節原 裕一  Setsuhara Yuichi

Thin Solid Films

巻: 790 ページ: 140203-140203

10.1016/j.tsf.2024.140203

Japanese Journal of Applied Physics

巻: 62 号: SI ページ: SI1005-SI1005

10.35848/1347-4065/acbd56

Japanese Journal of Applied Physics

巻: 62 号: SL ページ: SL1018-SL1018

10.35848/1347-4065/acdb7e

Vacuum

巻: 215 ページ: 112227-112227

10.1016/j.vacuum.2023.112227

Japanese Journal of Applied Physics

巻: 58 号: SA ページ: SAAC03-SAAC03

10.7567/1347-4065/aaec18

210000135226

Journal of Alloys and Compounds

巻: 772 ページ: 642-649

10.1016/j.jallcom.2018.09.143

Japanese Journal of Applied Physics

巻: 58 号: 9 ページ: 090605-090605

10.7567/1347-4065/ab219c

210000156015

Jpn J Appl Phys

巻: 57 号: 1 ページ: 0102B4-0102B4

10.7567/jjap.57.0102b4

Applied Physics Letters

巻: 112 号: 15 ページ: 152103-152103

10.1063/1.5011268

Japanese Journal of Applied Physics

巻: 57 号: 1S ページ: 01AD06-01AD06

10.7567/jjap.57.01ad06

Japanese Journal of Applied Physics

巻: 55 号: 1S ページ: 01AA18-01AA18

10.7567/jjap.55.01aa18

EEE Transactions on Plasma Science

巻: 44 号: 12 ページ: 3099-3106

10.1109/tps.2016.2593458

Journal of Applied Physics

巻: 120 号: 20 ページ: 203302-203302

10.1063/1.4968568

Japanese Journal of Applied Physics

巻: 56 号: 1S ページ: 01AC06-01AC06

10.7567/jjap.56.01ac06

210000147376

Archives of Biochemistry and Biophysics

巻: 605 ページ: 3-10

10.1016/j.abb.2016.04.009

Japanese Journal of Applied Physics

巻: 55 号: 1S ページ: 01AH03-01AH03

10.7567/jjap.55.01ah03

210000146000

Japanese Journal of Applied Physics

巻: 54 号: 6S2 ページ: 06GC02-06GC02

10.7567/jjap.54.06gc02

210000145321

J. Nanosci. Nanotechnol.

巻: 15 号: 3 ページ: 2192-2196

10.1166/jnn.2015.10233

Japanese Journal of Applied Physics

巻: 印刷中

J. Nanosci. Nanotechnol.

巻: 15 号: 3 ページ: 2115-2119

10.1166/jnn.2015.10229

IEEE Trans. Plasma Sci.

巻: 43 号: 3 ページ: 734-744

10.1109/tps.2014.2387064

J. Nanosci. Nanotechnol.

巻: 15 号: 3 ページ: 2324-2329

10.1166/jnn.2015.10232

IEEE Transactions on Plasma Science

巻: 43 号: 12 ページ: 4081-4087

10.1109/tps.2015.2488619

J. Nanosci. Nanotechnol.

巻: 15 号: 3 ページ: 2120-2124

10.1166/jnn.2015.10230

IEEE Transactions on Plasma Science

巻: 43 号: 11 ページ: 3821-3826

10.1109/tps.2015.2482998

Journal of Applied Physics

巻: 118 号: 4 ページ: 043301-043301

10.1063/1.4927217

Journal of Applied Physics

巻: 117 号: 15 ページ: 1533011-6

10.1063/1.4918546

Journal of Physics: Conference Series

巻: 未定

スマートプロセス学会誌

巻: 3 ページ: 15-21

130004972746

Jpn. J. Appl. Phys.

巻: 53 号: 11S ページ: 11RA08-11RA08

10.7567/jjap.53.11ra08

210000144622

J. Phys. : Conf. Ser.

巻: 518 ページ: 12018-12018

10.1088/1742-6596/518/1/012018

J. Phys. : Conf. Ser.

巻: 518 ページ: 12019-12019

10.1088/1742-6596/518/1/012019

スマートプロセス学会誌

巻: 3 ページ: 15-21

130004972746

Journal of Physics: Conference Series

巻: 未定

Jpn. J. Appl. Phys.

巻: 54 号: 1S ページ: 01AF04-01AF04

10.7567/jjap.54.01af04

210000144756

Japanese Journal of Applied Physics

巻: 52 号: 11S ページ: 11NB05-11NB05

10.7567/jjap.52.11nb05

210000143099

Journal of Physics: Conference Series

巻: 掲載確定

Surface and Coatings Technology

巻: 228 ページ: S271-S275

10.1016/j.surfcoat.2012.05.126

表面技術

巻: 64 ページ: 628-633

130004704921

Jpn. J. Appl. Phys.

巻: 52 号: 11S ページ: 11NE04-11NE04

10.7567/jjap.52.11ne04

210000143115

Current Applied Physics

巻: 13 ページ: S59-S63

10.1016/j.cap.2013.01.030

MRS Proc.

巻: 1598

10.1557/opl.2013.1155

Journal of Physics: Conference Series

巻: 441 ページ: 012001-012001

10.1088/1742-6596/441/1/012001

Jpn. J. Appl. Phys.

巻: 51 号: 1S ページ: 01AJ02-01AJ02

10.1143/jjap.51.01aj02

210000140089

Thin Solid Films

巻: 523 ページ: 15-19

10.1016/j.tsf.2012.05.061

高温学会誌

巻: 37 ページ: 289-297

10030167027

高温学会誌

巻: 37 ページ: 289-297

10030167027

The international workshop on advanced thin films and surface technology, Changwon, Korea., Novemver 13, 2007

ページ: 3-3

Proc. 24th Symp. on Plasma Processing, Osaka, Japan, 2007.1.29-31

ページ: 61-62

Trans-Pacific Workshop on Flexible Electronics, Dallas, USA, December 3, 2007.

ページ: 16-16

Proc. 24th Symp. on Plasma Processing, Osaka, Japan, 2007.1.29-31

ページ: 111-112

11th International Conferences on Modern Materials and Technologies, Acireale, Sicily, Italy, 2006.6.4-9, (2006) (INVITED)

ページ: 179-180

Proc.6th International Conf. on Reactive Plasmas and 23rd Symp. on Plasma Processing, Matsushima, Japan, Jan.24-27

ページ: 183-184

Proc.6^<th> International Conf.on Reactive Plasmas and 23^<nd> Symp.on Plasma Processing, Matsushima, Japan, Jan.24-27,(2006)

ページ: 179-180

Thin Solid Films (in press)

120005553870

Research Report for Feasibility of Applications in Optical Technologies - Femtosecond Laser Processing Technologies - (Optoelectronic Industry And Technology Development Association)

ページ: 63-89

4th International Conference on Silicon Epitaxy and Hetereostructures (ICSI-4), Awaji, Japan, May 23-26, (2005)

ページ: 306-307

プラズマ・核融合学会誌 81・2

ページ: 85-93

110003827774

表面技術 56・5

ページ: 268-275

10015665593

J.Plasma and Fusion Research 81(2)

ページ: 85-93

110003827774

表面技術 56・5

ページ: 268-275

10015665593

Thin Solid Films (in press)

120005553870

4th International Conference on Silicon Epitaxy and Heterostructures (ICSI-4), Awaji, Japan, May 23-26

ページ: 306-307

プラズマ・核融合学会誌 81・2

ページ: 85-93

110003827774

光技術応用システムのフィージビリティー調査報告書-フェムト秒加工技術-(財団法人光産業技術振興協会)

ページ: 63-89

Thin Solid Films (in press)

120005553870

J.Surface Finishing Society of Japan 56(5)

ページ: 268-275

10015665593

Bulletin of the American Physical Society Vol.49,No.5

ページ: 40-40

Ninth International Conference on Plasma Surface Engineering (Garmisch-Partenkirchen, Germany, September 13-17)

ページ: 372-372

Proc.7th China-Japan Symposium on Thin Films (Chengdu, China, September 20-22, 2004)

ページ: 23-24

Proc.The International Union of Material Research Society -International Conference in Asian 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18, (2004) (CDROM)

ページ: 1-12

Proc.7th China-Japan Symposium on Thin Films, Chengdu Sichuan, China, September 20-22

ページ: 23-24

Proc.The International Union of Material Research Society - International Conference in Asian 2004 (IUMRS-ICA-2004),Hsinchu, Taiwan, November 16-18,(2004) (CDROM)

ページ: 1-12

表面技術 Vol.55 No.12

ページ: 793-799

10014096314

Proc.The International Union of Material Research Society - International Conference in Asia 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18, (2004) (CDROM)

ページ: 1-12

Ninth International conference on Plasma Surface Engineering(Garmisch-Partenkirchen, Germany, September 13-17,2004)

ページ: 372-372

Proc.7th China-Japan Symposium on Thin Films(Chengdu, China, September 20-22,2004)

ページ: 23-24

Proc. The International Union of Material Research Society - International Conference in Asian 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18 (CD-ROM)

ページ: 1-12

J.Surface Finishing Soc.Jpn.[in Japanese] Vol.55, No.12

ページ: 793-799

10014096314

Bulletin of the American Physical Society Vol.49,No.5

ページ: 40-40

Ninth International Conference on Plasma Surface Engineering (Garmisch-Partenkirchen, Germany, September 13-17, 2004)

ページ: 372-372

4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003), Jeju, Korea, September 28-October 3

4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003), Jeju, Korea, September 28-October 3

International Conference on the Characterization and Control of Interfaces for High Quality Advanced Materials, Kurashiki, Japan, September 24-27

ページ: 91-91

International Conference on the Characterization and Control of Interfaces for High Qulity Advanced Materials, Kurashiki, Japan, September 24-27

ページ: 91-91

Proc.2nd International Symposium on Dry Process, DPS-2004, Tokyo, Japan 2002

ページ: 177-182

Proc.2nd International Symposium on Dry Process, DPS-2004, Tokyo (IEEJ, Tokyo, 2002)

ページ: 177-182