. Phys. 45・4B
  
  Pages: 3592-3597
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] Low-Temperature Growth of Epitaxial Si Films by Atmospheric Pressure Plasma Chemical Vapor Deposition Using Porous Carbon Electrode2006
- Author(s)
  H.Ohmi, H.Kakiuchi, N.Tawara, T.Wakamiya, T.Shimura, H.Watanabe, K.Yasutake
- Journal Title
  
  Jpn. J. Appl. Phys. 45・10B
  
  Pages: 8424-8429
- NAID
  10018340085
- Data Source
  KAKENHI-PROJECT-18656046
[Journal Article] Low-temperature crystallization of amorphous silicon by atmospheric pressure plasma treatment in H_2/He or H_2/Ar mixtures2006
- Author(s)
  Hiromasa Ohmi, Hiroaki Kakuuchi, Kenichi Nishijima, Heiji Watanabe, Kiyoshi Yasutake
- Journal Title
  
  The proceedings of the 6th ICRP and 23rd SSP (Matsushima/Sendai)
  
  Pages: 67-67
- Data Source
  KAKENHI-PROJECT-16760256
[Journal Article] Formation of Crystalline Ge Islands on Glass Substrates for Growth of Large-Grained Polycrystalline Si Thin Films2004
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi, S.Koyama, D.Nakajima, K.Minami
- Journal Title
  
  Proceedings of Thin Film Materials & Devices Meeting
  
  Pages: 19-24
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Size and Density Control of Crystalline Ge Islands on Glass Substrates by Oxygen Etching2004
- Author(s)
  K.YASUTAKE, H.OHMI, H.KAKIUCHI, H.WATANABE, K.YOSHII, Y.MORI
- Journal Title
  
  Japanese Journal of Applied Physics 43・12A
- NAID
  10015473490
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Size and Density Control of Crystalline Ge Islands on Glass Substrates by Oxygen Etching2004
- Author(s)
  K.Yasutake, H.Ohmi, H.Kakiuchi, H.Watanabe, K.Yoshii, Y.Mori
- Journal Title
  
  Jpn.J.Appl.Phys. 43 [12A]
- NAID
  10015473490
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Formation of Crystalline Ge Islands on Glass Substrates for Growth of Large-Grained Polycrystalline Si Thin Films2004
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi, S.Koyama, D.Nakajima, K.Minami
- Journal Title
  
  Proc. Thin Film Materials ＆ Devices Meeting
  
  Pages: 19-24
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Formation of Crystalline Ge Islands on Glass Substrates for Growth of Large-Grained Polycrystalline Si Thin Films2004
- Author(s)
  K.Yasutake, H.Watanabe, H.Ohmi, H.Kakiuchi, S.Koyama, D.Nakajima, K.Minami
- Journal Title
  
  Proc. Thin Film Materials ＆ Devices Meeting (2004)
  
  Pages: 19-24
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Journal Article] Size and Density Control of Crystalline Ge Islands on Glass Substrates by Oxygen Etching2004
- Author(s)
  K.Yasutake, H.Ohmi, H.Kakiuchi, H.Watanabe, K.Yoshii, Y.Mori
- Journal Title
  
  Jpn. J. Appl. Phys. (2004) 43巻・12A号
- NAID
  10015473490
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-16360070
[Patent] エッチング装置及びエッチング方法2016
- Inventor(s)
  大参宏昌、久保田　雄介
- Industrial Property Rights Holder
  東京エレクトロン、大阪大学
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2016-220048
- Filing Date
  2016-11-10
- Data Source
  KAKENHI-PROJECT-16H04245
[Patent] 成膜方法および成膜装置2013
- Inventor(s)
  大参宏昌
- Industrial Property Rights Holder
  大阪大学
- Industrial Property Rights Type
  特許
- Industrial Property Number
  2013-215103
- Filing Date
  2013-10-15
- Data Source
  KAKENHI-PROJECT-25289016
[Patent] 大気圧水素プラズマを用いた膜製造法,精製膜製造方法及び装置2006
- Inventor(s)
  大参宏昌, 安武潔, 垣内弘章
- Industrial Property Rights Holder
  大阪大学,関西TLO
- Filing Date
  2006-09-08
- Data Source
  KAKENHI-PROJECT-18760235
[Patent] 大気圧水素プラズマを用いた膜製造方法及び装置2005
- Inventor(s)
  大参宏昌
- Industrial Property Rights Holder
  大阪大学, 関西TLO
- Industrial Property Number
  2005-311934
- Filing Date
  2005-10-26
- Data Source
  KAKENHI-PROJECT-16760256
[Presentation] マイクロ波水素プラズマによるシリコンナノコーン形成における窒素および水蒸気添加の影響2023
- Author(s)
  多村尚起, 野村俊光, 垣内弘章, 大参宏昌
- Organizer
  2023年第70回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 高密度中圧プラズマを用いた極薄シリコンウエハ用ゲッタリング層の形成とその特性評価2022
- Author(s)
  野村俊光，垣内弘章，安武潔，大参宏昌
- Organizer
  2022年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] The impact of air feeding on silicon surface nanostructure formation bymoderate-pressure hydrogen plasma2022
- Author(s)
  T. Nomura, N. Tamura, H. Kakiuchi, H. Ohmi
- Organizer
  ICPE2022
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 中圧水素プラズマを用いたシリコンナノコーン形成プロセスに与える水素ガス中不純物の影響2022
- Author(s)
  多村尚起，野村俊光，垣内弘章，大参宏昌
- Organizer
  2022年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] Effects of minor addition of N2/O2 impurities on silicon nanostructureformation behavior in hydrogen plasma process2022
- Author(s)
  Toshimitsu Nomura, Naoki Tamura, Ken Sakamoto, Hiroaki Kakiuchi, Hiromasa Ohmi
- Organizer
  GEC 2022/ICRP-11
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 高圧水素プラズマ誘起ナノポーラス化銀表面のプラズモン特性評価2021
- Author(s)
  関戸拓郎、安東卓洋、垣内弘章、安武潔、大参宏昌
- Organizer
  2021年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 水素プラズマにより形成したナノコーン構造シリコン表面の光反射特性2021
- Author(s)
  野村俊光, 多村尚起, 垣内弘章, 大参宏昌
- Organizer
  2021年第82回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 中圧水素プラズマによるシリコン表面ナノコーン構造の創成2021
- Author(s)
  野村俊光、木元健太、垣内弘章、安武潔、大参宏昌
- Organizer
  2021年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 中圧水素プラズマによるナノポーラス銀表面の創成2021
- Author(s)
  関戸拓郎、安東卓洋、垣内弘章、安武潔、大参宏昌
- Organizer
  2021年第68回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 高密度中圧水素プラズマを用いたシリコン表面ナノコーンの作製と反射特性評価2021
- Author(s)
  多村尚起，野村俊光，垣内弘章，大参宏昌
- Organizer
  2021年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 中圧水素プラズマを用いた高アスペクト比シリコンナノコーンの形成2021
- Author(s)
  野村俊光、木元健太、垣内弘章、安武潔、大参宏昌
- Organizer
  2021年第68回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 高密度中圧水素プラズマを用いたシリコンナノコーン創成－結晶面方位とナノ構造の相関－2021
- Author(s)
  多村尚起，野村俊光，垣内弘章，大参宏昌
- Organizer
  2021年度精密工学会関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 高圧水素プラズマ誘起ナノポーラス化銀表面の光学特性評価2021
- Author(s)
  安東卓洋、関戸拓郎、垣内弘章、安武潔、大参宏昌
- Organizer
  2021年第68回応用物理学会春季学術講演会
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 高密度水素プラズマ曝露による銀表面のナノポーラス化挙動の観察2021
- Author(s)
  関戸拓郎、安東卓洋、垣内弘章、安武潔、大参宏昌
- Organizer
  2021年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] ユビキタスガス添加水素プラズマ化学輸送法による銅薄膜の形成2020
- Author(s)
  関戸拓郎，安東卓洋，垣内弘章，安武潔，大参宏昌
- Organizer
  2020年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] Surface nanostructuring of silicon by intermediate-pressure hydrogen plasma treatment2020
- Author(s)
  Toshimitsu Nomura, Kenta Kimoto, Hiroaki Kakiuchi, Kiyoshi Yasutake, Hiromasa Ohmi
- Organizer
  The 18th International Conference on Precision Engineering (ICPE2020)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 電磁場シミュレーションを用いた大気圧プラズマパラメータの解析―不均一密度モデルによる解析―2020
- Author(s)
  新田健，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2020年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 高圧水素プラズマによる極薄ゲッタリング層の形成2020
- Author(s)
  野村俊光、木元健太、垣内弘章、安武潔、大参宏昌
- Organizer
  2020年第81回応用物理学会秋季学術講演会
- Data Source
  KAKENHI-PROJECT-20H02049
[Presentation] 水蒸気添加水素プラズマによる金属銅の高速ドライエッチング2019
- Author(s)
  白數佳紀，垣内弘章，安武潔，大参宏昌
- Organizer
  2018年度精密工学会秋季大会学術講演会（2018年9月5日-7日，函館アリーナ）
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 水蒸気添加水素プラズマによる金属銅のドライエッチング2019
- Author(s)
  白數佳紀，安東卓洋，垣内弘章，安武潔，大参宏昌
- Organizer
  2019年第66回応用物理学会春季学術講演会（2019年3月9日-12日，東京工業大学）
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 高圧水素プラズマを用いた機能材料の成膜・加工プロセス2019
- Author(s)
  大参宏昌
- Organizer
  2019年度精密工学会秋季大会学術講演会
- Invited
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 結晶Si膜の低温形成に向けたSiH4ガスのプラズマ改質2019
- Author(s)
  浜中恵一，垣内弘章，安武潔，大参宏昌
- Organizer
  2019年第66回応用物理学会春季学術講演会（2019年3月9日-12日，東京工業大学）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 水素ベース高圧プラズマを用いた金属の化学加工法の開発2019
- Author(s)
  安東卓洋，白數佳紀，垣内弘章，安武潔，大参宏昌
- Organizer
  2019年度精密工学会春季大会学術講演会（2019年3月13日-15日，東京電気大学）
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 電磁場シミュレーションを用いた大気圧プラズマパラメータの解析－シース厚さを含めた高精度解析－2019
- Author(s)
  吉田和史，新田健，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2019年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] マイクロ波プラズマを用いたSiH4ガスの改質特性2019
- Author(s)
  浜中恵一，垣内弘章，安武潔，大参宏昌
- Organizer
  2019年度精密工学会春季大会学術講演会（2019年3月13日-15日，東京電気大学）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 電磁場シミュレーションによるシースを考慮したプラズマパラメータ解析2019
- Author(s)
  吉田和史，新田健，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2019年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 電磁場シミュレーションを用いた大気圧プラズマパラメータの解析2018
- Author(s)
  吉田和史，田中恭輔，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] Copper dry etching using a high-pressure plasma with non-toxic gas2018
- Author(s)
  Hiromasa Ohmi，Yoshiki Shirasu, Hiroaki Kakiuchi, Kiyoshi Yasutake
- Organizer
  The 17th Joint Vacuum Conference (JVC-17), Olomouc, Czech Republic
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-18K18809
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析―酸化プラズマパラメータと酸化膜特性の関係―2018
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2018年度精密工学会春季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] Copper dry etching using a high-pressure plasma with non-toxic gas2018
- Author(s)
  Hiromasa Ohmi，Yoshiki Shirasu, Hiroaki Kakiuchi, Kiyoshi Yasutake
- Organizer
  The 17th Joint Vacuum Conference (JVC-17), Olomouc, Czech Republic
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 添加ガスによる高圧水素プラズマを用いた銅ドライエッチングの特性改善2018
- Author(s)
  大参宏昌，佐藤純平，白数佳紀，垣内弘章，安武潔
- Organizer
  2018年度精密工学会春季大会学術講演会（2018年3月15日-17日，中央大学）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 高圧水素プラズマによるSi表面の欠陥制御法の検討2018
- Author(s)
  木元健太，垣内弘章，安武潔，大参宏昌
- Organizer
  2018年度精密工学会秋季大会学術講演会（函館アリーナ）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 高圧水素プラズマを用いたケミカルフリーなSiウエハ薄化プロセスの開発―プロセス雰囲気中不純物の影響―2018
- Author(s)
  木元健太，垣内弘章，安武潔，大参宏昌
- Organizer
  2018年度精密工学会春季大会学術講演会（2018年3月15日-17日，中央大学）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] マイクロ波水素プラズマを用いたオンサイトシラン生成器の開発とその応用2018
- Author(s)
  武居則久，垣内弘章，安武潔，大参宏昌
- Organizer
  第65回応用物理学会春季学術講演会（早稲田大学）
- Invited
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析　―ヘリウム及びヘリウム酸素混合プラズマの内部パラメータ比較―2018
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2018年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 高圧水素プラズマによるSi薄化プロセスの開発(I)2017
- Author(s)
  木元健太，武居則久，垣内弘章，安武潔，大参宏昌
- Organizer
  2017年第78回応用物理学会秋季学術講演会（2017年9月5日-8日，福岡国際会議場）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 水素プラズマを用いた銅ドライエッチングにおける添加ガス効果2017
- Author(s)
  大参宏昌，佐藤純平，久保田雄介，平野達也，垣内弘章，安武潔
- Organizer
  2017年第78回応用物理学会秋季学術講演会（2017年9月5日-8日，福岡国際会議場）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] Siウエハ薄化プロセスに向けた高密度水素プラズマエッチング技術の開発2017
- Author(s)
  木元健太，武居則久，垣内弘章，安武潔，大参宏昌
- Organizer
  2017年度精密工学会秋季大会学術講演会（2017年9月20日-22日，大阪大学）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 大気圧プラズマ装置の電磁場シミュレーションとプラズマパラメータ解析2017
- Author(s)
  田中恭輔，吉田和史，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  2017年度精密工学会秋季大会学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 電磁場解析によるマイクロ波プラズマの電子密度算出手法の開発2017
- Author(s)
  吉田和史，田中恭輔，首藤光利，大参宏昌，垣内弘章，安武潔
- Organizer
  精密工学会2017年度関西地方定期学術講演会
- Data Source
  KAKENHI-PROJECT-17K18990
[Presentation] 高密度水素プラズマによるオンサイト生成シランを用いたシリコンエピ成長とドーピング2017
- Author(s)
  武居則久，垣内弘章，安武潔，大参宏昌
- Organizer
  2017年第78回応用物理学会秋季学術講演会（2017年9月5日-8日，福岡国際会議場）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 狭ギャップ水素プラズマを用いたオンサイト生成SiH4によるシリコンエピ成長2017
- Author(s)
  武居則久，垣内弘章，安武潔，大参宏昌
- Organizer
  2017年度精密工学会秋季大会学術講演会（2017年9月20日-22日，大阪大学）
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] High-Rate Etching of Copper By High-Pressure Hydrogen-Based Plasma2017
- Author(s)
  H. Ohmi, H. Kakiuchi, K. Yasutake, and Y. Kubota
- Organizer
  231st ECS Meeting （May 28-June 1, 2017 New Orieans, LA, USA)
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] Toxic chemical-free Si etching by narrow gap hydrogen plasma toward Si wafer thinning process.2017
- Author(s)
  H. Ohmi, N. Takei, K. Kimoto, H. Kakiuchi, K. Yasutake
- Organizer
  CIP MIATEC 2017 （June 26-30, 2017 Nice, France）
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] On-site SiH4 generation using high-density microwave H2 plasma generated in narrow slit-type discharge gap2016
- Author(s)
  Hiromasa Ohmi, F. Shinoda, N. Takei, H. Kakiuchi, K. Yasutake
- Organizer
  16th Joint Vacuum Conference (JVC-16) and 14th European Vacuum Conference (EVC-14)
- Place of Presentation
  Portoroz, Slovenia
- Year and Date
  2016-06-06
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K13848
[Presentation] スリット型狭ギャッププラズマ源を用いたオンサイトSiH4生成2016
- Author(s)
  武居則久，篠田史也，垣内弘章，安武潔，大参宏昌
- Organizer
  精密工学会2016年度関西地方定期学術講演会
- Place of Presentation
  株式会社島津製作所
- Data Source
  KAKENHI-PROJECT-15K13848
[Presentation] 水素のみを用いた銅のプラズマエッチング技術の開発2016
- Author(s)
  平野達也，佐藤純平，垣内弘章，安武潔，久保田雄介，大参宏昌
- Organizer
  2016年度精密工学会秋季大会学術講演会
- Place of Presentation
  茨城大学 (茨城県・水戸市）
- Year and Date
  2016-09-06
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 狭ギャップ高密度水素プラズマによるオンサイトSiH4生成装置を用いたシリコンエピ成長2016
- Author(s)
  武居則久，篠田史也，垣内弘章，安武潔，大参宏昌
- Organizer
  2016年第77回応用物理学会秋季学術講演会
- Place of Presentation
  朱鷺メッセ　（新潟県・新潟市）
- Year and Date
  2016-09-13
- Data Source
  KAKENHI-PROJECT-16H04245
[Presentation] 高圧水素プラズマによる液体金属の超高速蒸発と多孔質金属膜の形成2015
- Author(s)
  平野達也，垣内弘章, 安武潔, 大参宏昌
- Organizer
  第71回マテルアルズ・テーラリング研究会
- Place of Presentation
  軽井沢研修所
- Year and Date
  2015-08-06
- Data Source
  KAKENHI-PROJECT-15K13848
[Presentation] 狭ギャップ高密度水素プラズマを用いたオンサイトSiH4生成装置の開発2015
- Author(s)
  篠田史也，垣内弘章，安武潔，大参宏昌
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場
- Year and Date
  2015-09-13
- Data Source
  KAKENHI-PROJECT-15K13848
[Presentation] 高圧水素プラズマ化学輸送法によるシリコンナノワイヤ形成における金属触媒の影響2015
- Author(s)
  竹本啓輝，垣内弘章，安武潔，大参宏昌
- Organizer
  第76回応用物理学会秋季学術講演会
- Place of Presentation
  名古屋国際会議場
- Year and Date
  2015-09-13
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 準大気圧雰囲気での水素プラズマ化学輸送法を用いたシリコンナノワイヤの形成2015
- Author(s)
  竹本啓輝，垣内弘章，安武潔，大参宏昌
- Organizer
  精密工学会 2015年度関西地方定期学術講演会
- Place of Presentation
  京都工芸繊維大学
- Year and Date
  2015-06-23
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] Impact of catalytic metal element on silicon nanowire growth by high-pressure hydrogen plasma chemical transport2015
- Author(s)
  H. Takemoto, Y. Ishikawa, H. Kakiuchi, K. Yasutake and H. Ohmi
- Organizer
  TACT 2015 International Thin Films Conference
- Place of Presentation
  National Cheng Kung University, Tainan, Taiwan
- Year and Date
  2015-11-15
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] High-rate metal evaporation induced by high-pressure hydrogen glow discharge plasma and its application to formation of metallic fine particle and porous film2015
- Author(s)
  H. Ohmi, H. Kakiuchi, and K. Yasutake
- Organizer
  TACT 2015 International Thin Films Conference
- Place of Presentation
  National Cheng Kung University, Tainan, Taiwan
- Year and Date
  2015-11-15
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-15K13848
[Presentation] Nucleation for Si film selective growth using GeO2 solution and high-pressure plasma2015
- Author(s)
  Hiromasa Ohmi, Akihiro Goto, Yuji Onoshita, Hiroaki Kakiuchi, Kiyoshi Yasutake
- Organizer
  20th international colloquium of plasma processes
- Place of Presentation
  Saint-Etienne, France
- Year and Date
  2015-06-01
- Int'l Joint Research
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 高圧水素プラズマによる液体金属の蒸発促進と金属膜の超高速形成2014
- Author(s)
  大参宏昌，垣内弘章，安武潔
- Organizer
  2014年度精密工学会春季大会学術講演会
- Place of Presentation
  東京
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] Development of Open Air Plasma Oxidation Process for Crystalline Si Solar Cells2014
- Author(s)
  Y. Fujiwara, Y. Kanetani, T. Yamada, H.　Ohmi, H.　Kakiuchi and K. Yasutake
- Organizer
  International Workshop on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 水素プラズマ化学輸送法によるシリコンナノワイヤ成長2014
- Author(s)
  石川祥博，垣内弘章，安武潔，大参宏昌
- Organizer
  2014年度精密工学会春季大会学術講演会
- Place of Presentation
  東京
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 大気圧プラズマ酸化によるAlOx/SiO2/Siスタック構造の形成と評価2014
- Author(s)
  藤原裕平，金谷優樹，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  2014年度精密工学会春季大会学術講演会
- Place of Presentation
  東京大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 水溶性Geを用いたプリンタブル核形成処理による選択的Si膜形成技術の開発2013
- Author(s)
  石川祥博,垣内弘章,安武潔,大参宏昌
- Organizer
  精密工学会 2013年度関西地方定期学術講演会
- Place of Presentation
  大阪
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] Printable formation of Ge film using a GeO2 solution by high-pressure hydrogen plasma reduction treatment2013
- Author(s)
  H.Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  TACT 2013 International Thin Films Conference
- Place of Presentation
  Taipei,Taiwan
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 大気開放プラズマ酸化による太陽電池用Si表面パッシベーョン技術の開発2013
- Author(s)
  藤原裕平，金谷優樹，山田高寛，大参宏昌，垣内弘章，安武潔
- Organizer
  2013年度精密工学会秋季大会学術講演会
- Place of Presentation
  関西大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] selective formation of silicon film by chemical transport technique using a high-pressure narrow-gap hydrogen plasma2013
- Author(s)
  H.Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  19th International Vacuum Congress IVC-19
- Place of Presentation
  Paris, France
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] Atmospheric Pressure Plasma Processing for Si Photovoltaics2012
- Author(s)
  K. Yasutake, H. Ohmi, T. Yamada and H. Kakiuchi
- Organizer
  2012 Kyrgyz-Japan Solar Energy Workshop
- Place of Presentation
  Bishkek (Kyrgyz)
- Invited
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] エピタキシャルSi太陽電池形成のための大気圧プラズマCVD技術の開発2012
- Author(s)
  金谷優樹, 後藤一磨, 三宮佑太, 卓澤騰, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Year and Date
  2012-03-14
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧VHFプラズマによるシリコン表面パッシベーションプロセスの開発2012
- Author(s)
  三宮佑太, 後藤一磨, 卓澤騰, 金谷優樹, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年春季第59回応用物理学関係連合講演会
- Place of Presentation
  早稲田大学
- Year and Date
  2012-03-17
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] エピタキシャルSi 太陽電池形成のための大気圧プラズマCVD 技術の開発2012
- Author(s)
  金谷優樹,後藤一磨,三宮佑太,卓澤騰,山田高寛,大参宏昌,垣内弘章,安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Year and Date
  2012-03-14
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 高圧プラズマ固体ソースエッチング法におけるプラズマ励起周波数の影響2012
- Author(s)
  大参宏昌、梅原弘毅、垣内弘章、安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] Surface passivation of Si by atmospheric-pressure plasma oxidation at low temperatures2012
- Author(s)
  卓澤騰, 三宮佑太, 後藤一磨, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2012年度精密工学会春季大会学術講演会
- Place of Presentation
  首都大学東京
- Year and Date
  2012-03-14
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Atmospheric Pressure Plasma Processes for Preparation of Si-Based Thin Films2012
- Author(s)
  K. Yasutake, H. Ohmi, T. Yamada, H. Kakiuchi
- Organizer
  59th AVS International Symposium
- Place of Presentation
  Tampa (USA)
- Invited
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Atmospheric-Pressure Plasma Oxidation Process for Si Surface Passivation2011
- Author(s)
  Y.Sannnomiya, K.Goto, ZT.Zhuo, Y.Kanetani, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  15th International Conference on Thin Films
- Place of Presentation
  京都
- Year and Date
  2011-11-09
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] エッチャント原料ガスフリーなプラズマエッチング法による太陽電池用シリコン基板の表面改質特性2011
- Author(s)
  梅原弘毅、垣内弘章、安武潔、大参宏昌
- Organizer
  2011年度精密工学会秋季大会学術講演会
- Place of Presentation
  金沢大学
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] Atmospheric-Pressure Plasma Processes for Efficient Formation of Functional Thin Films at Low-Temperatures2011
- Author(s)
  K.Yasutake, H.Ohmi, T.Yamada, H.Kakiuchi
- Organizer
  4th Int.Symp.on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪
- Year and Date
  2011-11-01
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Formation of SiO_xN_y Films for Passivation of Si Surfaces by Atmospheric-Pressure Plasma Oxidation2011
- Author(s)
  ZT.Zhuo, K.Goto, Y.Sannomiya, Y.Kanetani, T.Yamada, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  4th Int.Symp.on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪
- Year and Date
  2011-11-01
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Surface treatment for crystalline Si solar cell using a solid source high-pressure plasma etching method : texturing and affected layer removal2011
- Author(s)
  H.Ohmi, K.Umehara, H.Kakiuchi, K.Yasutake
- Organizer
  18th International Colloquium on Plasma Processes (CIP2011)
- Place of Presentation
  Nantes, France
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] Surface treatment for crystalline Si solar cell using a solid source high-pressure plasma etching method : texturing and affected layer removal2011
- Author(s)
  H. Ohmi, K. Umehara, H. Kakiuchi, K. Yasutake
- Organizer
  18th International Colloquium on Plasma Processes(CIP2011)
- Place of Presentation
  Nantes, France
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] 大気圧プラズマ酸化による太陽電池用Si表面パッシベーション技術の開発2011
- Author(s)
  後藤一磨, 卓澤騰, 三宮佑太, 金谷優樹, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2011年度精密工学会秋季大会学術講演会
- Place of Presentation
  金沢大学
- Year and Date
  2011-09-20
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧近傍でのプラズマ化学輸送を利用したシリコン材料プロセス2011
- Author(s)
  大参宏昌
- Organizer
  2011年春季応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学(厚木)(招待講演)
- Year and Date
  2011-03-25
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] Surface Passivation of N-type Si surfaces using SiO_2 grown by of Atmospheric-Pressure Plasma Oxidation Processing2011
- Author(s)
  卓澤騰, 大参宏昌, 垣内弘章, 安武潔, 他3名
- Organizer
  2011年度精密工学会春季大会学術講演会
- Place of Presentation
  講演論文集A66東洋大学(東京)
- Year and Date
  2011-03-01
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] シリコン太陽電池製造に向けたPFCガスフリーな大気圧ドライエッチング技術の開発2011
- Author(s)
  梅原弘毅、垣内弘章、安武潔、大参宏昌
- Organizer
  2011年度精密工学会春季大会
- Place of Presentation
  東洋大学(東京)
- Year and Date
  2011-03-16
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] 大気圧プラズマを用いたシリコン表面パッシベーションプロセスの開発2011
- Author(s)
  三宮佑太, 後藤一磨, 卓澤騰, 金谷優樹, 山田高寛, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会2011年度関西地方定期学術講演会
- Place of Presentation
  兵庫県立大学
- Year and Date
  2011-06-30
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧近傍でのプラズマ化学輸送を利用したシリコン材料プロセス2011
- Author(s)
  大参宏昌
- Organizer
  2011年春季応用物理学関係連合講演会
- Place of Presentation
  神奈川工科大学(厚木)
- Year and Date
  2011-03-25
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] 大気圧プラズマを用いたSi薄膜形成2010
- Author(s)
  安武潔, 大参宏昌, 山田高寛, 垣内弘章
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第98回研究会「高速・高品質化を実現する先端プラズマ技術(シリコン薄膜形成)」
- Place of Presentation
  弘済会館(東京)
- Year and Date
  2010-09-10
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] Atmospheric-Pressure Plasma Oxidation Process for Passivation of Si Surface2010
- Author(s)
  Z.T.Zhuo, H.Ohmi, H.Kakiuchi, K.Yasutake, 他3名
- Organizer
  63rd Gaseous Electronics Conf.and 7th Int.Conf on Reactive Plasmas
- Place of Presentation
  Maison de la Chimie (Paris)
- Year and Date
  2010-10-05
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] Atmospheric-Pressure Plasma Oxidation Process for Passivation of Si Surface2010
- Author(s)
  Z.T.Zhuo, H.Ohmi, H.Kakiuchi, K.Yasutake, 他2名
- Organizer
  精密工学会2010年度関西地方定期学術講演会
- Place of Presentation
  京都大学(京都)
- Year and Date
  2010-05-28
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] Development of Atmospheric-Pressure Plasma Oxidation Process for Surface Passivation of Si2010
- Author(s)
  Z.T.Zhuo, H.Ohmi, H.Kakiuchi, K.Yasutake, 他3名
- Organizer
  3rd Int.Symp.on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学中之島センター(大阪)
- Year and Date
  2010-11-24
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] 大気圧プラズマ酸化による太陽電池用Si表面パッシベーション膜の形成2010
- Author(s)
  後藤一磨, 大参宏昌, 垣内弘章, 安武潔, 他3名
- Organizer
  2010年度精密工学会秋季大会学術講演会
- Place of Presentation
  名古屋大学(名古屋)
- Year and Date
  2010-09-27
- Data Source
  KAKENHI-PROJECT-21656039
[Presentation] 大気圧プラズマを用いたSi 薄膜形成2010
- Author(s)
  安武潔,大参宏昌,山田髙寛,垣内弘章
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第98回研究会「高速・高品質化を実現する先端プラズマ技術 (シリコン薄膜形成)
- Place of Presentation
  弘済会館(東京)
- Year and Date
  2010-09-10
- Invited
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧プラズマCVD法によるSi選択エピタキシャル成長2009
- Author(s)
  大西崇之, 桐畑豊, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会春季大会学術講演会
- Place of Presentation
  中央大学(東京)
- Year and Date
  2009-03-11
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] New Formation Process of Solar-Grade Si Material Based on Atmospheric-Pressure Plasma Science2009
- Author(s)
  K.Yasutake, H.Ohmi, K.Inagaki, H.Kakiuchi
- Organizer
  2nd Int. Symp. on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学中之島会館(大阪市)
- Year and Date
  2009-11-26
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] In Situ Doped Si Selective Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2009
- Author(s)
  T.Ohnishi, Y.Kirihata, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  216th ECS meeting CVD-XVII & EUROCVD-17
- Place of Presentation
  Austria Center Vienna(オーストリア、ウィーン)
- Year and Date
  2009-10-05
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Si Selective Epitaxial Growth at Low Temperatures by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  Y. Kirihata, T. Ohnishi, H. Ohmi, H. Kakiuchi, K. Yasutake
- Organizer
  1^<st> Int. Symp. on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-
- Place of Presentation
  大阪大学
- Year and Date
  2009-02-16
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] (招待講演)大気圧プラズマCVD法による高品質Si系薄膜の低温形成2009
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Organizer
  2009年春季第56回応用物理学関係連合講演会第44回応用物理学会スクール「安価,簡単,便利～大気圧プラズマの基礎と応用～」
- Place of Presentation
  筑波大学(筑波市)
- Year and Date
  2009-04-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVDによる低温in situドープSi選択エピタキシャル成長に関する研究2009
- Author(s)
  大西崇之, 後藤一磨, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2009年度関西地方学術講演会
- Place of Presentation
  千里ライフサイエンスセンター(豊中市)
- Year and Date
  2009-05-13
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマ化学輸送法を用いたドライエッチング技術の開発2009
- Author(s)
  大参宏昌、垣内弘章、安武潔
- Organizer
  2009年度精密工学会秋季大会
- Place of Presentation
  神戸大学
- Year and Date
  2009-09-12
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] Low-Temperature Si Epitaxial Growth by Atmospheric-Pressure Plasma CVD2009
- Author(s)
  T.Ohnishi, K.Goto, H.Ohmi, H.Kakiuchi, K.Yasutake
- Organizer
  2nd Int. Symp. on Atomically Controlled Fabrication Technology
- Place of Presentation
  大阪大学中之島会館(大阪市)
- Year and Date
  2009-11-26
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Atmospheric-Pressure Plasma Processes for Efficient Formation of Si Thin Films at Low Temperatures2009
- Author(s)
  K. Yasutake, H. Ohmi, H. Kakiuchi
- Organizer
  1^<st> Int. Symp. on Atomically Controlled Fabrication Technology -Surface and Thin Film Processing-
- Place of Presentation
  大阪大学
- Year and Date
  2009-02-16
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による高品質Si系薄膜の低温形成2009
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Organizer
  第44回応用物理学会スクール「安価, 簡単, 便利～大気圧プラズマの基礎と応用～」
- Place of Presentation
  筑波大学(筑波市)(招待講演)
- Year and Date
  2009-04-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマ化学輸送法を用いたドライエッチング技術の開発2009
- Author(s)
  大参宏昌, 垣内弘章, 安武潔
- Organizer
  2009年度精密工学会秋季大会
- Place of Presentation
  神戸大学(神戸市)
- Year and Date
  2009-09-12
- Data Source
  KAKENHI-PROJECT-21686014
[Presentation] 大気圧プラズマプロセスによるSi系薄膜の低温形成2008
- Author(s)
  安武潔, 大参宏昌, 垣内弘章
- Organizer
  応用物理学会プラズマエレクトロニクス分科会第2回プラズマ新領域研究会
- Place of Presentation
  広島大学
- Year and Date
  2008-12-19
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による高品質Si系薄膜の形成2008
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第87回研究会
- Place of Presentation
  ホテル明山荘(蒲郡市)(招待講演)
- Year and Date
  2008-07-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による低温in situドープSi選択エピタキシャル成長2008
- Author(s)
  桐畑豊, 大西崇之, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2008年秋季第69回応用物理学会学術講演会
- Place of Presentation
  中部大学(愛知)
- Year and Date
  2008-09-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による高品質Si系薄膜の形成2008
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  日本学術振興会プラズマ材料科学第153委員会第87回研究会
- Place of Presentation
  ホテル明山荘(愛知)
- Year and Date
  2008-07-02
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures
- Place of Presentation
  Marseille, France
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Atmospheric-Pressure Plasma Processes for Fabrication of Si and SiO_2 Thin Films at Low-Temperatures (Invited)2007
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  第18回日本MRS学術シンポジウム
- Place of Presentation
  日本大学(駿河台)
- Year and Date
  2007-12-08
- Data Source
  KAKENHI-PROJECT-18656046
[Presentation] 大気圧プラズマCVDによる高品質エピタキシャルSiの低温成長2007
- Author(s)
  桐畑豊, 野村徹, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会2007年度関西地方定期学術講演会
- Place of Presentation
  大阪産業大学(大東市)
- Year and Date
  2007-08-09
- Data Source
  KAKENHI-PROJECT-18656046
[Presentation] Preparation of Si1・xGex and SiC Compound Films by Atmospheric-pressure Plasma Enhanced Chemical Transport2007
- Author(s)
  Hiromasa OHMI, Yoshinori HAMAOKA, Daiki KAMADA, BLLroaki KAKIUCHI and Kisyohi YASUTAKE
- Organizer
  The 22nd European Photovoltaic Solar Energy Conference and Exhibition
- Place of Presentation
  Milan,Ltaly
- Year and Date
  2007-09-04
- Data Source
  KAKENHI-PROJECT-18760235
[Presentation] Atmospheric-Pressure Plasma Processes for Fabrication of Si and SiO_2 Thin Films at Low-Temperatures (Invited)2007
- Author(s)
  安武潔, 垣内弘章, 大参宏昌
- Organizer
  第18回日本MRS学術シンポジウム
- Place of Presentation
  日本大学(駿河台)
- Year and Date
  2007-12-08
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法による高品質Siエピタキシャル膜の低温成長2007
- Author(s)
  桐畑豊, 田原直剛, 大参宏昌, 垣内弘章, 渡部平司, 安武潔
- Organizer
  2007年春季第54回応用物理学関係連合講演会
- Place of Presentation
  青山学院大学(相模原)
- Year and Date
  2007-03-29
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法で低温成長したエピタキシャルSi薄膜の電気特性評価2007
- Author(s)
  桐畑豊, 野村徹, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2007年度精密工学会秋季大会学術講演会
- Place of Presentation
  旭川市ときわ市民ホール
- Year and Date
  2007-09-14
- Data Source
  KAKENHI-PROJECT-18656046
[Presentation] In situ B doped Si Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2007
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi and K. Yasutake
- Organizer
  Int. 21st Century COE Symp. on Atomistic Fabrication Technology 2007
- Place of Presentation
  大阪大学(吹田)
- Year and Date
  2007-10-15
- Data Source
  KAKENHI-PROJECT-18656046
[Presentation] In situ B doped Si Epitaxial Growth at Low Temperatures by Atmospheric Pressure Plasma CVD2007
- Author(s)
  Y. Kirihata, T. Nomura, H. Ohmi, H. Kakiuchi and K. Yasutake
- Organizer
  Int. 21st Century COE Symp. on Atomistic Fabrication Technology 2007
- Place of Presentation
  大阪大学(吹田)
- Year and Date
  2007-10-15
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] Characterization of epitaxial Si films grown at low-temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  Y. Kirihata, N. Tawara, H. Ohmi, H. Kakiuchi, H. Watanabe, K. Yasutake
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures, 2007
- Place of Presentation
  マルセイユ
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-18656046
[Presentation] Atmospheric-pressure plasma processes for fabrication of Si and SiO2 thin films at low-temperatures2007
- Author(s)
  K. Yasutake, H. Ohmi, H. Kakiuchi
- Organizer
  第18回日本MRS学術シンポジウム
- Place of Presentation
  日本大学(千代田区)(招待講演)
- Year and Date
  2007-12-08
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVD法で低温成長したエピタキシャルSi薄膜の電気特性評価2007
- Author(s)
  桐畑豊, 野村徹, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  2007年度精密工学会秋季大会学術講演会
- Place of Presentation
  旭川市ときわ市民ホール
- Year and Date
  2007-09-14
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 大気圧プラズマCVDによる高品質エピタキシャルSiの低温成長2007
- Author(s)
  桐畑豊, 野村徹, 大参宏昌, 垣内弘章, 安武潔
- Organizer
  精密工学会 2007年度関西地方定期学術講演会
- Place of Presentation
  大阪産業大学(大東市)
- Year and Date
  2007-08-09
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures, 2007
- Place of Presentation
  マルセイユ
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-18656046
[Presentation] Characterization of epitaxial Si films grown at low-temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  Y. Kirihata, N. Tawara, H. Ohmi, H. Kakiuchi, H. Watanabe, K. Yasutake
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures, 2007
- Place of Presentation
  マルセイユ
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD2007
- Author(s)
  K. Yasutake, H. Ohmi, Y. Kirihata, H. Kakiuchi
- Organizer
  5th Int. Conf. on Silicon Epitaxy and Heterostructures, 2007
- Place of Presentation
  マルセイユ
- Year and Date
  2007-05-21
- Data Source
  KAKENHI-PROJECT-19206018
[Presentation] 低純度Si精製に向けたジボラン（B2H6）選択除去手法の開発とその特性評価
- Author(s)
  大参宏昌，垣内弘章，安武潔
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学
- Year and Date
  2014-09-17 – 2014-09-20
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 薄型結晶Si太陽電池のための大気開放プラズマ酸化プロセスの開発
- Author(s)
  藤原裕平,金谷優樹,山田高寛,大参宏昌,垣内弘章,安武潔
- Organizer
  精密工学会 2013年度関西地方定期学術講演会
- Place of Presentation
  大阪工業大学
- Data Source
  KAKENHI-PROJECT-22246017
[Presentation] 大気圧近傍の非平衡水素プラズマを用いた材料変換プロセスの開発
- Author(s)
  大参宏昌
- Organizer
  第68回マテルアルズ・テーラリング研究会
- Place of Presentation
  軽井沢研修センタ－
- Year and Date
  2014-07-24 – 2014-07-26
- Invited
- Data Source
  KAKENHI-PROJECT-25630027
[Presentation] 水素プラズマによる固体炭素源からの炭化水素ガスの生成特性とSiC薄膜形成への応用
- Author(s)
  篠田史也，垣内弘章，安武潔，大参宏昌
- Organizer
  第68回マテリアルズ・テーラリング研究会
- Place of Presentation
  軽井沢研修センタ－
- Year and Date
  2014-07-24 – 2014-07-26
- Data Source
  KAKENHI-PROJECT-25630027
[Presentation] Boron Elimination Filter from SiH4 and B2H6 Gas Mixture for Purification of Metallurgical Si
- Author(s)
  H. Ohmi, H. Kakiuchi, and K. Yasutake
- Organizer
  225th ECS Meeting
- Place of Presentation
  Orlando, FL, USA
- Year and Date
  2014-05-11 – 2014-05-15
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 大気圧近傍の非平衡水素プラズマを用いた材料変換プロセスの開発
- Author(s)
  大参宏昌
- Organizer
  第68回マテルアルズ・テーラリング研究会
- Place of Presentation
  軽井沢研修所
- Year and Date
  2014-07-24 – 2014-07-26
- Invited
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] SiH4 conversion rate in Si etching reaction induced by high-pressure hydrogen plasma
- Author(s)
  Hiromasa Ohmi, Hiroaki Kakiuchi, and Kiyoshi Yasutake
- Organizer
  13th European Vacuum Conference
- Place of Presentation
  Aveiro, Portugal
- Year and Date
  2014-09-08 – 2014-09-12
- Data Source
  KAKENHI-PROJECT-25289016
[Presentation] 水素プラズマによる金属の蒸発促進と高速成膜への応用
- Author(s)
  大参宏昌，垣内弘章，安武潔
- Organizer
  第75回応用物理学会秋季学術講演会
- Place of Presentation
  北海道大学
- Year and Date
  2014-09-17 – 2014-09-20
- Data Source
  KAKENHI-PROJECT-25289016

1. YASUTAKE Kiyoshi (80166503)

# of Collaborated Projects: 10 results

# of Collaborated Products: 143 results
2. KAKIUCHI Hiroaki (10233660)

# of Collaborated Projects: 5 results

# of Collaborated Products: 77 results
3. WATANABE Heiji (90379115)

# of Collaborated Projects: 1 results

# of Collaborated Products: 13 results
4. SHIMURA Takayoshi (90252600)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
5. 芳井熊安 (30029152)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
6. SIHONDA Fumiya

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
7. HIRANO Tatsuya

# of Collaborated Projects: 1 results

# of Collaborated Products: 1 results
8. TAKEI Norihisa

# of Collaborated Projects: 1 results

# of Collaborated Products: 2 results
9. 志村孝功

# of Collaborated Projects: 0 results

# of Collaborated Products: 1 results

Ohmi Hiromasa 大参 宏昌

OHMI Hiromasa 大参 宏昌

Research Projects

Research Products

Co-Researchers

Development of a smart manufacturing process for ultrathin crystalline Si solar cell using hydrogen plasmaPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

nanostructuring on semiconductor surface for optical management by high-pressure hydrogen plasmaPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Development of metal wiring process with low environmental load using high-density hydrogen radicalsPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Review Section

Research Institution

Formation of Nitride Nanostructures by Reaction of High Density N Radicals with Metals

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of chemical-free and sophisticated manufacturing process for semiconductor substrate through hydrogen cyclePrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of soft process of dimensional transformation for Si by non-equilibrium high-pressure hydrogen plasmaPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Direct formation of the high-quality nanowire Si from metallurgical Si source based on the plasma and nanotechnology sciencePrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Synthesis of industrial diamond film from woody biomass feedstock at low temperature and normal pressurePrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Atmospheric-pressure plasma processes for high-rate film formation applicable for thin crystalline Si solar cells

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

大気圧プラズマを用いた機能性界面創生によるSi表面パッシベーション技術の開発

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development of eco-friendly surface treatment technique for photovoltaic crystalline Si substrate by using fluorine resignsPrincipal Investigator

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

Development and application of totally low-temperature semiconductor process using atmospheric-pressure plasma

Principal Investigator

Project Period (FY)

Research Category

Research Field

Research Institution

インライン対応シリコン低温選択エビ技術の開発

Principal Investigator

Project Period (FY)

Ohmi Hiromasa 大参宏昌

OHMI Hiromasa 大参宏昌

[Book] 超精密加工と表面科学－原子レベルの生産技術－「大気圧プラズマ化学輸送法」2014

[Book] 超精密加工と表面科学－原子レベルの生産技術－「大気圧プラズマ化学輸送法」2014

[Book] 大気圧プラズマの生成制御と応用技術(監修小駒益弘),大気圧プラズマCVD によるシリコン薄膜の形成2012