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YOSHII Kumayasu  芳井 熊安

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… Alternative Names

芳井 熊安  ヨシイ クマヤス

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Researcher Number 30029152
External Links
Affiliation (Current) 2025: 大阪大学, その他部局等, 名誉教授
Affiliation (based on the past Project Information) *help 1998 – 2004: Precision Science and Technology, Professor, 大学院・工学研究科, 教授
1998: 大阪大学, 大学院工学研究科, 教授
1995 – 1997: 大阪大学, 工学部, 教授
1990 – 1992: Faculty of Engineering, Osaka Univ., Professor, 工学部, 教授
1989: 大阪大学, 工学部, 助教授
1986 – 1987: 大阪大学, 工学部, 助教授
Review Section/Research Field
Principal Investigator
機械工作・生産工学 / 金属材料(含表面処理・腐食防食) / Applied materials science/Crystal engineering
Except Principal Investigator
機械工作・生産工学 / 金属材料(含表面処理・腐食防食)
Keywords
Principal Investigator
High-rate deposition / Amorphous SiC / Atmospheric pressure plasma CVD / 超高速成膜 / アモルファスSiC / 大気圧プラズマCVD / atom interferometer / atom optics / atom lithography / nanostructure … More / magnetic quadrupole lens / laser cooling / velocity spectrometer / monochromatic atomic beam / 単一速度原子ビーム / ナノストラクチャー / 原子干渉計 / 原子光学 / アトムリソグラフィー / ナノ構造 / 高磁気勾配磁気回路 / レーザー冷却 / 原子ビーム速度分光装置 / 単色原子ビーム / atomic hydrogen radicals / RF sputtering method / polycrystalline silicon film / low temperature growth / 多結晶Si薄膜 / 高周波スパッタ蒸着法 / 低温成膜 / 多結晶 / Si薄膜 / photoluminescence / strained quantum well / phase locked epitaxy / semiconductor laser / 位相制御エピタキシ- / 半導体レ-ザ / フォトルミネッセンス / 歪み量子井戸 / 位相制御エピタキシー / 半導体レーザ / Al_xGa_<1-x>N / エピタキシャル成長 / PA-MBE / 紫外光 / レーザ / AlN / 窒化物半導体 … More
Except Principal Investigator
laser cooling / レーザー冷却 / EEM / Interfacial reactions of Al / Atomic structures of amorphous silicon carbide films / Ion beam sputtering device / metal multiple layered films / Ceramics / アモルファス炭化ケイ素 / 界面反応 / アモルファス薄膜界面 / 金属 / 多層薄膜 / イオンビームスパッター蒸着 / 非晶質炭化ケイ素多層膜の界面反応 / A1 / 非晶質炭化ケイ素薄膜の原理的構造 / イオンビームスパック装置 / 金属多層薄膜 / セラミックス / atom interferometer / atom optics / atom lithography / nanostructure / magnetic quadruple lens / velocity spectrometer / monochromatic atomic beam / 速度圧縮 / 中性原子速度分光 / 中性原子ビーム / 原子波干渉 / 原子干渉磁気回路 / 単色原子ビーム / 原子光学 / stimulated light force / ECR plasma / metastable lifetime / laser collimation / neutral F radical beam / NFィイD23ィエD2 plasma / anisotropic dry etching / フッ素ラジカル / ECRラジカル源 / Fラジカルビーム / 半導体ドライエッチング / 誘導放射圧 / ECRプラズマ / 準安定寿命 / レーザーコリメーション / 中性Fラジカルビーム / NF_3プラズマ / 異方性ドライエッチング / Ultra clean technology / First-principles molecular dynamics simulation / Electrochemical machining in ultrapure water / Atmospheric pressure plasma CVD / Plasma CVM / Ultra precision machining / Perfect surfaces / STM / 第一原理分子動力学シュミレーション / 超純粋電解加工 / ウルトラクリーンテクノロジー / 第一原理分子動力学シミュレーション / 超純水電解加工 / 大気圧プラズマCVD / プラズマCVM / 超精密加工 / 完全表面 / liquid phase crystal growth / Si sheet / dislocation-free single crystal Si / 無転移単結晶Si / 液相成長 / Siシート / 無転位単結晶Si / Quantum-size effect / Heterostructure energy-band diagram / Optical absorption / X-ray small angle scattering / Amorphous semiconductor superlattices / Amorphous semiconductor films / 真空紫外光電子分光 / 結晶化 / 量子サイズ効果 / ヘテロ接合界面エネルギ-バンド図 / 光学吸収 / X線小角散乱 / アモルファス半導体超格子 / アモルファス半導体薄膜 Less
  • Research Projects

    (11 results)
  • Co-Researchers

    (10 People)
  •  窒化物半導体による紫外光(UV)レーザへの発展Principal Investigator

    • Principal Investigator
      芳井 熊安
    • Project Period (FY)
      2002 – 2004
    • Research Category
      Grant-in-Aid for Exploratory Research
    • Research Field
      Applied materials science/Crystal engineering
    • Research Institution
      Osaka University
  •  Extremely High-Rate Deposition of High-Quality Amorphous Silicon Carbide FilmsPrincipal Investigator

    • Principal Investigator
      YOSII Kumayasu
    • Project Period (FY)
      2001 – 2003
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      機械工作・生産工学
    • Research Institution
      Osaka University
  •  Formation of Monochromatic Atomic Beam for Atom interferometer

    • Principal Investigator
      YASUTAKE Kiyoshi
    • Project Period (FY)
      1999 – 2001
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      機械工作・生産工学
    • Research Institution
      Osaka University
  •  Formation of Monochromatic Atomic Beam for NanolithographyPrincipal Investigator

    • Principal Investigator
      YOSHII Kumayasu
    • Project Period (FY)
      1998 – 2000
    • Research Category
      Grant-in-Aid for Scientific Research (B).
    • Research Field
      機械工作・生産工学
    • Research Institution
      Osaka University
  •  Development of Anisotropic Dry Etching Process Using Laser Cooling Method

    • Principal Investigator
      YASUTAKE Kiyoshi
    • Project Period (FY)
      1997 – 1999
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      機械工作・生産工学
    • Research Institution
      Osaka University
  •  Growth of Dislocation-Free Single Crystal Silicon Sheet

    • Principal Investigator
      YASUTAKE Kiyoshi
    • Project Period (FY)
      1996 – 1998
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      機械工作・生産工学
    • Research Institution
      Osaka University
  •  Creation of Perfect Surfaces

    • Principal Investigator
      MORI Yuzo
    • Project Period (FY)
      1996 – 2002
    • Research Category
      Grant-in-Aid for COE Research
    • Research Institution
      Osaka University
  •  Low temperature growth of polycrystalline semiconductor and diamond filmsPrincipal Investigator

    • Principal Investigator
      YOSHII Kumayasu
    • Project Period (FY)
      1995 – 1996
    • Research Category
      Grant-in-Aid for Scientific Research (B)
    • Research Field
      機械工作・生産工学
    • Research Institution
      Osaka University
  •  Development of InGaAs/GaAs strained single quantum well laser by phase looked epitaxy method.Principal Investigator

    • Principal Investigator
      YOSHII Kumayasu
    • Project Period (FY)
      1991 – 1992
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      金属材料(含表面処理・腐食防食)
    • Research Institution
      Osaka University
  •  Microstructure and Physical Property of a-Si : H/a-SiC : H Super-Lattices

    • Principal Investigator
      KAWABE Hideaki
    • Project Period (FY)
      1989 – 1990
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      金属材料(含表面処理・腐食防食)
    • Research Institution
      Osaka University
  •  Development of Ceramics/metal Multiple Layered Films with High Strength and Ductility

    • Principal Investigator
      KAWABE Hideaki
    • Project Period (FY)
      1986 – 1987
    • Research Category
      Grant-in-Aid for General Scientific Research (B)
    • Research Field
      金属材料(含表面処理・腐食防食)
    • Research Institution
      Osaka University
  • 1.  YASUTAKE Kiyoshi (80166503)
    # of Collaborated Projects: 11 results
    # of Collaborated Products: 0 results
  • 2.  KAKIUCHI Hiroaki (10233660)
    # of Collaborated Projects: 8 results
    # of Collaborated Products: 0 results
  • 3.  KAWABE Hideaki (90028978)
    # of Collaborated Projects: 3 results
    # of Collaborated Products: 0 results
  • 4.  MORI Yuzo (00029125)
    # of Collaborated Projects: 2 results
    # of Collaborated Products: 0 results
  • 5.  大参 宏昌 (00335382)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 6.  HIROSE Kikuji (10073892)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 7.  KATAOKA Toshihiko (50029328)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 8.  ENDO Katsuyoshi (90152008)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 9.  MORITA Mizuho (50157905)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results
  • 10.  青野 正和 (10184053)
    # of Collaborated Projects: 1 results
    # of Collaborated Products: 0 results

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