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すべて 雑誌論文 学会発表 産業財産権
Japanese Journal of Applied Physics
巻: 58 号: SA ページ: SAAC03-SAAC03
10.7567/1347-4065/aaec18
210000135226
Journal of Alloys and Compounds
巻: 772 ページ: 642-649
10.1016/j.jallcom.2018.09.143
Applied Physics Letters
巻: 112 ページ: 152103-152103
10.1063/1.5011268
巻: 57 号: 1 ページ: 0102B4-0102B4
10.7567/jjap.57.0102b4
巻: 57 号: 1S ページ: 01AD06-01AD06
10.7567/jjap.57.01ad06
210000148549
巻: 55 号: 1S ページ: 01AA18-01AA18
10.7567/jjap.55.01aa18
巻: 56 号: 1S ページ: 01AC06-01AC06
10.7567/jjap.56.01ac06
210000147376
EEE Transactions on Plasma Science
巻: 44 ページ: 3099-3106
10.1109/tps.2016.2593458
J. Appl. Phys.
巻: 120 ページ: 203302-203302
10.1063/1.4968568
巻: 55 号: 1S ページ: 01AH03-01AH03
10.7567/jjap.55.01ah03
210000146000
Archives of Biochemistry and Biophysics
巻: 605 ページ: 3-10
10.1016/j.abb.2016.04.009
巻: 印刷中
IEEE Transactions on Plasma Science
巻: 43 ページ: 3821-3826
10.1109/tps.2015.2482998
J. Nanosci. Nanotechnol.
巻: 15 ページ: 2324-2329
10.1166/jnn.2015.10232
巻: 15 ページ: 2115-2119
10.1166/jnn.2015.10229
Journal of Applied Physics
巻: 117 ページ: 1533011-6
10.1063/1.4918546
IEEE Trans. Plasma Sci.
巻: 43 ページ: 734-744
10.1109/tps.2014.2387064
巻: 15 ページ: 2120-2124
10.1166/jnn.2015.10230
巻: 15 ページ: 2192-2196
10.1166/jnn.2015.10233
J Appl Phys
巻: 118 ページ: 043301-043301
10.1063/1.4927217
巻: 54 号: 6S2 ページ: 06GC02-06GC02
10.7567/jjap.54.06gc02
210000145321
IEEE Trans. Plasma Science
巻: 43 ページ: 4081-4087
10.1109/tps.2015.2488619
Journal of Physics: Conference Series
巻: 518 ページ: 012018-012018
10.1088/1742-6596/518/1/012018
スマートプロセス学会誌
巻: 3 ページ: 15-21
130004972746
巻: 未定
巻: 53 号: 11S ページ: 11RA08-11RA08
10.7567/jjap.53.11ra08
210000144622
巻: 518 ページ: 012019-012019
10.1088/1742-6596/518/1/012019
巻: 54 号: 1S ページ: 01AF04-01AF04
10.7567/jjap.54.01af04
210000144756
Current Applied Physics
巻: 13
10.1016/j.cap.2013.01.030
巻: 52 号: 11S ページ: 11NE04-11NE04
10.7567/jjap.52.11ne04
210000143115
MRS Proceedings (Published online by Cambridge University Press)
巻: 1598
10.1557/opl.2013.1155
J. Phys.: Conf. Ser.
巻: 441
10.1088/1742-6596/441/1/012001
表面技術
巻: 64 ページ: 628-633
130004704921
Surface and Coatings Technology
巻: 228
10.1016/j.surfcoat.2012.05.126
巻: 掲載確定
巻: 52 号: 11S ページ: 11NB05-11NB05
10.7567/jjap.52.11nb05
210000143099
Thin Solid Films
巻: 523 ページ: 15-19
10.1016/j.tsf.2012.05.061
巻: 51 号: 1 ページ: 01AJ02-01AJ02
10.1143/jjap.51.01aj02
高温学会誌
巻: 37 ページ: 289-297
10030167027
Proc. 24th Symp. on Plasma Processing, Osaka, Japan, 2007.1.29-31
ページ: 111-112
ページ: 61-62
Trans-Pacific Workshop on Flexible Electronics, Dallas, USA, December 3, 2007.
ページ: 16-16
The international workshop on advanced thin films and surface technology, Changwon, Korea., Novemver 13, 2007
ページ: 3-3
Thin Solid Films (in press)
120005553870
Proc.6^<th> International Conf.on Reactive Plasmas and 23^<nd> Symp.on Plasma Processing, Matsushima, Japan, Jan.24-27,(2006)
ページ: 179-180
Proc.6th International Conf. on Reactive Plasmas and 23rd Symp. on Plasma Processing, Matsushima, Japan, Jan.24-27
ページ: 183-184
11th International Conferences on Modern Materials and Technologies, Acireale, Sicily, Italy, 2006.6.4-9, (2006) (INVITED)
J.Surface Finishing Society of Japan 56(5)
ページ: 268-275
10015665593
J.Plasma and Fusion Research 81(2)
ページ: 85-93
110003827774
表面技術 56・5
4th International Conference on Silicon Epitaxy and Hetereostructures (ICSI-4), Awaji, Japan, May 23-26, (2005)
ページ: 306-307
光技術応用システムのフィージビリティー調査報告書-フェムト秒加工技術-(財団法人光産業技術振興協会)
ページ: 63-89
プラズマ・核融合学会誌 81・2
4th International Conference on Silicon Epitaxy and Heterostructures (ICSI-4), Awaji, Japan, May 23-26
Research Report for Feasibility of Applications in Optical Technologies - Femtosecond Laser Processing Technologies - (Optoelectronic Industry And Technology Development Association)
Proc.The International Union of Material Research Society - International Conference in Asian 2004 (IUMRS-ICA-2004),Hsinchu, Taiwan, November 16-18,(2004) (CDROM)
ページ: 1-12
Proc.7th China-Japan Symposium on Thin Films(Chengdu, China, September 20-22,2004)
ページ: 23-24
Ninth International Conference on Plasma Surface Engineering (Garmisch-Partenkirchen, Germany, September 13-17, 2004)
ページ: 372-372
Proc. The International Union of Material Research Society - International Conference in Asian 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18 (CD-ROM)
Proc.The International Union of Material Research Society -International Conference in Asian 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18, (2004) (CDROM)
Proc.7th China-Japan Symposium on Thin Films (Chengdu, China, September 20-22, 2004)
Proc.The International Union of Material Research Society - International Conference in Asia 2004 (IUMRS-ICA-2004), Hsinchu, Taiwan, November 16-18, (2004) (CDROM)
J.Surface Finishing Soc.Jpn.[in Japanese] Vol.55, No.12
ページ: 793-799
10014096314
Bulletin of the American Physical Society Vol.49,No.5
ページ: 40-40
表面技術 Vol.55 No.12
Ninth International conference on Plasma Surface Engineering(Garmisch-Partenkirchen, Germany, September 13-17,2004)
Proc.7th China-Japan Symposium on Thin Films, Chengdu Sichuan, China, September 20-22
Ninth International Conference on Plasma Surface Engineering (Garmisch-Partenkirchen, Germany, September 13-17)
International Conference on the Characterization and Control of Interfaces for High Quality Advanced Materials, Kurashiki, Japan, September 24-27
ページ: 91-91
4th Asian-European International Conference on Plasma Surface Engineering (AEPSE 2003), Jeju, Korea, September 28-October 3
International Conference on the Characterization and Control of Interfaces for High Qulity Advanced Materials, Kurashiki, Japan, September 24-27
Proc.2nd International Symposium on Dry Process, DPS-2004, Tokyo, Japan 2002
ページ: 177-182
Proc.2nd International Symposium on Dry Process, DPS-2004, Tokyo (IEEJ, Tokyo, 2002)
