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畑谷 成郎  ハタタニ シゲオ

ORCIDConnect your ORCID iD *help
Researcher Number 90302942
Affiliation (based on the past Project Information) *help 2001: 東工大, 助手
2000: 東京工業大学, 大学院・理工学研究科, 助手
2000: 東京工業大学, 量子効果エレクトニクスセンター, 助手
2000: 東京工業大学, 量子効果エレクトロニクス研究センター, 助手
1999: 東京工業大学, 工学部, 助手
Review Section/Research Field
Principal Investigator
Electronic materials/Electric materials
Except Principal Investigator
Electronic materials/Electric materials / Applied materials science/Crystal engineering / 電子デバイス・機器工学
Keywords
Principal Investigator
シリコン / ナノ / ナノ結晶 / ナノ結晶シリコン / 酸化 / 窒化 / 量子効果 / 単電子デバイス
Except Principal Investigator
ナノ結晶シリコン / 単電子トンネル … More / nanocrystalline silicon / nano-technology / パルスプラズマプロセス / シリコン表面 / 微細加工プロセス / 量子ドット相関 / 単電子メモリ / バリスティック伝導 / pulsed plasma processing / interface / single electron tunneling / single electron memory / ballistic transport / surface electron emitter / プラズマCVD / 量子ドット / ストレス下の酸化 / 透過型電子顕微鏡観察 / フォトルミネッセンス / リンガラス低温融解 / 電子放出素子 / 酸化 / 単電子トランジスタ / 自己停止機構 / self-limiting oxidation / luminescence / stress effect / no phonon assisted / quasi-direct transition / planerization / Phase Shift / Excimer laser / Poly-Si / Re-crystallization / ELA / TFT / Siグレイン / エキシマレーザ / phase shift / excimer laser annealing / polycrystalline silicon / re-crystallization / thinfilm transistors / large grain size / silicon / oxide interface / silicon on glass Less
  • Research Projects

    (4 results)
  • Co-Researchers

    (7 People)
  •  超微細ナノ結晶シリコンの表面酸化及び表面空化Principal Investigator

    • Principal Investigator
      畑谷 成郎
    • Project Period (FY)
      2000 – 2001
    • Research Category
      Grant-in-Aid for Encouragement of Young Scientists (A)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tokyo Institute of Technology
  •  Twin Grain Thin Film Transistors

    • Principal Investigator
      MACHIDA Shinya, 松村 正清
    • Project Period (FY)
      2000 – 2001
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      電子デバイス・機器工学
    • Research Institution
      Tokyo Institute of Technology
  •  Single Electron Devices Based on NeoSilicon Materials

    • Principal Investigator
      ODA Shunri
    • Project Period (FY)
      1999 – 2001
    • Research Category
      Grant-in-Aid for Scientific Research (A)
    • Research Field
      Electronic materials/Electric materials
    • Research Institution
      Tokyo Institute of Technology
  •  Control of Particle Size and Position of Nano-crystalline Silicon

    • Principal Investigator
      ODA Shunri
    • Project Period (FY)
      1999 – 2001
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Tokyo Institute of Technology
  • 1.  ODA Shunri (50126314)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 2.  TSUCHIYA Yoshishige (80334506)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 3.  MACHIDA Shinya (70313335)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 4.  UCHIDA Yasutaka (80134823)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 5.  松村 正清 (30110729)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 6.  SHIMADA Toshikazu
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 7.  MIMURA Akio
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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