SHIMOZUMA Mitsuo 下妻光夫

Researcher Number	70041960
Other IDs
External Links
Affiliation (based on the past Project Information) *help	2003 – 2004: 北海道大学, 医学部, 教授 1998 – 2001: 北海道大学, 医療技術短期大学部, 教授 1987 – 1995: College of Medical Technology, Hokkaido University, 医療技術短期大学部, 助教授 1994: 北海道大学医療技術短期大学部, 助教授 1992: 北海道大学, 医療短期大学部, 助教授 … More 1986: Hokkaido University, College of Medical. Technology,Instructor, 医療技術短期大学部, 助手 1986: 北海道大学, 大学併設短期大学部, 助手 1986: Faculty of Engineering, Hokkaido University , Instractor, 工学部, 助手 1985: 北海道大学, 短大, 助手 Less
Review Section/Research Field	Principal Investigator 電子材料工学 / Electronic materials/Electric materials / Electronic materials/Electric materials Except Principal Investigator 電力工学 / 電力工学・電気機器工学 / 電子材料工学 / Material processing/treatments / Electronic materials/Electric materials / 応用物理学一般(含航海学)
Keywords	Principal Investigator プラズマCVD / 低周波プラズマ / 薄膜堆積 / ドライプロセス / Plasma CVD / TiN / GaAs / プラズマ制御 / 窒化シリコン / 反応性プラズマ … More / MOVPE / CCD / SiC / TiO_2 / プラズマCVD法 / プラズマプロセス / 拡散バリア材 / 薄膜生成 / 表面保護膜 / Device surface passivation / Interiayer insulation / Thin film deposition / Low temterature process / Low frequency(50Hz) / Silicon nitride / 最終保護膜 / 層間絶縁膜 / シラン窒素混合ガス / 低温プロセス / 絶縁薄膜 / 室温プロセス / シリコン窒化膜 / デポジション / 低周波 / selective doping / heterojunction / MBE / 有機金属気相成長 / 電荷結合素子 / 選択ドープ / ヘテロ接合 / Plasma Processing / Thin Film Radiation Detector / Alumina Structure / Ceramics Structure / Small size Radiation Detector / 生体適用放射線センサー / 紫外線センサー / TiO_2膜 / TiO_2薄膜 / 薄膜センサー / 放射線センサー / 薄膜放射線センサー / アルミナ構造 / セラミクス構造 / 微小放射線センサー / integrated circuit material / thin film low temperature deposition / diffusion barrier material / low frequency plasnra CVD / low frequency plasma / thin film deposition / plasma CVD / 薄膜低温形成 / 集積回路材 / 薄膜低温生成 / 低周波プラズマCVD / Passivation film / H_2+CH_4 mixture / Diamond thin film / Chemical vapor deposition / Low temperature process / Low frequency plasma / Amorphous carbon / アモルファスカ-ボン薄膜 / SiH_4+N_2混合ガス / プラズマ解離 / 13.56MHzRFプラズマCVD法 / RFプラズマCVD法 / 半導体低温プロセス / ダイヤモンド薄膜 / アモルファスカ-ボン膜 / CH_4+H_2混合ガス / 低周波プラズマCVD法 / アモルファスカーボン薄膜 / ドライプロセス技術 / ICTS / C-V特性 / 陽極酸化法 / 局在準位 / 界面準位 / MIS構造 / 非晶質シリコン / 微細加工 / 集積回路 / 集積回路ドライプロセス / SiH_4 / SiOx膜 / ポリマー / 代替ガラス / 表面硬質 / 非加熱薄膜堆積 / 50HzプラズマCVD / SiH_4+N_2O / シリコン酸化膜 / アモルファスカ-ボン / アラモルファスカ-ボン … More Except Principal Investigator プラズマCVD / ベーパーミスト誘電体 / MBE / MOVPE / GIS / FTIR / TEOS / Gas Insulation / 混合ガス / SF_6 / 交流破壊電圧 / 絶縁破壊 / ファインパウダ / fine particle measurement / dielectric liquids / dielectric strength / vapor-mist dielectric / 微粒径計測 / パルス波高分布分析 / 微粒子計測 / 誘電液体 / 電気絶縁耐力 / Traveling-wave amplification / Microwave device / Superlattice / Compound semiconductor / MOCVD / 進行波増幅 / マイクロ波素子 / 超格子構造 / 化合物半導体 / <SF_6> / Synergism / Gas Insulated Cubicle / Vapor-Mist Dielectrics / Gas Mixtures / 電子付着係数 / 実効電離係数 / 絶縁破壊特性 / c-GIS / フロロカーボン / 【SF_6】 / 相乗効果 / ガス絶縁キュービクル / ガス絶縁 / solid-state detectors / triode electrode / polymer structure / ceramics structure / TiO_2film / plasma CVD / radiation induced surface activation / electron collision cross section / radiation particle code / 放射線照射効果 / 界面相互作用 / モンテカルロシミュレーション / 固体放射線検出器 / トライオード電極 / ポリマー構造 / セラミクス構造 / TiO_2膜 / 放射線誘起表面活性 / 電子衝突断面積 / 放射線粒子コード / SiC Films / Thin Film Deposition / Plasma Reactor / Organic Silane / Mass Spectrometry / Optical Emission Spectroscopy / Plasma / RF プラズマ / SiC膜 / RFプラズマ / 薄膜堆積 / プラズマリアクタ / 有機シリコン / FT-IR / 質量分析 / 発光分光 / 高密度プラズマ / Unequilibrium plasma / Integrated circuit process / Low temperature process / Thin film deposition / Low frequency plasma / Silicon oxide film / Plasma (CVD) / 表面保護膜 / 層間絶縁膜 / ドライプロセス / TEOS+O_2 / 50HzプラズマCVD法 / 非平衡プラズマ / 集積回路ドライプロセス / 低温プロセス / 薄膜生成 / 低周波プラズマ / シリコン酸化膜 / Fine Powder Dielectrics / Uniform Electric Field / AC Breakdown Voltage / Electrical Insulation / Gaseous Dielectrics / Vapor-mist Dielectrics / 衝突電離 / モンテカルロ法 / 計算機シミュレーション / 液体誘電体 / 気体誘電体 / ガス絶縁材料 / 平等電界 / 絶縁ガス / ファインパウダー / 絶縁材料 / Si_3N_4 / SiO_2 / 雷インパルス / 50Hz交流 / フロン / 高電圧絶縁 / 地球環境問題 / ベーパーミスト絶縁 / ベ-パ-ミスト絶縁 / 微粉体絶縁 / インパルス破壊電圧 / 電気的絶縁破壊 / 破壊電圧 / 散布 / ファン / 粒径 / Si_3N_4パウダ / SiO_2パウダ Less

Development of Thin Film Radiation Detectors using TiO_2 film by plasma CVD methodPrincipal Investigator
- Principal Investigator
  
  SHIMOZUMA Mitsuo
- Project Period (FY)
  2003 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  HOKKAIDO UNIVERSITY
Radiation Interaction with Solid Material Surface in Radioisotope Plasmas
- Principal Investigator
  
  DATE Hiroyuki
- Project Period (FY)
  2003 – 2004
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Material processing/treatments
- Research Institution
  HOKKAIDO UNIVERSITY
Deposition of Thin Films Using VHF High-Density Plasmas and In Situ Diagnostics by a Mass Spectrometry, a Spatiotemporally Resolved Optical Emission and an Infrared Spectroscopies
- Principal Investigator
  
  ITOH Hidenori
- Project Period (FY)
  1999 – 2001
- Research Category
  
  Grant-in-Aid for Scientific Research (B)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  MURORAN INSTITUTE OF TECHNOLOGY
Low Temperature Deposition of TiN Diffusion Barrier Metal for Integrated Circuit by Low Frequency Plasma CVDPrincipal Investigator
- Principal Investigator
  
  SHIMOZUMA Mitsuo
- Project Period (FY)
  1998 – 1999
- Research Category
  
  Grant-in-Aid for Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  HOKKAIDO UNIVERSITY
地球環境問題を考慮した高電圧電力機器絶縁に関する基礎的研究
- Principal Investigator
  
  田頭博昭
- Project Period (FY)
  1995
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  電力工学・電気機器工学
- Research Institution
  Hokkaido University
プラズマCVD法による微細トレンチ内壁へのTiN膜低温形成基礎研究Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1995
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Hokkaido University
50HzプラズマCVDによるSiOx膜のGaAs表面保護膜低温形成基礎研究Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1994
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  Electronic materials/Electric materials
- Research Institution
  Hokkaido University
高電圧電力機器絶縁に関する基礎的研究
- Principal Investigator
  
  田頭博昭
- Project Period (FY)
  1993 – 1994
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  電力工学・電気機器工学
- Research Institution
  Hokkaido University
微粉体誘電体による気体(SF_6、空気)の絶縁耐力上昇機構に関する研究
- Principal Investigator
  
  TAGASHIRA Hiroaki
- Project Period (FY)
  1992
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  電力工学
- Research Institution
  Hokkaido University
低周波プラズマCVD法によるポリマー上へのSi0x膜低温堆積に関する基礎研究Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1992
- Research Category
  
  Grant-in-Aid for General Scientific Research (C)
- Research Field
  
  電子材料工学
- Research Institution
  Hokkaido University
Development of Low Temperature Deposition Process of Silicon Oxide Film by Low Frequency Plasma CVD (TEOS+O_2)Principal Investigator
- Principal Investigator
  
  DATE Hiroyuki, 下妻光夫
- Project Period (FY)
  1992 – 1993
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research (B)
- Research Field
  
  応用物理学一般(含航海学)
- Research Institution
  Hokkaido University
低周波放電のプロセスプラズマとしての適用とその制御法の開発Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1990
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Hokkaido University
Development of Low Temperature Deposition Process of Carbon Thin Film by Low Frequency 50Hz Plasma CVD.Principal Investigator
- Principal Investigator
  
  SHIMOZUMA Mitsuo
- Project Period (FY)
  1990 – 1991
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research (B)
- Research Field
  
  電子材料工学
- Research Institution
  College of Medical Technology, Hokkaido University
低周波放電のプロセスプラズマとしての適用とその制御法の開発Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1989
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Hokkaido University
Mechanism of Increase of Dielectric Strength of Gaseous Dielectics by Vapor Mist
- Principal Investigator
  
  TAGASHIRA Hiroaki
- Project Period (FY)
  1989 – 1990
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  電力工学
- Research Institution
  Hokkaido University
低周波放電のプロセスプラズマとしての適用とその制御法の開発Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1988
- Research Category
  
  Grant-in-Aid for Scientific Research on Priority Areas
- Research Institution
  Hokkaido University
Fundamental Research of Vapor-Mist Dielectrics for Insulation of Electric Power Apparatus
- Principal Investigator
  
  TAGASHIRA Hiroaki
- Project Period (FY)
  1987 – 1988
- Research Category
  
  Grant-in-Aid for General Scientific Research (B)
- Research Field
  
  電力工学
- Research Institution
  HOKKAIDO UNIVERSITY
Deveiopment of Room Temperature Deposition Process of Silicon Nitride Film by Low Frequency Plasma CVD.Principal Investigator
- Principal Investigator
  
  SHIMOZUMA Mitsuo
- Project Period (FY)
  1986 – 1987
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research
- Research Field
  
  電子材料工学
- Research Institution
  College of Medical Technology, Hokkaido University
電気化学的プロセスによる非晶質シリコン太陽電池の高性能化の研究Principal Investigator
- Principal Investigator
  
  下妻光夫
- Project Period (FY)
  1985
- Research Category
  
  Grant-in-Aid for Energy Research
- Research Institution
  Hokkaido University
STUDY OF ELECTRICAL INSULATION CONDITION FOR GAS INSULATED CUBICLE (C-GIS) BY <SF_6> AND FLUOROCABON MIXTURES
- Principal Investigator
  
  TAGASHIRA Hiroaki
- Project Period (FY)
  1985 – 1986
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research
- Research Field
  
  電力工学
- Research Institution
  Hokkaido University
Feasibility Study of Traveling Wave Devices Using Compound Semiconductor Superlattice Structures
- Principal Investigator
  
  FUKAI Ichiro
- Project Period (FY)
  1985 – 1986
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research
- Research Field
  
  電子材料工学
- Research Institution
  Hokkaido University
Selectively doped heterojunction CCDPrincipal Investigator
- Principal Investigator
  
  SHIMOZUMA Mitsuo, 大野英男
- Project Period (FY)
  1984 – 1985
- Research Category
  
  Grant-in-Aid for Developmental Scientific Research
- Research Field
  
  電子材料工学
- Research Institution
  Hokkaido University

All 2004 2003

All Journal Article Patent

[Journal Article] Development of TiO_2/Ceramics Radiation Detectors by Plasma CVD.2004
- Author(s)
  Shimozuma M, Yoshino M, Date H, Satoh K, Itoh H.
- Journal Title
  
  The 2l^<st> Symposium on Plasma Processing. P1-32
  
  Pages: 134-135
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560614
[Journal Article] プラズマCVDによる薄膜/セラミクス構造を持つ小型放射線検出器の試作2004
- Author(s)
  下妻光夫
- Journal Title
  
  日本放射線安全管理学会第3回学術大会講演集 3
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560267
[Journal Article] Development of TiO_2/Ceramics Radiation Detectors by Plasma CVD2004
- Author(s)
  Shimozuma M.
- Journal Title
  
  Proceedings of 51^<st> JSAP Spring Meeting 51
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560267
[Journal Article] Monte Carlo Simulation for Designing Radiation Detectors Using Radiation Induced Surface Activation.2004
- Author(s)
  Date H, Tomozawa H, Takamasa T, Okamoto K, Shimozuma M.
- Journal Title
  
  11^<th> International Congress of the International Radiaton Protection Association (IRPA11), Madrid, 3g3 ID : 339
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560614
[Journal Article] Development of Thin Film/ Insulator Radiation Detectors by Plasma CVD2004
- Author(s)
  Shimozuma M.
- Journal Title
  
  Proceedings of 3rd JRSM Meeting 3
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560267
[Journal Article] Development of TiO_2/Ceramics Radiation Detectors by Plasma CVD2004
- Author(s)
  Shimozuma M
- Journal Title
  
  The 21^<th> Symposium on Plasma Processing 21
  
  Pages: 134-135
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560267
[Journal Article] プラズマCVD法による薄膜/セラミクス構造の放射線センサーの開発2004
- Author(s)
  下妻光夫
- Journal Title
  
  第51回応用物理学関係連合講演集 51
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560267
[Journal Article] プラズマCVD法による薄膜/セラミクス構造の放射線センサーの開発2004
- Author(s)
  下妻光夫他
- Journal Title
  
  第51回応用物理学関係連合講演会 28p-S-4
- Data Source
  KAKENHI-PROJECT-15560614
[Journal Article] Development of TiO_2/Ceramics Radiation Detectors by Plasma CVD.2004
- Author(s)
  Shimozuma M et al.
- Journal Title
  
  The 21^<st> Symposium on Plasma Processing P1-32
  
  Pages: 134-135
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560614
[Journal Article] Development of TiO_2/Ceramics Radiation Detectors by Plasma CVD2004
- Author(s)
  Shimozuma M.
- Journal Title
  
  Proceedings of 21^<st> Symposium on Plasma Processing 21
  
  Pages: 134-135
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560267
[Journal Article] Electron collision processes in gaseous xenon.2003
- Author(s)
  H.Date, Y.Ishimaru, M.Shimozuma
- Journal Title
  
  Nucl.Instr.& Meth.in Phys.Res.B 207
  
  Pages: 373-380
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560614
[Journal Article] Deposition of TiO_2 Films by Triode Plasma CVD Method Using TiCl_4+O_2.2003
- Author(s)
  M.Shimozuma, M.Yoshino, H.Date, K.Satoh, H.Itoh
- Journal Title
  
  The 20^<th> Symposium on Plasma Processing. P2-27
  
  Pages: 279-280
- Description
  「研究成果報告書概要(欧文)」より
- Data Source
  KAKENHI-PROJECT-15560614
[Journal Article] Deposition of TiO_2 Films by Triode Plasma CVD Method Using TiCl_4+O_2.2003
- Author(s)
  M.Shimozuma et al.
- Journal Title
  
  The 20^<th> Symposium on Plasma Processing P2-27
  
  Pages: 279-280
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560614
[Patent] 放射線の線量測定素子およびこれを用いた放射線の線量測定装置2004
- Inventor(s)
  伊達広行, 下妻光夫
- Industrial Property Rights Holder
  伊達広行, 下妻光夫
- Filing Date
  2004-05-20
- Data Source
  KAKENHI-PROJECT-15560267
[Patent] 放射線の線量測定素子およびこれを用いた放射線の線量測定装置2004
- Inventor(s)
  伊達広行, 下妻光夫
- Industrial Property Rights Holder
  伊達広行, 下妻光夫
- Filing Date
  2004-05-20
- Description
  「研究成果報告書概要(和文)」より
- Data Source
  KAKENHI-PROJECT-15560267

1. TAGASHIRA Hiroaki (10001174)

# of Collaborated Projects: 13 results

# of Collaborated Products: 0 results
2. DATE Hiroaki (10197600)

# of Collaborated Projects: 11 results

# of Collaborated Products: 4 results
3. OHNO Hideo (00152215)

# of Collaborated Projects: 7 results

# of Collaborated Products: 0 results
4. SAKAI Yosuke (20002199)

# of Collaborated Projects: 6 results

# of Collaborated Products: 0 results
5. OHMORI Yoshiyuki

# of Collaborated Projects: 4 results

# of Collaborated Products: 0 results
6. KANEKO Yoshimatsu (90001271)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
7. 本間利久 (00091497)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
8. 菅原広剛 (90241356)

# of Collaborated Projects: 3 results

# of Collaborated Products: 0 results
9. SATOH Takashi (90048025)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
10. SATO Nobuyasu (20001290)

# of Collaborated Projects: 2 results

# of Collaborated Products: 0 results
11. HASHITSUME Tamotsu (80149898)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
12. ITOH Hidenori (70136282)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
13. SATOH Kohki (50235339)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
14. FUKAI Ichiro (70001740)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
15. HASEGAWA Hideki (60001781)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
16. 飯塚浩一 (30193147)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
17. ピーターヴェンツェック (80261329)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
18. 山本徹 (80261361)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
19. 沢田孝幸 (40113568)

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results
20. 中神芳武

# of Collaborated Projects: 1 results

# of Collaborated Products: 0 results

SHIMOZUMA Mitsuo 下妻 光夫

Research Projects

Research Products

Co-Researchers

Development of Thin Film Radiation Detectors using TiO_2 film by plasma CVD methodPrincipal Investigator

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Low Temperature Deposition of TiN Diffusion Barrier Metal for Integrated Circuit by Low Frequency Plasma CVDPrincipal Investigator

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プラズマCVD法による微細トレンチ内壁へのTiN膜低温形成基礎研究Principal Investigator

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50HzプラズマCVDによるSiOx膜のGaAs表面保護膜低温形成基礎研究Principal Investigator

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低周波プラズマCVD法によるポリマー上へのSi0x膜低温堆積に関する基礎研究Principal Investigator

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Development of Low Temperature Deposition Process of Silicon Oxide Film by Low Frequency Plasma CVD (TEOS+O_2)Principal Investigator

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低周波放電のプロセスプラズマとしての適用とその制御法の開発Principal Investigator

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Development of Low Temperature Deposition Process of Carbon Thin Film by Low Frequency 50Hz Plasma CVD.Principal Investigator

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低周波放電のプロセスプラズマとしての適用とその制御法の開発Principal Investigator

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SHIMOZUMA Mitsuo 下妻光夫